TWI303325B - - Google Patents

Download PDF

Info

Publication number
TWI303325B
TWI303325B TW094129565A TW94129565A TWI303325B TW I303325 B TWI303325 B TW I303325B TW 094129565 A TW094129565 A TW 094129565A TW 94129565 A TW94129565 A TW 94129565A TW I303325 B TWI303325 B TW I303325B
Authority
TW
Taiwan
Prior art keywords
filter
illumination
optical
filter device
light
Prior art date
Application number
TW094129565A
Other languages
English (en)
Chinese (zh)
Other versions
TW200622313A (en
Inventor
Maul Manfred
Fiolka Damian
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Publication of TW200622313A publication Critical patent/TW200622313A/zh
Application granted granted Critical
Publication of TWI303325B publication Critical patent/TWI303325B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/007—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light
    • G02B26/008—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light in the form of devices for effecting sequential colour changes, e.g. colour wheels
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0933—Systems for active beam shaping by rapid movement of an element
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0994—Fibers, light pipes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Astronomy & Astrophysics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Microscoopes, Condenser (AREA)
TW094129565A 2004-12-23 2005-08-29 A filter device for the compensation of an asymmetric pupil illumination TW200622313A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004063314A DE102004063314A1 (de) 2004-12-23 2004-12-23 Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung

Publications (2)

Publication Number Publication Date
TW200622313A TW200622313A (en) 2006-07-01
TWI303325B true TWI303325B (https=) 2008-11-21

Family

ID=35033385

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094129565A TW200622313A (en) 2004-12-23 2005-08-29 A filter device for the compensation of an asymmetric pupil illumination

Country Status (8)

Country Link
US (5) US7798676B2 (https=)
EP (2) EP1828844A1 (https=)
JP (1) JP4700697B2 (https=)
KR (2) KR101182940B1 (https=)
CN (1) CN101088049A (https=)
DE (1) DE102004063314A1 (https=)
TW (1) TW200622313A (https=)
WO (1) WO2006066638A1 (https=)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4599936B2 (ja) 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102006059024A1 (de) * 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
US7990520B2 (en) 2006-12-18 2011-08-02 Carl Zeiss Smt Gmbh Microlithography illumination systems, components and methods
WO2008092653A2 (en) 2007-01-30 2008-08-07 Carl Zeiss Smt Ag Illumination system of a microlithographic projection exposure apparatus
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity
US8908151B2 (en) * 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
DE102008001511A1 (de) * 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
NL1036905A1 (nl) * 2008-06-03 2009-12-04 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
KR101258344B1 (ko) 2008-10-31 2013-04-30 칼 짜이스 에스엠티 게엠베하 Ｅｕｖ 마이크로리소그래피용 조명 광학 기기
WO2010073795A1 (ja) 2008-12-24 2010-07-01 株式会社 ニコン 照明光学系、露光装置及びデバイスの製造方法
DE102010042901B3 (de) * 2010-10-26 2012-04-05 Carl Zeiss Smt Gmbh Polarisationsaktuator
DE102011005940A1 (de) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
WO2012126954A1 (en) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102011077234A1 (de) 2011-06-08 2012-12-13 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
CN102331688B (zh) * 2011-10-25 2013-06-26 中国科学院光电技术研究所 一种光瞳均匀性补偿装置
US8901496B2 (en) * 2012-06-20 2014-12-02 General Electric Company Overhead occupancy sensor
US9261793B2 (en) 2012-09-14 2016-02-16 Globalfoundries Inc. Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution
CN104216234B (zh) * 2013-06-05 2016-05-25 中芯国际集成电路制造(上海)有限公司 光刻系统光源对称性的检测方法
DE102013213545A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
US9721421B2 (en) 2015-05-05 2017-08-01 Mladen Blazevic Electronic gaming system with physical gaming chips and wager display
DE102015220144A1 (de) * 2015-10-16 2017-04-20 Carl Zeiss Smt Gmbh Optisches System und Lithographieanlage
CN106556974B (zh) * 2015-09-30 2019-04-26 中芯国际集成电路制造(上海)有限公司 光刻照明系统以及光刻设备
WO2017144265A1 (en) 2016-02-25 2017-08-31 Asml Netherlands B.V. Beam homogenizer, illumination system and metrology system
CN105739250B (zh) * 2016-05-13 2017-10-27 上海华力微电子有限公司 一种光刻机之照明光瞳均一性补偿装置及其补偿方法
CN108983559A (zh) * 2018-08-08 2018-12-11 中国科学院上海光学精密机械研究所 光刻机光瞳校正器及其使用方法
DE102021120952B3 (de) 2021-08-11 2022-11-10 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop
WO2024227859A1 (en) 2023-05-04 2024-11-07 Carl Zeiss Smt Gmbh Method for adjusting the telecentricity in a projection exposure system for microlithography

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
US5131577A (en) * 1988-05-17 1992-07-21 Ford Motor Company Apparatus for making a powder metal connecting rod
JPH0812754B2 (ja) * 1990-08-20 1996-02-07 富士通株式会社 昇圧回路
US5282121A (en) * 1991-04-30 1994-01-25 Vari-Lite, Inc. High intensity lighting projectors
US6769792B1 (en) * 1991-04-30 2004-08-03 Genlyte Thomas Group Llc High intensity lighting projectors
JP3158691B2 (ja) * 1992-08-07 2001-04-23 株式会社ニコン 露光装置及び方法、並びに照明光学装置
US5461456A (en) 1992-11-24 1995-10-24 General Signal Corporation Spatial uniformity varier for microlithographic illuminator
KR960006377B1 (ko) * 1993-11-17 1996-05-15 삼성전자주식회사 반도체 메모리장치의 워드라인 로딩 보상 회로
DE19520563A1 (de) 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
EP0687956B2 (de) 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
US5774222A (en) * 1994-10-07 1998-06-30 Hitachi, Ltd. Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected
JPH08293461A (ja) 1995-04-21 1996-11-05 Nikon Corp 照明装置および該装置を備えた投影露光装置
DE69619972D1 (de) * 1996-06-18 2002-04-25 St Microelectronics Srl Nichtflüchtige Speicheranordnung mit niedriger Versorgungsspannung und Spannungserhöher
JPH10153866A (ja) 1996-11-22 1998-06-09 Nikon Corp 照明装置および該照明装置を備えた露光装置
JP3005203B2 (ja) 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
US6333777B1 (en) 1997-07-18 2001-12-25 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JPH11271619A (ja) 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
TWI226972B (en) * 2000-06-01 2005-01-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
DE10043315C1 (de) * 2000-09-02 2002-06-20 Zeiss Carl Projektionsbelichtungsanlage
DE10046218B4 (de) 2000-09-19 2007-02-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
DE10065198A1 (de) 2000-12-20 2002-07-11 Zeiss Carl Lichtintegrator für eine Beleuchtungseinrichtung
WO2003002187A2 (en) * 2001-06-26 2003-01-09 Photomed Technologies, Inc. Multiple wavelength illuminator
DE60225216T2 (de) * 2001-09-07 2009-03-05 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1491959A1 (en) 2001-09-07 2004-12-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10151309A1 (de) 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
US6775069B2 (en) 2001-10-18 2004-08-10 Asml Holding N.V. Advanced illumination system for use in microlithography
DE10158921A1 (de) 2001-11-30 2003-06-26 Zeiss Carl Smt Ag Verfahren zum Bestimmen von mindestens einer Kenngröße, die für die Beleuchtungswinkelverteilung einer der Beleuchtung eines Gegenstandes dienenden Lichtquelle einer Projektionsbelichtungsanlage charakteristisch ist
JP4099423B2 (ja) * 2002-03-18 2008-06-11 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造法
EP1870772B1 (en) 2002-03-18 2013-10-23 ASML Netherlands B.V. Lithographic apparatus
EP1764655A3 (en) 2002-06-11 2007-09-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7023524B2 (en) * 2003-12-18 2006-04-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7283209B2 (en) * 2004-07-09 2007-10-16 Carl Zeiss Smt Ag Illumination system for microlithography
US7403418B2 (en) * 2005-09-30 2008-07-22 Silicon Storage Technology, Inc. Word line voltage boosting circuit and a memory array incorporating same

Also Published As

Publication number Publication date
JP2008525828A (ja) 2008-07-17
WO2006066638A1 (en) 2006-06-29
US20110299285A1 (en) 2011-12-08
US20100309450A1 (en) 2010-12-09
JP4700697B2 (ja) 2011-06-15
EP2278403A1 (en) 2011-01-26
CN101088049A (zh) 2007-12-12
KR20070085995A (ko) 2007-08-27
US8480261B2 (en) 2013-07-09
US8636386B2 (en) 2014-01-28
US20080113281A1 (en) 2008-05-15
KR20110094121A (ko) 2011-08-19
KR101182940B1 (ko) 2012-09-13
TW200622313A (en) 2006-07-01
US8246211B2 (en) 2012-08-21
KR101156369B1 (ko) 2012-06-13
US20120281198A1 (en) 2012-11-08
DE102004063314A1 (de) 2006-07-13
US20130278913A1 (en) 2013-10-24
WO2006066638A8 (en) 2006-08-24
EP1828844A1 (en) 2007-09-05
US8025427B2 (en) 2011-09-27
US7798676B2 (en) 2010-09-21

Similar Documents

Publication Publication Date Title
TWI303325B (https=)
KR100891340B1 (ko) 투영 노광 장치
TWI259934B (en) Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
JP4077619B2 (ja) 照明の設定が変更可能な照明系、該照明系を用いて照明を調整する方法、ｅｕｖ投影露光装置、及び、マイクロエレクトロニクス部品の製造方法
JP4808893B2 (ja) 画像投影装置及び集光システム
JP4044146B2 (ja) マイクロリソグラフィ用投影露光装置のｒｅｍａ対物レンズ
JP3316937B2 (ja) 照明光学装置、露光装置、及び該露光装置を用いた転写方法
JP2018504219A (ja) ブロードライン眼底イメージングにおいて散乱光を低減するための方法および装置
TW200947141A (en) Lighting optical system, exposure device, method of fabricating device, correction filter and exposure optical system
KR20080108474A (ko) 광 시스템 및 안과학적 치료 장치의 초점 위치를 검출하는 장치 및 방법
TW201027269A (en) Lighting optical system, exposure device and element manufacturing method
TW201234123A (en) Mirror
TWI242114B (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
TW201100971A (en) Microlithographic projection exposure apparatus
TW201022855A (en) Correction unit, illumination optical system, exposure apparatus and device manufacturing method
DE102022210158A1 (de) Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln
JP2005519459A (ja) 射出瞳の環状照明のための入れ子式集光器を備える照明光学系
TW201216006A (en) Illumination system of a microlithographic projection exposure apparatus
JP2008529290A (ja) 照射システム、具体的には、半導体リソグラフにおける投影露光装置のための照射システム
TW201142349A (en) Catadioptric projection objective
JP2000164500A (ja) 露光装置、露光方法および露光装置の製造方法
JP3864105B2 (ja) 顕微鏡用照明光学系
TW201015239A (en) Illumination optical system, exposure apparatus, and device manufacturing method
JP2003109895A (ja) 投影露光方法及びその装置
JPH04161137A (ja) 眼球顕微鏡

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees