KR20050094753A - 띠 형상 워크의 노광 장치 - Google Patents
띠 형상 워크의 노광 장치 Download PDFInfo
- Publication number
- KR20050094753A KR20050094753A KR1020040115319A KR20040115319A KR20050094753A KR 20050094753 A KR20050094753 A KR 20050094753A KR 1020040115319 A KR1020040115319 A KR 1020040115319A KR 20040115319 A KR20040115319 A KR 20040115319A KR 20050094753 A KR20050094753 A KR 20050094753A
- Authority
- KR
- South Korea
- Prior art keywords
- work
- workpiece
- stage
- vacuum
- strip
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (1)
- 띠 형상 워크를 간헐적으로 반송하고,상기 반송된 워크를, 스테이지에 진공 흡착하여 노광하는 띠 형상 워크의 노광 장치에 있어서,상기 스테이지에는, 상기 워크가 노광되는 영역을 진공 흡착하기 위한 다수의 제1 구멍군에 부가하여, 적어도 워크 반송 방향의 상류측과 하류측에, 상기 노광되는 영역 이외의 영역을 흡인하는 제2 구멍군이 형성되고,상기 제1 구멍군과 제2 구멍군에는, 각각 별개의 진공 공급계가 접속되고,적어도 제1 구멍군에 공급되는 진공 공급계에는, 상기 워크의 흡착을 검출하는 센서가 설치되어 있는 것을 특징으로 하는 띠 형상 워크의 노광 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004084407A JP4407333B2 (ja) | 2004-03-23 | 2004-03-23 | 帯状ワークの露光装置 |
JPJP-P-2004-00084407 | 2004-03-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050094753A true KR20050094753A (ko) | 2005-09-28 |
KR100769804B1 KR100769804B1 (ko) | 2007-10-23 |
Family
ID=35174453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040115319A KR100769804B1 (ko) | 2004-03-23 | 2004-12-29 | 띠 형상 워크의 노광 장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4407333B2 (ko) |
KR (1) | KR100769804B1 (ko) |
TW (1) | TWI276925B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170094281A (ko) * | 2014-12-12 | 2017-08-17 | 캐논 가부시끼가이샤 | 기판 유지 장치, 리소그래피 장치, 및 물품의 제조 방법 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5117052B2 (ja) * | 2006-04-26 | 2013-01-09 | 株式会社オーク製作所 | 露光装置および露光方法 |
JP4908958B2 (ja) * | 2006-07-21 | 2012-04-04 | 本田技研工業株式会社 | 電解質・電極接合体の製造方法及びその装置 |
JP4949195B2 (ja) * | 2007-10-26 | 2012-06-06 | 株式会社アドテックエンジニアリング | 露光装置及び基板の矯正装置 |
JP5117243B2 (ja) * | 2008-03-27 | 2013-01-16 | 株式会社オーク製作所 | 露光装置 |
JP5424803B2 (ja) * | 2009-10-07 | 2014-02-26 | 株式会社オーク製作所 | 露光装置 |
JP5908744B2 (ja) * | 2012-02-24 | 2016-04-26 | 株式会社アドテックエンジニアリング | 露光描画装置、プログラム及び露光描画方法 |
JP5908745B2 (ja) * | 2012-02-24 | 2016-04-26 | 株式会社アドテックエンジニアリング | 露光描画装置、プログラム及び露光描画方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6443429A (en) * | 1987-08-11 | 1989-02-15 | Fuji Photo Film Co Ltd | Exposure method |
JPH03282473A (ja) * | 1990-03-30 | 1991-12-12 | Ushio Inc | フィルム露光装置 |
JPH08314149A (ja) * | 1995-05-16 | 1996-11-29 | Orc Mfg Co Ltd | 精密片面露光装置および露光方法 |
-
2004
- 2004-03-23 JP JP2004084407A patent/JP4407333B2/ja not_active Expired - Lifetime
- 2004-11-23 TW TW093136043A patent/TWI276925B/zh active
- 2004-12-29 KR KR1020040115319A patent/KR100769804B1/ko active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170094281A (ko) * | 2014-12-12 | 2017-08-17 | 캐논 가부시끼가이샤 | 기판 유지 장치, 리소그래피 장치, 및 물품의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
JP2005274670A (ja) | 2005-10-06 |
KR100769804B1 (ko) | 2007-10-23 |
JP4407333B2 (ja) | 2010-02-03 |
TWI276925B (en) | 2007-03-21 |
TW200532386A (en) | 2005-10-01 |
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