TWI477904B - Photosensitive resin composition - Google Patents
Photosensitive resin composition Download PDFInfo
- Publication number
- TWI477904B TWI477904B TW100107740A TW100107740A TWI477904B TW I477904 B TWI477904 B TW I477904B TW 100107740 A TW100107740 A TW 100107740A TW 100107740 A TW100107740 A TW 100107740A TW I477904 B TWI477904 B TW I477904B
- Authority
- TW
- Taiwan
- Prior art keywords
- compound
- mass
- resin composition
- meth
- photosensitive resin
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010071809 | 2010-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201144939A TW201144939A (en) | 2011-12-16 |
TWI477904B true TWI477904B (zh) | 2015-03-21 |
Family
ID=44696584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100107740A TWI477904B (zh) | 2010-03-26 | 2011-03-08 | Photosensitive resin composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5673243B2 (ja) |
KR (2) | KR102066277B1 (ja) |
CN (1) | CN102207680B (ja) |
TW (1) | TWI477904B (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5981167B2 (ja) * | 2011-03-24 | 2016-08-31 | 東京応化工業株式会社 | 感光性樹脂組成物 |
WO2013084282A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント |
WO2013084283A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント |
US20140335350A1 (en) * | 2011-12-05 | 2014-11-13 | Hitachi Chemical Company, Ltd. | Method for forming protective film on electrode for touch panel, photosensitive resin composition and photosensitive element, and method for manufacturing touch panel |
JP2013160825A (ja) * | 2012-02-02 | 2013-08-19 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
JP2013171278A (ja) * | 2012-02-23 | 2013-09-02 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
WO2014038576A1 (ja) * | 2012-09-05 | 2014-03-13 | 株式会社日本触媒 | フォトスペーサー用感光性樹脂組成物およびフォトスペーサー |
KR102145934B1 (ko) * | 2014-05-20 | 2020-08-19 | 동우 화인켐 주식회사 | 광경화 패턴의 형성 방법 |
US10040967B2 (en) | 2015-11-06 | 2018-08-07 | Hitachi Chemical Company, Ltd. | Photosensitive film, photosensitive element, cured product and touch panel |
KR101697336B1 (ko) | 2016-03-03 | 2017-01-17 | 주식회사 엘지화학 | 액정 배향막의 제조방법 |
KR101979980B1 (ko) * | 2016-03-23 | 2019-05-17 | 동우 화인켐 주식회사 | 감광성 수지 조성물 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007041502A (ja) * | 2005-06-30 | 2007-02-15 | Dainippon Ink & Chem Inc | 感光性樹脂組成物 |
JP2008291090A (ja) * | 2007-05-23 | 2008-12-04 | Jsr Corp | 感放射線性樹脂組成物、液晶表示素子のスペーサーおよび保護膜ならびにそれらの形成方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4470089B2 (ja) * | 2002-01-22 | 2010-06-02 | 東洋紡績株式会社 | 導電性基材用活性光線硬化型レジストインキ |
CN1573545A (zh) * | 2003-06-20 | 2005-02-02 | 富士胶片株式会社 | 感光性转印片、感光性层合体、图像花样的形成方法以及布线花样的形成方法 |
JP4419736B2 (ja) * | 2004-07-20 | 2010-02-24 | Jsr株式会社 | 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル |
KR100658714B1 (ko) * | 2004-11-30 | 2006-12-15 | 삼성에스디아이 주식회사 | 감광성 조성물, 이를 포함하는 격벽 형성용 감광성페이스트 조성물, 및 이를 이용한 플라즈마 디스플레이패널용 격벽의 제조방법. |
KR101329436B1 (ko) * | 2005-04-01 | 2013-11-14 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 이것으로부터 형성된 돌기 및 스페이서, 및 이들을 구비하는 액정 표시 소자 |
JP2006309157A (ja) * | 2005-04-01 | 2006-11-09 | Jsr Corp | 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子 |
WO2007004334A1 (ja) * | 2005-06-30 | 2007-01-11 | Dainippon Ink And Chemicals, Inc. | 感光性樹脂組成物 |
KR100961818B1 (ko) * | 2007-02-21 | 2010-06-08 | 주식회사 엘지화학 | 블랙 매트릭스용 감광성 수지 조성물, 이에 의해 형성되는블랙 매트릭스 및 이를 포함하는 액정표시소자 |
JP4844774B2 (ja) * | 2007-02-27 | 2011-12-28 | Jsr株式会社 | 感放射線性樹脂組成物、液晶表示素子用スペーサーおよび保護膜ならびにそれらの形成方法 |
JP4814997B2 (ja) * | 2007-04-24 | 2011-11-16 | 三井化学株式会社 | 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 |
WO2009034780A1 (ja) * | 2007-09-10 | 2009-03-19 | Fujifilm Corporation | カラーフィルタ及びその製造方法、ならびに液晶表示装置 |
JP5589270B2 (ja) * | 2007-10-23 | 2014-09-17 | Jsr株式会社 | 青色カラーフィルタ用感放射線性組成物、カラーフィルタ及び液晶表示素子 |
JP2009134078A (ja) | 2007-11-30 | 2009-06-18 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
JP5527965B2 (ja) * | 2008-02-22 | 2014-06-25 | Jsr株式会社 | 緑色画素形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 |
KR101482552B1 (ko) * | 2008-04-30 | 2015-01-21 | 주식회사 동진쎄미켐 | 네가티브 감광성 수지 조성물 |
-
2011
- 2011-03-08 TW TW100107740A patent/TWI477904B/zh active
- 2011-03-14 JP JP2011055275A patent/JP5673243B2/ja active Active
- 2011-03-21 KR KR1020110024761A patent/KR102066277B1/ko active IP Right Grant
- 2011-03-24 CN CN201110078470.6A patent/CN102207680B/zh active Active
-
2018
- 2018-02-14 KR KR1020180018165A patent/KR102115077B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007041502A (ja) * | 2005-06-30 | 2007-02-15 | Dainippon Ink & Chem Inc | 感光性樹脂組成物 |
JP2008291090A (ja) * | 2007-05-23 | 2008-12-04 | Jsr Corp | 感放射線性樹脂組成物、液晶表示素子のスペーサーおよび保護膜ならびにそれらの形成方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20110108268A (ko) | 2011-10-05 |
KR102066277B1 (ko) | 2020-01-14 |
CN102207680A (zh) | 2011-10-05 |
KR102115077B1 (ko) | 2020-05-25 |
JP2011221508A (ja) | 2011-11-04 |
CN102207680B (zh) | 2015-09-02 |
JP5673243B2 (ja) | 2015-02-18 |
KR20180021753A (ko) | 2018-03-05 |
TW201144939A (en) | 2011-12-16 |
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