TWI483290B - 描畫方法和製造物品的方法 - Google Patents

描畫方法和製造物品的方法 Download PDF

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Publication number
TWI483290B
TWI483290B TW101150553A TW101150553A TWI483290B TW I483290 B TWI483290 B TW I483290B TW 101150553 A TW101150553 A TW 101150553A TW 101150553 A TW101150553 A TW 101150553A TW I483290 B TWI483290 B TW I483290B
Authority
TW
Taiwan
Prior art keywords
patterns
pattern
pair
cutting
pitch
Prior art date
Application number
TW101150553A
Other languages
English (en)
Chinese (zh)
Other versions
TW201331986A (zh
Inventor
Kouichirou Tsujita
Masato Muraki
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW201331986A publication Critical patent/TW201331986A/zh
Application granted granted Critical
Publication of TWI483290B publication Critical patent/TWI483290B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
TW101150553A 2012-01-31 2012-12-27 描畫方法和製造物品的方法 TWI483290B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012018634A JP6087506B2 (ja) 2012-01-31 2012-01-31 描画方法及び物品の製造方法

Publications (2)

Publication Number Publication Date
TW201331986A TW201331986A (zh) 2013-08-01
TWI483290B true TWI483290B (zh) 2015-05-01

Family

ID=48836788

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101150553A TWI483290B (zh) 2012-01-31 2012-12-27 描畫方法和製造物品的方法

Country Status (5)

Country Link
US (1) US9690201B2 (enExample)
JP (1) JP6087506B2 (enExample)
KR (1) KR101597869B1 (enExample)
CN (1) CN103226292B (enExample)
TW (1) TWI483290B (enExample)

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US9501601B2 (en) * 2013-03-14 2016-11-22 Taiwan Semiconductor Manufacturing Company, Ltd. Layout optimization of a main pattern and a cut pattern
JP6215061B2 (ja) * 2014-01-14 2017-10-18 株式会社アドバンテスト 電子ビーム露光装置
JP6211435B2 (ja) * 2014-02-26 2017-10-11 株式会社アドバンテスト 半導体装置の製造方法
US9318564B2 (en) 2014-05-19 2016-04-19 Qualcomm Incorporated High density static random access memory array having advanced metal patterning
JP6462720B2 (ja) * 2014-06-13 2019-01-30 インテル・コーポレーション 電子ビームの３ビームアパーチャアレイ
US10216087B2 (en) 2014-06-13 2019-02-26 Intel Corporation Ebeam universal cutter
WO2015191104A1 (en) 2014-06-13 2015-12-17 Intel Corporation Ebeam staggered beam aperture array
US10217732B2 (en) 2014-06-25 2019-02-26 Intel Corporation Techniques for forming a compacted array of functional cells
CN106537556B (zh) * 2014-08-19 2021-09-07 英特尔公司 利用电子束通用切具的交叉扫描接近度校正
JP2016122676A (ja) * 2014-12-24 2016-07-07 株式会社アドバンテスト 露光装置および露光方法
JP2016207925A (ja) 2015-04-27 2016-12-08 株式会社アドバンテスト 素子、製造方法、および露光装置
JP2016207926A (ja) * 2015-04-27 2016-12-08 株式会社アドバンテスト 露光装置および露光方法
JP2017063101A (ja) 2015-09-24 2017-03-30 株式会社アドバンテスト 露光装置および露光方法
US9818623B2 (en) 2016-03-22 2017-11-14 Globalfoundries Inc. Method of forming a pattern for interconnection lines and associated continuity blocks in an integrated circuit
JP2018041790A (ja) 2016-09-06 2018-03-15 株式会社アドバンテスト 露光装置および露光データ構造
US9818640B1 (en) 2016-09-21 2017-11-14 Globalfoundries Inc. Apparatus and method of forming self-aligned cuts in a non-mandrel line of an array of metal lines
US9818641B1 (en) 2016-09-21 2017-11-14 Globalfoundries Inc. Apparatus and method of forming self-aligned cuts in mandrel and a non-mandrel lines of an array of metal lines
US9786545B1 (en) 2016-09-21 2017-10-10 Globalfoundries Inc. Method of forming ANA regions in an integrated circuit
US9852986B1 (en) 2016-11-28 2017-12-26 Globalfoundries Inc. Method of patterning pillars to form variable continuity cuts in interconnection lines of an integrated circuit
US10043703B2 (en) 2016-12-15 2018-08-07 Globalfoundries Inc. Apparatus and method for forming interconnection lines having variable pitch and variable widths
US9887127B1 (en) 2016-12-15 2018-02-06 Globalfoundries Inc. Interconnection lines having variable widths and partially self-aligned continuity cuts
US9812351B1 (en) 2016-12-15 2017-11-07 Globalfoundries Inc. Interconnection cells having variable width metal lines and fully-self aligned continuity cuts
US10002786B1 (en) 2016-12-15 2018-06-19 Globalfoundries Inc. Interconnection cells having variable width metal lines and fully-self aligned variable length continuity cuts
JP7474151B2 (ja) * 2020-08-21 2024-04-24 株式会社ニューフレアテクノロジー マルチ電子ビーム描画装置及びマルチ電子ビーム描画方法
JP7455720B2 (ja) * 2020-09-29 2024-03-26 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム照射装置およびマルチ荷電粒子ビーム照射方法
JP7492929B2 (ja) * 2021-02-19 2024-05-30 株式会社東芝 半導体装置、荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム照射装置

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Also Published As

Publication number Publication date
TW201331986A (zh) 2013-08-01
US20130196517A1 (en) 2013-08-01
JP2013157547A (ja) 2013-08-15
US9690201B2 (en) 2017-06-27
CN103226292B (zh) 2015-04-22
JP6087506B2 (ja) 2017-03-01
KR101597869B1 (ko) 2016-02-25
KR20130088772A (ko) 2013-08-08
CN103226292A (zh) 2013-07-31

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