CN1670940A - 观察装置和观察方法 - Google Patents
观察装置和观察方法 Download PDFInfo
- Publication number
- CN1670940A CN1670940A CNA2005100558536A CN200510055853A CN1670940A CN 1670940 A CN1670940 A CN 1670940A CN A2005100558536 A CNA2005100558536 A CN A2005100558536A CN 200510055853 A CN200510055853 A CN 200510055853A CN 1670940 A CN1670940 A CN 1670940A
- Authority
- CN
- China
- Prior art keywords
- object lens
- aforementioned
- observation
- optical path
- multiplying power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 15
- 230000003287 optical effect Effects 0.000 claims abstract description 57
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 238000001514 detection method Methods 0.000 claims abstract description 5
- 230000003321 amplification Effects 0.000 claims description 15
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 15
- 230000008569 process Effects 0.000 claims description 6
- 238000009434 installation Methods 0.000 abstract description 12
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 68
- 238000001179 sorption measurement Methods 0.000 description 52
- 238000012360 testing method Methods 0.000 description 29
- 230000009471 action Effects 0.000 description 17
- 230000002950 deficient Effects 0.000 description 12
- 238000003860 storage Methods 0.000 description 7
- 238000012797 qualification Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000008676 import Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/04—Measuring microscopes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Optics & Photonics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004076267 | 2004-03-17 | ||
| JP2004076267A JP2005266083A (ja) | 2004-03-17 | 2004-03-17 | 観察装置及び観察方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1670940A true CN1670940A (zh) | 2005-09-21 |
Family
ID=34985878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2005100558536A Pending CN1670940A (zh) | 2004-03-17 | 2005-03-15 | 观察装置和观察方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7456947B2 (enExample) |
| JP (1) | JP2005266083A (enExample) |
| KR (1) | KR20060044352A (enExample) |
| CN (1) | CN1670940A (enExample) |
| TW (1) | TWI364552B (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102749040A (zh) * | 2011-04-18 | 2012-10-24 | 株式会社三丰 | 形状测量设备 |
| CN113433134A (zh) * | 2021-06-24 | 2021-09-24 | 深圳中科飞测科技股份有限公司 | 检测方法、检测设备及计算机可读存储介质 |
| CN117969045A (zh) * | 2024-03-29 | 2024-05-03 | 杭州海康威视数字技术股份有限公司 | 物镜检测装置及其检测方法、显微镜 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4933057B2 (ja) * | 2005-05-13 | 2012-05-16 | キヤノン株式会社 | ヘッド基板、記録ヘッド、及び記録装置 |
| JP4644065B2 (ja) * | 2005-08-11 | 2011-03-02 | 株式会社日立ハイテクノロジーズ | 走査型電子顕微鏡およびその画像表示方法 |
| US20080243299A1 (en) * | 2007-03-27 | 2008-10-02 | Haas Automation, Inc. | Machine tool control system |
| US7812971B2 (en) * | 2007-06-28 | 2010-10-12 | Quality Vision International, Inc. | Multi color autofocus apparatus and method |
| KR100837729B1 (ko) * | 2007-10-09 | 2008-06-13 | 서울엔지니어링(주) | Lcd 검사장비의 스테이지 정밀이동장치 |
| JP5174693B2 (ja) * | 2009-01-22 | 2013-04-03 | オリンパス株式会社 | 顕微鏡システム |
| JP5555014B2 (ja) * | 2010-03-10 | 2014-07-23 | オリンパス株式会社 | バーチャルスライド作成装置 |
| US9182341B2 (en) * | 2012-06-13 | 2015-11-10 | Kla-Tencor Corporation | Optical surface scanning systems and methods |
| US20140135581A1 (en) * | 2012-11-14 | 2014-05-15 | Gynius Ab | Portable battery powered self-illuminated multispectral multi-magnification colposcope |
| JP2014153500A (ja) * | 2013-02-07 | 2014-08-25 | Sony Corp | 画像取得装置およびステージ制御方法 |
| US9304089B2 (en) * | 2013-04-05 | 2016-04-05 | Mitutoyo Corporation | System and method for obtaining images with offset utilized for enhanced edge resolution |
| JP6173154B2 (ja) * | 2013-10-01 | 2017-08-02 | オリンパス株式会社 | 顕微鏡システム |
| US12196673B2 (en) | 2020-03-31 | 2025-01-14 | Hitachi High-Tech Corporation | Defect inspection apparatus and defect inspection method |
| JP7744864B2 (ja) * | 2022-03-28 | 2025-09-26 | 株式会社エビデント | 顕微鏡システム、動作方法、プログラム |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3565512A (en) * | 1969-04-29 | 1971-02-23 | Bausch & Lomb | Microscope nosepiece assembly having adjustable optical components |
| DE2102922C3 (de) * | 1971-01-22 | 1978-08-24 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Anordnung zum selbsttätigen Fokussieren auf in optischen Geräten zu betrachtende Objekte |
| JPS5793311A (en) * | 1980-12-02 | 1982-06-10 | Olympus Optical Co Ltd | Controller for relative moving speed of mirror body and sample in microscope |
| US4503555A (en) * | 1982-04-21 | 1985-03-05 | University Of California | Semi-automatic optical scanning apparatus utilizing line integration |
| US4577141A (en) * | 1983-11-30 | 1986-03-18 | Nippon Kogaku K.K. | System for driving a movable stage |
| US4725720A (en) * | 1985-05-27 | 1988-02-16 | Mitutoyo Manufacturing Co., Ltd. | Microscope with auto focus and light adjusting means |
| JPS62102752A (ja) * | 1985-10-31 | 1987-05-13 | オリンパス光学工業株式会社 | 顕微鏡の移動装置 |
| US4695137A (en) * | 1986-02-26 | 1987-09-22 | Carl-Zeiss-Stiftung, Heidenheim/Brenz | Motorized focus drive for a microscope |
| DE3879603T2 (de) * | 1987-10-09 | 1993-07-01 | Olympus Optical Co | Koaxialer grob-/feinversteller zur bedienung eines mikroskoptisches. |
| CA1308203C (en) * | 1989-06-01 | 1992-09-29 | Nanoquest (Canada) Inc. | Magnification compensation apparatus |
| JP2925647B2 (ja) * | 1990-04-16 | 1999-07-28 | オリンパス光学工業株式会社 | 顕微鏡変倍装置 |
| JP3396070B2 (ja) * | 1993-12-15 | 2003-04-14 | オリンパス光学工業株式会社 | 顕微鏡装置 |
| US5557456A (en) * | 1994-03-04 | 1996-09-17 | Oncometrics Imaging Corp. | Personal interface device for positioning of a microscope stage |
| JPH09127426A (ja) * | 1995-10-31 | 1997-05-16 | Nikon Corp | 拡大観察装置における駆動指令装置 |
| US5818637A (en) * | 1996-02-26 | 1998-10-06 | Hoover; Rex A. | Computerized video microscopy system |
| US6248988B1 (en) * | 1998-05-05 | 2001-06-19 | Kla-Tencor Corporation | Conventional and confocal multi-spot scanning optical microscope |
| JP4320802B2 (ja) * | 1998-08-27 | 2009-08-26 | 株式会社ニコン | 電動ステージ付き顕微鏡 |
| JP2001134760A (ja) * | 1999-11-02 | 2001-05-18 | Sony Corp | 紫外光の焦点位置制御機構及び検査装置 |
| JP4477181B2 (ja) * | 2000-01-18 | 2010-06-09 | オリンパス株式会社 | 顕微鏡装置 |
| JP2001332595A (ja) | 2000-05-25 | 2001-11-30 | Sony Corp | 焦点合わせ制御機構及びこれを用いた検査装置 |
| US6906858B2 (en) * | 2000-07-17 | 2005-06-14 | Olympus Optical Co., Ltd. | Microscope provided with an objective lens focusing apparatus and an objective lens switching apparatus |
| JP4121735B2 (ja) * | 2001-01-22 | 2008-07-23 | ソニー株式会社 | ポリシリコン膜評価装置 |
| JP2002328306A (ja) * | 2001-04-27 | 2002-11-15 | Nikon Corp | 紫外線顕微鏡およびこれを用いた観察方法 |
| DE10159239A1 (de) * | 2001-12-03 | 2003-06-26 | Leica Microsystems | Mikroskopobjektiv, Mikroskop und Verfahren zum Abbilden einer Probe |
| US6989927B2 (en) * | 2003-07-02 | 2006-01-24 | Leica Microsystems Inc. | Stage well |
-
2004
- 2004-03-17 JP JP2004076267A patent/JP2005266083A/ja active Pending
-
2005
- 2005-03-11 US US11/078,084 patent/US7456947B2/en not_active Expired - Fee Related
- 2005-03-14 TW TW094107689A patent/TWI364552B/zh not_active IP Right Cessation
- 2005-03-14 KR KR1020050020940A patent/KR20060044352A/ko not_active Withdrawn
- 2005-03-15 CN CNA2005100558536A patent/CN1670940A/zh active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102749040A (zh) * | 2011-04-18 | 2012-10-24 | 株式会社三丰 | 形状测量设备 |
| CN113433134A (zh) * | 2021-06-24 | 2021-09-24 | 深圳中科飞测科技股份有限公司 | 检测方法、检测设备及计算机可读存储介质 |
| CN117969045A (zh) * | 2024-03-29 | 2024-05-03 | 杭州海康威视数字技术股份有限公司 | 物镜检测装置及其检测方法、显微镜 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005266083A (ja) | 2005-09-29 |
| TWI364552B (en) | 2012-05-21 |
| KR20060044352A (ko) | 2006-05-16 |
| US7456947B2 (en) | 2008-11-25 |
| TW200540455A (en) | 2005-12-16 |
| US20050206885A1 (en) | 2005-09-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20050921 |