TWI364552B - Inspecting apparatus and inspecting method - Google Patents

Inspecting apparatus and inspecting method Download PDF

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Publication number
TWI364552B
TWI364552B TW094107689A TW94107689A TWI364552B TW I364552 B TWI364552 B TW I364552B TW 094107689 A TW094107689 A TW 094107689A TW 94107689 A TW94107689 A TW 94107689A TW I364552 B TWI364552 B TW I364552B
Authority
TW
Taiwan
Prior art keywords
objective lens
observation
substrate
moving
movement
Prior art date
Application number
TW094107689A
Other languages
English (en)
Chinese (zh)
Other versions
TW200540455A (en
Inventor
Shunsuke Kurata
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200540455A publication Critical patent/TW200540455A/zh
Application granted granted Critical
Publication of TWI364552B publication Critical patent/TWI364552B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Microscoopes, Condenser (AREA)
TW094107689A 2004-03-17 2005-03-14 Inspecting apparatus and inspecting method TWI364552B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004076267A JP2005266083A (ja) 2004-03-17 2004-03-17 観察装置及び観察方法

Publications (2)

Publication Number Publication Date
TW200540455A TW200540455A (en) 2005-12-16
TWI364552B true TWI364552B (en) 2012-05-21

Family

ID=34985878

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094107689A TWI364552B (en) 2004-03-17 2005-03-14 Inspecting apparatus and inspecting method

Country Status (5)

Country Link
US (1) US7456947B2 (enExample)
JP (1) JP2005266083A (enExample)
KR (1) KR20060044352A (enExample)
CN (1) CN1670940A (enExample)
TW (1) TWI364552B (enExample)

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JP4933057B2 (ja) * 2005-05-13 2012-05-16 キヤノン株式会社 ヘッド基板、記録ヘッド、及び記録装置
JP4644065B2 (ja) * 2005-08-11 2011-03-02 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡およびその画像表示方法
US20080243299A1 (en) * 2007-03-27 2008-10-02 Haas Automation, Inc. Machine tool control system
US7812971B2 (en) * 2007-06-28 2010-10-12 Quality Vision International, Inc. Multi color autofocus apparatus and method
KR100837729B1 (ko) * 2007-10-09 2008-06-13 서울엔지니어링(주) Ｌｃｄ 검사장비의 스테이지 정밀이동장치
JP5174693B2 (ja) * 2009-01-22 2013-04-03 オリンパス株式会社 顕微鏡システム
JP5555014B2 (ja) * 2010-03-10 2014-07-23 オリンパス株式会社 バーチャルスライド作成装置
JP2012225701A (ja) * 2011-04-18 2012-11-15 Mitsutoyo Corp 形状測定装置
US9182341B2 (en) * 2012-06-13 2015-11-10 Kla-Tencor Corporation Optical surface scanning systems and methods
US20140135581A1 (en) * 2012-11-14 2014-05-15 Gynius Ab Portable battery powered self-illuminated multispectral multi-magnification colposcope
JP2014153500A (ja) * 2013-02-07 2014-08-25 Sony Corp 画像取得装置およびステージ制御方法
US9304089B2 (en) * 2013-04-05 2016-04-05 Mitutoyo Corporation System and method for obtaining images with offset utilized for enhanced edge resolution
JP6173154B2 (ja) * 2013-10-01 2017-08-02 オリンパス株式会社 顕微鏡システム
US12196673B2 (en) 2020-03-31 2025-01-14 Hitachi High-Tech Corporation Defect inspection apparatus and defect inspection method
CN113433134A (zh) * 2021-06-24 2021-09-24 深圳中科飞测科技股份有限公司 检测方法、检测设备及计算机可读存储介质
JP7744864B2 (ja) * 2022-03-28 2025-09-26 株式会社エビデント 顕微鏡システム、動作方法、プログラム
CN117969045B (zh) * 2024-03-29 2024-10-25 杭州海康威视数字技术股份有限公司 物镜检测装置及其检测方法、显微镜

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DE2102922C3 (de) * 1971-01-22 1978-08-24 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Anordnung zum selbsttätigen Fokussieren auf in optischen Geräten zu betrachtende Objekte
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JP2925647B2 (ja) * 1990-04-16 1999-07-28 オリンパス光学工業株式会社 顕微鏡変倍装置
JP3396070B2 (ja) * 1993-12-15 2003-04-14 オリンパス光学工業株式会社 顕微鏡装置
US5557456A (en) * 1994-03-04 1996-09-17 Oncometrics Imaging Corp. Personal interface device for positioning of a microscope stage
JPH09127426A (ja) * 1995-10-31 1997-05-16 Nikon Corp 拡大観察装置における駆動指令装置
US5818637A (en) * 1996-02-26 1998-10-06 Hoover; Rex A. Computerized video microscopy system
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JP4320802B2 (ja) * 1998-08-27 2009-08-26 株式会社ニコン 電動ステージ付き顕微鏡
JP2001134760A (ja) * 1999-11-02 2001-05-18 Sony Corp 紫外光の焦点位置制御機構及び検査装置
JP4477181B2 (ja) * 2000-01-18 2010-06-09 オリンパス株式会社 顕微鏡装置
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JP4121735B2 (ja) * 2001-01-22 2008-07-23 ソニー株式会社 ポリシリコン膜評価装置
JP2002328306A (ja) * 2001-04-27 2002-11-15 Nikon Corp 紫外線顕微鏡およびこれを用いた観察方法
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US6989927B2 (en) * 2003-07-02 2006-01-24 Leica Microsystems Inc. Stage well

Also Published As

Publication number Publication date
JP2005266083A (ja) 2005-09-29
CN1670940A (zh) 2005-09-21
KR20060044352A (ko) 2006-05-16
US7456947B2 (en) 2008-11-25
TW200540455A (en) 2005-12-16
US20050206885A1 (en) 2005-09-22

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