TWI534161B - 共聚物、含有該共聚物的樹脂組成物、感光性樹脂組成物、及彩色濾光片 - Google Patents

共聚物、含有該共聚物的樹脂組成物、感光性樹脂組成物、及彩色濾光片 Download PDF

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Publication number
TWI534161B
TWI534161B TW101112060A TW101112060A TWI534161B TW I534161 B TWI534161 B TW I534161B TW 101112060 A TW101112060 A TW 101112060A TW 101112060 A TW101112060 A TW 101112060A TW I534161 B TWI534161 B TW I534161B
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Taiwan
Prior art keywords
copolymer
resin composition
acrylate
group
meth
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TW101112060A
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English (en)
Chinese (zh)
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TW201302822A (zh
Inventor
木下健宏
小森康廣
橋詰純平
西口將司
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昭和電工股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/302—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and two or more oxygen atoms in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Filters (AREA)
TW101112060A 2011-04-11 2012-04-05 共聚物、含有該共聚物的樹脂組成物、感光性樹脂組成物、及彩色濾光片 TWI534161B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011087344 2011-04-11

Publications (2)

Publication Number Publication Date
TW201302822A TW201302822A (zh) 2013-01-16
TWI534161B true TWI534161B (zh) 2016-05-21

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TW101112060A TWI534161B (zh) 2011-04-11 2012-04-05 共聚物、含有該共聚物的樹脂組成物、感光性樹脂組成物、及彩色濾光片

Country Status (5)

Country Link
JP (1) JP5736038B2 (ja)
KR (1) KR101536500B1 (ja)
CN (1) CN103459443B (ja)
TW (1) TWI534161B (ja)
WO (1) WO2012141000A1 (ja)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6001877B2 (ja) * 2012-02-28 2016-10-05 株式会社日本触媒 フォトスペーサー用硬化性樹脂組成物および柱状スペーサー
JP2014174222A (ja) * 2013-03-06 2014-09-22 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP6099198B2 (ja) * 2013-03-29 2017-03-22 日本化薬株式会社 エネルギー線硬化型樹脂組成物及びその硬化物
JP6157193B2 (ja) 2013-04-22 2017-07-05 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途
JP6259240B2 (ja) * 2013-09-30 2018-01-10 昭和電工株式会社 感光性樹脂の製造方法及びカラーフィルターの製造方法
JP6404557B2 (ja) * 2013-10-04 2018-10-10 株式会社日本触媒 硬化性樹脂組成物
JP6377928B2 (ja) * 2014-03-25 2018-08-22 株式会社日本触媒 アルカリ可溶性樹脂を含むレジスト組成物及びその保存方法
TWI483073B (zh) * 2014-04-02 2015-05-01 Chi Mei Corp 感光性樹脂組成物、彩色濾光片及其製造方法、液晶顯示裝置
JP2016042157A (ja) * 2014-08-18 2016-03-31 株式会社日本触媒 硬化性樹脂組成物
KR20160049953A (ko) * 2014-10-28 2016-05-10 삼성에스디아이 주식회사 광경화 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 장치
KR20160053750A (ko) * 2014-10-29 2016-05-13 삼성에스디아이 주식회사 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치
WO2016068414A1 (ko) * 2014-10-29 2016-05-06 삼성에스디아이 주식회사 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치
WO2016068416A1 (ko) * 2014-10-29 2016-05-06 삼성에스디아이 주식회사 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치
KR101636178B1 (ko) * 2014-12-30 2016-07-04 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서
JP6773420B2 (ja) * 2016-02-04 2020-10-21 株式会社日本触媒 カラーフィルター用顔料分散組成物
JP6782077B2 (ja) * 2016-02-04 2020-11-11 株式会社日本触媒 カラーフィルター用感光性樹脂組成物
CN105669892B (zh) * 2016-03-17 2019-07-26 上海昭和高分子有限公司 一种溶剂型共聚树脂及其组合物
JP6829571B2 (ja) * 2016-09-29 2021-02-10 株式会社日本触媒 顔料分散組成物
KR102270594B1 (ko) 2016-12-14 2021-06-28 쇼와 덴코 가부시키가이샤 컬러 필터용 수지 조성물, 그 제조 방법 및 컬러 필터
TWI677761B (zh) * 2016-12-23 2019-11-21 奇美實業股份有限公司 黑色矩陣用負型感光性樹脂組成物、黑色矩陣、彩色濾光片以及液晶顯示元件
JP7396786B2 (ja) * 2017-02-24 2023-12-12 日鉄ケミカル＆マテリアル株式会社 遮光膜用の感光性樹脂組成物、遮光膜、液晶表示装置、スペーサー機能を有する遮光膜の製造方法、および液晶表示装置の製造方法
WO2019225465A1 (ja) * 2018-05-24 2019-11-28 Dic株式会社 重合性組成物、その硬化物、フォトスペーサー、表示素子用オーバーコート、表示素子用層間絶縁材料、及び液晶表示素子
CN113039216B (zh) * 2018-11-08 2023-08-22 株式会社力森诺科 共聚物及包含该共聚物的树脂组合物
WO2020111022A1 (ja) * 2018-11-28 2020-06-04 昭和電工株式会社 エチレン性不飽和樹脂組成物、及び感光性樹脂組成物

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JP3058507B2 (ja) * 1992-04-17 2000-07-04 日本化薬株式会社 紙用活性エネルギー線硬化性樹脂組成物及びその硬化物
JP3228432B2 (ja) * 1992-04-22 2001-11-12 日本化薬株式会社 光デイスク用材料及びその硬化物
JPH05311102A (ja) * 1992-05-11 1993-11-22 Nippon Kayaku Co Ltd 印刷インキ用組成物及びこの硬化物
JP2008266578A (ja) * 2007-03-23 2008-11-06 Sanyo Electric Co Ltd 光学ポリマー材料及び光学部品
JP2009102500A (ja) * 2007-10-23 2009-05-14 Sumitomo Chemical Co Ltd 組成物、該組成物から得られる共重合体および光学フィルムならびに該光学フィルムの製造方法
CN101158810A (zh) * 2007-11-21 2008-04-09 京东方科技集团股份有限公司 感光树脂组合物及其制备方法和彩色滤光片制备方法

Also Published As

Publication number Publication date
KR20130132639A (ko) 2013-12-04
JP5736038B2 (ja) 2015-06-17
CN103459443A (zh) 2013-12-18
KR101536500B1 (ko) 2015-08-17
TW201302822A (zh) 2013-01-16
WO2012141000A1 (ja) 2012-10-18
CN103459443B (zh) 2016-08-24
JPWO2012141000A1 (ja) 2014-07-28

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