TWI372947B - Method and apparatus for monitoring and controlling imaging in immersion lithography systems - Google Patents

Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Info

Publication number
TWI372947B
TWI372947B TW093122007A TW93122007A TWI372947B TW I372947 B TWI372947 B TW I372947B TW 093122007 A TW093122007 A TW 093122007A TW 93122007 A TW93122007 A TW 93122007A TW I372947 B TWI372947 B TW I372947B
Authority
TW
Taiwan
Prior art keywords
monitoring
immersion lithography
lithography systems
controlling imaging
imaging
Prior art date
Application number
TW093122007A
Other languages
English (en)
Chinese (zh)
Other versions
TW200510965A (en
Inventor
Harry J Levinson
Original Assignee
Globalfoundries Us Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Globalfoundries Us Inc filed Critical Globalfoundries Us Inc
Publication of TW200510965A publication Critical patent/TW200510965A/zh
Application granted granted Critical
Publication of TWI372947B publication Critical patent/TWI372947B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW093122007A 2003-07-25 2004-07-23 Method and apparatus for monitoring and controlling imaging in immersion lithography systems TWI372947B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/628,021 US7006209B2 (en) 2003-07-25 2003-07-25 Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Publications (2)

Publication Number Publication Date
TW200510965A TW200510965A (en) 2005-03-16
TWI372947B true TWI372947B (en) 2012-09-21

Family

ID=34080711

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093122007A TWI372947B (en) 2003-07-25 2004-07-23 Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Country Status (7)

Country Link
US (1) US7006209B2 (enExample)
EP (1) EP1652008B1 (enExample)
JP (1) JP4465356B2 (enExample)
KR (1) KR101071966B1 (enExample)
CN (1) CN100538523C (enExample)
TW (1) TWI372947B (enExample)
WO (1) WO2005013008A2 (enExample)

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Also Published As

Publication number Publication date
US20050018208A1 (en) 2005-01-27
KR101071966B1 (ko) 2011-10-11
CN1820229A (zh) 2006-08-16
TW200510965A (en) 2005-03-16
JP2007500449A (ja) 2007-01-11
EP1652008A2 (en) 2006-05-03
JP4465356B2 (ja) 2010-05-19
KR20060058684A (ko) 2006-05-30
US7006209B2 (en) 2006-02-28
EP1652008B1 (en) 2011-06-08
WO2005013008A3 (en) 2005-11-10
WO2005013008A2 (en) 2005-02-10
CN100538523C (zh) 2009-09-09

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