WO2005013008A3 - Method for monitoring and controlling imaging in immersion lithography systems - Google Patents
Method for monitoring and controlling imaging in immersion lithography systems Download PDFInfo
- Publication number
- WO2005013008A3 WO2005013008A3 PCT/US2004/023876 US2004023876W WO2005013008A3 WO 2005013008 A3 WO2005013008 A3 WO 2005013008A3 US 2004023876 W US2004023876 W US 2004023876W WO 2005013008 A3 WO2005013008 A3 WO 2005013008A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- monitoring
- immersion lithography
- lithography systems
- controlling imaging
- immersion
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04757263A EP1652008B1 (en) | 2003-07-25 | 2004-07-23 | Method for monitoring an immersion lithography system |
JP2006521952A JP4465356B2 (en) | 2003-07-25 | 2004-07-23 | Method and apparatus for monitoring and controlling immersion lithography system |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/628,021 US7006209B2 (en) | 2003-07-25 | 2003-07-25 | Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
US10/628,021 | 2003-07-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005013008A2 WO2005013008A2 (en) | 2005-02-10 |
WO2005013008A3 true WO2005013008A3 (en) | 2005-11-10 |
Family
ID=34080711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/023876 WO2005013008A2 (en) | 2003-07-25 | 2004-07-23 | Method for monitoring and controlling imaging in immersion lithography systems |
Country Status (7)
Country | Link |
---|---|
US (1) | US7006209B2 (en) |
EP (1) | EP1652008B1 (en) |
JP (1) | JP4465356B2 (en) |
KR (1) | KR101071966B1 (en) |
CN (1) | CN100538523C (en) |
TW (1) | TWI372947B (en) |
WO (1) | WO2005013008A2 (en) |
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- 2004-07-23 JP JP2006521952A patent/JP4465356B2/en not_active Expired - Fee Related
- 2004-07-23 KR KR1020067001296A patent/KR101071966B1/en not_active IP Right Cessation
- 2004-07-23 TW TW093122007A patent/TWI372947B/en not_active IP Right Cessation
- 2004-07-23 WO PCT/US2004/023876 patent/WO2005013008A2/en active Search and Examination
- 2004-07-23 CN CNB2004800195324A patent/CN100538523C/en not_active Expired - Lifetime
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US9104117B2 (en) | 2004-07-07 | 2015-08-11 | Bob Streefkerk | Lithographic apparatus having a liquid detection system |
US9250537B2 (en) | 2004-07-12 | 2016-02-02 | Nikon Corporation | Immersion exposure apparatus and method with detection of liquid on members of the apparatus |
US8941810B2 (en) | 2005-12-30 | 2015-01-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8947631B2 (en) | 2005-12-30 | 2015-02-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9436096B2 (en) | 2005-12-30 | 2016-09-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9256136B2 (en) | 2010-04-22 | 2016-02-09 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply |
Also Published As
Publication number | Publication date |
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KR20060058684A (en) | 2006-05-30 |
EP1652008A2 (en) | 2006-05-03 |
US7006209B2 (en) | 2006-02-28 |
JP2007500449A (en) | 2007-01-11 |
CN1820229A (en) | 2006-08-16 |
TWI372947B (en) | 2012-09-21 |
KR101071966B1 (en) | 2011-10-11 |
WO2005013008A2 (en) | 2005-02-10 |
US20050018208A1 (en) | 2005-01-27 |
JP4465356B2 (en) | 2010-05-19 |
CN100538523C (en) | 2009-09-09 |
TW200510965A (en) | 2005-03-16 |
EP1652008B1 (en) | 2011-06-08 |
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