JP2006245110A - 熱的処理装置 - Google Patents

熱的処理装置 Download PDF

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Publication number
JP2006245110A
JP2006245110A JP2005055944A JP2005055944A JP2006245110A JP 2006245110 A JP2006245110 A JP 2006245110A JP 2005055944 A JP2005055944 A JP 2005055944A JP 2005055944 A JP2005055944 A JP 2005055944A JP 2006245110 A JP2006245110 A JP 2006245110A
Authority
JP
Japan
Prior art keywords
substrate
heaters
processing
thermal processing
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005055944A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006245110A5 (enrdf_load_stackoverflow
Inventor
Yoshiharu Ota
義治 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2005055944A priority Critical patent/JP2006245110A/ja
Priority to TW095106655A priority patent/TWI295415B/zh
Priority to KR1020060019378A priority patent/KR101237092B1/ko
Publication of JP2006245110A publication Critical patent/JP2006245110A/ja
Publication of JP2006245110A5 publication Critical patent/JP2006245110A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G39/00—Rollers, e.g. drive rollers, or arrangements thereof incorporated in roller-ways or other types of mechanical conveyors 
    • B65G39/10—Arrangements of rollers
    • B65G39/12—Arrangements of rollers mounted on framework
    • B65G39/18—Arrangements of rollers mounted on framework for guiding loads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B27/00—Tempering or quenching glass products
    • C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B27/00—Tempering or quenching glass products
    • C03B27/04—Tempering or quenching glass products using gas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2005055944A 2005-03-01 2005-03-01 熱的処理装置 Pending JP2006245110A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005055944A JP2006245110A (ja) 2005-03-01 2005-03-01 熱的処理装置
TW095106655A TWI295415B (en) 2005-03-01 2006-02-27 Thermal processing unit
KR1020060019378A KR101237092B1 (ko) 2005-03-01 2006-02-28 열적 처리 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005055944A JP2006245110A (ja) 2005-03-01 2005-03-01 熱的処理装置

Publications (2)

Publication Number Publication Date
JP2006245110A true JP2006245110A (ja) 2006-09-14
JP2006245110A5 JP2006245110A5 (enrdf_load_stackoverflow) 2007-04-19

Family

ID=37051248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005055944A Pending JP2006245110A (ja) 2005-03-01 2005-03-01 熱的処理装置

Country Status (3)

Country Link
JP (1) JP2006245110A (enrdf_load_stackoverflow)
KR (1) KR101237092B1 (enrdf_load_stackoverflow)
TW (1) TWI295415B (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008160011A (ja) * 2006-12-26 2008-07-10 Tokyo Electron Ltd 基板処理装置
JP2008172104A (ja) * 2007-01-12 2008-07-24 Tokyo Electron Ltd リフロー処理装置およびリフロー処理方法
JP2008218593A (ja) * 2007-03-02 2008-09-18 Tokyo Electron Ltd 基板処理装置
JP2008224192A (ja) * 2007-03-15 2008-09-25 Koyo Thermo System Kk 連続式焼成炉
JP2008311250A (ja) * 2007-06-12 2008-12-25 Tokyo Electron Ltd リフローシステムおよびリフロー方法
JP2011066318A (ja) * 2009-09-18 2011-03-31 Tokyo Electron Ltd 熱処理装置
WO2011148716A1 (ja) * 2010-05-25 2011-12-01 シャープ株式会社 ベーク装置
JP2018029137A (ja) * 2016-08-18 2018-02-22 株式会社アルバック 搬送装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100811695B1 (ko) * 2006-11-28 2008-03-11 엔티엠 주식회사 기판 건조장치
KR101052758B1 (ko) * 2008-11-18 2011-08-01 세메스 주식회사 평판 디스플레이 소자 제조 장치
KR102410492B1 (ko) * 2015-07-23 2022-06-20 삼성디스플레이 주식회사 글라스 성형 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09237965A (ja) * 1996-02-29 1997-09-09 Furukawa Electric Co Ltd:The リフロー炉
JP3756402B2 (ja) * 2000-12-08 2006-03-15 富士写真フイルム株式会社 基板搬送装置及び方法
JP2003332727A (ja) * 2002-05-15 2003-11-21 Sony Corp 熱遮蔽部分材及びリフロー装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008160011A (ja) * 2006-12-26 2008-07-10 Tokyo Electron Ltd 基板処理装置
JP2008172104A (ja) * 2007-01-12 2008-07-24 Tokyo Electron Ltd リフロー処理装置およびリフロー処理方法
JP2008218593A (ja) * 2007-03-02 2008-09-18 Tokyo Electron Ltd 基板処理装置
JP2008224192A (ja) * 2007-03-15 2008-09-25 Koyo Thermo System Kk 連続式焼成炉
JP2008311250A (ja) * 2007-06-12 2008-12-25 Tokyo Electron Ltd リフローシステムおよびリフロー方法
JP2011066318A (ja) * 2009-09-18 2011-03-31 Tokyo Electron Ltd 熱処理装置
WO2011148716A1 (ja) * 2010-05-25 2011-12-01 シャープ株式会社 ベーク装置
JP2018029137A (ja) * 2016-08-18 2018-02-22 株式会社アルバック 搬送装置

Also Published As

Publication number Publication date
TW200641553A (en) 2006-12-01
KR101237092B1 (ko) 2013-02-25
KR20060096903A (ko) 2006-09-13
TWI295415B (en) 2008-04-01

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