TWI378318B - Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern - Google Patents

Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern Download PDF

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Publication number
TWI378318B
TWI378318B TW097111158A TW97111158A TWI378318B TW I378318 B TWI378318 B TW I378318B TW 097111158 A TW097111158 A TW 097111158A TW 97111158 A TW97111158 A TW 97111158A TW I378318 B TWI378318 B TW I378318B
Authority
TW
Taiwan
Prior art keywords
film
light
defect
semi
correction
Prior art date
Application number
TW097111158A
Other languages
English (en)
Chinese (zh)
Other versions
TW200848919A (en
Inventor
Michiaki Sano
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200848919A publication Critical patent/TW200848919A/zh
Application granted granted Critical
Publication of TWI378318B publication Critical patent/TWI378318B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW097111158A 2007-03-31 2008-03-28 Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern TWI378318B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007095881A JP5102912B2 (ja) 2007-03-31 2007-03-31 グレートーンマスクの欠陥修正方法、グレートーンマスクの製造方法、及びパターン転写方法

Publications (2)

Publication Number Publication Date
TW200848919A TW200848919A (en) 2008-12-16
TWI378318B true TWI378318B (en) 2012-12-01

Family

ID=39980419

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097111158A TWI378318B (en) 2007-03-31 2008-03-28 Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern

Country Status (4)

Country Link
JP (1) JP5102912B2 (ko)
KR (1) KR101444463B1 (ko)
CN (1) CN101276140B (ko)
TW (1) TWI378318B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI659262B (zh) * 2017-08-07 2019-05-11 日商Ｈｏｙａ股份有限公司 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5336226B2 (ja) * 2008-02-26 2013-11-06 Ｈｏｙａ株式会社 多階調フォトマスクの製造方法
CN101943854B (zh) * 2009-07-03 2012-07-04 深圳清溢光电股份有限公司 半灰阶掩模板半曝光区的设计方法及其制造方法
JP2011081282A (ja) * 2009-10-09 2011-04-21 Hoya Corp フォトマスク用欠陥修正方法、フォトマスク用欠陥修正装置、フォトマスク用欠陥修正ヘッド、及びフォトマスク用欠陥検査装置、並びにフォトマスクの製造方法
KR101032695B1 (ko) 2010-04-26 2011-06-10 주식회사 에스앤에스텍 그레이톤 포토마스크의 결함 수정 방법, 그레이톤 포토마스크 블랭크, 그레이톤 포토마스크, 및 그들의 제조 방법
CN104746041B (zh) * 2015-03-04 2018-02-13 深圳清溢光电股份有限公司 激光气相沉积方式修补白缺陷的方法
JP6666694B2 (ja) * 2015-11-12 2020-03-18 株式会社エスケーエレクトロニクス 多階調ハーフトーンマスクおよびその製造方法
JP6235643B2 (ja) 2016-03-25 2017-11-22 Hoya株式会社 パターン修正方法、フォトマスクの製造方法、フォトマスク、及び修正膜形成装置
JP6557638B2 (ja) 2016-07-06 2019-08-07 株式会社エスケーエレクトロニクス ハーフトーンマスクおよびハーフトーンマスクブランクス
KR20180066354A (ko) * 2016-12-08 2018-06-19 주식회사 피케이엘 하프톤 마스크의 반투과부 결함 수정 방법 및 그 결함 수정 하프톤 마스크
US11086222B2 (en) 2018-11-23 2021-08-10 Nanya Technology Corporation Method of manufacturing semiconductor structure
JP6741893B1 (ja) * 2020-03-04 2020-08-19 株式会社エスケーエレクトロニクス ハーフトーンマスクの欠陥修正方法、ハーフトーンマスクの製造方法及びハーフトーンマスク

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3630935B2 (ja) * 1997-08-18 2005-03-23 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクの欠陥修正方法
JPH11109605A (ja) * 1997-10-03 1999-04-23 Toshiba Corp 露光マスクの修正方法
JP3556591B2 (ja) * 2000-09-29 2004-08-18 Ｈｏｙａ株式会社 グレートーンマスクにおけるグレートーン部の欠陥修正方法
JP4297693B2 (ja) * 2003-01-31 2009-07-15 株式会社ルネサステクノロジ フォトマスク、フォトマスクの製造方法、およびフォトマスクの製造装置
JP3993125B2 (ja) * 2003-04-01 2007-10-17 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法
JP4559921B2 (ja) * 2005-06-20 2010-10-13 エスアイアイ・ナノテクノロジー株式会社 グレートーンのパターン膜欠陥修正方法
KR100936716B1 (ko) * 2005-09-23 2010-01-13 엘지이노텍 주식회사 하프톤 마스크의 반투과부 결함 수정 방법 및 이를 이용한리페어된 하프톤 마스크
JP2007151850A (ja) * 2005-12-06 2007-06-21 Taito Corp 端末ゲーム装置
JP4446395B2 (ja) * 2006-02-02 2010-04-07 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法、及びグレートーンマスク
JP5036349B2 (ja) * 2007-02-28 2012-09-26 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI659262B (zh) * 2017-08-07 2019-05-11 日商Ｈｏｙａ股份有限公司 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法

Also Published As

Publication number Publication date
KR20080089269A (ko) 2008-10-06
TW200848919A (en) 2008-12-16
JP5102912B2 (ja) 2012-12-19
JP2008256759A (ja) 2008-10-23
KR101444463B1 (ko) 2014-09-24
CN101276140A (zh) 2008-10-01
CN101276140B (zh) 2012-02-22

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