DE102004063314A1 - Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung - Google Patents

Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung Download PDF

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Publication number
DE102004063314A1
DE102004063314A1 DE102004063314A DE102004063314A DE102004063314A1 DE 102004063314 A1 DE102004063314 A1 DE 102004063314A1 DE 102004063314 A DE102004063314 A DE 102004063314A DE 102004063314 A DE102004063314 A DE 102004063314A DE 102004063314 A1 DE102004063314 A1 DE 102004063314A1
Authority
DE
Germany
Prior art keywords
filter
illumination
filter device
pupil
filter element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102004063314A
Other languages
German (de)
English (en)
Inventor
Damian Fiolka
Manfred Maul
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102004063314A priority Critical patent/DE102004063314A1/de
Priority to EP10007886A priority patent/EP2278403A1/en
Priority to US11/722,631 priority patent/US7798676B2/en
Priority to CNA2005800448498A priority patent/CN101088049A/zh
Priority to KR1020117015632A priority patent/KR101182940B1/ko
Priority to EP05782800A priority patent/EP1828844A1/en
Priority to JP2007547201A priority patent/JP4700697B2/ja
Priority to PCT/EP2005/009165 priority patent/WO2006066638A1/en
Priority to KR1020077013078A priority patent/KR101156369B1/ko
Priority to TW094129565A priority patent/TW200622313A/zh
Publication of DE102004063314A1 publication Critical patent/DE102004063314A1/de
Priority to US12/855,305 priority patent/US8025427B2/en
Priority to US13/215,910 priority patent/US8246211B2/en
Priority to US13/553,005 priority patent/US8480261B2/en
Priority to US13/917,505 priority patent/US8636386B2/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0933—Systems for active beam shaping by rapid movement of an element
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/007—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light
    • G02B26/008—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light in the form of devices for effecting sequential colour changes, e.g. colour wheels
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0994—Fibers, light pipes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Astronomy & Astrophysics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Microscoopes, Condenser (AREA)
DE102004063314A 2004-12-23 2004-12-23 Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung Withdrawn DE102004063314A1 (de)

Priority Applications (14)

Application Number Priority Date Filing Date Title
DE102004063314A DE102004063314A1 (de) 2004-12-23 2004-12-23 Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung
PCT/EP2005/009165 WO2006066638A1 (en) 2004-12-23 2005-08-25 A filter device for the compensation of an asymmetric pupil illumination
KR1020077013078A KR101156369B1 (ko) 2004-12-23 2005-08-25 비대칭 동공 조명의 보정을 위한 필터 장치
CNA2005800448498A CN101088049A (zh) 2004-12-23 2005-08-25 用于补偿不对称光瞳照明的滤光装置
KR1020117015632A KR101182940B1 (ko) 2004-12-23 2005-08-25 비대칭 동공 조명의 보정을 위한 필터 장치
EP05782800A EP1828844A1 (en) 2004-12-23 2005-08-25 A filter device for the compensation of an asymmetric pupil illumination
JP2007547201A JP4700697B2 (ja) 2004-12-23 2005-08-25 非対称瞳照射を補償するフィルタ装置
EP10007886A EP2278403A1 (en) 2004-12-23 2005-08-25 A filter device for the compensation of an asymmectric pupil illumination
US11/722,631 US7798676B2 (en) 2004-12-23 2005-08-25 Filter device for the compensation of an asymmetric pupil illumination
TW094129565A TW200622313A (en) 2004-12-23 2005-08-29 A filter device for the compensation of an asymmetric pupil illumination
US12/855,305 US8025427B2 (en) 2004-12-23 2010-08-12 Filter device for the compensation of an asymmetric pupil illumination
US13/215,910 US8246211B2 (en) 2004-12-23 2011-08-23 Filter device for the compensation of an asymmetric pupil illumination
US13/553,005 US8480261B2 (en) 2004-12-23 2012-07-19 Filter device for the compensation of an asymmetric pupil illumination
US13/917,505 US8636386B2 (en) 2004-12-23 2013-06-13 Filter device for the compensation of an asymmetric pupil illumination

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004063314A DE102004063314A1 (de) 2004-12-23 2004-12-23 Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung

Publications (1)

Publication Number Publication Date
DE102004063314A1 true DE102004063314A1 (de) 2006-07-13

Family

ID=35033385

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102004063314A Withdrawn DE102004063314A1 (de) 2004-12-23 2004-12-23 Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung

Country Status (8)

Country Link
US (5) US7798676B2 (https=)
EP (2) EP1828844A1 (https=)
JP (1) JP4700697B2 (https=)
KR (2) KR101182940B1 (https=)
CN (1) CN101088049A (https=)
DE (1) DE102004063314A1 (https=)
TW (1) TW200622313A (https=)
WO (1) WO2006066638A1 (https=)

Cited By (5)

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WO2008092653A3 (en) * 2007-01-30 2008-10-09 Zeiss Carl Smt Ag Illumination system of a microlithographic projection exposure apparatus
US7990520B2 (en) 2006-12-18 2011-08-02 Carl Zeiss Smt Gmbh Microlithography illumination systems, components and methods
DE102013213545A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
DE102015220144A1 (de) * 2015-10-16 2017-04-20 Carl Zeiss Smt Gmbh Optisches System und Lithographieanlage
DE102021120952B3 (de) 2021-08-11 2022-11-10 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop

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JP4599936B2 (ja) 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102006059024A1 (de) * 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity
US8908151B2 (en) * 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
DE102008001511A1 (de) * 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
NL1036905A1 (nl) * 2008-06-03 2009-12-04 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
KR101258344B1 (ko) 2008-10-31 2013-04-30 칼 짜이스 에스엠티 게엠베하 Ｅｕｖ 마이크로리소그래피용 조명 광학 기기
WO2010073795A1 (ja) 2008-12-24 2010-07-01 株式会社 ニコン 照明光学系、露光装置及びデバイスの製造方法
DE102010042901B3 (de) * 2010-10-26 2012-04-05 Carl Zeiss Smt Gmbh Polarisationsaktuator
DE102011005940A1 (de) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
WO2012126954A1 (en) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102011077234A1 (de) 2011-06-08 2012-12-13 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
CN102331688B (zh) * 2011-10-25 2013-06-26 中国科学院光电技术研究所 一种光瞳均匀性补偿装置
US8901496B2 (en) * 2012-06-20 2014-12-02 General Electric Company Overhead occupancy sensor
US9261793B2 (en) 2012-09-14 2016-02-16 Globalfoundries Inc. Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution
CN104216234B (zh) * 2013-06-05 2016-05-25 中芯国际集成电路制造(上海)有限公司 光刻系统光源对称性的检测方法
US9721421B2 (en) 2015-05-05 2017-08-01 Mladen Blazevic Electronic gaming system with physical gaming chips and wager display
CN106556974B (zh) * 2015-09-30 2019-04-26 中芯国际集成电路制造(上海)有限公司 光刻照明系统以及光刻设备
WO2017144265A1 (en) 2016-02-25 2017-08-31 Asml Netherlands B.V. Beam homogenizer, illumination system and metrology system
CN105739250B (zh) * 2016-05-13 2017-10-27 上海华力微电子有限公司 一种光刻机之照明光瞳均一性补偿装置及其补偿方法
CN108983559A (zh) * 2018-08-08 2018-12-11 中国科学院上海光学精密机械研究所 光刻机光瞳校正器及其使用方法
WO2024227859A1 (en) 2023-05-04 2024-11-07 Carl Zeiss Smt Gmbh Method for adjusting the telecentricity in a projection exposure system for microlithography

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7990520B2 (en) 2006-12-18 2011-08-02 Carl Zeiss Smt Gmbh Microlithography illumination systems, components and methods
US8643825B2 (en) 2006-12-18 2014-02-04 Carl Zeiss Smt Gmbh Microlithography illumination systems, components and methods
US9116441B2 (en) 2007-01-30 2015-08-25 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
JP2010517310A (ja) * 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム
US8169594B2 (en) 2007-01-30 2012-05-01 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
CN101636695B (zh) * 2007-01-30 2012-06-06 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的照明系统
WO2008092653A3 (en) * 2007-01-30 2008-10-09 Zeiss Carl Smt Ag Illumination system of a microlithographic projection exposure apparatus
DE102013213545A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
EP2824512A3 (de) * 2013-07-10 2015-05-06 Carl Zeiss SMT GmbH Beleuchtungsoptik für die Projektionslithografie
US9753375B2 (en) 2013-07-10 2017-09-05 Carl Zeiss Smt Gmbh Illumination optical unit for projection lithography
DE102015220144A1 (de) * 2015-10-16 2017-04-20 Carl Zeiss Smt Gmbh Optisches System und Lithographieanlage
DE102021120952B3 (de) 2021-08-11 2022-11-10 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop
US12105427B2 (en) 2021-08-11 2024-10-01 Carl Zeiss Smt Gmbh Method and device for correcting a telecentricity error of an imaging device

Also Published As

Publication number Publication date
JP2008525828A (ja) 2008-07-17
WO2006066638A1 (en) 2006-06-29
US20110299285A1 (en) 2011-12-08
US20100309450A1 (en) 2010-12-09
JP4700697B2 (ja) 2011-06-15
TWI303325B (https=) 2008-11-21
EP2278403A1 (en) 2011-01-26
CN101088049A (zh) 2007-12-12
KR20070085995A (ko) 2007-08-27
US8480261B2 (en) 2013-07-09
US8636386B2 (en) 2014-01-28
US20080113281A1 (en) 2008-05-15
KR20110094121A (ko) 2011-08-19
KR101182940B1 (ko) 2012-09-13
TW200622313A (en) 2006-07-01
US8246211B2 (en) 2012-08-21
KR101156369B1 (ko) 2012-06-13
US20120281198A1 (en) 2012-11-08
US20130278913A1 (en) 2013-10-24
WO2006066638A8 (en) 2006-08-24
EP1828844A1 (en) 2007-09-05
US8025427B2 (en) 2011-09-27
US7798676B2 (en) 2010-09-21

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