TWD193434S - Reaction tube - Google Patents

Reaction tube

Info

Publication number
TWD193434S
TWD193434S TW106307404F TW106307404F TWD193434S TW D193434 S TWD193434 S TW D193434S TW 106307404 F TW106307404 F TW 106307404F TW 106307404 F TW106307404 F TW 106307404F TW D193434 S TWD193434 S TW D193434S
Authority
TW
Taiwan
Prior art keywords
reaction tube
item
entirety
transparent body
design description
Prior art date
Application number
TW106307404F
Other languages
English (en)
Inventor
岡嶋優作
吉田秀成
西堂周平
史
三村英俊
Original Assignee
日商日立國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立國際電氣股份有限公司 filed Critical 日商日立國際電氣股份有限公司
Publication of TWD193434S publication Critical patent/TWD193434S/zh

Links

Abstract

【物品用途】;(省略之);【設計說明】;本物品的整體是利用透明體所形成。

Description

反應管
本物品的整體是利用透明體所形成。
TW106307404F 2017-08-10 2017-12-18 Reaction tube TWD193434S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2017-17353F JP1605461S (zh) 2017-08-10 2017-08-10
JP2017-017353 2017-08-10

Publications (1)

Publication Number Publication Date
TWD193434S true TWD193434S (zh) 2018-10-11

Family

ID=62238961

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106307404F TWD193434S (zh) 2017-08-10 2017-12-18 Reaction tube

Country Status (3)

Country Link
US (1) USD842823S1 (zh)
JP (1) JP1605461S (zh)
TW (1) TWD193434S (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD208387S (zh) 2019-03-20 2020-11-21 日商國際電氣股份有限公司 半導體製造裝置用反應管之內管

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Publication number Priority date Publication date Assignee Title
JP1624562S (zh) * 2018-06-15 2019-02-18
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1678273S (ja) * 2020-03-10 2021-02-01 反応管
JP1731674S (zh) * 2022-05-30 2022-12-08
JP1731675S (zh) * 2022-05-30 2022-12-08
JP1731673S (zh) * 2022-05-30 2022-12-08

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JP3024449B2 (ja) * 1993-07-24 2000-03-21 ヤマハ株式会社 縦型熱処理炉及び熱処理方法
JPH08264521A (ja) * 1995-03-20 1996-10-11 Kokusai Electric Co Ltd 半導体製造用反応炉
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
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JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
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USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP4930438B2 (ja) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 反応管及び熱処理装置
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
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TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
JP1535455S (zh) * 2015-02-25 2015-10-19
JP1546512S (zh) * 2015-09-04 2016-03-22
JP1546345S (zh) * 2015-09-04 2016-03-22
JP1563524S (zh) * 2016-03-30 2016-11-21

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD208387S (zh) 2019-03-20 2020-11-21 日商國際電氣股份有限公司 半導體製造裝置用反應管之內管

Also Published As

Publication number Publication date
JP1605461S (zh) 2021-05-31
USD842823S1 (en) 2019-03-12

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