TWI575249B - 抗反射物件及其製作方法 - Google Patents
抗反射物件及其製作方法 Download PDFInfo
- Publication number
- TWI575249B TWI575249B TW098145627A TW98145627A TWI575249B TW I575249 B TWI575249 B TW I575249B TW 098145627 A TW098145627 A TW 098145627A TW 98145627 A TW98145627 A TW 98145627A TW I575249 B TWI575249 B TW I575249B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- meth
- acrylate
- plasma
- composite
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 62
- 230000003667 anti-reflective effect Effects 0.000 title claims description 32
- 239000000758 substrate Substances 0.000 claims description 122
- 239000000203 mixture Substances 0.000 claims description 50
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 46
- 238000005530 etching Methods 0.000 claims description 38
- 239000011159 matrix material Substances 0.000 claims description 32
- 239000002105 nanoparticle Substances 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 29
- 238000001020 plasma etching Methods 0.000 claims description 28
- 239000000853 adhesive Substances 0.000 claims description 27
- 230000001070 adhesive effect Effects 0.000 claims description 27
- 230000005540 biological transmission Effects 0.000 claims description 27
- 239000002131 composite material Substances 0.000 claims description 24
- 239000007789 gas Substances 0.000 claims description 23
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 20
- 239000011521 glass Substances 0.000 claims description 18
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 18
- 229920000642 polymer Polymers 0.000 claims description 18
- 229920000193 polymethacrylate Polymers 0.000 claims description 16
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 239000000243 solution Substances 0.000 claims description 11
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 229920000728 polyester Polymers 0.000 claims description 10
- 229920000647 polyepoxide Polymers 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229920002313 fluoropolymer Polymers 0.000 claims description 8
- 239000004811 fluoropolymer Substances 0.000 claims description 8
- 239000004973 liquid crystal related substance Substances 0.000 claims description 8
- 229920001577 copolymer Polymers 0.000 claims description 7
- 239000003822 epoxy resin Substances 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 239000002061 nanopillar Substances 0.000 claims description 6
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims description 5
- 239000004713 Cyclic olefin copolymer Substances 0.000 claims description 5
- 239000004593 Epoxy Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 4
- 229920002284 Cellulose triacetate Polymers 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 239000004677 Nylon Substances 0.000 claims description 4
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 claims description 4
- 229920002678 cellulose Polymers 0.000 claims description 4
- 239000001913 cellulose Substances 0.000 claims description 4
- 125000004386 diacrylate group Chemical group 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 229910010272 inorganic material Inorganic materials 0.000 claims description 4
- 239000011147 inorganic material Substances 0.000 claims description 4
- 229920001778 nylon Polymers 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 239000011777 magnesium Substances 0.000 claims description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 2
- 239000006104 solid solution Substances 0.000 claims description 2
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 claims description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 35
- 239000011248 coating agent Substances 0.000 description 34
- 239000010408 film Substances 0.000 description 33
- 239000012071 phase Substances 0.000 description 32
- 239000010410 layer Substances 0.000 description 31
- 230000008569 process Effects 0.000 description 26
- -1 neutral molecules Chemical class 0.000 description 23
- 239000002245 particle Substances 0.000 description 22
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 20
- 239000000178 monomer Substances 0.000 description 20
- 239000003795 chemical substances by application Substances 0.000 description 18
- 239000012530 fluid Substances 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- 229920005989 resin Polymers 0.000 description 18
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 17
- 230000007246 mechanism Effects 0.000 description 17
- 239000002086 nanomaterial Substances 0.000 description 15
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 13
- 150000002500 ions Chemical class 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 11
- 229920002799 BoPET Polymers 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 125000000524 functional group Chemical group 0.000 description 11
- 239000011810 insulating material Substances 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 8
- 238000001723 curing Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 230000004048 modification Effects 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 238000009832 plasma treatment Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 239000011554 ferrofluid Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 238000005266 casting Methods 0.000 description 5
- 239000002826 coolant Substances 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 238000001125 extrusion Methods 0.000 description 5
- 239000003607 modifier Substances 0.000 description 5
- 229920005862 polyol Polymers 0.000 description 5
- 150000003077 polyols Chemical class 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 239000012756 surface treatment agent Substances 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- DRVWBEJJZZTIGJ-UHFFFAOYSA-N cerium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Ce+3].[Ce+3] DRVWBEJJZZTIGJ-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 4
- 230000009975 flexible effect Effects 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 230000000845 anti-microbial effect Effects 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 description 3
- 201000007909 oculocutaneous albinism Diseases 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 229960004065 perflutren Drugs 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- 229920000307 polymer substrate Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- GNPSQUCXOBDIDY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane Chemical compound C(CCCCCCC)C(C(OC)(OC)OC)CCC GNPSQUCXOBDIDY-UHFFFAOYSA-N 0.000 description 2
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920013665 Ampacet Polymers 0.000 description 2
- KJKCNRWXADKKRU-UHFFFAOYSA-N C(=C)CC(CCCCCCCCC)(OCC)OCC Chemical compound C(=C)CC(CCCCCCCCC)(OCC)OCC KJKCNRWXADKKRU-UHFFFAOYSA-N 0.000 description 2
- DBJFSFSBHGPDPG-UHFFFAOYSA-N C(C(=C)C)(=O)OCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(C(=C)C)(=O)OCCCC(C(OC)(OC)OC)CCCCCCCC DBJFSFSBHGPDPG-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229910018503 SF6 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 2
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000001246 colloidal dispersion Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000006184 cosolvent Substances 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 230000003670 easy-to-clean Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001227 electron beam curing Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 2
- PGFXOWRDDHCDTE-UHFFFAOYSA-N hexafluoropropylene oxide Chemical compound FC(F)(F)C1(F)OC1(F)F PGFXOWRDDHCDTE-UHFFFAOYSA-N 0.000 description 2
- 238000001198 high resolution scanning electron microscopy Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- 239000000693 micelle Substances 0.000 description 2
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000012811 non-conductive material Substances 0.000 description 2
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000010076 replication Effects 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 2
- 229960000909 sulfur hexafluoride Drugs 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 150000003673 urethanes Chemical class 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- CBVVBUBADASQPL-UHFFFAOYSA-N (2,4-dichlorophenyl) prop-2-enoate Chemical compound ClC1=CC=C(OC(=O)C=C)C(Cl)=C1 CBVVBUBADASQPL-UHFFFAOYSA-N 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 1
- ICKFOGODAXJVSQ-UHFFFAOYSA-N 1,3,5-tribromo-2-ethenylbenzene Chemical compound BrC1=CC(Br)=C(C=C)C(Br)=C1 ICKFOGODAXJVSQ-UHFFFAOYSA-N 0.000 description 1
- TXFONIGDXLPYOB-UHFFFAOYSA-N 1,3,5-trichloro-2-ethenylbenzene Chemical compound ClC1=CC(Cl)=C(C=C)C(Cl)=C1 TXFONIGDXLPYOB-UHFFFAOYSA-N 0.000 description 1
- UULPGUKSBAXNJN-UHFFFAOYSA-N 1-ethenyl-4-phenoxybenzene Chemical compound C1=CC(C=C)=CC=C1OC1=CC=CC=C1 UULPGUKSBAXNJN-UHFFFAOYSA-N 0.000 description 1
- JPEWDCTZJFUITH-UHFFFAOYSA-N 1-methoxydecane Chemical compound CCCCCCCCCCOC JPEWDCTZJFUITH-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 1
- AMBJXYFIMKHOQE-UHFFFAOYSA-N 2-(2,4,6-tribromophenoxy)ethyl prop-2-enoate Chemical compound BrC1=CC(Br)=C(OCCOC(=O)C=C)C(Br)=C1 AMBJXYFIMKHOQE-UHFFFAOYSA-N 0.000 description 1
- CLLLODNOQBVIMS-UHFFFAOYSA-N 2-(2-methoxyethoxy)acetic acid Chemical compound COCCOCC(O)=O CLLLODNOQBVIMS-UHFFFAOYSA-N 0.000 description 1
- YHBWXWLDOKIVCJ-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]acetic acid Chemical compound COCCOCCOCC(O)=O YHBWXWLDOKIVCJ-UHFFFAOYSA-N 0.000 description 1
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- YMUQRDRWZCHZGC-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO.CCC(CO)(CO)CO YMUQRDRWZCHZGC-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- RHOOUTWPJJQGSK-UHFFFAOYSA-N 2-phenylsulfanylethyl prop-2-enoate Chemical compound C=CC(=O)OCCSC1=CC=CC=C1 RHOOUTWPJJQGSK-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- LBIHNTAFJVHBLJ-UHFFFAOYSA-N 3-(triethoxymethyl)undec-1-ene Chemical compound C(=C)C(C(OCC)(OCC)OCC)CCCCCCCC LBIHNTAFJVHBLJ-UHFFFAOYSA-N 0.000 description 1
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 1
- DFYGYTNMHPUJBY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane-1-thiol Chemical compound SCCCC(C(OC)(OC)OC)CCCCCCCC DFYGYTNMHPUJBY-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- WXTIEWYBVINAOP-UHFFFAOYSA-N C(=C)C(C(OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C)CCCCCCCC Chemical compound C(=C)C(C(OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C)CCCCCCCC WXTIEWYBVINAOP-UHFFFAOYSA-N 0.000 description 1
- YXFRBUCPZXPBFQ-UHFFFAOYSA-N C(=C)C(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC Chemical compound C(=C)C(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC YXFRBUCPZXPBFQ-UHFFFAOYSA-N 0.000 description 1
- JIPVNTTVGUHSIV-UHFFFAOYSA-N C(=C)C(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)OC1=CC=CC=C1)CCCCCCCC Chemical compound C(=C)C(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)OC1=CC=CC=C1)CCCCCCCC JIPVNTTVGUHSIV-UHFFFAOYSA-N 0.000 description 1
- SPBOUQIQODHYHJ-UHFFFAOYSA-N C(=C)C(C(OCC)(C)C)CCCCCCCC Chemical compound C(=C)C(C(OCC)(C)C)CCCCCCCC SPBOUQIQODHYHJ-UHFFFAOYSA-N 0.000 description 1
- ARULYXVKFZZVJD-UHFFFAOYSA-N C(=C)C(CCCCCCCCC)(OCC(C)C)CCCCCCCCCC Chemical compound C(=C)C(CCCCCCCCC)(OCC(C)C)CCCCCCCCCC ARULYXVKFZZVJD-UHFFFAOYSA-N 0.000 description 1
- DDXSGRJLQHWXNI-UHFFFAOYSA-N C(C(=C)C)(=O)OCCCC(C(C)(C)OCC)CCCCCCCC Chemical compound C(C(=C)C)(=O)OCCCC(C(C)(C)OCC)CCCCCCCC DDXSGRJLQHWXNI-UHFFFAOYSA-N 0.000 description 1
- AAVQACKPQVDAEK-UHFFFAOYSA-N C(C(=C)C)(=O)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C(=C)C)(=O)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC AAVQACKPQVDAEK-UHFFFAOYSA-N 0.000 description 1
- JIIQIHQRBHEDNF-UHFFFAOYSA-N C(C=C)(=O)OCCCC(CC(OC)(OC)C)CCCCCCC Chemical compound C(C=C)(=O)OCCCC(CC(OC)(OC)C)CCCCCCC JIIQIHQRBHEDNF-UHFFFAOYSA-N 0.000 description 1
- DXQKRPJMNRDHBG-UHFFFAOYSA-N C(CCC)CCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCC)CCCCC(C(OC)(OC)OC)CCCCCCCC DXQKRPJMNRDHBG-UHFFFAOYSA-N 0.000 description 1
- QCBHFHGTQMRGII-UHFFFAOYSA-N C(CCCCC(C)C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCC(C)C)C(C(OC)(OC)OC)CCCCCCCC QCBHFHGTQMRGII-UHFFFAOYSA-N 0.000 description 1
- DKCXIJLUMAOOHX-UHFFFAOYSA-N C(CCCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCC)C(C(OC)(OC)OC)CCCCCCCC DKCXIJLUMAOOHX-UHFFFAOYSA-N 0.000 description 1
- CRGCAWOGRIKNFP-UHFFFAOYSA-N C(CCCCCCCCC)CCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCCCCCC)CCC(C(OC)(OC)OC)CCCCCCCC CRGCAWOGRIKNFP-UHFFFAOYSA-N 0.000 description 1
- UMUVKMNHJFWLQT-UHFFFAOYSA-N C(CCCCCCCCCCCCCCCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCCCCCCCCCCCCCC)C(C(OC)(OC)OC)CCCCCCCC UMUVKMNHJFWLQT-UHFFFAOYSA-N 0.000 description 1
- JSGRIFNBTXDZQU-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OC)(OC)OC)CCCCCCCC JSGRIFNBTXDZQU-UHFFFAOYSA-N 0.000 description 1
- CBGSUANKNSADFQ-UHFFFAOYSA-N C1(=CC=CC=C1)OC(C=C)=S Chemical compound C1(=CC=CC=C1)OC(C=C)=S CBGSUANKNSADFQ-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- DIWVBIXQCNRCFE-UHFFFAOYSA-N DL-alpha-Methoxyphenylacetic acid Chemical compound COC(C(O)=O)C1=CC=CC=C1 DIWVBIXQCNRCFE-UHFFFAOYSA-N 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229920000007 Nylon MXD6 Polymers 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229920000995 Spectralon Polymers 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000003124 biologic agent Substances 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical group CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000001815 facial effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910003439 heavy metal oxide Inorganic materials 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
- YWWNNLPSZSEZNZ-UHFFFAOYSA-N n,n-dimethyldecan-1-amine Chemical compound CCCCCCCCCCN(C)C YWWNNLPSZSEZNZ-UHFFFAOYSA-N 0.000 description 1
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XFHJDMUEHUHAJW-UHFFFAOYSA-N n-tert-butylprop-2-enamide Chemical compound CC(C)(C)NC(=O)C=C XFHJDMUEHUHAJW-UHFFFAOYSA-N 0.000 description 1
- 239000002121 nanofiber Substances 0.000 description 1
- 239000002077 nanosphere Substances 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000417 polynaphthalene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- XTUSEBKMEQERQV-UHFFFAOYSA-N propan-2-ol;hydrate Chemical compound O.CC(C)O XTUSEBKMEQERQV-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001392 ultraviolet--visible--near infrared spectroscopy Methods 0.000 description 1
- 230000035899 viability Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/107—Post-treatment of applied coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/02—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by a sequence of laminating steps, e.g. by adding new layers at consecutive laminating stations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0008—Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
- C08J7/0423—Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/054—Forming anti-misting or drip-proofing coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/056—Forming hydrophilic coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/42—Polarizing, birefringent, filtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/202—LCD, i.e. liquid crystal displays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2551/00—Optical elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
- C08J2323/04—Homopolymers or copolymers of ethene
- C08J2323/06—Polyethene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2433/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2433/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2433/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/02—Polysilicates
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/10—Details of absorbing elements characterised by the absorbing material
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/60—Details of absorbing elements characterised by the structure or construction
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/254—Polymeric or resinous material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
- Y10T428/257—Iron oxide or aluminum oxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/258—Alkali metal or alkaline earth metal or compound thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/259—Silicic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2848—Three or more layers
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polarising Elements (AREA)
- Materials Engineering (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Optical Elements Other Than Lenses (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14151708P | 2008-12-30 | 2008-12-30 | |
| US15768309P | 2009-03-05 | 2009-03-05 | |
| US23478209P | 2009-08-18 | 2009-08-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201035586A TW201035586A (en) | 2010-10-01 |
| TWI575249B true TWI575249B (zh) | 2017-03-21 |
Family
ID=42060629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098145627A TWI575249B (zh) | 2008-12-30 | 2009-12-29 | 抗反射物件及其製作方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US9435916B2 (enExample) |
| EP (1) | EP2380045B1 (enExample) |
| JP (2) | JP6174300B2 (enExample) |
| KR (2) | KR101915868B1 (enExample) |
| CN (1) | CN102326099B (enExample) |
| SG (1) | SG172204A1 (enExample) |
| TW (1) | TWI575249B (enExample) |
| WO (1) | WO2010078071A1 (enExample) |
Families Citing this family (83)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006002713A1 (de) * | 2005-03-18 | 2006-10-12 | BSH Bosch und Siemens Hausgeräte GmbH | Frontbaugruppe für eine Wäschetrockenmaschine |
| US20100003493A1 (en) * | 2007-10-10 | 2010-01-07 | Ppg Industries Ohio, Inc. | Radiation curable coating compositions, related coatings and methods |
| SG172204A1 (en) | 2008-12-30 | 2011-07-28 | 3M Innovative Properties Co | Antireflective articles and methods of making the same |
| JP5940809B2 (ja) | 2008-12-30 | 2016-06-29 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化物品及びナノ構造化物品の作製方法 |
| US8553333B2 (en) * | 2009-01-23 | 2013-10-08 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Nanostructured anti-reflective coatings for substrates |
| DE102009035797A1 (de) * | 2009-07-31 | 2011-02-03 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Verfahren zur Herstellung von Beschichtungen mit Antireflexionseigenschaften |
| JP2013521534A (ja) * | 2010-03-03 | 2013-06-10 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化表面を有するコーティングされた偏光子、及びこれを作製する方法 |
| TW201212972A (en) * | 2010-09-17 | 2012-04-01 | Univ Nat Yang Ming | A small ultraviolet (UV) irradiating module |
| US8469551B2 (en) * | 2010-10-20 | 2013-06-25 | 3M Innovative Properties Company | Light extraction films for increasing pixelated OLED output with reduced blur |
| JP5579020B2 (ja) * | 2010-10-27 | 2014-08-27 | 三菱樹脂株式会社 | 塗布層を有するポリエステルフィルム |
| US9310527B2 (en) | 2011-03-09 | 2016-04-12 | 3M Innovative Properties Company | Antireflective film comprising large particle size fumed silica |
| US20140004304A1 (en) * | 2011-03-14 | 2014-01-02 | 3M Innovative Properties Company | Multilayer nanostructured articles |
| CN103443211B (zh) * | 2011-03-14 | 2016-12-14 | 3M创新有限公司 | 纳米结构化制品 |
| CN102749666B (zh) * | 2011-04-20 | 2015-04-01 | 国家纳米科学中心 | 一种减反射涂层的制备方法 |
| CN102841397B (zh) * | 2011-06-21 | 2016-06-15 | 宏腾光电股份有限公司 | 多层膜反射片及其制作方法 |
| BR112014003326A2 (pt) * | 2011-08-17 | 2017-03-01 | 3M Innovative Properties Co | artigos nanoestruturados e métodos para produzir os mesmos |
| KR20130027852A (ko) * | 2011-09-08 | 2013-03-18 | 씨제이제일제당 (주) | 나노구조의 소수성 표면을 갖는 식품용기 및 그의 제조방법 |
| US9484123B2 (en) | 2011-09-16 | 2016-11-01 | Prc-Desoto International, Inc. | Conductive sealant compositions |
| JP2014534289A (ja) * | 2011-10-06 | 2014-12-18 | ソルヴェイ(ソシエテ アノニム) | コーティング組成物およびそれから製造される反射防止コーティング |
| US20150024191A1 (en) * | 2012-01-13 | 2015-01-22 | Corning Incorporated | Reflection-Resistant Glass Articles and Methods for Making and Using Same |
| SG11201406122WA (en) | 2012-03-26 | 2014-10-30 | 3M Innovative Properties Co | Nanostructured material and method of making the same |
| WO2013148129A1 (en) * | 2012-03-26 | 2013-10-03 | 3M Innovative Properties Company | Article and method of making the same |
| TW201400562A (zh) * | 2012-04-05 | 2014-01-01 | Daikin Ind Ltd | 具有含氟矽烷系塗覆層之物品的製造方法 |
| US11133118B2 (en) * | 2012-05-22 | 2021-09-28 | University Of Massachusetts | Patterned nanoparticle structures |
| KR20140018807A (ko) * | 2012-07-31 | 2014-02-13 | 주식회사 엘지화학 | 유기전자소자용 기판 |
| JP6371032B2 (ja) * | 2012-08-01 | 2018-08-08 | スリーエム イノベイティブ プロパティズ カンパニー | 反射防止ハードコートおよび反射防止物品 |
| CN104995535B (zh) * | 2012-10-08 | 2019-03-08 | 康宁股份有限公司 | 用于提供改善的显示器部件的方法和设备 |
| AU2014257171B2 (en) * | 2013-04-22 | 2019-05-16 | Creative Nail Design, Inc. | Nail coatings having enhanced adhesion |
| US20140322547A1 (en) * | 2013-04-30 | 2014-10-30 | Corning Incorporated | Antimicrobial Glass Articles and Methods for Making and Using Same |
| US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| KR20150012877A (ko) * | 2013-07-26 | 2015-02-04 | 삼성디스플레이 주식회사 | 윈도우 패널, 그 제조 방법, 및 이를 구비한 표시장치 |
| US20150158245A1 (en) * | 2013-12-10 | 2015-06-11 | Apple Inc. | Ultrasonic bonding of a cover glass sub-assembly |
| EP3083234B1 (en) | 2013-12-19 | 2018-11-14 | 3M Innovative Properties Company | Multilayer composite article |
| DE102013226998B4 (de) | 2013-12-20 | 2015-08-06 | Technische Universität Dresden | Verfahren zur Herstellung einer Nanodrahtelektrode für optoelektronische Bauelemente sowie deren Verwendung |
| US20150202834A1 (en) | 2014-01-20 | 2015-07-23 | 3M Innovative Properties Company | Lamination transfer films for forming antireflective structures |
| JP6551691B2 (ja) * | 2014-03-28 | 2019-07-31 | 日産化学株式会社 | 表面粗化方法 |
| CN103923529B (zh) * | 2014-05-05 | 2015-12-02 | 北京印刷学院 | 一种复合油墨、柔性超级电容器电极及其制作方法 |
| WO2015200003A1 (en) | 2014-06-23 | 2015-12-30 | 3M Innovative Properties Company | Silicon-containing polymer and method of making a silicon-containing polymer |
| US9507064B2 (en) * | 2014-07-27 | 2016-11-29 | The Board Of Trustees Of The Leland Stanford Junior University | Dielectric metasurface optical elements |
| KR101888223B1 (ko) * | 2014-08-26 | 2018-08-14 | 주식회사 엘지화학 | 비산 방지 필름 및 이의 제조방법 |
| EP3230062B1 (en) | 2014-12-08 | 2022-08-10 | 3M Innovative Properties Company | Acrylic polyvinyl acetal films |
| TWI546559B (zh) | 2015-05-19 | 2016-08-21 | 長興材料工業股份有限公司 | 增光穿透塗料組合物及由其所形成之塗層 |
| KR20160149847A (ko) * | 2015-06-19 | 2016-12-28 | 삼성전자주식회사 | 반사 방지 필름, 그 필름을 포함한 전자 장치, 및 그 필름의 제조방법과 제조장치 |
| EP3341769B1 (en) * | 2015-08-27 | 2025-10-22 | Surrey Nanosystems Limited | Low reflectivity coating and method and system for coating a substrate |
| JP6784487B2 (ja) * | 2015-10-30 | 2020-11-11 | デクセリアルズ株式会社 | 光学体、および表示装置 |
| CN105404045A (zh) * | 2015-12-02 | 2016-03-16 | 东莞市纳利光学材料有限公司 | 一种抗电磁波增亮膜及其制备方法 |
| EP3393795A2 (en) | 2015-12-22 | 2018-10-31 | 3M Innovative Properties Company | Acrylic films comprising a structured layer |
| CN108430769B (zh) | 2015-12-22 | 2021-07-16 | 3M创新有限公司 | 包括第二层的丙烯酸类聚乙烯醇缩醛膜 |
| WO2017112458A1 (en) | 2015-12-22 | 2017-06-29 | 3M Innovative Properties Company | Acrylic polyvinyl acetal graphic films |
| WO2017112537A1 (en) | 2015-12-22 | 2017-06-29 | 3M Innovative Properties Company | Acrylic polyvinyl acetal films comprising an adhesive layer |
| EP3452384B1 (en) * | 2016-05-05 | 2023-12-27 | The Coca-Cola Company | Containers and methods for improved mechanical strength |
| EP3478779B1 (en) * | 2016-06-30 | 2021-10-06 | 3M Innovative Properties Company | Fluorocarbon release coating |
| JP7002895B2 (ja) * | 2016-09-30 | 2022-01-20 | 東友ファインケム株式会社 | ハードコーティング組成物及びこれを用いたハードコーティングフィルム |
| WO2018118916A1 (en) | 2016-12-22 | 2018-06-28 | 3M Innovative Properties Company | Surface structured articles and methods of making the same |
| CN106935725A (zh) * | 2017-02-17 | 2017-07-07 | 武汉华星光电技术有限公司 | 有机电致发光显示装置 |
| JP2018180099A (ja) * | 2017-04-05 | 2018-11-15 | スリーエム イノベイティブ プロパティズ カンパニー | 親水性ハードコート積層体、及びその製造方法 |
| EP3735574A1 (en) | 2018-01-05 | 2020-11-11 | 3M Innovative Properties Company | Stray light absorbing film |
| TWI821234B (zh) | 2018-01-09 | 2023-11-11 | 美商康寧公司 | 具光改變特徵之塗覆製品及用於製造彼等之方法 |
| KR20210013289A (ko) | 2018-06-20 | 2021-02-03 | 생-고뱅 퍼포먼스 플라스틱스 코포레이션 | 반사 방지 코팅이 있는 복합 필름 |
| CN108490514A (zh) * | 2018-07-03 | 2018-09-04 | 佛山王氏航空光学科技有限公司 | 一种非球曲面塑料导热防雾透明面罩 |
| US12503608B2 (en) | 2018-08-31 | 2025-12-23 | 3M Innovative Properties Company | Articles including nanostructured surfaces and interpenetrating layers, and methods of making same |
| US11261335B1 (en) * | 2018-09-25 | 2022-03-01 | United States Of America As Represented By The Administrator Of Nasa | Methods involving oxygen plasma exposure to improve adhesion of silicate thermal coatings |
| WO2020142189A1 (en) * | 2018-12-31 | 2020-07-09 | Saint-Gobain Performance Plastics Corporation | Composite film with anti-reflective coating |
| FI128907B (en) | 2019-03-07 | 2021-02-26 | Fp Pigments Oy | Transparent varnish composition |
| EP3718463A1 (en) * | 2019-04-02 | 2020-10-07 | Ambu A/S | A housing for the tip of a disposable insertion endoscope |
| CN109985782A (zh) * | 2019-04-10 | 2019-07-09 | 贵州钢绳股份有限公司 | 一种利用冷镀锌工艺在拉丝机卷筒内壁进行防锈处理的方法 |
| US12103846B2 (en) * | 2019-05-08 | 2024-10-01 | 3M Innovative Properties Company | Nanostructured article |
| FR3108735A1 (fr) * | 2019-10-14 | 2021-10-01 | Safran Electronics & Defense | Composant optique résistant à la pluvio-érosion |
| EP4078049A4 (en) | 2019-12-19 | 2024-01-24 | 3M Innovative Properties Company | COMPOSITE COOLING FILM WITH AN ORGANIC POLYMER LAYER, A UV-ABSORBING LAYER AND A REFLECTIVE METAL LAYER |
| EP4091003A4 (en) | 2020-01-16 | 2024-01-24 | 3M Innovative Properties Company | COMPOSITE COOLING FOIL WITH A REFLECTIVE NONPOROUS ORGANIC POLYMER LAYER AND A UV PROTECTIVE LAYER |
| WO2021172231A1 (ja) * | 2020-02-28 | 2021-09-02 | Agc株式会社 | 積層体および積層体の製造方法 |
| CN111366993B (zh) * | 2020-03-03 | 2022-12-23 | 明基材料有限公司 | 抗反射膜以及具有此抗反射膜的偏光板 |
| JP7446663B2 (ja) * | 2020-03-05 | 2024-03-11 | エルジー・ケム・リミテッド | 光学フィルムおよびこれを含むマイクロledディスプレイ |
| US12147009B2 (en) | 2020-07-09 | 2024-11-19 | Corning Incorporated | Textured region to reduce specular reflectance including a low refractive index substrate with higher elevated surfaces and lower elevated surfaces and a high refractive index material disposed on the lower elevated surfaces |
| CN116324554B (zh) | 2020-09-17 | 2024-04-02 | 泛达公司 | 一种线缆管理系统 |
| FR3114267B1 (fr) * | 2020-09-18 | 2023-01-20 | Saint Gobain | Vitrage feuillete a cristaux liquides et son procede de fabrication |
| WO2022118178A1 (en) * | 2020-12-04 | 2022-06-09 | 3M Innovative Properties Company | Method of transferring particles to a coating surface |
| KR102793429B1 (ko) * | 2020-12-09 | 2025-04-14 | 생-고뱅 퍼포먼스 플라스틱스 코포레이션 | 반사 방지 코팅을 갖는 복합 필름 |
| CN114664885A (zh) | 2020-12-22 | 2022-06-24 | 乐金显示有限公司 | 显示装置 |
| WO2024033778A1 (en) * | 2022-08-07 | 2024-02-15 | Technology Innovation Institute – Sole Proprietorship LLC | Lightweight nanoparticle composition for a protective apparatus and method of making |
| EP4369062B1 (en) | 2022-11-14 | 2025-08-06 | Essilor International | Article coated with a low refractive index layer based on organic silsesquioxane compounds |
| CN117511309A (zh) * | 2023-11-27 | 2024-02-06 | 几何智慧(常州)光伏电站运维管理有限公司 | 应用于光伏板的水性涂料的制备工艺 |
| WO2025133762A1 (en) | 2023-12-21 | 2025-06-26 | 3M Innovative Properties Company | Retroreflective article comprising a retroreflective layer and an antireflective layer, kits, and methods thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW274539B (enExample) * | 1994-02-15 | 1996-04-21 | Dainippon Printing Co Ltd | |
| CN1235647A (zh) * | 1996-11-05 | 1999-11-17 | 明尼苏达矿业和制造公司 | 在移动基材上沉积富碳涂层的方法和装置 |
| TW520445B (en) * | 2000-12-25 | 2003-02-11 | Nitto Denko Corp | Optical diffusing layer, optical diffusing sheet, and optical element |
| TW200630426A (en) * | 2004-12-30 | 2006-09-01 | 3M Innovative Properties Co | Durable high index nanocomposites for ar coatings |
Family Cites Families (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1590694A (enExample) | 1968-09-20 | 1970-04-20 | ||
| GB2064987B (en) | 1979-11-14 | 1983-11-30 | Toray Industries | Process for producing transparent shaped article having enhanced anti-reflective effect |
| US5104929A (en) | 1988-04-11 | 1992-04-14 | Minnesota Mining And Manufacturing Company | Abrasion resistant coatings comprising silicon dioxide dispersions |
| JP3360898B2 (ja) * | 1993-10-05 | 2003-01-07 | 日東電工株式会社 | 反射防止部材の製造方法及び偏光板 |
| US5888594A (en) | 1996-11-05 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Process for depositing a carbon-rich coating on a moving substrate |
| DE19708776C1 (de) | 1997-03-04 | 1998-06-18 | Fraunhofer Ges Forschung | Entspiegelungsschicht sowie Verfahren zur Herstellung derselben |
| JPH10301105A (ja) * | 1997-05-01 | 1998-11-13 | Bridgestone Corp | 液晶表示装置用偏光板及び液晶表示装置 |
| JP3940546B2 (ja) | 1999-06-07 | 2007-07-04 | 株式会社東芝 | パターン形成方法およびパターン形成材料 |
| US6890448B2 (en) | 1999-06-11 | 2005-05-10 | Shipley Company, L.L.C. | Antireflective hard mask compositions |
| US6372829B1 (en) | 1999-10-06 | 2002-04-16 | 3M Innovative Properties Company | Antistatic composition |
| US6376590B2 (en) | 1999-10-28 | 2002-04-23 | 3M Innovative Properties Company | Zirconia sol, process of making and composite material |
| JP4759780B2 (ja) | 1999-12-07 | 2011-08-31 | 凸版印刷株式会社 | 低屈折率組成物、低屈折率膜、光学多層膜および反射防止膜 |
| US6811867B1 (en) | 2000-02-10 | 2004-11-02 | 3M Innovative Properties Company | Color stable pigmented polymeric films |
| US6483635B1 (en) | 2000-06-07 | 2002-11-19 | Cirrex Corp. | Apparatus for light amplification |
| JP2002122702A (ja) * | 2000-10-17 | 2002-04-26 | Matsushita Electric Ind Co Ltd | 光学フィルム、及び表示素子 |
| JP3921952B2 (ja) * | 2001-02-28 | 2007-05-30 | 凸版印刷株式会社 | 撮像素子及びその製造方法 |
| JP2002286906A (ja) | 2001-03-23 | 2002-10-03 | Mitsubishi Chemicals Corp | 反射防止方法及び反射防止構造並びに反射防止構造を有する反射防止構造体及びその製造方法 |
| CN100445340C (zh) | 2001-04-10 | 2008-12-24 | 东丽精密化学株式会社 | 固化性涂料组合物 |
| CN100351294C (zh) | 2001-08-02 | 2007-11-28 | 3M创新有限公司 | 光学透明和抗静电的压敏粘合剂 |
| DE60229340D1 (de) | 2001-10-05 | 2008-11-27 | Shinetsu Chemical Co | Perfluoropolyethermodifizierte Silane, Oberflächenbehandlungsmittel und Antireflexfilter |
| JP2003129008A (ja) * | 2001-10-24 | 2003-05-08 | Nitto Denko Corp | 放射線硬化型保護シート |
| JP2003279705A (ja) * | 2002-03-25 | 2003-10-02 | Sanyo Electric Co Ltd | 反射防止部材 |
| US7068898B2 (en) * | 2002-09-05 | 2006-06-27 | Nanosys, Inc. | Nanocomposites |
| DE10241708B4 (de) | 2002-09-09 | 2005-09-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Reduzierung der Grenzflächenreflexion von Kunststoffsubstraten sowie derart modifiziertes Substrat und dessen Verwendung |
| TW557363B (en) | 2002-10-15 | 2003-10-11 | Optimax Tech Corp | Anti-glare film |
| EP1416303B8 (en) | 2002-10-30 | 2010-10-13 | Hitachi, Ltd. | Method for manufacturing functional substrates comprising columnar micro-pillars |
| US6887917B2 (en) | 2002-12-30 | 2005-05-03 | 3M Innovative Properties Company | Curable pressure sensitive adhesive compositions |
| DE60326121D1 (de) | 2003-05-20 | 2009-03-26 | Dsm Ip Assets Bv | Verfahren zur Herstellung von Nanostrukturierten Oberflächenbeschichtungen, deren Beschichtungen und Gegenständen enthaltend die Beschichtung |
| JP2005011021A (ja) * | 2003-06-18 | 2005-01-13 | Alps Electric Co Ltd | タブレット及び液晶表示装置 |
| JP4475016B2 (ja) | 2003-06-30 | 2010-06-09 | 東レ株式会社 | ハードコートフィルム、反射防止フィルムおよび画像表示装置 |
| JP4505670B2 (ja) | 2003-08-29 | 2010-07-21 | 株式会社ニコン | 透過型光学素子の製造方法 |
| US7074463B2 (en) | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| US7030008B2 (en) | 2003-09-12 | 2006-04-18 | International Business Machines Corporation | Techniques for patterning features in semiconductor devices |
| KR100577693B1 (ko) * | 2004-05-20 | 2006-05-10 | 광주과학기술원 | 콜로이드 다중 입자층 구조를 이용한 반사 방지막과 이의제조방법 |
| US7850319B2 (en) | 2004-05-27 | 2010-12-14 | Panasonic Corporation | Light-absorbing member |
| US8574789B2 (en) | 2004-07-08 | 2013-11-05 | Toyota Motor Engineering & Manufacturing North America, Inc. | Dendritic metal nanostructures for fuel cells and other applications |
| US7378136B2 (en) | 2004-07-09 | 2008-05-27 | 3M Innovative Properties Company | Optical film coating |
| US20060134400A1 (en) | 2004-12-17 | 2006-06-22 | Nitto Denko Corporation | Hard-coated film and method of manufacturing the same |
| US7241437B2 (en) | 2004-12-30 | 2007-07-10 | 3M Innovative Properties Company | Zirconia particles |
| JP4855781B2 (ja) | 2005-02-01 | 2012-01-18 | 日東電工株式会社 | 反射防止ハードコートフィルム、光学素子および画像表示装置 |
| US20070047087A1 (en) * | 2005-08-25 | 2007-03-01 | Fuji Photo Film Co., Ltd. | Optical film, polarizing plate and image display device |
| US20070065638A1 (en) | 2005-09-20 | 2007-03-22 | Eastman Kodak Company | Nano-structured thin film with reduced light reflection |
| JPWO2007037276A1 (ja) | 2005-09-29 | 2009-04-09 | 大日本印刷株式会社 | 反射防止膜 |
| US20070104922A1 (en) | 2005-11-08 | 2007-05-10 | Lei Zhai | Superhydrophilic coatings |
| TW200732691A (en) * | 2005-12-22 | 2007-09-01 | Fujifilm Corp | Antireflection film, front plate for plasma display panel using the same, plasma display panel-display device, and image display device |
| US7848021B2 (en) | 2006-02-17 | 2010-12-07 | Fujifilm Corporation | Optical film, antireflection film, polarizing plate and image display device |
| WO2007103762A2 (en) | 2006-03-03 | 2007-09-13 | Colorado State University Research Foundation | Compositions and methods of use of electron transport system inhibitors |
| JP5252811B2 (ja) * | 2006-05-16 | 2013-07-31 | 日東電工株式会社 | 防眩性ハードコートフィルム、偏光板および画像表示装置 |
| WO2007139209A1 (en) | 2006-05-31 | 2007-12-06 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
| EP1862827B2 (en) | 2006-05-31 | 2012-05-30 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Nano-structured Zero-order diffractive filter |
| JP5148170B2 (ja) * | 2006-05-31 | 2013-02-20 | 株式会社半導体エネルギー研究所 | 表示装置 |
| CN101479031B (zh) | 2006-06-30 | 2012-11-14 | 王子制纸株式会社 | 单粒子膜蚀刻掩模及其制造方法、使用该单粒子膜蚀刻掩模的微细结构体的制造方法及通过该制造方法得到的微细结构体 |
| US7842352B2 (en) | 2006-08-09 | 2010-11-30 | Massachusetts Institute Of Technology | Nanoparticle coatings and methods of making |
| JP4986138B2 (ja) | 2006-11-15 | 2012-07-25 | 独立行政法人産業技術総合研究所 | 反射防止構造を有する光学素子用成形型の製造方法 |
| US20080135089A1 (en) * | 2006-11-15 | 2008-06-12 | General Electric Company | Graded hybrid amorphous silicon nanowire solar cells |
| DE102006056578A1 (de) | 2006-11-30 | 2008-06-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Nanostruktur an einer Kunststoffoberfläche |
| US7839570B2 (en) | 2007-01-22 | 2010-11-23 | Dai Nippon Printing Co., Ltd. | Optical layered body, polarizer and image display device |
| JP4155337B1 (ja) | 2007-02-21 | 2008-09-24 | ソニー株式会社 | 防眩性フィルムおよびその製造方法、ならびに表示装置 |
| FR2913231B1 (fr) * | 2007-03-02 | 2009-07-10 | Essilor Int | Article ayant une surface nanotexturee a proprietes superhydrophobes. |
| TW200909549A (en) | 2007-04-13 | 2009-03-01 | 3M Innovative Properties Co | Antistatic optically clear pressure sensitive adhesive |
| US7604381B2 (en) | 2007-04-16 | 2009-10-20 | 3M Innovative Properties Company | Optical article and method of making |
| US20090087629A1 (en) | 2007-09-28 | 2009-04-02 | Everaerts Albert I | Indium-tin-oxide compatible optically clear adhesive |
| JP4945460B2 (ja) | 2008-01-04 | 2012-06-06 | 株式会社東芝 | 反射防止構造の形成方法および反射防止構造 |
| JP2011509338A (ja) | 2008-01-11 | 2011-03-24 | スリーエム イノベイティブ プロパティズ カンパニー | 延伸剥離性の光学的に透明な感圧性接着剤 |
| US20090305012A1 (en) | 2008-06-07 | 2009-12-10 | Kevin Song | Functional Optical Films with Nanostructures |
| JP5210748B2 (ja) * | 2008-07-28 | 2013-06-12 | 富士フイルム株式会社 | 防眩性反射防止フィルムの製造方法 |
| US20100028564A1 (en) | 2008-07-29 | 2010-02-04 | Ming Cheng | Antistatic optical constructions having optically-transmissive adhesives |
| US20100221513A1 (en) | 2008-09-05 | 2010-09-02 | Wisconsin Alumni Research Foundation | Self sintering transparent nanoporous thin-films for use in self-cleaning, anti-fogging, anti-corrosion, anti-erosion electronic and optical applications |
| SG172204A1 (en) | 2008-12-30 | 2011-07-28 | 3M Innovative Properties Co | Antireflective articles and methods of making the same |
| JP5940809B2 (ja) | 2008-12-30 | 2016-06-29 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化物品及びナノ構造化物品の作製方法 |
-
2009
- 2009-12-18 SG SG2011044187A patent/SG172204A1/en unknown
- 2009-12-18 WO PCT/US2009/068639 patent/WO2010078071A1/en not_active Ceased
- 2009-12-18 KR KR1020167010364A patent/KR101915868B1/ko not_active Expired - Fee Related
- 2009-12-18 KR KR1020117017517A patent/KR20110110240A/ko not_active Ceased
- 2009-12-18 EP EP09808972.5A patent/EP2380045B1/en not_active Not-in-force
- 2009-12-18 CN CN200980157422.7A patent/CN102326099B/zh not_active Expired - Fee Related
- 2009-12-18 JP JP2011544480A patent/JP6174300B2/ja not_active Expired - Fee Related
- 2009-12-18 US US12/641,478 patent/US9435916B2/en not_active Expired - Fee Related
- 2009-12-29 TW TW098145627A patent/TWI575249B/zh not_active IP Right Cessation
-
2016
- 2016-04-07 JP JP2016077331A patent/JP2016145992A/ja not_active Withdrawn
- 2016-08-03 US US15/227,349 patent/US9939557B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW274539B (enExample) * | 1994-02-15 | 1996-04-21 | Dainippon Printing Co Ltd | |
| CN1235647A (zh) * | 1996-11-05 | 1999-11-17 | 明尼苏达矿业和制造公司 | 在移动基材上沉积富碳涂层的方法和装置 |
| TW520445B (en) * | 2000-12-25 | 2003-02-11 | Nitto Denko Corp | Optical diffusing layer, optical diffusing sheet, and optical element |
| TW200630426A (en) * | 2004-12-30 | 2006-09-01 | 3M Innovative Properties Co | Durable high index nanocomposites for ar coatings |
Also Published As
| Publication number | Publication date |
|---|---|
| US20100165276A1 (en) | 2010-07-01 |
| KR20110110240A (ko) | 2011-10-06 |
| SG172204A1 (en) | 2011-07-28 |
| WO2010078071A1 (en) | 2010-07-08 |
| US9435916B2 (en) | 2016-09-06 |
| TW201035586A (en) | 2010-10-01 |
| KR101915868B1 (ko) | 2018-11-06 |
| KR20160052746A (ko) | 2016-05-12 |
| JP6174300B2 (ja) | 2017-08-02 |
| CN102326099A (zh) | 2012-01-18 |
| EP2380045A1 (en) | 2011-10-26 |
| JP2016145992A (ja) | 2016-08-12 |
| CN102326099B (zh) | 2014-09-17 |
| US9939557B2 (en) | 2018-04-10 |
| US20160370506A1 (en) | 2016-12-22 |
| JP2012514238A (ja) | 2012-06-21 |
| EP2380045B1 (en) | 2017-06-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI575249B (zh) | 抗反射物件及其製作方法 | |
| EP2379443B1 (en) | Nanostructured articles and methods of making nanostructured articles | |
| JP5788807B2 (ja) | ナノ構造化表面を製造する方法 | |
| EP2686389B1 (en) | Nanostructured articles | |
| EP2686716B1 (en) | Multilayer nanostructured articles | |
| EP2744857B1 (en) | Nanostructured articles and methods to make the same | |
| US20130003179A1 (en) | Composite with nano-structured layer and method of making the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |