KR20060044352A - 관찰 장치 및 관찰 방법 - Google Patents

관찰 장치 및 관찰 방법 Download PDF

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Publication number
KR20060044352A
KR20060044352A KR1020050020940A KR20050020940A KR20060044352A KR 20060044352 A KR20060044352 A KR 20060044352A KR 1020050020940 A KR1020050020940 A KR 1020050020940A KR 20050020940 A KR20050020940 A KR 20050020940A KR 20060044352 A KR20060044352 A KR 20060044352A
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KR
South Korea
Prior art keywords
objective lens
observation
substrate
magnification
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020050020940A
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English (en)
Korean (ko)
Inventor
šœ슈케 구라타
Original Assignee
올림푸스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 올림푸스 가부시키가이샤 filed Critical 올림푸스 가부시키가이샤
Publication of KR20060044352A publication Critical patent/KR20060044352A/ko
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Microscoopes, Condenser (AREA)
KR1020050020940A 2004-03-17 2005-03-14 관찰 장치 및 관찰 방법 Withdrawn KR20060044352A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00076267 2004-03-17
JP2004076267A JP2005266083A (ja) 2004-03-17 2004-03-17 観察装置及び観察方法

Publications (1)

Publication Number Publication Date
KR20060044352A true KR20060044352A (ko) 2006-05-16

Family

ID=34985878

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050020940A Withdrawn KR20060044352A (ko) 2004-03-17 2005-03-14 관찰 장치 및 관찰 방법

Country Status (5)

Country Link
US (1) US7456947B2 (enExample)
JP (1) JP2005266083A (enExample)
KR (1) KR20060044352A (enExample)
CN (1) CN1670940A (enExample)
TW (1) TWI364552B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100837729B1 (ko) * 2007-10-09 2008-06-13 서울엔지니어링(주) Ｌｃｄ 검사장비의 스테이지 정밀이동장치

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JP4933057B2 (ja) * 2005-05-13 2012-05-16 キヤノン株式会社 ヘッド基板、記録ヘッド、及び記録装置
JP4644065B2 (ja) * 2005-08-11 2011-03-02 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡およびその画像表示方法
US20080243299A1 (en) * 2007-03-27 2008-10-02 Haas Automation, Inc. Machine tool control system
US7812971B2 (en) * 2007-06-28 2010-10-12 Quality Vision International, Inc. Multi color autofocus apparatus and method
JP5174693B2 (ja) * 2009-01-22 2013-04-03 オリンパス株式会社 顕微鏡システム
JP5555014B2 (ja) * 2010-03-10 2014-07-23 オリンパス株式会社 バーチャルスライド作成装置
JP2012225701A (ja) * 2011-04-18 2012-11-15 Mitsutoyo Corp 形状測定装置
US9182341B2 (en) * 2012-06-13 2015-11-10 Kla-Tencor Corporation Optical surface scanning systems and methods
US20140135581A1 (en) * 2012-11-14 2014-05-15 Gynius Ab Portable battery powered self-illuminated multispectral multi-magnification colposcope
JP2014153500A (ja) * 2013-02-07 2014-08-25 Sony Corp 画像取得装置およびステージ制御方法
US9304089B2 (en) * 2013-04-05 2016-04-05 Mitutoyo Corporation System and method for obtaining images with offset utilized for enhanced edge resolution
JP6173154B2 (ja) * 2013-10-01 2017-08-02 オリンパス株式会社 顕微鏡システム
US12196673B2 (en) 2020-03-31 2025-01-14 Hitachi High-Tech Corporation Defect inspection apparatus and defect inspection method
CN113433134A (zh) * 2021-06-24 2021-09-24 深圳中科飞测科技股份有限公司 检测方法、检测设备及计算机可读存储介质
JP7744864B2 (ja) * 2022-03-28 2025-09-26 株式会社エビデント 顕微鏡システム、動作方法、プログラム
CN117969045B (zh) * 2024-03-29 2024-10-25 杭州海康威视数字技术股份有限公司 物镜检测装置及其检测方法、显微镜

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US3565512A (en) * 1969-04-29 1971-02-23 Bausch & Lomb Microscope nosepiece assembly having adjustable optical components
DE2102922C3 (de) * 1971-01-22 1978-08-24 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Anordnung zum selbsttätigen Fokussieren auf in optischen Geräten zu betrachtende Objekte
JPS5793311A (en) * 1980-12-02 1982-06-10 Olympus Optical Co Ltd Controller for relative moving speed of mirror body and sample in microscope
US4503555A (en) * 1982-04-21 1985-03-05 University Of California Semi-automatic optical scanning apparatus utilizing line integration
US4577141A (en) * 1983-11-30 1986-03-18 Nippon Kogaku K.K. System for driving a movable stage
US4725720A (en) * 1985-05-27 1988-02-16 Mitutoyo Manufacturing Co., Ltd. Microscope with auto focus and light adjusting means
JPS62102752A (ja) * 1985-10-31 1987-05-13 オリンパス光学工業株式会社 顕微鏡の移動装置
US4695137A (en) * 1986-02-26 1987-09-22 Carl-Zeiss-Stiftung, Heidenheim/Brenz Motorized focus drive for a microscope
DE3879603T2 (de) * 1987-10-09 1993-07-01 Olympus Optical Co Koaxialer grob-/feinversteller zur bedienung eines mikroskoptisches.
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
JP2925647B2 (ja) * 1990-04-16 1999-07-28 オリンパス光学工業株式会社 顕微鏡変倍装置
JP3396070B2 (ja) * 1993-12-15 2003-04-14 オリンパス光学工業株式会社 顕微鏡装置
US5557456A (en) * 1994-03-04 1996-09-17 Oncometrics Imaging Corp. Personal interface device for positioning of a microscope stage
JPH09127426A (ja) * 1995-10-31 1997-05-16 Nikon Corp 拡大観察装置における駆動指令装置
US5818637A (en) * 1996-02-26 1998-10-06 Hoover; Rex A. Computerized video microscopy system
US6248988B1 (en) * 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
JP4320802B2 (ja) * 1998-08-27 2009-08-26 株式会社ニコン 電動ステージ付き顕微鏡
JP2001134760A (ja) * 1999-11-02 2001-05-18 Sony Corp 紫外光の焦点位置制御機構及び検査装置
JP4477181B2 (ja) * 2000-01-18 2010-06-09 オリンパス株式会社 顕微鏡装置
JP2001332595A (ja) 2000-05-25 2001-11-30 Sony Corp 焦点合わせ制御機構及びこれを用いた検査装置
US6906858B2 (en) * 2000-07-17 2005-06-14 Olympus Optical Co., Ltd. Microscope provided with an objective lens focusing apparatus and an objective lens switching apparatus
JP4121735B2 (ja) * 2001-01-22 2008-07-23 ソニー株式会社 ポリシリコン膜評価装置
JP2002328306A (ja) * 2001-04-27 2002-11-15 Nikon Corp 紫外線顕微鏡およびこれを用いた観察方法
DE10159239A1 (de) * 2001-12-03 2003-06-26 Leica Microsystems Mikroskopobjektiv, Mikroskop und Verfahren zum Abbilden einer Probe
US6989927B2 (en) * 2003-07-02 2006-01-24 Leica Microsystems Inc. Stage well

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100837729B1 (ko) * 2007-10-09 2008-06-13 서울엔지니어링(주) Ｌｃｄ 검사장비의 스테이지 정밀이동장치

Also Published As

Publication number Publication date
JP2005266083A (ja) 2005-09-29
TWI364552B (en) 2012-05-21
CN1670940A (zh) 2005-09-21
US7456947B2 (en) 2008-11-25
TW200540455A (en) 2005-12-16
US20050206885A1 (en) 2005-09-22

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20050314

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid