CN101276140B - 灰阶掩模的缺陷修正方法和制造方法、灰阶掩模及图案转印方法 - Google Patents

灰阶掩模的缺陷修正方法和制造方法、灰阶掩模及图案转印方法 Download PDF

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Publication number
CN101276140B
CN101276140B CN2008100865843A CN200810086584A CN101276140B CN 101276140 B CN101276140 B CN 101276140B CN 2008100865843 A CN2008100865843 A CN 2008100865843A CN 200810086584 A CN200810086584 A CN 200810086584A CN 101276140 B CN101276140 B CN 101276140B
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film
semi
gray
tone mask
defect
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CN2008100865843A
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CN101276140A (zh
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佐野道明
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Hoya Corp
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Hoya Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN2008100865843A 2007-03-31 2008-03-20 灰阶掩模的缺陷修正方法和制造方法、灰阶掩模及图案转印方法 Expired - Fee Related CN101276140B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007095881A JP5102912B2 (ja) 2007-03-31 2007-03-31 グレートーンマスクの欠陥修正方法、グレートーンマスクの製造方法、及びパターン転写方法
JP2007-095881 2007-03-31

Publications (2)

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CN101276140A CN101276140A (zh) 2008-10-01
CN101276140B true CN101276140B (zh) 2012-02-22

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CN2008100865843A Expired - Fee Related CN101276140B (zh) 2007-03-31 2008-03-20 灰阶掩模的缺陷修正方法和制造方法、灰阶掩模及图案转印方法

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JP (1) JP5102912B2 (ko)
KR (1) KR101444463B1 (ko)
CN (1) CN101276140B (ko)
TW (1) TWI378318B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5336226B2 (ja) * 2008-02-26 2013-11-06 Ｈｏｙａ株式会社 多階調フォトマスクの製造方法
CN101943854B (zh) * 2009-07-03 2012-07-04 深圳清溢光电股份有限公司 半灰阶掩模板半曝光区的设计方法及其制造方法
JP2011081282A (ja) * 2009-10-09 2011-04-21 Hoya Corp フォトマスク用欠陥修正方法、フォトマスク用欠陥修正装置、フォトマスク用欠陥修正ヘッド、及びフォトマスク用欠陥検査装置、並びにフォトマスクの製造方法
KR101032695B1 (ko) 2010-04-26 2011-06-10 주식회사 에스앤에스텍 그레이톤 포토마스크의 결함 수정 방법, 그레이톤 포토마스크 블랭크, 그레이톤 포토마스크, 및 그들의 제조 방법
CN104746041B (zh) * 2015-03-04 2018-02-13 深圳清溢光电股份有限公司 激光气相沉积方式修补白缺陷的方法
JP6235643B2 (ja) 2016-03-25 2017-11-22 Hoya株式会社 パターン修正方法、フォトマスクの製造方法、フォトマスク、及び修正膜形成装置
JP6557638B2 (ja) 2016-07-06 2019-08-07 株式会社エスケーエレクトロニクス ハーフトーンマスクおよびハーフトーンマスクブランクス
KR20180066354A (ko) * 2016-12-08 2018-06-19 주식회사 피케이엘 하프톤 마스크의 반투과부 결함 수정 방법 및 그 결함 수정 하프톤 마스크
TWI659262B (zh) * 2017-08-07 2019-05-11 日商Ｈｏｙａ股份有限公司 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法
US11086222B2 (en) 2018-11-23 2021-08-10 Nanya Technology Corporation Method of manufacturing semiconductor structure
JP6741893B1 (ja) * 2020-03-04 2020-08-19 株式会社エスケーエレクトロニクス ハーフトーンマスクの欠陥修正方法、ハーフトーンマスクの製造方法及びハーフトーンマスク

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1519653A (zh) * 2003-01-31 2004-08-11 株式会社瑞萨科技 光刻掩模、光刻掩模的制造方法以及光刻掩模的制造装置
CN1534366A (zh) * 2003-04-01 2004-10-06 Hoya株式会社 灰色调掩模的缺陷校正方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3630935B2 (ja) * 1997-08-18 2005-03-23 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクの欠陥修正方法
JPH11109605A (ja) * 1997-10-03 1999-04-23 Toshiba Corp 露光マスクの修正方法
JP3556591B2 (ja) * 2000-09-29 2004-08-18 Ｈｏｙａ株式会社 グレートーンマスクにおけるグレートーン部の欠陥修正方法
JP4559921B2 (ja) * 2005-06-20 2010-10-13 エスアイアイ・ナノテクノロジー株式会社 グレートーンのパターン膜欠陥修正方法
KR100936716B1 (ko) * 2005-09-23 2010-01-13 엘지이노텍 주식회사 하프톤 마스크의 반투과부 결함 수정 방법 및 이를 이용한리페어된 하프톤 마스크
JP2007151850A (ja) * 2005-12-06 2007-06-21 Taito Corp 端末ゲーム装置
JP4446395B2 (ja) * 2006-02-02 2010-04-07 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法、及びグレートーンマスク
JP5036349B2 (ja) * 2007-02-28 2012-09-26 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1519653A (zh) * 2003-01-31 2004-08-11 株式会社瑞萨科技 光刻掩模、光刻掩模的制造方法以及光刻掩模的制造装置
CN1534366A (zh) * 2003-04-01 2004-10-06 Hoya株式会社 灰色调掩模的缺陷校正方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JP特开平5-142758A 1993.06.11
JP特开平6-347994A 1994.12.22
JP特开平7-191450A 1995.07.28

Also Published As

Publication number Publication date
JP2008256759A (ja) 2008-10-23
CN101276140A (zh) 2008-10-01
TWI378318B (en) 2012-12-01
KR20080089269A (ko) 2008-10-06
JP5102912B2 (ja) 2012-12-19
KR101444463B1 (ko) 2014-09-24
TW200848919A (en) 2008-12-16

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