TWD208387S - Inner tube of reaction tube for semiconductor manufacturing equipment - Google Patents

Inner tube of reaction tube for semiconductor manufacturing equipment Download PDF

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Publication number
TWD208387S
TWD208387S TW108305507F TW108305507F TWD208387S TW D208387 S TWD208387 S TW D208387S TW 108305507 F TW108305507 F TW 108305507F TW 108305507 F TW108305507 F TW 108305507F TW D208387 S TWD208387 S TW D208387S
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TW
Taiwan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
inner tube
reaction tube
tube
Prior art date
Application number
TW108305507F
Other languages
Chinese (zh)
Inventor
加賀谷徹
梅川純史
Original Assignee
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD208387S publication Critical patent/TWD208387S/en

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Abstract

【物品用途】;本物品係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。;【設計說明】;本創作係有關於一種半導體製造裝置用反應管之內管之新穎設計。;本創作之半導體製造裝置用反應管之內管如附圖所示,其整體外形設計新穎美觀,為根據使用機能所作之最佳與最合理之設計,於申請前未見於刊物亦未公開使用,符合設計專利要件。;本物品係整體以透明體所形成。[Use of article]: This article is an inner tube installed inside a reaction tube used in semiconductor manufacturing equipment. ;[Design Description];This creation is about a novel design of the inner tube of a reaction tube for semiconductor manufacturing equipment. ;The inner tube of the reaction tube for semiconductor manufacturing equipment of this invention is as shown in the attached figure. Its overall appearance design is novel and beautiful. It is the best and most reasonable design based on the use function. It has not been seen in publications and has not been used publicly before the application. , meets the design patent requirements. ;This product is made entirely of a transparent body.

Description

半導體製造裝置用反應管之內管Inner tube of reaction tube for semiconductor manufacturing equipment

本物品係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。This article is an inner tube used by being installed on the inside of a reaction tube, and the reaction tube is used in a semiconductor manufacturing device.

本創作係有關於一種半導體製造裝置用反應管之內管之新穎設計。This creation is about a novel design of the inner tube of a reaction tube used in semiconductor manufacturing equipment.

本創作之半導體製造裝置用反應管之內管如附圖所示,其整體外形設計新穎美觀,為根據使用機能所作之最佳與最合理之設計,於申請前未見於刊物亦未公開使用,符合設計專利要件。The inner tube of the reaction tube used in the semiconductor manufacturing device of this creation is shown in the attached drawings. Its overall shape design is novel and beautiful. It is the best and most reasonable design based on the use function. It has not been seen in the publication or used before the application. Meet the design patent requirements.

本物品係整體以透明體所形成。This article is formed by a transparent body as a whole.

TW108305507F 2019-03-20 2019-09-11 Inner tube of reaction tube for semiconductor manufacturing equipment TWD208387S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019005924F JP1644260S (en) 2019-03-20 2019-03-20
JP2019-005924 2019-03-20

Publications (1)

Publication Number Publication Date
TWD208387S true TWD208387S (en) 2020-11-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW108305507F TWD208387S (en) 2019-03-20 2019-09-11 Inner tube of reaction tube for semiconductor manufacturing equipment

Country Status (3)

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US (1) USD901406S1 (en)
JP (1) JP1644260S (en)
TW (1) TWD208387S (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1731672S (en) * 2022-03-15 2025-12-15 Furnace for substrate processing equipment
JP1731671S (en) * 2022-03-15 2025-12-15 Furnace for substrate processing equipment
JP1731674S (en) 2022-05-30 2025-12-15 Inner tubes for reaction tubes in semiconductor manufacturing equipment
JP1731675S (en) 2022-05-30 2025-12-15 Inner tubes for reaction tubes in semiconductor manufacturing equipment
JP1731673S (en) 2022-05-30 2025-12-15 Inner tubes for reaction tubes in semiconductor manufacturing equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD193434S (en) 2017-08-10 2018-10-11 日商日立國際電氣股份有限公司 Reaction tube

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR890008922A (en) * 1987-11-21 1989-07-13 후세 노보루 Heat treatment device
JP3024449B2 (en) * 1993-07-24 2000-03-21 ヤマハ株式会社 Vertical heat treatment furnace and heat treatment method
JPH08264521A (en) * 1995-03-20 1996-10-11 Kokusai Electric Co Ltd Reactor for semiconductor manufacturing
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD404368S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Outer tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
JP2000243747A (en) * 1999-02-18 2000-09-08 Kokusai Electric Co Ltd Substrate processing equipment
KR100360401B1 (en) * 2000-03-17 2002-11-13 삼성전자 주식회사 Process tube having a slit type process gas injection portion and a waste gas exhaust portion of multi hole type and apparatus for semiconductor fabricating
JP3985899B2 (en) * 2002-03-28 2007-10-03 株式会社日立国際電気 Substrate processing equipment
JP4523225B2 (en) * 2002-09-24 2010-08-11 東京エレクトロン株式会社 Heat treatment equipment
TWD104755S1 (en) * 2003-11-04 2005-05-21 東京威力科創股份有限公司 Process tube for semiconductor device manufacturing apparatus
TWD105531S1 (en) * 2003-11-04 2005-07-11 東京威力科創股份有限公司 Process tube for semiconductor device manufacturing apparatus
US7836919B2 (en) * 2005-10-03 2010-11-23 Tubemaster Inc. Device for loading chemical reactor tubes
JP5157100B2 (en) * 2006-08-04 2013-03-06 東京エレクトロン株式会社 Film forming apparatus and film forming method
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
TWD125600S1 (en) * 2006-10-12 2008-10-21 東京威力科創股份有限公司 Processing tubes for semiconductor manufacturing
JP5096182B2 (en) * 2008-01-31 2012-12-12 東京エレクトロン株式会社 Heat treatment furnace
TWD143034S1 (en) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 Processing tubes for semiconductor manufacturing
JP4930438B2 (en) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 Reaction tube and heat treatment equipment
TWD133943S1 (en) * 2008-05-09 2010-03-21 日立國際電氣股份有限公司 Reaction tube
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD724551S1 (en) * 2011-11-18 2015-03-17 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
TWD167986S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD167987S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD168774S (en) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 part of reaction tube
JP1535455S (en) * 2015-02-25 2015-10-19
JP1546345S (en) * 2015-09-04 2016-03-22
JP1546512S (en) * 2015-09-04 2016-03-22
JP1563524S (en) * 2016-03-30 2016-11-21
JP1605460S (en) * 2017-08-09 2021-05-31
JP1605982S (en) * 2017-12-27 2021-05-31

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD193434S (en) 2017-08-10 2018-10-11 日商日立國際電氣股份有限公司 Reaction tube

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Publication number Publication date
USD901406S1 (en) 2020-11-10
JP1644260S (en) 2019-10-28

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