TWI539129B - Substrate processing device - Google Patents

Substrate processing device Download PDF

Info

Publication number
TWI539129B
TWI539129B TW099105294A TW99105294A TWI539129B TW I539129 B TWI539129 B TW I539129B TW 099105294 A TW099105294 A TW 099105294A TW 99105294 A TW99105294 A TW 99105294A TW I539129 B TWI539129 B TW I539129B
Authority
TW
Taiwan
Prior art keywords
air knife
substrate
support member
longitudinal direction
hook
Prior art date
Application number
TW099105294A
Other languages
English (en)
Chinese (zh)
Other versions
TW201040476A (en
Inventor
Hideki Sueyoshi
Hisaaki Miyasako
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of TW201040476A publication Critical patent/TW201040476A/zh
Application granted granted Critical
Publication of TWI539129B publication Critical patent/TWI539129B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Drying Of Solid Materials (AREA)
  • Screen Printers (AREA)
TW099105294A 2009-04-21 2010-02-24 Substrate processing device TWI539129B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009103154A JP5021695B2 (ja) 2009-04-21 2009-04-21 基板の処理装置

Publications (2)

Publication Number Publication Date
TW201040476A TW201040476A (en) 2010-11-16
TWI539129B true TWI539129B (zh) 2016-06-21

Family

ID=42996729

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099105294A TWI539129B (zh) 2009-04-21 2010-02-24 Substrate processing device

Country Status (4)

Country Link
JP (1) JP5021695B2 (ja)
KR (1) KR101095107B1 (ja)
CN (1) CN101871721B (ja)
TW (1) TWI539129B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102954676A (zh) * 2011-08-25 2013-03-06 无锡尚德太阳能电力有限公司 去除器件上的碱性溶液的方法及设备
CN103851887B (zh) * 2012-12-07 2016-01-27 深南电路有限公司 Pcb干燥机
CN103995434A (zh) * 2014-06-12 2014-08-20 上海华力微电子有限公司 一种掩膜版除尘装置
KR102278073B1 (ko) * 2014-11-28 2021-07-16 세메스 주식회사 기판 처리 장치
CN104759433B (zh) * 2015-04-20 2017-01-25 东莞市联洲知识产权运营管理有限公司 一种汽车喷涂前自动吹灰系统
CN106738400A (zh) * 2016-12-12 2017-05-31 惠科股份有限公司 玻璃碎屑清洁结构及搬运机
KR102247201B1 (ko) * 2019-08-13 2021-05-03 이돈형 멀티 슬릿 에어 나이프 장치
CN110779320A (zh) * 2019-09-17 2020-02-11 苏州晶洲装备科技有限公司 一种新型风干系统及具有该系统的oled基板剥离设备
JP7356368B2 (ja) * 2020-02-10 2023-10-04 株式会社荏原製作所 基板乾燥装置
CN111330917B (zh) * 2020-04-21 2024-01-02 南通芯盟测试研究院运营管理有限公司 微电子器件编带的除尘装置
CN113465347B (zh) * 2021-07-13 2022-06-21 江西师范大学 一种食品真空包装用风淋式快速干燥装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5005250A (en) * 1989-06-05 1991-04-09 Billco Manufacturing, Inc. Glass sheet cleaning apparatus
JP3012279B2 (ja) * 1990-05-01 2000-02-21 株式会社松谷製作所 歯科用ハンドピース
JP3122795B2 (ja) * 1991-09-19 2001-01-09 ヤンマー農機株式会社 乾燥装置
JPH08288250A (ja) * 1995-04-19 1996-11-01 Dainippon Screen Mfg Co Ltd 基板の液切り装置
EP2312380B1 (en) * 2001-02-27 2020-11-18 Dolby Laboratories Licensing Corporation A method and device for displaying an image
JP4602798B2 (ja) * 2005-03-03 2010-12-22 芝浦メカトロニクス株式会社 基板の処理装置
KR100873333B1 (ko) 2007-11-21 2008-12-10 세메스 주식회사 처리 유체 공급 장치 및 이를 포함하는 기판 처리 장치
JP2009262033A (ja) * 2008-04-24 2009-11-12 Micro Engineering Inc 梁のたわみ制御方法

Also Published As

Publication number Publication date
CN101871721A (zh) 2010-10-27
KR20100116123A (ko) 2010-10-29
JP2010258035A (ja) 2010-11-11
CN101871721B (zh) 2014-04-30
JP5021695B2 (ja) 2012-09-12
TW201040476A (en) 2010-11-16
KR101095107B1 (ko) 2011-12-16

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