CN1670940A - 观察装置和观察方法 - Google Patents

观察装置和观察方法 Download PDF

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Publication number
CN1670940A
CN1670940A CNA2005100558536A CN200510055853A CN1670940A CN 1670940 A CN1670940 A CN 1670940A CN A2005100558536 A CNA2005100558536 A CN A2005100558536A CN 200510055853 A CN200510055853 A CN 200510055853A CN 1670940 A CN1670940 A CN 1670940A
Authority
CN
China
Prior art keywords
object lens
aforementioned
observation
optical path
multiplying power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005100558536A
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English (en)
Chinese (zh)
Inventor
仓田俊辅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of CN1670940A publication Critical patent/CN1670940A/zh
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/0016Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/04Measuring microscopes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/02Objectives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Microscoopes, Condenser (AREA)
CNA2005100558536A 2004-03-17 2005-03-15 观察装置和观察方法 Pending CN1670940A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004076267 2004-03-17
JP2004076267A JP2005266083A (ja) 2004-03-17 2004-03-17 観察装置及び観察方法

Publications (1)

Publication Number Publication Date
CN1670940A true CN1670940A (zh) 2005-09-21

Family

ID=34985878

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005100558536A Pending CN1670940A (zh) 2004-03-17 2005-03-15 观察装置和观察方法

Country Status (5)

Country Link
US (1) US7456947B2 (enExample)
JP (1) JP2005266083A (enExample)
KR (1) KR20060044352A (enExample)
CN (1) CN1670940A (enExample)
TW (1) TWI364552B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102749040A (zh) * 2011-04-18 2012-10-24 株式会社三丰 形状测量设备
CN113433134A (zh) * 2021-06-24 2021-09-24 深圳中科飞测科技股份有限公司 检测方法、检测设备及计算机可读存储介质
CN117969045A (zh) * 2024-03-29 2024-05-03 杭州海康威视数字技术股份有限公司 物镜检测装置及其检测方法、显微镜

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JP4933057B2 (ja) * 2005-05-13 2012-05-16 キヤノン株式会社 ヘッド基板、記録ヘッド、及び記録装置
JP4644065B2 (ja) * 2005-08-11 2011-03-02 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡およびその画像表示方法
US20080243299A1 (en) * 2007-03-27 2008-10-02 Haas Automation, Inc. Machine tool control system
US7812971B2 (en) * 2007-06-28 2010-10-12 Quality Vision International, Inc. Multi color autofocus apparatus and method
KR100837729B1 (ko) * 2007-10-09 2008-06-13 서울엔지니어링(주) Lcd 검사장비의 스테이지 정밀이동장치
JP5174693B2 (ja) * 2009-01-22 2013-04-03 オリンパス株式会社 顕微鏡システム
JP5555014B2 (ja) * 2010-03-10 2014-07-23 オリンパス株式会社 バーチャルスライド作成装置
US9182341B2 (en) * 2012-06-13 2015-11-10 Kla-Tencor Corporation Optical surface scanning systems and methods
US20140135581A1 (en) * 2012-11-14 2014-05-15 Gynius Ab Portable battery powered self-illuminated multispectral multi-magnification colposcope
JP2014153500A (ja) * 2013-02-07 2014-08-25 Sony Corp 画像取得装置およびステージ制御方法
US9304089B2 (en) * 2013-04-05 2016-04-05 Mitutoyo Corporation System and method for obtaining images with offset utilized for enhanced edge resolution
JP6173154B2 (ja) * 2013-10-01 2017-08-02 オリンパス株式会社 顕微鏡システム
US12196673B2 (en) 2020-03-31 2025-01-14 Hitachi High-Tech Corporation Defect inspection apparatus and defect inspection method
JP7744864B2 (ja) * 2022-03-28 2025-09-26 株式会社エビデント 顕微鏡システム、動作方法、プログラム

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DE2102922C3 (de) * 1971-01-22 1978-08-24 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Anordnung zum selbsttätigen Fokussieren auf in optischen Geräten zu betrachtende Objekte
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US4503555A (en) * 1982-04-21 1985-03-05 University Of California Semi-automatic optical scanning apparatus utilizing line integration
US4577141A (en) * 1983-11-30 1986-03-18 Nippon Kogaku K.K. System for driving a movable stage
US4725720A (en) * 1985-05-27 1988-02-16 Mitutoyo Manufacturing Co., Ltd. Microscope with auto focus and light adjusting means
JPS62102752A (ja) * 1985-10-31 1987-05-13 オリンパス光学工業株式会社 顕微鏡の移動装置
US4695137A (en) * 1986-02-26 1987-09-22 Carl-Zeiss-Stiftung, Heidenheim/Brenz Motorized focus drive for a microscope
DE3879603T2 (de) * 1987-10-09 1993-07-01 Olympus Optical Co Koaxialer grob-/feinversteller zur bedienung eines mikroskoptisches.
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
JP2925647B2 (ja) * 1990-04-16 1999-07-28 オリンパス光学工業株式会社 顕微鏡変倍装置
JP3396070B2 (ja) * 1993-12-15 2003-04-14 オリンパス光学工業株式会社 顕微鏡装置
US5557456A (en) * 1994-03-04 1996-09-17 Oncometrics Imaging Corp. Personal interface device for positioning of a microscope stage
JPH09127426A (ja) * 1995-10-31 1997-05-16 Nikon Corp 拡大観察装置における駆動指令装置
US5818637A (en) * 1996-02-26 1998-10-06 Hoover; Rex A. Computerized video microscopy system
US6248988B1 (en) * 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
JP4320802B2 (ja) * 1998-08-27 2009-08-26 株式会社ニコン 電動ステージ付き顕微鏡
JP2001134760A (ja) * 1999-11-02 2001-05-18 Sony Corp 紫外光の焦点位置制御機構及び検査装置
JP4477181B2 (ja) * 2000-01-18 2010-06-09 オリンパス株式会社 顕微鏡装置
JP2001332595A (ja) 2000-05-25 2001-11-30 Sony Corp 焦点合わせ制御機構及びこれを用いた検査装置
US6906858B2 (en) * 2000-07-17 2005-06-14 Olympus Optical Co., Ltd. Microscope provided with an objective lens focusing apparatus and an objective lens switching apparatus
JP4121735B2 (ja) * 2001-01-22 2008-07-23 ソニー株式会社 ポリシリコン膜評価装置
JP2002328306A (ja) * 2001-04-27 2002-11-15 Nikon Corp 紫外線顕微鏡およびこれを用いた観察方法
DE10159239A1 (de) * 2001-12-03 2003-06-26 Leica Microsystems Mikroskopobjektiv, Mikroskop und Verfahren zum Abbilden einer Probe
US6989927B2 (en) * 2003-07-02 2006-01-24 Leica Microsystems Inc. Stage well

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102749040A (zh) * 2011-04-18 2012-10-24 株式会社三丰 形状测量设备
CN113433134A (zh) * 2021-06-24 2021-09-24 深圳中科飞测科技股份有限公司 检测方法、检测设备及计算机可读存储介质
CN117969045A (zh) * 2024-03-29 2024-05-03 杭州海康威视数字技术股份有限公司 物镜检测装置及其检测方法、显微镜

Also Published As

Publication number Publication date
JP2005266083A (ja) 2005-09-29
TWI364552B (en) 2012-05-21
KR20060044352A (ko) 2006-05-16
US7456947B2 (en) 2008-11-25
TW200540455A (en) 2005-12-16
US20050206885A1 (en) 2005-09-22

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Open date: 20050921