TWD208387S - 半導體製造裝置用反應管之內管 - Google Patents

半導體製造裝置用反應管之內管 Download PDF

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Publication number
TWD208387S
TWD208387S TW108305507F TW108305507F TWD208387S TW D208387 S TWD208387 S TW D208387S TW 108305507 F TW108305507 F TW 108305507F TW 108305507 F TW108305507 F TW 108305507F TW D208387 S TWD208387 S TW D208387S
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TW
Taiwan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
inner tube
reaction tube
tube
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Application number
TW108305507F
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English (en)
Chinese (zh)
Inventor
加賀谷徹
梅川純史
Original Assignee
日商國際電氣股份有限公司
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Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD208387S publication Critical patent/TWD208387S/zh

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TW108305507F 2019-03-20 2019-09-11 半導體製造裝置用反應管之內管 TWD208387S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-005924 2019-03-20
JP2019005924F JP1644260S (enExample) 2019-03-20 2019-03-20

Publications (1)

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TWD208387S true TWD208387S (zh) 2020-11-21

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TW108305507F TWD208387S (zh) 2019-03-20 2019-09-11 半導體製造裝置用反應管之內管

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US (1) USD901406S1 (enExample)
JP (1) JP1644260S (enExample)
TW (1) TWD208387S (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1731671S (ja) * 2022-03-15 2025-12-15 基板処理装置用炉
JP1731672S (ja) * 2022-03-15 2025-12-15 基板処理装置用炉
JP1731674S (ja) 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731673S (ja) 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731675S (ja) 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD193434S (zh) 2017-08-10 2018-10-11 日商日立國際電氣股份有限公司 Reaction tube

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JP3024449B2 (ja) * 1993-07-24 2000-03-21 ヤマハ株式会社 縦型熱処理炉及び熱処理方法
JPH08264521A (ja) * 1995-03-20 1996-10-11 Kokusai Electric Co Ltd 半導体製造用反応炉
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JP4523225B2 (ja) * 2002-09-24 2010-08-11 東京エレクトロン株式会社 熱処理装置
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JP4930438B2 (ja) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 反応管及び熱処理装置
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TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
JP1535455S (enExample) * 2015-02-25 2015-10-19
JP1546512S (enExample) * 2015-09-04 2016-03-22
JP1546345S (enExample) * 2015-09-04 2016-03-22
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JP1605460S (enExample) * 2017-08-09 2021-05-31
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Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
TWD193434S (zh) 2017-08-10 2018-10-11 日商日立國際電氣股份有限公司 Reaction tube

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JP1644260S (enExample) 2019-10-28
USD901406S1 (en) 2020-11-10

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