TWI581397B - 晶片封裝、電腦系統、和電子裝置 - Google Patents
晶片封裝、電腦系統、和電子裝置 Download PDFInfo
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- TWI581397B TWI581397B TW102116547A TW102116547A TWI581397B TW I581397 B TWI581397 B TW I581397B TW 102116547 A TW102116547 A TW 102116547A TW 102116547 A TW102116547 A TW 102116547A TW I581397 B TWI581397 B TW I581397B
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Classifications
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- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
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Description
此申請案係關於藉由羅伯特J.德羅斯特等人之美國專利申請案第12/507,349號、標題為“高帶寬斜坡堆疊晶片封裝”,其係在2009年7月22日提出,其內容以引用的方式併入本文中(代理人案號SUN09-0678)。
本揭示內容大致上有關半導體晶片封裝。更明確地是,本揭示內容有關包含被配置在一堆疊中之一群晶片、及一斜坡零組件的晶片封裝,該斜坡零組件相對該堆疊被導向在一角度,且被耦接至該等晶片。
相較於被連接至印刷電路板之傳統個別地封裝的晶片,包含堆疊半導體晶片之晶片封裝能提供較高的性能及較低之成本。這些晶片封裝亦提供某些優點、諸如該能力:在該堆疊中之不同晶片上使用不同製程,以組合較高密度的邏輯及記憶體,及使用較少功率來傳送資料。譬如,提
供動態隨機存取記憶體(DRAM)的晶片之堆疊能使用高金屬層計數、在基底晶片中之高性能邏輯處理,以施行輸入/輸出(I/O)及控制器功能,且一組較低的金屬層計數、專用DRAM處理之晶片能被使用於該堆疊的其餘部分。以此方式,該組合之晶片組可比以下者具有較佳之性能及較低的成本:使用該DRAM製程所製成之單一晶片,其包含I/O及控制器功能;使用邏輯製程所製成之單一晶片,其包含記憶體電路;及/或使用單一製程,以製成邏輯及記憶體物理結構。
用於堆疊晶片之現存技術包含引線接合及直通矽晶穿孔(TSVs)。引線接合係一低帶寬、價格便宜之技術,其中晶片係彼此偏置地堆疊,以界定一樓梯狀之晶片邊緣,其包含暴露的接合墊片。電連接至該等晶片係藉由將引線接合至這些接合墊片所施行。
於對比中,TSVs典型具有比引線接合較高的帶寬。於TSV加工技術中,晶片被處理,以致其金屬層在其工作面上的一或多層係導電地連接至其背面上之新的墊片。然後,晶片係黏著地連接在一堆疊中,以致一晶片的背面上之新的墊片與一鄰接晶片的工作面上之對應墊片造成導電接觸。
然而,TSVs典型比引線接合具有較高的成本。這是因為TSVs通過晶片之工作矽層。因此,TSV佔有能被使用於電晶體或佈線的區域。此機會成本可為大的。譬如,如果該TSV排除或保留直徑係20微米,且TSVs被放置
在30微米節距,則大約45%的矽區域被該TSVs所消耗。這使用於該堆疊中之晶片中的任何電路之每一面積的成本約略地加倍。(其實,該間接費用係極可能甚至更大的,因為電路典型散開以容納TSVs,其浪費更多面積)。此外,製造TSVs通常必需額外之處理操作,其亦增加該晶片成本。
因此,所需要者係一晶片封裝,其提供堆疊晶片之優點,而沒有上述的問題。
本揭示內容的一實施例提供一晶片封裝,其包含於直立方向中被配置在一堆疊中的一組半導體晶粒,該直立方向係實質上垂直於該堆疊中之第一半導體晶粒的平面。於此堆疊中,在該第一半導體晶粒之後,給定的半導體晶粒係於該平面中之水平方向中由直接地在該堆疊中的前一半導體晶粒偏置達一偏置值,藉此在該堆疊的一側面界定一階梯狀斜坡區。再者,該階梯狀斜坡區中之半導體晶粒的每一者之表面包含二列大約平行於該等半導體晶粒之邊緣的第一墊片。再者,該晶片封裝包含連接器,其被電性地與機械地耦接至該等第一墊片;及斜坡零組件,其被電性地與機械地耦接至該等半導體晶粒。此斜坡零組件被定位在該堆疊的一側面上,且係沿著該階梯狀斜坡區大約平行於一方向,該方向係在該水平方向及該直立方向之間。另外,該斜坡零組件具有一包含第二墊片的表面,用於該等
半導體晶粒之每一者,該等第二墊片被配置在至少二列之第二墊片中,且該等連接器被電性地與機械地耦接至該等第二墊片。
注意該斜坡零組件可為被動零組件、諸如具有電耦接至該等半導體晶粒之金屬跡線的塑膠基板。另一選擇係,該斜坡零組件可為另一半導體晶粒。
再者,該等連接器可包含焊料球,且該等連接器可被牢牢地機械式耦接至該等第一墊片及該等第二墊片。譬如,該等焊料球具有二不同尺寸,及該等焊料球的第一尺寸可為與該二列第一墊片中之第一列有關聯,且該等焊料球的第二尺寸可為與該二列第一墊片中之第二列有關聯。另一選擇或另外,該等第一墊片可具有二不同尺寸;該等第一墊片之第一尺寸可為與該二列第一墊片中之第一列有關聯,且該等第一墊片的第二尺寸可為與該二列第一墊片中之第二列有關聯。類似地,該等第二墊片可具有二不同尺寸;該等第二墊片的第一尺寸可為與至少該二列第二墊片中之第一列有關聯,且該等第二墊片的第二尺寸可為與至少該二列第二墊片中之第二列有關聯。於一些實施例中,至少部份該等第一墊片及該等第二墊片具有橢圓的形狀及/或至少部份該等焊料球被壓縮超過該等焊料球之剩餘部分。
於一些實施例中,該斜坡零組件係藉由撓性連接器(諸如微型彈簧連接器)電性地耦接至該等半導體晶粒的每一者,且該等連接器能為可再配對地機械式耦接至該等第
一墊片與該等第二墊片。譬如,該等撓性連接器可具有二不同高度,在此該等撓性連接器之第一高度可為與該二列第一墊片中之第一列有關聯,且該等撓性連接器之第二高度可為與該二列第一墊片中之第二列有關聯。另一選擇係,該斜坡零組件可藉由各向異性的薄膜被電性地耦接至該等半導體晶粒的每一者。
為促進該等半導體晶粒及該斜坡零組件間之電耦接,該斜坡零組件可包含被設置在該表面上及被成列地配置的導柱,且在此用於該等半導體晶粒的每一者之二列第二墊片的至少一者被設置在該等導柱列之其中一者上。
於一些實施例中,該等半導體晶粒之表面包含被設置在該表面上及被成列地配置的負極部件(諸如蝕刻凹處),及在此用於該等半導體晶粒的每一者之二列第二墊片的至少一者被設置在該等負極部件列之其中一者上。再者,該等負極部件中之正極部件(諸如焊料球,其可為該等連接器)維持該堆疊中之半導體晶粒的相對對齊。
注意該斜坡零組件可促進電信號及功率信號至該等半導體晶粒之傳遞,而在該等半導體晶粒中沒有穿晶片孔。
於一些實施例中,該晶片封裝一於該堆疊中之半導體晶粒的至少二者之間的中介晶片。該中介晶片可沿著該水平方向運送藉由該等半導體晶粒之至少二者的操作所產生之熱。
另一實施例提供一包含該晶片封裝的電腦系統。
另一實施例提供一包含該晶片封裝之電子裝置。
100‧‧‧晶片封裝
110‧‧‧半導體晶粒
110-1‧‧‧半導體晶粒
110-2‧‧‧半導體晶粒
112‧‧‧斜坡零組件
116‧‧‧堆疊
118‧‧‧水平方向
120‧‧‧直立方向
122‧‧‧方向
124‧‧‧恆定之角度
126‧‧‧偏置值
128‧‧‧階梯狀斜坡區
130‧‧‧表面
132‧‧‧墊片
134‧‧‧連接器
136‧‧‧表面
138‧‧‧墊片
140‧‧‧計算晶片
142‧‧‧中介晶片
210‧‧‧邊緣
300‧‧‧晶片封裝
400‧‧‧晶片封裝
410‧‧‧焊料球
500‧‧‧晶片封裝
510‧‧‧焊料球
550‧‧‧晶片封裝
560‧‧‧晶片封裝
570‧‧‧墊片節距
572‧‧‧墊片節距
600‧‧‧晶片封裝
610‧‧‧表面
612‧‧‧銅導柱
614‧‧‧墊片
700‧‧‧晶片封裝
710‧‧‧表面
712‧‧‧凹處
714‧‧‧墊片
800‧‧‧晶片封裝
810‧‧‧連接器
900‧‧‧晶片封裝
1000‧‧‧電子裝置
1010‧‧‧電源
1012‧‧‧晶片封裝
1100‧‧‧電腦系統
1108‧‧‧晶片封裝
1110‧‧‧處理器
1112‧‧‧通訊介面
1114‧‧‧使用者介面
1116‧‧‧顯示器
1118‧‧‧鍵盤
1120‧‧‧指標
1122‧‧‧信號線
1124‧‧‧記憶體
1126‧‧‧作業系統
1128‧‧‧通訊模組
1130‧‧‧程式模組
注意遍及該等圖面之相像的參考數字意指對應零件。再者,相同零件之多數實例被標以共同之字首,而藉由一短劃來與實例數目分開。
圖1係方塊圖,說明按照本揭示內容之實施例的晶片封裝之側視圖。
圖2係方塊圖,說明按照本揭示內容之實施例的晶片封裝之俯視圖。
圖3係方塊圖,說明按照本揭示內容之實施例而具有連接器幾何形狀問題的晶片封裝之側視圖。
圖4係方塊圖,說明按照本揭示內容之實施例而具有被壓縮的焊料球之晶片封裝的側視圖。
圖5A係方塊圖,說明按照本揭示內容之實施例而具有不同尺寸設計的焊料球之晶片封裝的側視圖。
圖5B係方塊圖,說明按照本揭示內容之實施例而具有不同墊片節距的晶片封裝之俯視圖。
圖5C係方塊圖,說明按照本揭示內容之實施例而具有不同墊片節距的晶片封裝之俯視圖。
圖6係方塊圖,說明按照本揭示內容之實施例而具有選擇性地升高在一表面上方的墊片之晶片封裝的側視圖。
圖7係方塊圖,說明按照本揭示內容之實施例而具有選擇性地降低至一表面下方的墊片之晶片封裝的側視圖。
圖8係方塊圖,說明按照本揭示內容之實施例而具有撓性連接器的晶片封裝之側視圖。
圖9係方塊圖,說明按照本揭示內容之實施例的晶片封裝之側視圖。
圖10係方塊圖,說明一包含按照本揭示內容之實施例的一或多個晶片封裝之電子裝置。
圖11係方塊圖,說明一包含按照本揭示內容之實施例的一或多個晶片封裝之電腦系統。
表1提供按照本揭示內容之實施例的晶片封裝中之幾何參數的範例。
晶片封裝、包含該晶片封裝之電子裝置、及包含該晶片封裝的電腦系統之實施例被敘述。此晶片封裝包含彼此偏置的半導體晶粒或晶片之堆疊,藉此界定一具有暴露之墊片的斜坡區。再者,該階梯狀斜坡區中之半導體晶粒的每一者之表面包含大約平行於該等半導體晶粒的邊緣之二列第一墊片。再者,該晶片封裝包含一高帶寬斜坡零組件,其被定位成大約平行於該斜坡區,且用於該等半導體晶粒的每一者,其具有一包含被配置在至少二列第二墊片中之第二墊片的表面。該等第二墊片係藉由連接器電性地與機械地耦接至該等暴露的第一墊片。譬如,該等連接器可包含:焊料、撓性連接器及/或各向異性的薄膜。因此,該晶片封裝中之電接觸點可具有一導電、電容或大致上複合的阻抗。再者,該等晶片及/或該斜坡零組件可使用球與凹處對齊技術相對彼此被定位。
藉由移除對於該等半導體晶粒中之昂貴及面積消耗的直通矽晶穿孔(TSVs)之需要,該晶片封裝可有助於晶片將被以一提供高帶寬及低成本的方式堆疊。譬如,該成本可藉由避免與該等半導體晶粒中之TSVs有關聯的處理操作及浪費的面積而被減少。如此,該堆疊中之晶片可使用標準之處理而被製成。再者,撓性連接器及/或各向異性的薄膜可具有一較低的成本及/或可提供比引線接合改善之可靠性。注意於實施例中,該等晶片及該斜坡零組件間之機械及/或電耦接係可再配對的,該晶片封裝之產量可藉由允許重加工(諸如替換壞的晶片,其在組裝或燒入期間被識別)而增加。
此外,該晶片封裝能比引線接合提供較高的零組件相互間之通訊帶寬。雖然TSVs原則上提供較高的帶寬,這典型需要大量TSVs,其消耗該等半導體晶粒中之顯著百分比的矽面積。用於浪費較少矽面積的適當數目之TSVs,該斜坡零組件能提供可比較的零組件相互間之通訊帶寬。再者,藉由在該等半導體晶粒及該斜坡零組件上包含二列墊片,該晶片封裝有助於非平行表面間之高帶寬電耦接。
我們現在敘述一晶片封裝之實施例。圖1呈現一方塊圖,說明包含沿著直立方向120被配置在一堆疊116中之一組晶片或半導體晶粒110的晶片封裝100之側視圖,該方向120實質上係垂直於一平行於半導體晶粒110-1的平面。於此堆疊中,在半導體晶粒110-1(諸如半導體晶粒
110-2)之後,每一半導體晶粒可為於該平面中之水平方向118中由直接地在該堆疊116中的前一半導體晶粒偏置達至少一偏置值126,藉此在該堆疊116的一側面界定一階梯狀斜坡區128(具有恆定之角度124)。再者,該階梯狀斜坡區128中之半導體晶粒110的每一者之表面130包含二列墊片132。如圖2所示,其呈現一說明晶片封裝100之俯視圖的方塊圖,墊片132可為大約平行於半導體晶粒110之邊緣210。
回頭參考圖1,晶片封裝100包含電性地與機械地耦接至墊片132的連接器134、及一電性地與機械地被耦接至半導體晶粒110之斜坡零組件112。此斜坡零組件被定位在該堆疊116的一側面上,且係沿著階梯狀斜坡區128大約平行於一方向122,該方向係於水平方向118及直立方向120之間。另外,用於半導體晶粒110的每一者,斜坡零組件112具有一包含被配置在至少二列墊片138中之墊片138的表面136,且連接器134係電性地與機械地耦接至墊片138。
如此,半導體晶粒110可互相通訊,並經由斜坡零組件112與外部裝置或系統通訊。注意該斜坡零組件112可促進電信號及功率信號之傳遞至半導體晶粒110,而於半導體晶粒110中沒有TSVs。因此,半導體晶粒110可使用標準之矽處理而被製成。再者,這些半導體晶粒可提供支援邏輯及/或記憶體功能的矽面積。
大致上,用於機械及電性的理由,半導體晶粒或晶片
係彼此附著或附著至一晶片封裝中之基板。譬如,當該晶片封裝被繞行時(諸如在軟焊或印刷板組裝期間),基板可對晶片提供額外之剛性,該剛性可使得該晶片更易於處理。再者,晶片係典型僅只有用的,只要其能承接功率及與外部環境通訊。於傳統之倒裝晶片封裝中,該晶片之頂部表面被咬合至一基板,藉此提供一完全2D面積,其中功率及輸入/輸出(I/O)信號能於該基板及該晶片之間通過。藉由僅只將每一晶片之單一邊緣呈現至該基板(或斜坡零組件112),晶片封裝100之組構顯著地改變此典範。然而,此組構可顯著地限制至該晶片的I/O及功率運送。如此,當傳統之倒裝晶片封裝允許該I/O能力因該晶片尺寸被增加而隨著該面積線性地調整時,晶片封裝100中之組構可僅只允許該I/O能力隨著該晶片邊緣長度而線性地生長,如此當比較於該晶片面積時,使有限I/O之問題惡化。
為處理此挑戰,晶片封裝100中的半導體晶粒110及斜坡零組件112間之連接數目係藉由加入第二列墊片132及138所增加。然而,此方式導入另一問題。特別地是,因為該堆疊幾何形狀,表面130及136間之距離或間隙係未恆定的。因此,其將為難以使用單一焊料球尺寸來連接兩列墊片132及138,其通常被使用於傳統之倒裝晶片封裝中。此連接器幾何形狀問題被說明於圖3中,其呈現一說明晶片封裝300之側視圖的方塊圖。
如圖1所示及進一步在下面被敘述,該連接器幾何形狀問題可使用在半導體晶粒110及斜坡零組件112上之至
少二列墊片或連接器而被處理。這些額外之墊片潛在地加倍I/O連接的數目。因為通訊傾向於成為現代系統中之限制因素,這些額外的I/O連接可顯著地增加該晶片封裝之性能。譬如,該等額外之墊片能提供更多功率/接地連接,其能藉由減少經過該等墊片之電流,且如此減少老化而增加晶片封裝100的壽命。另一選擇係,該等額外之功率/接地連接能夠使用具有較大電流及電壓需求的較高功率零組件。
再者,該等額外之I/O連接可為能夠有用於通訊及/或額外的通訊通道之增加的帶寬。譬如,使用晶片封裝100,由如此多的DRAM晶片可用之帶寬能被存取,且在斜坡零組件112的相反側面上由半導體晶粒110準備好一選擇性計算晶片140。此計算晶片可藉由穿基板孔(TSVs)被電耦接至半導體晶粒110(其係藉由斜坡零組件112中之虛線所指示),其可有助於與半導體晶粒110之電或功率信號的通訊。再者,選擇性基板140可包含:用於記憶體的緩衝或邏輯晶片、及/或I/O至外部裝置及/或系統。
於示範實施例中,堆疊116中之半導體晶粒110的每一者可為x8-DDR3 DRAM零組件。這些記憶體裝置的每一者可具有92個I/O栓銷,其中之51個可為用於功率及接地,且該剩餘41個可為用於信號。該等半導體晶粒可具有8.3×7.0平方毫米之尺寸,且具有沿著該短尺寸配置的I/O墊片。這意指如果所有該等I/O墊片沿著DRAM零組件之短邊緣被放置於單一列中,每一I/O墊片將僅只有
76微米。此距離包含該墊片本身及墊片間之間距,其係需要的,以確保該焊料不會橋接在墊片之間,且在一起使信號短路。以目前技術,這是一很有侵略性的節距。傳統之倒裝晶片焊接技術目前係約150微米節距。藉由使用二列墊片,墊片間之間距能被增加,以致倒裝晶片封裝焊料球技術(包含傳統的焊料球尺寸與間距)能被使用,藉此減少因為侵略性定比的不佳連接之風險。
雖然圖1說明晶片封裝100之特別組構,許多技術及組構可被用來施行電接觸、機械對齊、組裝、及/或斜坡零組件112與半導體晶粒110間之電I/O。特別地是,各種技術可被用來處理該連接器幾何形狀問題,譬如,藉由改變該等焊料球的尺寸來負責表面130及136間之可變的間隙,以致零組件間之連接能被建立。該結果之連接亦可為能耐受錯誤的,該等錯誤可當焊料球於迴焊期間被壓縮時發生。我們現在敘述數個這些實施例。
如先前所述,於一技術中,連接器134可包含焊料球(諸如可迴焊的焊料層),且連接器134可被牢牢地機械式耦接至墊片132及138。特別地是,該等連接可被設計,以致一些連接間之橋接不會發生,藉此消除晶片封裝中之錯誤的成因之其中一者。大致上,當二表面被接合時,與較小間隙有關聯之連接器列將被壓縮,其可造成該等焊料球往外擴展。如果墊片132及138被組織,使得承載該相同信號之墊片係彼此靠近,且承載完全不同信號的墊片被進一步隔開,則將有與不同信號有關聯的墊片間之非計劃
中的橋接係較不可能的。注意允許橋接之墊片包含至功率墊片的功率墊片及至接地墊片之接地墊片。
方塊圖被顯示在圖4中,具有晶片封裝400之側視圖,該晶片封裝具有壓縮的焊料球410。於此晶片封裝中,至少部份該等焊料球410被壓縮超過該等焊料球之剩餘部分。注意焊料球410之壓縮可使用來自薩斯奎漢娜大學被稱為'Surface Evolver'的分析軟體來形成模型。此分析軟體能在表面張力及重力的力量之下模擬液體的物理學,以決定該液體將採取之形狀。於壓縮焊料球之案例中,該模擬顯示過多之焊料噴出至壓縮焊料球之側面,在此該壓縮係最小的。這是因為在此側面上之減少的曲率比該壓縮側面上之高曲率具有較低的能量。因此,晶片封裝400中之焊料球可為較不可能橋接在一列墊片內,且可為較可能橋接於不同列墊片之間。注意增加該等焊料球之分離進一步(譬如,藉由使用一更寬廣之列至列間距Is)可導致藉由每一焊料球所佔有的空間中之較大變動,及可導致該被壓縮之焊料球的更多壓縮,以便確保該第二列中之焊料球將弄濕表面130及136兩者上之墊片(圖1)。
於一些實施例中,至少部份墊片132及138(圖1)具有橢圓的形狀。通常,焊料墊片係圓形或大約圓形。於晶片封裝400中,具有較高縱橫比的焊料墊片可為有用的,因為它們允許在垂直於一列墊片之方向中擴展,而在此方向有額外之空間。這可提供一些邊際效益,以確保良好、低阻抗連接。注意該縱橫比不能為太高,因為焊料球410
的形狀傾向於為橢圓形,並可由該等焊料墊片之端部拉離。
於另一技術中,不同尺寸設計的焊料球可被使用於不同列中之連接器134(圖1)。這是被顯示於圖5A中,其呈現一方塊圖,說明一具有不同尺寸之焊料球510的晶片封裝500之側視圖。藉由變動被使用於接合每一列的焊料球510之尺寸,此方式調整用於該等列間之不同間隙。特別地是,墊片之第一列可使用較小的焊料球,而墊片之第二列可使用較大的焊料球。
為了增加該密度,該等墊片之節距亦可變動,以致於具有該等較小焊料球之墊片列中有更多連接及於該等具有較大焊料球的墊片列中具有更少連接。這是被顯示在圖5B及5C中,其呈現方塊圖,分別說明具有不同墊片節距570及572的晶片封裝550及560之俯視圖。
於晶片封裝550及560中,該等焊料球可具有二不同尺寸,使該等焊料球之第一尺寸與墊片的第一列有關聯,且該等焊料球之第二尺寸與墊片的第二列有關聯。另一選擇或額外地,該等墊片可具有二不同尺寸,使墊片之第一尺寸與墊片的第一列有關聯,且墊片之第二尺寸與墊片的第二列有關聯。注意這些不同的墊片尺寸可為在表面130及136之任一者或兩者上(圖1)。
如圖5B及5C所示,於該焊料配置中有二種選擇。於圖5B中之晶片封裝550中,該最高密度係藉由使用一用於該等小焊料球之較小節距及一用於該等較大焊料球的
較大節距而被使用。此方式可確保對於可靠之焊料連接有充分的間距及該最大數目之連接被達成。於對比中,在圖5C中之晶片封裝560中,兩列中之焊料球可具有相同的節距。此方式可允許該二列墊片間之更緊密的間距,但可減少連接之密度。注意於圖5B所示規劃中,遞送該等信號至墊片的外列可為困難的。因此,圖5C中所示規劃可為較佳的。
圖4、5B及5C中之幾何形狀參數的示範實施例被顯示在表1中。
各種技術可被用來於單一晶片封裝中獲得不同尺寸的焊料球,而沒有橋接。譬如,以雷射為基礎之焊料配置工具(或拾取與放置機械)可被用來將個別之焊料球放置於墊片上,且接著弄濕它們。此方式能放置寬廣變化性尺寸之焊料球,並可被使用於將二不同尺寸放置在單一晶片封裝上。然而,其可為難以將以雷射為基礎之焊料配置工具調整至比每秒8個焊料球更快的速率。
另一選擇係,不同尺寸之焊料球可為分別在該不同晶片的表面上生長,而該等晶片將在一晶片封裝中被堆疊。
此方式可使用不同的晶片,以生長二不同尺寸的焊料球,而沒有衝突。然而,對於該等晶片,在它們已被碰撞之後,可有更迫切之處理需求,故此方式可需要更小心的處理,以確保良好的產量。
於另一方式中,二不同尺寸的焊料球可在相同表面上使用不同尺寸設計的基底墊片/鈍化開口而被生長。特別地是,當焊膏被施加時,越過晶片通常具有一恆定之高度。因此,焊料球之體積典型係藉由墊片的不同半徑所決定。然後,當該焊料被熔化及迴焊時,表面張力將該焊膏拉入具有一主要藉由該墊片尺寸及焊料的體積所決定之高度的焊料球。然而,於一些實施例中,不同數量之焊膏可被使用,以獲得不同的焊料球尺寸。
於一些實施例中,半導體晶粒110的表面間之可變間隙(圖1)係藉由選擇性地加至一表面所平均。這被顯示在圖6中,其呈現一方塊圖,說明具有選擇性地升高在一表面610上方之墊片614的晶片封裝600之側視圖。譬如,具有一些焊料的一列銅導柱612可被使用於該等墊片列之其中一列中,以減少該二表面間之距離。然後,焊料球可被放置在另一(相反)表面上之墊片列上,且當該等晶片被集合供迴焊時,所有該等焊料球至其目標焊接點可具有大約相同之距離。此方式槓桿作用銅柱焊料衝撞之成熟度。
此外,銅導柱對於電及熱係傳導性的,故它們在任一晶片上可能不需要額外之設計,且該等焊料球可直接地使用標準製程相對該等導柱被弄濕。
另一選擇係,該等晶片間之距離或間隙可藉由在一表面下方選擇性地降低部份該等墊片而被平均。這被顯示在圖7中,其呈現一方塊圖,說明具有選擇性地降低在一表面710下方之墊片714的晶片封裝700之側視圖。譬如,凹處712(及,更大致上,負極部件)能夠在表面710中被蝕刻至降低一整列之墊片。這將增加該等晶片表面沿著此列墊片之距離,對於兩列墊片保持該等晶片間之距離或間隙大約相同。此方式亦可促進該等連接器之自行對齊,因為該等焊料球(及,更大致上,正極部件)可自然地安頓進入該等凹處,藉此維持堆疊116中的半導體晶粒110之相對對齊(圖1)。然而,其可為難以提供一附著該焊料之表面,該焊料係電連接至該晶片。因為該蝕刻製程不須金屬位於該凹處中,RDL製程可被需要,以於該蝕刻之後在該凹處內側加入金屬墊片。此RDL墊片可在該凹處面積外側被電耦接至該晶片的表面上之墊片。
於圖1中,斜坡零組件112可藉由撓性連接器(諸如微型彈簧連接器)被電耦接至半導體晶粒110的每一者,且連接器134能為可再配對地機械式耦接至該等墊片132及138。這被顯示在圖8中,其呈現一方塊圖,說明具有撓性連接器810的晶片封裝800之側視圖。譬如,撓性連接器810可具有二不同高度,使撓性連接器810之第一高度與該等墊片之第一列有關聯,且撓性連接器810之第二高度與該等墊片之第二列有關聯。
注意撓性連接器810能被製成在寬廣變化性的表面上
,包含:印刷電路板(PCB)、有機或陶瓷積體電路(IC)、及/或在半導體晶粒之表面上。再者,撓性連接器810可被製成具有晶片相互間之連接的一面積密度,其超過高效能ICs上之I/O信號的密度,且撓性連接器810之柔順性能增加對機械運動及晶片封裝800中之零組件的未對準之容差。
撓性連接器810亦可提供機械及電接觸點,而沒有使用焊料。如此,於圖1中,斜坡零組件112及半導體晶粒110間之機械及/或電耦接可為能移去或再配對的(亦即這些零組件可被再配對地耦接),其有助於晶片封裝800在組裝及測試期間及/或在組裝及測試之後的重加工。注意該可再配對之機械或電耦接應被了解為可被反覆地(亦即,二或更多次)建立及切斷的機械或電耦接,而不需要重加工或加熱(諸如以焊料),於一些實施例中,該可再配對之機械或電耦接涉及被設計成彼此耦接的公及母零組件(諸如咬合在一起的零組件)。如此,可再配對的零組件係被建構成允許可再配對地耦接被建立之零組件。然而,如先前所述,於一些實施例中,在圖1中,斜坡零組件112及半導體晶粒110間之機械及/或電耦接係更永久的(譬如,其可能不可再配對的、諸如焊料接點)。
為了增加該等連接部之電容,於一些實施例中,導電液體、軟膏或薄膜可被加至該接觸區域,以填入任何間隙。這亦將具有把該重疊面積增加至該液體、軟膏或薄膜延伸超出該等給定撓性連接器之邊緣的範圍之有益效果。
另一選擇係,於圖1中,斜坡零組件112可藉由各向異性的薄膜(未示出)、諸如各向異性的彈性體薄膜(其有時候被稱為‘向異性的導電薄膜’)被電耦接至半導體晶粒110的每一者。注意各向異性的薄膜之各向異性的性質增強正交於該各向異性的薄膜之表面的電導性,而亦遞減正切至該各向異性的薄膜之表面的電導性。其結果是,該各向異性的薄膜可電耦接該各向異性的薄膜之相反面上的機械式對齊墊片。
譬如,該各向異性的薄膜可包含該PariPoser®材料(來自麻薩諸塞州福爾裡弗市之Paricon技術公司)、以及其他型式的各向異性薄膜、諸如那些基於電耦接導電箔片之導電彈性體者,該等導電箔片係藉由絕緣薄片所分開。於PariPoser型之各向異性的導電彈性體薄膜中,小的導電焊料球係懸浮在矽酮橡膠中,使得該等焊料球大致上排列成多行及正交、但不正切於該各向異性的薄膜之表面提供傳導。關於撓性連接器810(圖8),大致上該結果之電接點的阻抗可為導電及/或電容的。如果該阻抗係導電的,傳統傳輸及接收I/O電路可被使用於晶片封裝100中之零組件。然而,如果該阻抗係複合的,晶片封裝100中之傳輸及接收I/O電路可包含藉由羅伯特J德羅斯特等人之美國專利申請案12/425,871中、標題為“用於具有可變複合阻抗的連接器之接收電路”所敘述之一或多個實施例,其係在2009年4月17日提出之代理人案號SUN09-0285,其內容以引用的方式併入本文中。
於一些實施例中,圖1中之半導體晶粒110被單元或模組所替代,其每一者包含藉由TSVs所耦接之二或更多半導體晶粒。這是被顯示在圖9中,其呈現一方塊圖,說明晶片封裝900的側視圖。此方式可允許40塊晶片堆疊將由十塊四晶片模組所構成。因此,該TSV組裝製程可僅只必需每次處理四晶片,且晶片封裝900中之堆疊製程可僅只必需每次處理十個模組。相對40晶片堆疊,這可減少製造晶片封裝900中之困難。此外,其可為比個別半導體晶粒更易於處理以TSV為基礎之模組,因為該等模組可為更厚(且因此更剛硬)。
我們現在敘述電子裝置及電腦系統之實施例。圖10呈現一方塊圖,說明一電子裝置1000,其包含一或多個晶片封裝1012、諸如一晶片封裝之先前實施例的其中一者。注意該電子裝置1000可包含一電源1010(諸如電池),其被電耦接至該一或多個晶片封裝1012。
圖11呈現一方塊圖,說明包含一或多個晶片封裝1108、諸如晶片封裝之先前實施例的其中一者之電腦系統1100。電腦系統1100包含:一或多個處理器(或處理器核心)1110、通訊介面1112、使用者介面1114、及將這些零組件耦接在一起的一或多個信號線1122。注意該一或多個處理器(或處理器核心)1110可支援平行處理及/或多執行緒操作,該通訊介面1112可具有持續的通訊連接,且該一或多個信號線1122可構成一通訊匯流排。再者,該使用者介面1114可包含:顯示器1116、鍵盤1118、及/
或諸如滑鼠之指標1120。
於此電腦系統1100中,記憶體1124可包含揮發性記憶體及/或非揮發性記憶體。更明確地是,記憶體1124可包含:ROM、RAM、EPROM、EEPROM、快閃記憶體、一或多個記憶卡、一或多個磁碟儲存裝置、及/或一或多個光學儲存裝置。記憶體1124可儲存一作業系統1126,其包含用於處理各種基本之系統服務的程序(或一組指令),用於施行硬體相依之工作。再者,記憶體1124亦可於通訊模組1128中儲存通訊程序(或一組指令)。這些通訊程序亦可被使用於與一或多個電腦、裝置及/或伺服器通訊,包含相對於該電腦系統1100遠端地坐落的電腦、裝置及/或伺服器。
記憶體1124亦可包含一或多個程式模組1130(或一組指令)。注意程式模組1130的一或多個可構成電腦程式機件。於該記憶體1124中之各種模組中的指令可被施行於:高階程序語言、目的導向之程式語言、及/或於組合或機器語言中。該程式語言可被編譯或解譯、亦即可配置或被建構成藉由該一或多個處理器(或處理器核心)1110所執行。
電腦系統1100可包含、但不被限制於:伺服器、膝上型電腦、個人電腦、工作站、大型電腦、刀鋒運算平台、企業電腦、資料中心、手提式計算裝置、平板電腦、行動電話、超級電腦、網路附接儲存(NAS)系統、儲存區域網路(SAN)系統、及/或另一電子計算裝置。例如,晶片封
裝1108可被包含在一耦接至多數處理器刀鋒運算平台的底板中,或晶片封裝1108可耦接不同型式之零組件(諸如處理器、記憶體、I/O裝置、及/或周邊裝置)。如此,晶片封裝1108可施行以下之功能:開關、集線器、橋接件、及/或路由器。注意電腦系統1100可為在一位置或可為分佈在多數、地理學分散位置之上。
注意一些或所有電子裝置1000(圖10)及/或電腦系統1100之功能性可在一或多個特殊應用積體電路(ASICs)及/或一或多個數位信號處理器(DSPs)中被施行。再者,該等前述實施例中之功能性可更多於硬體中及更少於軟體中被施行、或更少於硬體中及更多於軟體中,如係於該技藝中所習知者。
該等前述實施例可包含更少之零組件或額外的零組件。再者,雖然這些晶片封裝、裝置及系統被說明為具有許多離散之項目,這些實施例係意欲為各種特色之功能敘述,其可為存在而非在此中所敘述之實施例的結構性概要。因此,於這些實施例中,二或更多零組件可被組合成單一零組件及/或一或多個零組件的一位置可被改變。再者,該等前述實施例的二或更多個中之特色可彼此組合。
於一些實施例中,於圖1中,晶片封裝100包含特色,以移去在一或多個半導體晶粒110及/或斜坡零組件112上之電路的操作期間所產生之熱。特別地是,晶片封裝100可包含至少二個半導體晶粒110間之選擇性中介晶片142。此中介晶片可沿著水平方向118運送藉由該等半導
體晶粒的至少一者之操作所產生之熱。再者,熱運送可為藉由選擇性中介晶片142上之微流控所促進。注意於一些實施例中,選擇性中介晶片142亦可減少二或更多半導體晶粒110間之串擾。
於圖1中,雖然該等前述實施例使用該晶片封裝中之半導體晶粒110(諸如矽),於其他實施例中,異於半導體的不同材料可於一或多個這些晶片中被用作該基板材料。因此,於一些實施例中,斜坡零組件112係被動零組件、諸如具有金屬跡線的塑膠基板,以電耦接至半導體晶粒110。譬如,斜坡零組件112可使用射出成形塑膠被製成。另一選擇係,斜坡零組件112可為另一具有微影地界定之電線或信號線的半導體晶粒。於斜坡零組件112包含半導體晶粒的實施例中,諸如極限放大器的主動元件可被包含,以減少該等信號線間之串擾。另外,串擾可於主動或被動之斜坡零組件112的任一者中使用差分信號方式而被減少。
於一些實施例中,斜坡零組件112包含經由連接器134在半導體晶粒110之中穿梭資料及功率信號的電晶體及電線。例如,斜坡零組件112可包含高電壓信號。這些信號可被遞減供使用在半導體晶粒110上,並使用:遞減調整器(諸如電容器至電容器的遞減調整器)、以及電容器及/或電感器之離散零組件,以耦接至半導體晶粒110。
注意可有圍繞晶片封裝100之至少一部份的選擇性封裝(未示出)。
大致上,晶片封裝100中之零組件可使用電磁耦接信號之PxC互相通訊及/或與外部裝置或系統通訊(其被稱為‘電磁近區通訊’)、諸如電容耦接信號及/或光學信號之近區通訊(其分別被稱為‘電性近區通訊’與‘光學近區通訊’)。於一些實施例中,該電磁近區通訊包含電感性耦接信號及/或導電地耦接信號。
因此,與連接器134及半導體晶粒110間之電接點有關聯的阻抗可為導電的(亦即,同相)及/或電容的(亦即,反相),諸如當在半導體晶粒110的表面上之金屬墊片上方、或緊接至半導體晶粒110的表面有一鈍化層(例如玻璃層)時。大致上,該阻抗可為複合的,其包含一同相分量及一反相分量。不管該電接點機件(諸如焊料、撓性連接器、及/或各向異性的薄膜),如果與該等接點有關聯的阻抗係導電的,傳統傳輸及接收I/O電路可被使用於晶片封裝100中之零組件。然而,如先前所應注意的,用於具有複合(及盡可能可變的)阻抗之接點,該傳輸及接收I/O電路可包含在美國專利申請案12/425,871中所敘述之一或多個實施例。
如先前所注意的,寬廣變化性之對齊技術可被使用於該晶片封裝之實施例中。一對齊技術涉及蝕刻凹處會同該等蝕刻凹處中之焊料球的使用,以維持堆疊116中之半導體晶粒110的相對對齊。更大致上,斜坡零組件112及/或半導體晶粒110上之機械式鎖定的正及負表面特色之任何組合可對齊該晶片封裝中之零組件。
注意於一些實施例中,電子對齊技術被使用於校正晶片封裝中之平面式機械未對準。譬如,如果一給定之撓性連接器接觸一列陣之傳輸或接收微墊片(micropads)或微條棒(microbars),電子對齊可被與導電及/或電容接點一起使用。
於一些實施例中,晶片封裝100之組裝係使用機械式止動件所促進,該止動件有助於定位堆疊116中之半導體晶粒110。此外,經由連接器134的電耦接可為藉由被設置在表面130及136的任一者或兩者上之壓縮元件所促進,且其至少壓縮一些連接器134。
該前面之敘述係意欲能夠使任何熟諳此技藝者製造成及使用該揭示內容,且被提供於特別應用及其需求之情況中。再者,本揭示內容之實施例的前面敘述已僅只被呈現用於說明及敘述之目的。它們係不意欲為詳盡的或將本揭示內容限制於所揭示之形式。據此,對於熟諳此技藝之從業者,很多修改及變動將變得明顯,且在此中所界定之一般原理可被應用至其他實施例及應用,而不會由本揭示內容之精神及範圍脫離。另外,該等前述實施例之討論係不意欲限制本揭示內容。如此,本揭示內容係不意欲被限制於所示實施例,但被給予與在此中所揭示之原理及特色一致的最寬廣範圍。
110-1‧‧‧半導體晶粒
110-2‧‧‧半導體晶粒
112‧‧‧斜坡零組件
500‧‧‧晶片封裝
510‧‧‧焊料球
Claims (20)
- 一種晶片封裝,包括:半導體晶粒,於直立方向中被配置在一堆疊中,該直立方向係實質上垂直於該堆疊中之第一半導體晶粒的平面,其中在該第一半導體晶粒之後,每一半導體晶粒係於該平面中之水平方向中由直接地在該堆疊中的前一半導體晶粒偏置達一偏置值,藉此在該堆疊的一側面界定一階梯狀斜坡區(terrace),且其中該階梯狀斜坡區中之半導體晶粒的每一者之表面包含二列大約平行於該等半導體晶粒之邊緣的第一墊片;連接器,被電性地與機械地耦接至該等第一墊片;及斜坡零組件,被定位在該堆疊的一側面上,其中該斜坡零組件係沿著該階梯狀斜坡區大約平行於一方向,該方向係在該水平方向及該直立方向之間;其中該斜坡零組件具有一包含第二墊片的表面,用於該等半導體晶粒之每一者,該等第二墊片被配置在至少二列之第二墊片中;及其中該等連接器被電性地與機械地耦接至該等第二墊片且包括至少二列的連接器,其中第一列的該等連接器耦接至第一列的該等第一墊片和第一列的該等第二墊片,其中第二列的該等連接器耦接至第二列的該等第一墊片和第二列的該等第二墊片,且其中該二列的該等連接器具有下述組態的至少一者:該二列的該等連接器具有不同的尺寸、該二列的該等連接器具有不同的形狀、和該二列的該等 連接器的至少一者具有包括凹處或導柱的次組件,藉此使得能夠以可變間距耦接該等第一和第二墊片。
- 如申請專利範圍第1項之晶片封裝,其中該等連接器包含焊料球;及其中該等連接器係牢牢地機械式耦接至該等第一墊片及該等第二墊片。
- 如申請專利範圍第2項之晶片封裝,其中該等焊料球具有二不同尺寸;及其中該等焊料球的第一尺寸係與該二列第一墊片中之第一列有關聯,且該等焊料球的第二尺寸係與該二列第一墊片中之第二列有關聯。
- 如申請專利範圍第2項之晶片封裝,其中該等第一墊片具有二不同尺寸;及其中該等第一墊片之第一尺寸係與該二列第一墊片中之第一列有關聯,且該等第一墊片的第二尺寸係與該二列第一墊片中之第二列有關聯。
- 如申請專利範圍第2項之晶片封裝,其中該等第二墊片具有二不同尺寸;及其中該等第二墊片的第一尺寸係與至少該二列第二墊片中之第一列有關聯,且該等第二墊片的第二尺寸係與至少該二列第二墊片中之第二列有關聯。
- 如申請專利範圍第2項之晶片封裝,其中至少部份該等第一墊片及該等第二墊片具有橢圓的形狀。
- 如申請專利範圍第2項之晶片封裝,其中至少部份 該等焊料球被壓縮超過該等焊料球之剩餘部分。
- 如申請專利範圍第1項之晶片封裝,其中該等連接器包含撓性連接器;及其中該等連接器係可再配對地機械式耦接至該等第一墊片與該等第二墊片。
- 如申請專利範圍第8項之晶片封裝,其中該等撓性連接器具有二不同高度;及其中該等撓性連接器之第一高度係與該二列第一墊片中之第一列有關聯,且該等撓性連接器之第二高度係與該二列第一墊片中之第二列有關聯。
- 如申請專利範圍第1項之晶片封裝,其中該斜坡零組件包含被設置在該表面上及被成列地配置的導柱;及其中用於該等半導體晶粒的每一者之二列第二墊片的至少一者被設置在該等導柱列之其中一者上。
- 如申請專利範圍第1項之晶片封裝,其中該斜坡零組件包含被設置在該表面上及被成列地配置的負極部件;及其中用於該等半導體晶粒的每一者之二列第二墊片的至少一者被設置在該等負極部件列之其中一者上。
- 如申請專利範圍第1項之晶片封裝,其中該斜坡零組件係被動零組件。
- 如申請專利範圍第12項之晶片封裝,其中該被動零組件包含具有用於電耦接至該等半導體晶粒之金屬跡線的塑膠基板。
- 如申請專利範圍第1項之晶片封裝,其中該斜坡零組件係另一半導體晶粒。
- 如申請專利範圍第1項之晶片封裝,其中該連接器包含各向異性的導電薄膜。
- 如申請專利範圍第1項之晶片封裝,其中該斜坡零組件促進電信號及功率信號至該半導體晶粒之傳遞,而在該等半導體晶粒中沒有穿晶片孔。
- 如申請專利範圍第1項之晶片封裝,另包括一於該堆疊中之半導體晶粒的至少二者之間的中介晶片,其中該中介晶片被建構成沿著該水平方向運送藉由該等半導體晶粒之至少二者的操作所產生之熱。
- 如申請專利範圍第1項之晶片封裝,其中該等半導體晶粒之表面包含負極部件;及其中該等負極部件中之正極部件維持該堆疊中之半導體晶粒的相對對齊。
- 一種電腦系統,包括:處理器;記憶體,儲存一被建構成藉由該處理器所執行之程式模組;及晶片封裝,其中該晶片封裝包含:半導體晶粒,於直立方向中被配置在一堆疊中,該直立方向係實質上垂直於該堆疊中之第一半導體晶粒的平面,其中在該第一半導體晶粒之後,每一半導體晶粒係於該平面中之水平方向中由直接地在該堆疊中的前一半導 體晶粒偏置達一偏置值,藉此在該堆疊的一側面界定一階梯狀斜坡區,且其中該階梯狀斜坡區中之半導體晶粒的每一者之表面包含二列大約平行於該等半導體晶粒之邊緣的第一墊片;連接器,被電性地與機械地耦接至該等第一墊片;及斜坡零組件,被定位在該堆疊的一側面上,其中該斜坡零組件係沿著該階梯狀斜坡區大約平行於一方向,該方向係在該水平方向及該直立方向之間;其中該斜坡零組件具有一包含第二墊片的表面,用於該等半導體晶粒之每一者,該等第二墊片被配置在至少二列之第二墊片中;及其中該等連接器被電性地與機械地耦接至該等第二墊片且包括至少二列的連接器,其中第一列的該等連接器耦接至第一列的該等第一墊片和第一列的該等第二墊片,其中第二列的該等連接器耦接至第二列的該等第一墊片和第二列的該等第二墊片,且其中該二列的該等連接器具有下述組態的至少一者:該二列的該等連接器具有不同的尺寸、該二列的該等連接器具有不同的形狀、和該二列的該等連接器的至少一者具有包括凹處或導柱的次組件(sub-components),藉此使得能夠以可變間距耦接該等第一和第二墊片。
- 一種電子裝置,包括:電源;及 晶片封裝,被電耦接至該電源,其中該晶片封裝包含:半導體晶粒,於直立方向中被配置在一堆疊中,該直立方向係實質上垂直於該堆疊中之第一半導體晶粒的平面,其中在該第一半導體晶粒之後,每一半導體晶粒係於該平面中之水平方向中由直接地在該堆疊中的前一半導體晶粒偏置達一偏置值,藉此在該堆疊的一側面界定一階梯狀斜坡區,且其中該階梯狀斜坡區中之半導體晶粒的每一者之表面包含二列大約平行於該等半導體晶粒之邊緣的第一墊片;連接器,被電性地與機械地耦接至該等第一墊片;及斜坡零組件,被定位在該堆疊的一側面上,其中該斜坡零組件係沿著該階梯狀斜坡區大約平行於一方向,該方向係在該水平方向及該直立方向之間;其中該斜坡零組件具有一包含第二墊片的表面,用於該等半導體晶粒之每一者,該等第二墊片被配置在至少二列之第二墊片中;及其中該等連接器被電性地與機械地耦接至該等第二墊片且包括至少二列的連接器,其中第一列的該等連接器耦接至第一列的該等第一墊片和第一列的該等第二墊片,其中第二列的該等連接器耦接至第二列的該等第一墊片和第二列的該等第二墊片,且其中該二列的該等連接器具有下述組態的至少一者:該二列的該等連接器具有不同 的尺寸、該二列的該等連接器具有不同的形狀、和該二列的該等連接器的至少一者具有包括凹處或導柱的次組件,藉此使得能夠以可變間距耦接該等第一和第二墊片。
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WO2013170122A1 (en) | 2013-11-14 |
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EP2847793B1 (en) | 2020-08-05 |
EP2847793A1 (en) | 2015-03-18 |
US9082632B2 (en) | 2015-07-14 |
TW201409659A (zh) | 2014-03-01 |
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