TWI276925B - Exposure device for stripline work - Google Patents

Exposure device for stripline work Download PDF

Info

Publication number
TWI276925B
TWI276925B TW093136043A TW93136043A TWI276925B TW I276925 B TWI276925 B TW I276925B TW 093136043 A TW093136043 A TW 093136043A TW 93136043 A TW93136043 A TW 93136043A TW I276925 B TWI276925 B TW I276925B
Authority
TW
Taiwan
Prior art keywords
workpiece
stage
vacuum
work
strip
Prior art date
Application number
TW093136043A
Other languages
English (en)
Chinese (zh)
Other versions
TW200532386A (en
Inventor
Atsushi Mito
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200532386A publication Critical patent/TW200532386A/zh
Application granted granted Critical
Publication of TWI276925B publication Critical patent/TWI276925B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093136043A 2004-03-23 2004-11-23 Exposure device for stripline work TWI276925B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004084407A JP4407333B2 (ja) 2004-03-23 2004-03-23 帯状ワークの露光装置

Publications (2)

Publication Number Publication Date
TW200532386A TW200532386A (en) 2005-10-01
TWI276925B true TWI276925B (en) 2007-03-21

Family

ID=35174453

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093136043A TWI276925B (en) 2004-03-23 2004-11-23 Exposure device for stripline work

Country Status (3)

Country Link
JP (1) JP4407333B2 (ja)
KR (1) KR100769804B1 (ja)
TW (1) TWI276925B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5117052B2 (ja) * 2006-04-26 2013-01-09 株式会社オーク製作所 露光装置および露光方法
JP4908958B2 (ja) * 2006-07-21 2012-04-04 本田技研工業株式会社 電解質・電極接合体の製造方法及びその装置
JP4949195B2 (ja) * 2007-10-26 2012-06-06 株式会社アドテックエンジニアリング 露光装置及び基板の矯正装置
JP5117243B2 (ja) * 2008-03-27 2013-01-16 株式会社オーク製作所 露光装置
JP5424803B2 (ja) * 2009-10-07 2014-02-26 株式会社オーク製作所 露光装置
JP5908744B2 (ja) * 2012-02-24 2016-04-26 株式会社アドテックエンジニアリング 露光描画装置、プログラム及び露光描画方法
JP5908745B2 (ja) * 2012-02-24 2016-04-26 株式会社アドテックエンジニアリング 露光描画装置、プログラム及び露光描画方法
JP6400120B2 (ja) * 2014-12-12 2018-10-03 キヤノン株式会社 基板保持装置、リソグラフィ装置、及び物品の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6443429A (en) * 1987-08-11 1989-02-15 Fuji Photo Film Co Ltd Exposure method
JPH03282473A (ja) * 1990-03-30 1991-12-12 Ushio Inc フィルム露光装置
JPH08314149A (ja) * 1995-05-16 1996-11-29 Orc Mfg Co Ltd 精密片面露光装置および露光方法

Also Published As

Publication number Publication date
KR20050094753A (ko) 2005-09-28
JP2005274670A (ja) 2005-10-06
KR100769804B1 (ko) 2007-10-23
JP4407333B2 (ja) 2010-02-03
TW200532386A (en) 2005-10-01

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