TWD208387S - Inner tube of reaction tube for semiconductor manufacturing equipment - Google Patents
Inner tube of reaction tube for semiconductor manufacturing equipment Download PDFInfo
- Publication number
- TWD208387S TWD208387S TW108305507F TW108305507F TWD208387S TW D208387 S TWD208387 S TW D208387S TW 108305507 F TW108305507 F TW 108305507F TW 108305507 F TW108305507 F TW 108305507F TW D208387 S TWD208387 S TW D208387S
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor manufacturing
- manufacturing equipment
- inner tube
- reaction tube
- tube
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 239000004065 semiconductor Substances 0.000 title abstract description 7
Images
Abstract
【物品用途】;本物品係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。;【設計說明】;本創作係有關於一種半導體製造裝置用反應管之內管之新穎設計。;本創作之半導體製造裝置用反應管之內管如附圖所示,其整體外形設計新穎美觀,為根據使用機能所作之最佳與最合理之設計,於申請前未見於刊物亦未公開使用,符合設計專利要件。;本物品係整體以透明體所形成。[Use of article]: This article is an inner tube installed inside a reaction tube used in semiconductor manufacturing equipment. ;[Design Description];This creation is about a novel design of the inner tube of a reaction tube for semiconductor manufacturing equipment. ;The inner tube of the reaction tube for semiconductor manufacturing equipment of this invention is as shown in the attached figure. Its overall appearance design is novel and beautiful. It is the best and most reasonable design based on the use function. It has not been seen in publications and has not been used publicly before the application. , meets the design patent requirements. ;This product is made entirely of a transparent body.
Description
本物品係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。This article is an inner tube used by being installed on the inside of a reaction tube, and the reaction tube is used in a semiconductor manufacturing device.
本創作係有關於一種半導體製造裝置用反應管之內管之新穎設計。This creation is about a novel design of the inner tube of a reaction tube used in semiconductor manufacturing equipment.
本創作之半導體製造裝置用反應管之內管如附圖所示,其整體外形設計新穎美觀,為根據使用機能所作之最佳與最合理之設計,於申請前未見於刊物亦未公開使用,符合設計專利要件。The inner tube of the reaction tube used in the semiconductor manufacturing device of this creation is shown in the attached drawings. Its overall shape design is novel and beautiful. It is the best and most reasonable design based on the use function. It has not been seen in the publication or used before the application. Meet the design patent requirements.
本物品係整體以透明體所形成。This article is formed by a transparent body as a whole.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019005924F JP1644260S (en) | 2019-03-20 | 2019-03-20 | |
| JP2019-005924 | 2019-03-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD208387S true TWD208387S (en) | 2020-11-21 |
Family
ID=68297037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108305507F TWD208387S (en) | 2019-03-20 | 2019-09-11 | Inner tube of reaction tube for semiconductor manufacturing equipment |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD901406S1 (en) |
| JP (1) | JP1644260S (en) |
| TW (1) | TWD208387S (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| JP1731672S (en) * | 2022-03-15 | 2025-12-15 | Furnace for substrate processing equipment | |
| JP1731671S (en) * | 2022-03-15 | 2025-12-15 | Furnace for substrate processing equipment | |
| JP1731674S (en) | 2022-05-30 | 2025-12-15 | Inner tubes for reaction tubes in semiconductor manufacturing equipment | |
| JP1731675S (en) | 2022-05-30 | 2025-12-15 | Inner tubes for reaction tubes in semiconductor manufacturing equipment | |
| JP1731673S (en) | 2022-05-30 | 2025-12-15 | Inner tubes for reaction tubes in semiconductor manufacturing equipment |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD193434S (en) | 2017-08-10 | 2018-10-11 | 日商日立國際電氣股份有限公司 | Reaction tube |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR890008922A (en) * | 1987-11-21 | 1989-07-13 | 후세 노보루 | Heat treatment device |
| JP3024449B2 (en) * | 1993-07-24 | 2000-03-21 | ヤマハ株式会社 | Vertical heat treatment furnace and heat treatment method |
| JPH08264521A (en) * | 1995-03-20 | 1996-10-11 | Kokusai Electric Co Ltd | Reactor for semiconductor manufacturing |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD417438S (en) * | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube |
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| USD404368S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
| JP2000243747A (en) * | 1999-02-18 | 2000-09-08 | Kokusai Electric Co Ltd | Substrate processing equipment |
| KR100360401B1 (en) * | 2000-03-17 | 2002-11-13 | 삼성전자 주식회사 | Process tube having a slit type process gas injection portion and a waste gas exhaust portion of multi hole type and apparatus for semiconductor fabricating |
| JP3985899B2 (en) * | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | Substrate processing equipment |
| JP4523225B2 (en) * | 2002-09-24 | 2010-08-11 | 東京エレクトロン株式会社 | Heat treatment equipment |
| TWD104755S1 (en) * | 2003-11-04 | 2005-05-21 | 東京威力科創股份有限公司 | Process tube for semiconductor device manufacturing apparatus |
| TWD105531S1 (en) * | 2003-11-04 | 2005-07-11 | 東京威力科創股份有限公司 | Process tube for semiconductor device manufacturing apparatus |
| US7836919B2 (en) * | 2005-10-03 | 2010-11-23 | Tubemaster Inc. | Device for loading chemical reactor tubes |
| JP5157100B2 (en) * | 2006-08-04 | 2013-03-06 | 東京エレクトロン株式会社 | Film forming apparatus and film forming method |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| TWD125600S1 (en) * | 2006-10-12 | 2008-10-21 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
| JP5096182B2 (en) * | 2008-01-31 | 2012-12-12 | 東京エレクトロン株式会社 | Heat treatment furnace |
| TWD143034S1 (en) * | 2008-03-28 | 2011-10-01 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
| JP4930438B2 (en) * | 2008-04-03 | 2012-05-16 | 東京エレクトロン株式会社 | Reaction tube and heat treatment equipment |
| TWD133943S1 (en) * | 2008-05-09 | 2010-03-21 | 日立國際電氣股份有限公司 | Reaction tube |
| USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| TWD167986S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
| TWD167987S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| TWD168774S (en) * | 2013-06-28 | 2015-07-01 | 日立國際電氣股份有限公司 | part of reaction tube |
| JP1535455S (en) * | 2015-02-25 | 2015-10-19 | ||
| JP1546345S (en) * | 2015-09-04 | 2016-03-22 | ||
| JP1546512S (en) * | 2015-09-04 | 2016-03-22 | ||
| JP1563524S (en) * | 2016-03-30 | 2016-11-21 | ||
| JP1605460S (en) * | 2017-08-09 | 2021-05-31 | ||
| JP1605982S (en) * | 2017-12-27 | 2021-05-31 |
-
2019
- 2019-03-20 JP JP2019005924F patent/JP1644260S/ja active Active
- 2019-09-09 US US29/705,011 patent/USD901406S1/en active Active
- 2019-09-11 TW TW108305507F patent/TWD208387S/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD193434S (en) | 2017-08-10 | 2018-10-11 | 日商日立國際電氣股份有限公司 | Reaction tube |
Also Published As
| Publication number | Publication date |
|---|---|
| USD901406S1 (en) | 2020-11-10 |
| JP1644260S (en) | 2019-10-28 |
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