TWI275551B - Apparatus for transferring substrate in horizontal and vertical directions - Google Patents

Apparatus for transferring substrate in horizontal and vertical directions Download PDF

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Publication number
TWI275551B
TWI275551B TW093115263A TW93115263A TWI275551B TW I275551 B TWI275551 B TW I275551B TW 093115263 A TW093115263 A TW 093115263A TW 93115263 A TW93115263 A TW 93115263A TW I275551 B TWI275551 B TW I275551B
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TW
Taiwan
Prior art keywords
substrate
horizontal
transferring
vertical
transfer
Prior art date
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TW093115263A
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English (en)
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TW200502151A (en
Inventor
Yong-Seok Park
Kyung-Chul Kim
Tae-Bong Son
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Dms Co Ltd
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Application filed by Dms Co Ltd filed Critical Dms Co Ltd
Publication of TW200502151A publication Critical patent/TW200502151A/zh
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Description

1275551 越過該狹縫，以壓低該基板的角落來將該基板對準在該精 確位置處。 -個垂直傳送構件，其用於從該水平傳送構件處接收 該基板（或將該基板傳送到該水平傳送構件），並且用於 將該基板傳送到-個基板處理線（或從該基板處理線接收 該基板）；以及 個傳送單①’該傳送單元被配置在該垂直傳送構件 與該基板處理線之間，以從該垂直傳送構件處接收該基板 (或將該基板傳送到該垂直傳送構件）； 5. 一種基板傳送裝置，其包括有： 一個框架； 一個水平傳送構件，其藉由將該基板定位在—個精確 Si水平方向來傳送該基板’該水平傳送構件防止該基 :下垂以及轉動該基板，該水平傳送構件被裝設在該框架 々Μ㈣直料構件，其心㈣水平料構件處接收 將；其起或將該基板傳送到該水平傳送構件），並且用於 傳送f板處理線（或從該基板處理線接收 該上垂直傳送構件包括有…個上下緩衝單元， ，其中…早7"具有一個上方握持器以及-個下方握持器 以從該^上方握持器在垂直與水平方向"^可移動的， 〇平傳送構件處接收該基板，或 該水平傳㈣2將該基板傳送到 于器用來將該基板傳送到該 28 2送單元或是用來將該基板從該傳送單元傳制該下方握 持器；以及 -個傳送單元，該傳送單元被配置在該垂直傳送構件 ^該基板處理線之間，以從該垂直傳送構件處接收該基板 (或將該基板傳送到該垂直傳送構件）^ 6.如申請專利範圍帛5項之基板傳送裝置，其中，該 上，握持器包括有：以平行方式配置的第一與第二握持器 ，该等第一與第二握持器的每一個具有一個水平部件以及 個垂直部件’其中’該水平部件被提供有複數個支樓梢 ，該基板被座落在該等支擇梢之上，而該垂直部件被裝設 在該框架之上，以朝水平與垂直方向移動。 ★ 7.如中請專利範圍第6項之基板傳送裝置，其中，該 等第-與第二握持器的複數個垂直部件之下方端部由一連 接桿所相互連接’該連接桿被連接到一個第一馬達，以由 該第-馬達垂直移動，而該等下方端部由一 而被進一步連接到一個第一 軸 個第一馬達，並且以可滑動的方式被 連接到複數個水平導_勤，兮·楚p# ±ι_ -、 卜 十導執該荨水平導軌被裝設到該連接桿丨 ，以由該第二馬達水平地移動。 8.如申請專利範圍帛5項之基板傳送裝置，其中，該 下方握持器包括有：—個水平框架、複數個支撑梢以及- 個支樓板’其中’該等支擇梢在該水平框架被形成，以支 樓該基板，而該支撐板被裝設在該水平框架上，並且被連 接到一個第三馬達’以由該第三馬達朝垂直方向上往復移 動0 29 [S 1 1275551 9.如申請專利範圍第5項之基板傳送裝置，其中，該 上下緩衝單元包括有：第一與第二緩衝單元，該等第一與 第二緩衝單元被配置在該框架的前側與後側之上。 拾壹、圖式： 如次頁 30
TW093115263A 2003-06-25 2004-05-28 Apparatus for transferring substrate in horizontal and vertical directions TWI275551B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2003-0041656A KR100500170B1 (ko) 2003-06-25 2003-06-25 기판의 수평 및 상하 이송장치

Publications (2)

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TW200502151A TW200502151A (en) 2005-01-16
TWI275551B true TWI275551B (en) 2007-03-11

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW093115263A TWI275551B (en) 2003-06-25 2004-05-28 Apparatus for transferring substrate in horizontal and vertical directions

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JP (1) JP4053517B2 (zh)
KR (1) KR100500170B1 (zh)
CN (1) CN1284710C (zh)
TW (1) TWI275551B (zh)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100618918B1 (ko) * 2005-04-12 2006-09-01 주식회사 디엠에스 적층형 기판 이송장치
KR100654849B1 (ko) * 2005-04-14 2006-12-06 주식회사 대성미크론 인쇄회로기판 표면 실장용 스크린 프린터의 다수개의인쇄회로기판 각도조정 및 정렬장치
KR100729958B1 (ko) * 2005-08-30 2007-06-19 에버테크노 주식회사 패널 이송리프터
KR100674882B1 (ko) * 2005-10-24 2007-01-29 주식회사 디엠에스 기판 이송용 트랜스퍼
KR100660780B1 (ko) * 2005-12-26 2006-12-26 주식회사 디엠에스 평판 디스플레이용 기판 전달 장치
KR100793137B1 (ko) * 2006-09-06 2008-01-10 (주)젬텍 엘시디 마더글라스 이송라인의 버퍼스테이션
KR100830873B1 (ko) * 2006-10-17 2008-05-21 주식회사 에스에프에이 인쇄장치
US9834378B2 (en) 2006-12-22 2017-12-05 Brooks Automation, Inc. Loader and buffer for reduced lot size
KR100783762B1 (ko) * 2007-01-04 2007-12-07 주식회사 디엠에스 기판 반송장치
KR100963316B1 (ko) * 2008-06-13 2010-06-11 주식회사 디엠에스 기판세정장치
KR100967222B1 (ko) 2008-06-16 2010-07-05 정진황 이송챔버 및 기판이송방법
KR100962362B1 (ko) 2008-06-27 2010-06-10 주식회사 디엠에스 기판세정장치
CN101633559B (zh) * 2008-07-24 2011-07-27 洛阳兰迪玻璃机器有限公司 一种玻璃输送升降装置
KR101052753B1 (ko) * 2008-11-18 2011-08-01 세메스 주식회사 기판 이송 모듈 및 이를 포함하는 기판 처리 장치
KR101052750B1 (ko) * 2008-11-18 2011-08-01 세메스 주식회사 기판 이송 모듈 및 이를 포함하는 기판 처리 장치
KR101105416B1 (ko) * 2009-07-23 2012-01-17 주식회사 디엠에스 기판 처리 장치
CN102107781B (zh) * 2009-12-23 2013-06-19 株式会社太星技研 平板玻璃移送装置
KR101302485B1 (ko) * 2010-11-05 2013-09-02 주식회사 로보스타 이송장비
KR101917824B1 (ko) * 2012-06-11 2018-11-13 세메스 주식회사 기판 반전 장치 및 방법
KR101977244B1 (ko) * 2012-08-01 2019-05-10 엘지디스플레이 주식회사 건조 장치
KR200470942Y1 (ko) 2013-01-24 2014-01-21 (주)아모레퍼시픽 화장품 용기 홀더 이송장치
CN103569611A (zh) * 2013-10-23 2014-02-12 南京熊猫电子股份有限公司 一种洁净环境玻璃走行提升装置
KR102064803B1 (ko) * 2014-05-09 2020-01-13 주식회사 제우스 기판반전유닛
CN106369955B (zh) * 2016-08-31 2019-08-16 武汉华星光电技术有限公司 薄膜烘干机支架及薄膜烘干机
CN107958865A (zh) * 2017-12-11 2018-04-24 苏州广林达电子科技有限公司 Oled托盘上下传输装置及显示装置
CN108946019B (zh) * 2018-08-09 2020-10-23 李舒欣 一种机械加工生产用平移机械装置
KR102049043B1 (ko) * 2019-08-16 2019-11-26 (주)선우하이테크 기판 위치 가변형 표면 처리장치
CN115312446B (zh) * 2022-10-11 2023-03-21 南通大鹏光电有限公司 一种太阳能光伏电池组件的运输装置

Also Published As

Publication number Publication date
JP4053517B2 (ja) 2008-02-27
TW200502151A (en) 2005-01-16
KR20050001482A (ko) 2005-01-07
KR100500170B1 (ko) 2005-07-07
JP2005019986A (ja) 2005-01-20
CN1576199A (zh) 2005-02-09
CN1284710C (zh) 2006-11-15

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