TWI583927B - 用於監控耦合至處理腔室之流量控制器的方法 - Google Patents
用於監控耦合至處理腔室之流量控制器的方法 Download PDFInfo
- Publication number
- TWI583927B TWI583927B TW101135955A TW101135955A TWI583927B TW I583927 B TWI583927 B TW I583927B TW 101135955 A TW101135955 A TW 101135955A TW 101135955 A TW101135955 A TW 101135955A TW I583927 B TWI583927 B TW I583927B
- Authority
- TW
- Taiwan
- Prior art keywords
- flow controller
- flow
- time
- value
- controller
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 175
- 230000008569 process Effects 0.000 title claims description 85
- 238000012544 monitoring process Methods 0.000 title claims description 61
- 239000007789 gas Substances 0.000 claims description 116
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 21
- 238000005070 sampling Methods 0.000 claims description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 230000001186 cumulative effect Effects 0.000 claims 1
- 238000012545 processing Methods 0.000 description 49
- 239000000758 substrate Substances 0.000 description 34
- 238000012937 correction Methods 0.000 description 12
- 230000008859 change Effects 0.000 description 7
- 238000011065 in-situ storage Methods 0.000 description 7
- 230000006399 behavior Effects 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 230000001939 inductive effect Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000002405 diagnostic procedure Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 230000000135 prohibitive effect Effects 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000004164 analytical calibration Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical group C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000006903 response to temperature Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/15—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters specially adapted for gas meters
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0623—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the set value given to the control element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Fluid Mechanics (AREA)
- Flow Control (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161540817P | 2011-09-29 | 2011-09-29 | |
| US13/627,659 US9772629B2 (en) | 2011-09-29 | 2012-09-26 | Methods for monitoring a flow controller coupled to a process chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201331558A TW201331558A (zh) | 2013-08-01 |
| TWI583927B true TWI583927B (zh) | 2017-05-21 |
Family
ID=47996756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101135955A TWI583927B (zh) | 2011-09-29 | 2012-09-28 | 用於監控耦合至處理腔室之流量控制器的方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9772629B2 (enExample) |
| JP (3) | JP6328556B2 (enExample) |
| KR (1) | KR102062593B1 (enExample) |
| CN (1) | CN103930972B (enExample) |
| TW (1) | TWI583927B (enExample) |
| WO (1) | WO2013049512A2 (enExample) |
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| JP5346628B2 (ja) * | 2009-03-11 | 2013-11-20 | 株式会社堀場エステック | マスフローコントローラの検定システム、検定方法、検定用プログラム |
| US8707754B2 (en) * | 2010-04-30 | 2014-04-29 | Applied Materials, Inc. | Methods and apparatus for calibrating flow controllers in substrate processing systems |
| US9091397B2 (en) * | 2012-03-27 | 2015-07-28 | Lam Research Corporation | Shared gas panels in plasma processing chambers employing multi-zone gas feeds |
| US20140271243A1 (en) * | 2013-03-14 | 2014-09-18 | Usc, L.L.C. | Pump stand with improved pump control |
| DE102013106155A1 (de) * | 2013-06-13 | 2014-12-18 | Endress + Hauser Flowtec Ag | Meßsystem mit einem Druckgerät sowie Verfahren zur Überwachung und/oder Überprüfung eines solchen Druckgeräts |
| EP3211288B1 (en) | 2016-02-26 | 2023-10-25 | Nel Hydrogen A/S | A control system for a hydrogen refuelling station |
| EP3211289B1 (en) * | 2016-02-26 | 2021-12-15 | Nel Hydrogen A/S | Communication/control system for a hydrogen refuelling system |
| JP6541596B2 (ja) * | 2016-03-22 | 2019-07-10 | 東京エレクトロン株式会社 | プラズマ処理方法 |
| JP6767232B2 (ja) * | 2016-10-14 | 2020-10-14 | 東京エレクトロン株式会社 | 基板処理装置の流量制御器によって出力されるガスの出力流量を求める方法 |
| JP6996289B2 (ja) * | 2016-12-26 | 2022-01-17 | 株式会社島津製作所 | バルブ装置 |
| US10663337B2 (en) | 2016-12-30 | 2020-05-26 | Ichor Systems, Inc. | Apparatus for controlling flow and method of calibrating same |
| CA3007375A1 (en) * | 2017-06-15 | 2018-12-15 | Kevin Kornelsen | Calibration-less micro-fabricated vacuum gauge devices and method for measuring pressure |
| US11327510B2 (en) * | 2018-05-23 | 2022-05-10 | Hitachi Metals, Ltd. | Multi-chamber rate-of-change system for gas flow verification |
| US10760944B2 (en) * | 2018-08-07 | 2020-09-01 | Lam Research Corporation | Hybrid flow metrology for improved chamber matching |
| JP2020086936A (ja) * | 2018-11-26 | 2020-06-04 | 株式会社フジキン | 流量変化の評価装置、方法、及びコンピュータプログラム |
| US11817297B2 (en) * | 2020-03-06 | 2023-11-14 | Applied Materials, Inc. | System and method for managing substrate outgassing |
| US11486927B2 (en) * | 2020-04-02 | 2022-11-01 | Applied Materials, Inc. | Bode fingerprinting for characterizations and failure detections in processing chamber |
| US11693435B2 (en) * | 2020-06-25 | 2023-07-04 | Applied Materials, Inc. | Ethercat liquid flow controller communication for substrate processing systems |
| CN111968901B (zh) * | 2020-08-25 | 2022-08-16 | 北京北方华创微电子装备有限公司 | 半导体反应腔室及半导体加工设备 |
| US20220084842A1 (en) * | 2020-09-11 | 2022-03-17 | Applied Materials, Inc. | Antifragile systems for semiconductor processing equipment using multiple special sensors and algorithms |
| DE102020124936B4 (de) * | 2020-09-24 | 2024-11-28 | VON ARDENNE Asset GmbH & Co. KG | Verfahren, sowie Steuervorrichtung und nichtflüchtiger Datenspeicher, aufweisend Codesegmente, zum Durchführen desselbigen |
| US12191214B2 (en) * | 2021-03-05 | 2025-01-07 | Taiwan Semiconductor Manufacturing Company Limited | System and methods for controlling an amount of primer in a primer application gas |
| US20230088457A1 (en) * | 2021-09-17 | 2023-03-23 | Applied Materials, Inc. | Energy efficiency improvement with continuous flow modulation in cluster tool |
| US12518989B2 (en) | 2021-09-23 | 2026-01-06 | Applied Materials Inc. | In-situ calibration/optimization of emissivity settings in vacuum for temperature measurement |
| CN117707100B (zh) * | 2024-02-06 | 2024-04-19 | 深圳市杰美康机电有限公司 | EtherCAT总线驱动控制器及其同步控制方法 |
| US20250347579A1 (en) * | 2024-05-13 | 2025-11-13 | Applied Materials, Inc. | Method of in situ leak monitoring in fluid circuits |
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| JPH06275562A (ja) * | 1993-03-24 | 1994-09-30 | Toshiba Emi Ltd | プラズマ処理装置 |
| TW200600990A (en) * | 2004-02-12 | 2006-01-01 | Mykrolis Corp | System and method for flow monitoring and control |
| CN1848015A (zh) * | 2005-12-09 | 2006-10-18 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种半导体设备中气体校准的方法 |
| KR100969990B1 (ko) * | 2008-03-21 | 2010-07-15 | 주식회사 아토 | 질량 유량 조절기의 점검 방법 및 장치 |
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| JPH08335118A (ja) | 1995-06-06 | 1996-12-17 | Hitachi Metals Ltd | 流量制御方法 |
| JPH09305202A (ja) * | 1996-05-16 | 1997-11-28 | Kokusai Electric Co Ltd | ガス流量の監視制御装置 |
| US5944048A (en) | 1996-10-04 | 1999-08-31 | Emerson Electric Co. | Method and apparatus for detecting and controlling mass flow |
| JPH10232714A (ja) * | 1997-02-18 | 1998-09-02 | Kokusai Electric Co Ltd | 流量制御装置の診断装置 |
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| KR100427563B1 (ko) | 1999-04-16 | 2004-04-27 | 가부시키가이샤 후지킨 | 병렬분류형 유체공급장치와, 이것에 사용하는 유체가변형압력식 유량제어방법 및 유체가변형 압력식 유량제어장치 |
| JP4332986B2 (ja) | 2000-04-24 | 2009-09-16 | 日立金属株式会社 | 質量流量制御装置 |
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| JP5442413B2 (ja) * | 2009-12-03 | 2014-03-12 | ルネサスエレクトロニクス株式会社 | 半導体製造装置および流量制御装置 |
| JP5650548B2 (ja) * | 2009-12-25 | 2015-01-07 | 株式会社堀場エステック | マスフローコントローラシステム |
-
2012
- 2012-09-26 US US13/627,659 patent/US9772629B2/en active Active
- 2012-09-28 KR KR1020147011427A patent/KR102062593B1/ko active Active
- 2012-09-28 TW TW101135955A patent/TWI583927B/zh active
- 2012-09-28 WO PCT/US2012/057830 patent/WO2013049512A2/en not_active Ceased
- 2012-09-28 JP JP2014533371A patent/JP6328556B2/ja active Active
- 2012-09-28 CN CN201280055872.7A patent/CN103930972B/zh active Active
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2017
- 2017-08-28 US US15/687,573 patent/US10222810B2/en active Active
- 2017-10-13 JP JP2017199297A patent/JP6789909B2/ja active Active
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2019
- 2019-10-10 JP JP2019186493A patent/JP6912540B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06275562A (ja) * | 1993-03-24 | 1994-09-30 | Toshiba Emi Ltd | プラズマ処理装置 |
| TW200600990A (en) * | 2004-02-12 | 2006-01-01 | Mykrolis Corp | System and method for flow monitoring and control |
| CN1848015A (zh) * | 2005-12-09 | 2006-10-18 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种半导体设备中气体校准的方法 |
| KR100969990B1 (ko) * | 2008-03-21 | 2010-07-15 | 주식회사 아토 | 질량 유량 조절기의 점검 방법 및 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2013049512A3 (en) | 2013-05-23 |
| WO2013049512A2 (en) | 2013-04-04 |
| CN103930972A (zh) | 2014-07-16 |
| TW201331558A (zh) | 2013-08-01 |
| JP2020038678A (ja) | 2020-03-12 |
| KR102062593B1 (ko) | 2020-01-06 |
| JP2018037091A (ja) | 2018-03-08 |
| US20130092243A1 (en) | 2013-04-18 |
| US10222810B2 (en) | 2019-03-05 |
| JP2014528606A (ja) | 2014-10-27 |
| JP6912540B2 (ja) | 2021-08-04 |
| JP6789909B2 (ja) | 2020-11-25 |
| CN103930972B (zh) | 2017-01-18 |
| KR20140069305A (ko) | 2014-06-09 |
| US20180024573A1 (en) | 2018-01-25 |
| US9772629B2 (en) | 2017-09-26 |
| JP6328556B2 (ja) | 2018-05-23 |
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