TWI279375B - Apparatus for transferring laminated basal plate - Google Patents

Apparatus for transferring laminated basal plate Download PDF

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Publication number
TWI279375B
TWI279375B TW095112796A TW95112796A TWI279375B TW I279375 B TWI279375 B TW I279375B TW 095112796 A TW095112796 A TW 095112796A TW 95112796 A TW95112796 A TW 95112796A TW I279375 B TWI279375 B TW I279375B
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TW
Taiwan
Prior art keywords
substrate
conveying
shelf
rotating shaft
disposed
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Application number
TW095112796A
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Chinese (zh)
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TW200635835A (en
Inventor
Yong-Seok Park
Sok-Joo Lee
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Dms Co Ltd
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Publication of TWI279375B publication Critical patent/TWI279375B/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G13/00—Roller-ways
    • B65G13/11—Roller frames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G13/00—Roller-ways
    • B65G13/11—Roller frames
    • B65G13/12—Roller frames adjustable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G39/00—Rollers, e.g. drive rollers, or arrangements thereof incorporated in roller-ways or other types of mechanical conveyors 
    • B65G39/02—Adaptations of individual rollers and supports therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062—Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/067—Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/07—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers Not used, see H01L21/677
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G51/00—Conveying articles through pipes or tubes by fluid flow or pressure; Conveying articles over a flat surface, e.g. the base of a trough, by jets located in the surface
    • B65G51/02—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases
    • B65G51/03—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases over a flat surface or in troughs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67236—Apparatus for manufacturing or treating in a plurality of work-stations the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

Abstract

The invention is an apparatus for transferring a laminated basal plate comprising a rack. An upper transferring mechanism which is formed a certain space between the axis of the above-mentioned roller and the basal plate is set in the rack for transferring the basal plate, and it passes through a roller whose diameter is larger than a pre-determined value for transferring the basal plate. A buffer device is set in one side of the rack; the front end of it enters the space of the upper transferring mechanism for receiving or providing the basal plate. Passing through the buffer device to receive or provide the basal plate for transferring the transferring unit of the basal plate.

Description

1279375 九、發明說明： 【發明所屬之技術領域】 本發明有關一種疊層基板的輸送裝置，特別是有關一 種把通過上部輸送機構輪送的基板很容易地輸送到下部輸 送機構的疊層基板輸送裝置。 【先前技術】 一般情況下，應用於平板顯示器（FPD: Flat Panel Dlsplay )、半導體基板、LCD、光掩模用玻璃等領域的基 .板，要經過〜系列的處理流程，進行㈣、剝離.、清洗二 工序後，進行清洗。 …對上述的基板進行處理和清洗時，為了向各道工序傳 送基板，必須使用輸送裝置。 .上述基板輪送裝置的結構有多種多樣，但目前通常採 用的疋水平接收/供應基板的輸送裝置。即，為了對基板進 φ 订冑S &種幸刖达裝置以水平狀輸送基才反，供、給加工線入 口處的裝載機，或從卸载機一側接收經處理的基板，而後 •輸送到其他處理工序。 . …而疊層基板輸送m彳通過上部輸送機構輸送基板， 亚通過可上下反復移動的緩衝裝置（㈣“ ^⑷接收/供 f所述基板，然後通過緩衝裝置向下部輸送機構接收/供應 基板。 但疋’ 24種結構的疊層基板輸送裝置因基板的大面積 赵为’從而使現有的上部輸送機構不適用。 !279375 【發明内容】 本發明的目的在於提供一種通過改進上部輸送機構的 結構，可簡便地上下輸送所述基板的疊層基板輸送裝置。 本發明的另一目的在於通過加大輸送輥直徑，提高美 板的輸送速度。通過使用上述的大直徑輕子，可順利實現 基板的接收或供應。 本發明是以如下方式實現的。本發明疊層基板輪送裝 置’包含：架子；設置於所述架子上，並帶有可在原地旋 轉和前後移動、用於輸送基板的輥子的上部輸送機構；設 置於所述上部輸送機構的附近，可上下移動，當所述輸送 機構向其靠近時，其前端可進入由設置於所述上部輸送機 構内、且其直徑大於一定數值的親子所形成的空間，用於 接收/供應所述基板的緩衝裝置；通過從所述緩衝裝置接 收、或向緩衝裝置供應所述基板而輸送基板的輸送裝置及 基板處理裝置。 【實施方式】 以下結合附圖和實施例對本發明疊層基板輪送裝置進 行更為詳細的說明。 如圖1至圖4所示，本發明較佳實施例中疊層基板輸 送裝置，包含··沿垂直及水平方向排列，並形成框架的多 们木子1 ’設置於所述架子1的上部，並可在其上滑移， 用於接收/供應所述基板G的上部輪送機構3 ;從所述上部 1279375 用於接收/供應所述基板 輪送機構3的下侧設置於架子】 的下部輪送機構4〇。 在基板處理單亓】n 二 別形成的别後，所述下部輪送機構40分 小成早獨的輪送機構8、12。 所本Γ明逛包含，可從所述上部輸送機# 3接收，或向 緩：Ϊ置：达機構3供應基板G的緩衝裝置5、7。所述的 衣置 7可垂直移動，以此實現升降。 從所述緩衝裝置5、7接收供應基輸送部9 口弟一輪送部U構成所述上部輸送機構3。所述的下部輸 送機構4〇從所述緩衝裝置5、7接收所述基板g，而後把 该基板G輸送到用於清洗、乾燥該基板〇的基板處理單元 所述基板處理單元丨〇可採用該領域的通用設備，因 此省略其詳細說明。 所述的第一輸送部9可在所述架子10的指定位置旋 罕才所返苐一褕送部Π設置於所述第一輸送部9的前方， 可自轉，並可前後移動。特別是，所述的第二輸送部1工 的設置位低於所述第一輸送部9的設置位。 為此’所述的第一輸送部9包含：排列於兩側架子i 上的至少一個支架1 3 ;設置於所述支架1 3上並可旋轉的 弟 $疋轉軸16 ;設置於所述弟一旋轉軸16，用於支持基 板的至少一個第一輸送輥1 5 ;用於連接所述的多個第一輸 送秦t* 1 5的連接軸17 ;用於驅動所述多個第一旋轉軸16的 第一電動機組1 9。 並且，所述的多個第一旋轉軸1 6的一端通過連接軸i 7 1279375 相互連接 ,, ，連接軸17通過蝸杆及蝸輪等動 把所述第㈣寺動力傳遞結構， 16。—〗9的旋轉力傳遞給所述第一旋轉軸 轉，動機* 19 寺’旋轉轴17隨之旋 旋轉隨之旋旋轉軸16旋轉’而多個第—輸送輥15 方疋轉的同時，帶動基板G移動。 士上所述的作用下，通過所述一 的基板G，供給到第二輸送輕n。輪^ 9而輪送 ::的第二輸送輥U包含：_對架子2〇;設置於所 ”子2〇上面的執道21 ;設置於 前後直線運動的移動板23. + 1上亚可做 Μ絲 6又置於所述移動板23上，並 一疋’且可設置基板G的第二輪送輥25 ;用於旋轉所述 第二輸送輥25的電動機組26。 迷 所述第二輸送部丨丨的架子2〇 ά入、、， 文衣位置低於所述第 一輪迗部9的架子1的位置。 弟 所述軌道21包含LM式執道，在所述的LM式軌道 上-置移動板23,使該移動板23沿執道2ι前後移動。 在所述移動板23的上部，向上突設有支撑架31，在 所述支擇架Μ上設置有可旋轉的第二旋轉軸η。並且， 所述第二旋轉軸27通過電動機組26和皮帶Μ傳遞動力。 所述電動機組26的旋轉轴30和第二旋轉轴27通過皮 連接。 戶斤述的多個第二輸送輕25設置於所述第二旋轉軸27。 並且，所述第二旋轉轴27帶動第二輪送親25旋轉， 8 1279375 從而輪送基板G。 此時，所述的第二輸送棍25採用大直徑^大輥子。所 述大輕子的直徑大於所述第-輸送輥15的直徑。 即’如圖3所示，如果所$钕 果所述弟二輸送輥25的直徑大於 :定值，那麼當基板G設置於所述第二輸送輥25時，在 弟二旋轉軸27和基板G之間可形成—定大小的空間S。兮 的大小應當足以使所述緩衝袭置5的前端進入。這 疋確疋所述第二輸送輥25的直徑的條件。 即使所述第二輸送輥25的直 μ μ t 仅文大，所述的第二輸送 部11的位置還是低於第一 、 平方向上輸送基板。 置’因此可在水 斤，、讀衣置5的則端為了接收、供應所述基板 入所述弟二旋轉軸27和基板G之間時，進人該空間s，因 二可使緩衝裝置5易於進入。所述緩衝…進入所述* 間的狀；下’利用常規方法將所述緩衝裝i 5稍微向上： 動，使设置於所述第二輸送輕25 裝置5-側。 〗基板G移向所述緩衝 如上所述，在所述第一輸送輥9的 G向前方輸送時，所述的第_ $ 所述基板 ，〜〜十一翻达輮1丨向所述鉍 9方向移動，並接收所述基板^，所述的询< 收所述基板G後，移動板23沿執道21向寸方=輪11接 把所述基板G輸送到所述緩衝裝置$。 私動彳&而 如此，把原地旋轉的所述第一輸送部 的所述第二輸送部U設置成一列 ：可前後移動 又所述弟二輪送部i i 1279375 的位置低於所述第一輸送部9的位置，並採用大直徑輥子， 以此可加快基板的輸送速度。 圖5所不的疋本發明的另一實施例。如圖5所示，本 實施例中第二輸送輥25未採用大直徑輥子，而採用了分 離的旋轉軸42、44。 即’將所述第二輸送部U的旋轉軸27分成兩個旋轉 軸42、44。所述的兩個旋轉轴42、44分別設置於支撐架 46、48，並可旋轉。此時，在所述兩個旋轉軸42、44上 設置常規直徑的輸送輥50。以此相分離的兩個旋轉軸42、 44之間，形成一定大小的空間D。 所述緩衝裝置49為接收所述基板而進入所述輥子5〇 之間時’在該一定大小的D可上下移動，由此可接收 和供應基板。 上述說明中，通過基板的清洗及乾燥工序對基板的輸 送裝置及方法進行了說明’但並不限於上述内$，本發明 也可適用於基板的蝕刻（Etching)及剝離（strip)工序。 如上所述，本發明疊層基板輸送裝置，把兩個輸送部 設置成一列，把其中一側輸送部設置於低端，並加大該輸 送部的輥子直&，使該大直徑輥子在自轉的同時前後做直 線運動，以此讓用於接收所述基板的緩衝裝置可進入基板 和輥子之間，從而減少了在疊層基板輸送裝置上，上下輸 送基板所需的時間。 ^ 上述的說明是對本發明實施例的詳細描述，但本發明 亚不限定於上述實施方式。在申請專利範圍和說明書及其 】0 1279375 附圖所示的範圍之内通過一 式，而這種修改應屬於本發 些修改，可實現不同的實施方 明的保護範圍。 【圖式簡單說明 體圖； 圖1是本發明疊層基板輪送裝置第-較佳實施例的立 大圖； 圖2疋本务明璺層基板輪送裝置實施例的主要部分放 視圖 圖3是本發明疊層基板輪 J V衣置貫施例的側視圖； 圖4是本發明疊層基板輪 、衣置貫施例的主視圖； 圖5是本發明疊層基板輪 汉勒适裝置第二較佳實施例的主 【主要元件符號說明】 1 架子 3 上部輸送機構 5、7 緩衝裝置 8、12 輸送機構 9 第一輸送部 10 基板處理單元 11 第二輸送部 13 支架 15 第一輸送幸昆 16 第一旋轉轴 12793751279375 IX. Description of the Invention: [Technical Field] The present invention relates to a transport apparatus for a laminated substrate, and more particularly to a laminated substrate transporting a substrate which is transported by an upper transport mechanism to a lower transport mechanism Device. [Prior Art] In general, the base plate used in the field of flat panel display (FPD: Flat Panel Dlsplay), semiconductor substrate, LCD, glass for photomask, etc., must be subjected to (four) and stripping through a series of processing procedures. After cleaning the second process, it is cleaned. When the substrate is processed and cleaned, it is necessary to use a transport device in order to transport the substrate to each step. The above-described substrate transfer device has a variety of configurations, but a transfer device for receiving/supplying a substrate horizontally is generally employed. That is, in order to feed the substrate into the φ 胄 & 种 种 装置 装置 以 以 以 以 以 以 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平 水平Transfer to other processing steps. ... and the laminated substrate conveyance m 输送 conveys the substrate through the upper conveying mechanism, passes through a buffer device that can be repeatedly moved up and down ((4) "^(4) receives/sends the substrate, and then receives/serves the substrate through the buffer device to the lower conveying mechanism However, the laminated substrate transfer device of the 24 structures is not suitable for the existing upper conveying mechanism due to the large area of the substrate. [279] SUMMARY OF THE INVENTION It is an object of the present invention to provide an improved upper conveying mechanism. The structure is a laminated substrate transporting apparatus capable of easily transporting the substrate up and down. Another object of the present invention is to increase the conveying speed of the beautiful plate by increasing the diameter of the conveying roller. By using the above-mentioned large-diameter lepton, it can be smoothly realized. Receiving or supplying the substrate. The present invention is achieved in the following manner. The laminated substrate transfer device of the present invention comprises: a shelf; is disposed on the shelf, and is capable of rotating in situ and moving back and forth for transporting the substrate Upper conveying mechanism of the roller; disposed in the vicinity of the upper conveying mechanism, movable up and down, when the conveying When it is approached, its front end can enter a space formed by a parent placed in the upper conveying mechanism and having a diameter larger than a certain value, a buffer device for receiving/supplying the substrate; The apparatus for receiving and transporting the substrate to the buffer device to transport the substrate and the substrate processing device. [Embodiment] Hereinafter, the laminated substrate transfer device of the present invention will be described in more detail with reference to the accompanying drawings and embodiments. 1 to 4, in the preferred embodiment of the present invention, a laminated substrate conveying apparatus comprising: a plurality of woods 1' arranged in a vertical and horizontal direction and forming a frame is disposed at an upper portion of the shelf 1, and Sliding thereon, an upper transfer mechanism 3 for receiving/supplying the substrate G; a lower transfer from the upper portion 1279375 for receiving/supplying the lower side of the substrate transfer mechanism 3 to the shelf Mechanism 4. After the substrate processing unit n is formed, the lower wheel transfer mechanism 40 is divided into early and independent wheeling mechanisms 8, 12 lose The machine #3 receives, or slows down: the buffer mechanism 5, 7 that supplies the substrate G to the mechanism 3. The clothes 7 are vertically movable, thereby achieving lifting. Receiving the supply from the buffer devices 5, 7. The base transport unit 9 constitutes the upper transport mechanism 3. The lower transport mechanism 4 receives the substrate g from the buffer devices 5, 7 and then transports the substrate G for cleaning. The substrate processing unit for drying the substrate 所述 can adopt a general-purpose device in the field, and thus detailed description thereof will be omitted. The first conveying portion 9 can be rotated at a specified position of the shelf 10. The returning unit is disposed in front of the first conveying unit 9, and is rotatable and movable forward and backward. In particular, the second conveying unit 1 has a lower setting position than the first conveying unit. The setting bit of the part 9. For this purpose, the first conveying portion 9 includes: at least one bracket 1 3 arranged on the two sides of the shelf i; a rotating shaft 16 which is arranged on the bracket 13 and rotatable; a rotating shaft 16 for supporting at least one first conveying roller 15 of the substrate; a connecting shaft 17 for connecting the plurality of first conveying wires 11*; for driving the plurality of first rotations The first motor unit 19 of the shaft 16. Further, one end of the plurality of first rotating shafts 16 is connected to each other via a connecting shaft i 7 1279375, and the connecting shaft 17 moves the fourth (fourth) power transmission structure 16 by a worm, a worm wheel or the like. - the rotational force of the 9 is transmitted to the first rotating shaft, and the motive * 19 temple 'rotating shaft 17 is rotated with the rotation of the rotating shaft 16 and the plurality of first conveying rollers 15 are rotated, The substrate G is moved. Under the action described above, the substrate G is supplied to the second transport light n. The second conveying roller U of the wheel: 9 and the following: comprises: _ pair of shelves 2 〇; the arranging road 21 disposed on the top of the quilt 2; the moving plate 23 arranged in front and rear linear motion. The twisting wire 6 is placed on the moving plate 23 again, and a second transfer roller 25 of the substrate G can be disposed, and a motor group 26 for rotating the second conveying roller 25 can be disposed. The shelf 2 of the transport unit 〇ά is inserted into, and the position of the clothes is lower than the position of the shelf 1 of the first rim portion 9. The track 21 includes the LM type, in the LM track. Moving the plate 23 up and down, moving the moving plate 23 back and forth along the road 2. At the upper portion of the moving plate 23, a support frame 31 is protruded upward, and a rotatable portion is arranged on the supporting frame The second rotating shaft 27 transmits power through the motor unit 26 and the belt raft. The rotating shaft 30 and the second rotating shaft 27 of the motor unit 26 are connected by a skin. The second conveying light 25 is disposed on the second rotating shaft 27. And, the second rotating shaft 27 drives the second rotating parent 25 to rotate, 8 1279375 and thus the wheel Substrate G. At this time, the second conveying roller 25 adopts a large diameter and a large roller. The diameter of the large lepton is larger than the diameter of the first conveying roller 15. That is, as shown in Fig. 3, if In the case where the diameter of the second transport roller 25 is greater than: a fixed value, when the substrate G is disposed on the second transport roller 25, a space S can be formed between the second rotating shaft 27 and the substrate G. The size of the crucible should be sufficient to allow the front end of the buffering device 5 to enter. This confirms the condition of the diameter of the second conveying roller 25. Even if the straight μ μ t of the second conveying roller 25 is only large, The position of the second conveying portion 11 is still lower than that of the first and square-shaped conveying substrates. Therefore, it is possible to receive and supply the substrate into the rotating shaft of the second shaft at the end of the reading device 5 When the space between the substrate 27 and the substrate G enters the space s, the buffer device 5 can be easily accessed. The buffer can enter the shape of the *; the lower portion can be slightly upward by the conventional method. : moving to be disposed on the side of the second transport light 25 device 5. The substrate G is moved toward the buffer As described above, when the G of the first conveying roller 9 is conveyed forward, the substrate _$ turns to 輮1丨, moves toward the 铋9 direction, and receives the Substrate ^, the inquiry < After receiving the substrate G, the moving plate 23 transports the substrate G to the buffer device $ along the lane 21 to the inch=wheel 11. The private movement & The second conveying portions U of the first conveying portion that rotates in place are arranged in a row: the position of the second conveying portion ii 1279375 can be moved back and forth and the position of the second conveying portion ii 1279375 is lower than the position of the first conveying portion 9, Large diameter rollers are used to speed up the substrate transfer. Figure 5 illustrates another embodiment of the present invention. As shown in Fig. 5, in the present embodiment, the second conveying roller 25 does not employ a large-diameter roller, but separate rotating shafts 42, 44 are employed. That is, the rotation shaft 27 of the second conveying portion U is divided into two rotation shafts 42, 44. The two rotating shafts 42, 44 are respectively disposed on the support frames 46, 48 and are rotatable. At this time, a conveying roller 50 of a normal diameter is disposed on the two rotating shafts 42, 44. A space D of a certain size is formed between the two rotating shafts 42, 44 separated by this phase. When the buffer device 49 receives the substrate and enters between the rollers 5, 'the fixed size D can be moved up and down, whereby the substrate can be received and supplied. In the above description, the substrate transfer apparatus and method have been described by the cleaning and drying process of the substrate. However, the present invention is also applicable to the etching and stripping processes of the substrate. As described above, in the laminated substrate conveying apparatus of the present invention, the two conveying portions are arranged in a row, one of the conveying portions is disposed at the lower end, and the roller of the conveying portion is enlarged and enlarged so that the large-diameter roller is The linear motion is performed before and after the rotation, so that the buffer device for receiving the substrate can enter between the substrate and the roller, thereby reducing the time required for the substrate to be transported up and down on the laminated substrate transport device. The above description is a detailed description of the embodiments of the present invention, but the present invention is not limited to the above embodiments. It is intended to be within the scope of the invention and the scope of the invention, and the scope of the invention, which is to be construed as being limited to the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a front elevational view of a first preferred embodiment of a laminated substrate transfer device of the present invention; FIG. 2 is a front view of a main portion of an embodiment of a conventional substrate substrate transfer device; 3 is a side view of a laminated substrate wheel JV garment according to the present invention; FIG. 4 is a front view of a laminated substrate wheel and a garment embodiment of the present invention; FIG. 5 is a laminated substrate wheel Hanley device of the present invention; Main part of the second preferred embodiment [Main element symbol description] 1 Shelf 3 Upper conveying mechanism 5, 7 Buffering device 8, 12 conveying mechanism 9 First conveying portion 10 Substrate processing unit 11 Second conveying portion 13 Bracket 15 First conveying Lucky kun 16 first rotating shaft 1279375

17 連接軸 19 第一電動機組 20 架子 21 軌道 23 移動板 25 第二輸送親 26 電動機組 27 第二旋轉軸 28 皮帶 3 1 支撐架 40 下部輸送機構 42、44 旋轉軸 46 > 48 支撐架 49 緩衝裝置 50 輥子 D 空間 G 基板 r 直徑 s 空間 1217 Connecting shaft 19 First motor unit 20 Shelf 21 Track 23 Moving plate 25 Second conveying pro 26 Motor unit 27 Second rotating shaft 28 Belt 3 1 Support frame 40 Lower conveying mechanism 42, 44 Rotary shaft 46 > 48 Support frame 49 Buffer device 50 roller D space G substrate r diameter s space 12

Claims (1)

1279375 十、申請專利範圍·· 1、 一種疊層基板輸送裝置，其特徵在於：其包含： 其兩端的高度不同、並設置成一列的架子； 設置於所述架子的高端，用於輸送基板的至少兩個可 旋轉的第一輸送輥； 設置於所述架子的低端並可旋轉，其直徑大於所述第 —輪送輥的直徑’用於從所述第一輸送輥接收基板的至少 兩個第二輸送輥； 用於使至少兩個所述第二輸送輥同時在所述架子的低 端進行前後移動，並可使所述基板沿水平方向移動的移動 板； 設置於所述架子的低端，且進入至少兩個所述的第二 輪送輥之間，用於接收/供應基板，並可使該基板沿垂直方 向上下移動的緩衝裝置； 通過所述緩衝裝置接收/供應所述基板，並向基板處理 單元輸送基板的下部輸送機構。 2、 如申請專利範圍第1項所述之疊層基板輸送裝置， 其特徵在於：所述的至少兩個第一輸送輥和至少兩個第二 輸送報構成上部輸送機構，其分別設置於第一旋轉轴和第 二旋轉軸，並通過電動機組實現旋轉。 3、 如申請專利範圍第1項所述之疊層基板輸送裝置， 其特徵在於：所述的至少兩個第一輸送輥設置於排歹j在所 述架子兩側上的至少兩個支架，並與用於連接至少兩個所 述的第一輸送輥的連接軸相連，以此傳遞動力。 13 1279375 4、 如申請專利範圍第1項所述之疊層基板輸送裝置， 其特徵在於··所述的至少兩個第二輸送輥設置於可在所述 架子上面的執道上滑動的移動板。 5、 如申請專利範圍第1項所述之疊層基板輸送裝置， 其将彳政在於：所述第二輸送輥的直徑大小為，當所述基板 設置於所述第二旋轉軸時，足以使所述緩衝裝置進入基板 和第二旋轉軸之間。 6、 一種疊層基板輸送裝置，其特徵在於，該裝置包含： 架子； 設置於所述架子的一側，；:店丄 通過在原地旋轉的輥子輸送 基板的第一輸送部； 設置於所述架子的另一側，並可前後移動，帶有堆積 基板用輥子，用於從所述第—輸送部接收/供應所述基板 分離設置肢連接所料絲板㈣子㈣轉軸，以形成 -定大小的空,1 ’可使所述緩衝裝置進入的第二輸送部.1279375 X. Patent Application Range 1. A laminated substrate conveying apparatus comprising: a shelf having different heights at both ends and arranged in a row; and being disposed at a high end of the shelf for transporting a substrate At least two rotatable first conveying rollers; disposed at a lower end of the shelf and rotatable, the diameter of which is greater than a diameter of the first-passing roller' for receiving at least two of the substrates from the first conveying roller a second conveying roller; a moving plate for moving at least two of the second conveying rollers at the lower end of the shelf at the same time, and moving the substrate in a horizontal direction; a buffer device for receiving/supplying a substrate between the at least two of the second transfer rollers and moving the substrate up and down in a vertical direction; receiving/producing the same by the buffer device The substrate and the lower conveying mechanism of the substrate are transported to the substrate processing unit. 2. The laminated substrate conveying apparatus according to claim 1, wherein the at least two first conveying rollers and the at least two second conveying rollers constitute an upper conveying mechanism, which are respectively disposed at the A rotating shaft and a second rotating shaft are rotated by the motor unit. 3. The laminated substrate conveying apparatus according to claim 1, wherein the at least two first conveying rollers are disposed on at least two brackets on both sides of the rack. And transmitting power to the connecting shaft for connecting at least two of the first conveying rollers. The laminated substrate conveying device according to claim 1, wherein the at least two second conveying rollers are disposed on a movable plate that can slide on the road on the shelf. . 5. The laminated substrate transport apparatus of claim 1, wherein the second transport roller has a diameter that is sufficient when the substrate is disposed on the second rotating shaft The cushioning device is caused to enter between the substrate and the second rotating shaft. 6. A laminated substrate conveying apparatus, comprising: a shelf; disposed on one side of the shelf; the store: transporting the first conveying portion of the substrate by a roller rotating in place; The other side of the shelf, and movable forward and backward, with a roller for stacking the substrate, for receiving/supplying the substrate from the first conveying portion, and separately connecting the wire (4) sub-four (4) rotating shaft of the limb to form a predetermined The size of the empty, 1 'the second conveyor can make the buffer device into. 從所述緩衝裝置接收所述基板，通過基板處理單 送基板的下部輸送機構。 51 7、如甲請專利範圍第6百 图弟6項所述之疊層基板輸送裝置， 其特徵在於：所述的第二輸送部包含： 設置於所述架子上面的執道； 设置於所述執道，並可在 工i在所述執道上滑動的 在所述移動板上，向上突出的支撐_; 扳， 分別設置於所述支撑牟卜 又伢木上，並可旋轉的 分別設置於所述的分離 疋轉軸， 、的刀離型旋轉軸，用 14 J279375 m 二輸送輥； 用於旋轉所述分離型旋轉軸的電動機組。 十一、圖式： . 如次頁The substrate is received from the buffer device, and the lower transport mechanism of the substrate is processed by the substrate. The laminated substrate conveying device according to the sixth aspect of the invention, wherein the second conveying unit comprises: an obstruction disposed on the shelf; Illustrated, and can be slid on the mobile board, the upwardly protruding support _; the wrench, respectively arranged on the support 牟 伢 伢 ,, and can be rotated separately For the separation of the rotating shaft, the knife-off rotating shaft, the 14 J279375 m two conveying roller; the motor group for rotating the separate rotating shaft. XI. Schema: . as the next page 1515
TW095112796A 2005-04-12 2006-04-11 Apparatus for transferring laminated basal plate TWI279375B (en)

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CN101339316B (en) * 2007-07-02 2010-07-28 显示器生产服务株式会社 Substrate conveyer device
WO2009090743A1 (en) * 2008-01-17 2009-07-23 Hirata Corporation Substrate transport device
TWI462215B (en) * 2010-03-29 2014-11-21 Dainippon Screen Mfg Substrate processing apparatus, changing method and transferring method
CN102602654A (en) * 2012-02-03 2012-07-25 安徽昊锐光伏新能源科技有限公司 Fixing roll stand device
CN105173619A (en) * 2014-06-06 2015-12-23 日东电工株式会社 Conveying device and conveying method
CN108357929A (en) * 2018-04-18 2018-08-03 昆山精讯电子技术有限公司 A kind of front panel migrating apparatus
CN109279305A (en) * 2018-08-27 2019-01-29 河北卓达建材研究院有限公司 A kind of turning machine for the conveying of wallboard production line mold
KR20200123349A (en) * 2019-04-19 2020-10-29 주식회사 디엠에스 Guide apparatus for substrate transfer

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