TWI295415B - Thermal processing unit - Google Patents
Thermal processing unit Download PDFInfo
- Publication number
- TWI295415B TWI295415B TW095106655A TW95106655A TWI295415B TW I295415 B TWI295415 B TW I295415B TW 095106655 A TW095106655 A TW 095106655A TW 95106655 A TW95106655 A TW 95106655A TW I295415 B TWI295415 B TW I295415B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- heat treatment
- heaters
- heater
- unit
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims description 206
- 238000010438 heat treatment Methods 0.000 claims description 54
- 238000001816 cooling Methods 0.000 claims description 41
- 239000007789 gas Substances 0.000 claims description 24
- 239000000112 cooling gas Substances 0.000 claims description 10
- 230000007246 mechanism Effects 0.000 claims description 10
- 230000007723 transport mechanism Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 description 20
- 238000004140 cleaning Methods 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 19
- 239000011521 glass Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 239000007788 liquid Substances 0.000 description 9
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 8
- 238000001035 drying Methods 0.000 description 6
- 229910052770 Uranium Inorganic materials 0.000 description 5
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000003245 coal Substances 0.000 description 3
- 239000003550 marker Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005338 heat storage Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000011232 storage material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G39/00—Rollers, e.g. drive rollers, or arrangements thereof incorporated in roller-ways or other types of mechanical conveyors
- B65G39/10—Arrangements of rollers
- B65G39/12—Arrangements of rollers mounted on framework
- B65G39/18—Arrangements of rollers mounted on framework for guiding loads
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/04—Tempering or quenching glass products using gas
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Organic Chemistry (AREA)
- Nonlinear Science (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005055944A JP2006245110A (ja) | 2005-03-01 | 2005-03-01 | 熱的処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200641553A TW200641553A (en) | 2006-12-01 |
TWI295415B true TWI295415B (en) | 2008-04-01 |
Family
ID=37051248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095106655A TWI295415B (en) | 2005-03-01 | 2006-02-27 | Thermal processing unit |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2006245110A (enrdf_load_stackoverflow) |
KR (1) | KR101237092B1 (enrdf_load_stackoverflow) |
TW (1) | TWI295415B (enrdf_load_stackoverflow) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100811695B1 (ko) * | 2006-11-28 | 2008-03-11 | 엔티엠 주식회사 | 기판 건조장치 |
JP2008160011A (ja) * | 2006-12-26 | 2008-07-10 | Tokyo Electron Ltd | 基板処理装置 |
JP2008172104A (ja) * | 2007-01-12 | 2008-07-24 | Tokyo Electron Ltd | リフロー処理装置およびリフロー処理方法 |
JP4341978B2 (ja) * | 2007-03-02 | 2009-10-14 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5401015B2 (ja) * | 2007-03-15 | 2014-01-29 | 光洋サーモシステム株式会社 | 連続式焼成炉 |
JP2008311250A (ja) * | 2007-06-12 | 2008-12-25 | Tokyo Electron Ltd | リフローシステムおよびリフロー方法 |
KR101052758B1 (ko) * | 2008-11-18 | 2011-08-01 | 세메스 주식회사 | 평판 디스플레이 소자 제조 장치 |
JP4936567B2 (ja) * | 2009-09-18 | 2012-05-23 | 東京エレクトロン株式会社 | 熱処理装置 |
WO2011148716A1 (ja) * | 2010-05-25 | 2011-12-01 | シャープ株式会社 | ベーク装置 |
KR102410492B1 (ko) * | 2015-07-23 | 2022-06-20 | 삼성디스플레이 주식회사 | 글라스 성형 장치 |
JP6814570B2 (ja) * | 2016-08-18 | 2021-01-20 | 株式会社アルバック | 搬送装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09237965A (ja) * | 1996-02-29 | 1997-09-09 | Furukawa Electric Co Ltd:The | リフロー炉 |
JP3756402B2 (ja) * | 2000-12-08 | 2006-03-15 | 富士写真フイルム株式会社 | 基板搬送装置及び方法 |
JP2003332727A (ja) * | 2002-05-15 | 2003-11-21 | Sony Corp | 熱遮蔽部分材及びリフロー装置 |
-
2005
- 2005-03-01 JP JP2005055944A patent/JP2006245110A/ja active Pending
-
2006
- 2006-02-27 TW TW095106655A patent/TWI295415B/zh not_active IP Right Cessation
- 2006-02-28 KR KR1020060019378A patent/KR101237092B1/ko not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2006245110A (ja) | 2006-09-14 |
TW200641553A (en) | 2006-12-01 |
KR101237092B1 (ko) | 2013-02-25 |
KR20060096903A (ko) | 2006-09-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |