TWI477904B - Photosensitive resin composition - Google Patents

Photosensitive resin composition Download PDF

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Publication number
TWI477904B
TWI477904B TW100107740A TW100107740A TWI477904B TW I477904 B TWI477904 B TW I477904B TW 100107740 A TW100107740 A TW 100107740A TW 100107740 A TW100107740 A TW 100107740A TW I477904 B TWI477904 B TW I477904B
Authority
TW
Taiwan
Prior art keywords
compound
mass
resin composition
meth
photosensitive resin
Prior art date
Application number
TW100107740A
Other languages
English (en)
Chinese (zh)
Other versions
TW201144939A (en
Inventor
Kazuo Takebe
Katsuharu Inoue
Ryuichi Matsuura
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201144939A publication Critical patent/TW201144939A/zh
Application granted granted Critical
Publication of TWI477904B publication Critical patent/TWI477904B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
TW100107740A 2010-03-26 2011-03-08 Photosensitive resin composition TWI477904B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010071809 2010-03-26

Publications (2)

Publication Number Publication Date
TW201144939A TW201144939A (en) 2011-12-16
TWI477904B true TWI477904B (zh) 2015-03-21

Family

ID=44696584

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100107740A TWI477904B (zh) 2010-03-26 2011-03-08 Photosensitive resin composition

Country Status (4)

Country Link
JP (1) JP5673243B2 (ja)
KR (2) KR102066277B1 (ja)
CN (1) CN102207680B (ja)
TW (1) TWI477904B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5981167B2 (ja) * 2011-03-24 2016-08-31 東京応化工業株式会社 感光性樹脂組成物
WO2013084282A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント
WO2013084283A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント
US20140335350A1 (en) * 2011-12-05 2014-11-13 Hitachi Chemical Company, Ltd. Method for forming protective film on electrode for touch panel, photosensitive resin composition and photosensitive element, and method for manufacturing touch panel
JP2013160825A (ja) * 2012-02-02 2013-08-19 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP2013171278A (ja) * 2012-02-23 2013-09-02 Sumitomo Chemical Co Ltd 感光性樹脂組成物
WO2014038576A1 (ja) * 2012-09-05 2014-03-13 株式会社日本触媒 フォトスペーサー用感光性樹脂組成物およびフォトスペーサー
KR102145934B1 (ko) * 2014-05-20 2020-08-19 동우 화인켐 주식회사 광경화 패턴의 형성 방법
US10040967B2 (en) 2015-11-06 2018-08-07 Hitachi Chemical Company, Ltd. Photosensitive film, photosensitive element, cured product and touch panel
KR101697336B1 (ko) 2016-03-03 2017-01-17 주식회사 엘지화학 액정 배향막의 제조방법
KR101979980B1 (ko) * 2016-03-23 2019-05-17 동우 화인켐 주식회사 감광성 수지 조성물

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007041502A (ja) * 2005-06-30 2007-02-15 Dainippon Ink & Chem Inc 感光性樹脂組成物
JP2008291090A (ja) * 2007-05-23 2008-12-04 Jsr Corp 感放射線性樹脂組成物、液晶表示素子のスペーサーおよび保護膜ならびにそれらの形成方法

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JP4470089B2 (ja) * 2002-01-22 2010-06-02 東洋紡績株式会社 導電性基材用活性光線硬化型レジストインキ
CN1573545A (zh) * 2003-06-20 2005-02-02 富士胶片株式会社 感光性转印片、感光性层合体、图像花样的形成方法以及布线花样的形成方法
JP4419736B2 (ja) * 2004-07-20 2010-02-24 Ｊｓｒ株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
KR100658714B1 (ko) * 2004-11-30 2006-12-15 삼성에스디아이 주식회사 감광성 조성물, 이를 포함하는 격벽 형성용 감광성페이스트 조성물, 및 이를 이용한 플라즈마 디스플레이패널용 격벽의 제조방법.
KR101329436B1 (ko) * 2005-04-01 2013-11-14 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 이것으로부터 형성된 돌기 및 스페이서, 및 이들을 구비하는 액정 표시 소자
JP2006309157A (ja) * 2005-04-01 2006-11-09 Jsr Corp 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子
WO2007004334A1 (ja) * 2005-06-30 2007-01-11 Dainippon Ink And Chemicals, Inc. 感光性樹脂組成物
KR100961818B1 (ko) * 2007-02-21 2010-06-08 주식회사 엘지화학 블랙 매트릭스용 감광성 수지 조성물, 이에 의해 형성되는블랙 매트릭스 및 이를 포함하는 액정표시소자
JP4844774B2 (ja) * 2007-02-27 2011-12-28 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示素子用スペーサーおよび保護膜ならびにそれらの形成方法
JP4814997B2 (ja) * 2007-04-24 2011-11-16 三井化学株式会社 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品
WO2009034780A1 (ja) * 2007-09-10 2009-03-19 Fujifilm Corporation カラーフィルタ及びその製造方法、ならびに液晶表示装置
JP5589270B2 (ja) * 2007-10-23 2014-09-17 Ｊｓｒ株式会社 青色カラーフィルタ用感放射線性組成物、カラーフィルタ及び液晶表示素子
JP2009134078A (ja) 2007-11-30 2009-06-18 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5527965B2 (ja) * 2008-02-22 2014-06-25 Ｊｓｒ株式会社 緑色画素形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
KR101482552B1 (ko) * 2008-04-30 2015-01-21 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007041502A (ja) * 2005-06-30 2007-02-15 Dainippon Ink & Chem Inc 感光性樹脂組成物
JP2008291090A (ja) * 2007-05-23 2008-12-04 Jsr Corp 感放射線性樹脂組成物、液晶表示素子のスペーサーおよび保護膜ならびにそれらの形成方法

Also Published As

Publication number Publication date
KR20110108268A (ko) 2011-10-05
KR102066277B1 (ko) 2020-01-14
CN102207680A (zh) 2011-10-05
KR102115077B1 (ko) 2020-05-25
JP2011221508A (ja) 2011-11-04
CN102207680B (zh) 2015-09-02
JP5673243B2 (ja) 2015-02-18
KR20180021753A (ko) 2018-03-05
TW201144939A (en) 2011-12-16

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