JP1731675S - - Google Patents

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Publication number
JP1731675S
JP1731675S JP2022011411F JP2022011411F JP1731675S JP 1731675 S JP1731675 S JP 1731675S JP 2022011411 F JP2022011411 F JP 2022011411F JP 2022011411 F JP2022011411 F JP 2022011411F JP 1731675 S JP1731675 S JP 1731675S
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022011411F
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Japanese (ja)
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Publication date
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Priority to JP2022011411F priority Critical patent/JP1731675S/ja
Priority to US29/861,194 priority patent/USD1019583S1/en
Application granted granted Critical
Publication of JP1731675S publication Critical patent/JP1731675S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2022011411F 2022-05-30 2022-05-30 Active JP1731675S (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022011411F JP1731675S (en) 2022-05-30 2022-05-30
US29/861,194 USD1019583S1 (en) 2022-05-30 2022-11-28 Inner tube of reaction tube for semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022011411F JP1731675S (en) 2022-05-30 2022-05-30

Publications (1)

Publication Number Publication Date
JP1731675S true JP1731675S (en) 2022-12-08

Family

ID=84322292

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022011411F Active JP1731675S (en) 2022-05-30 2022-05-30

Country Status (2)

Country Link
US (1) USD1019583S1 (en)
JP (1) JP1731675S (en)

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5637153A (en) * 1993-04-30 1997-06-10 Tokyo Electron Limited Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405430S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD551634S1 (en) * 2005-02-28 2007-09-25 Tokyo Electron Limited Wafer-boat for heat-processing of semiconductor wafers
USD552047S1 (en) * 2005-02-28 2007-10-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP4331768B2 (en) * 2007-02-28 2009-09-16 東京エレクトロン株式会社 Heat treatment furnace and vertical heat treatment equipment
US8023806B2 (en) * 2007-03-20 2011-09-20 Tokyo Electron Limited Heat processing furnace and vertical-type heat processing apparatus
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
US8398773B2 (en) * 2011-01-21 2013-03-19 Asm International N.V. Thermal processing furnace and liner for the same
USD724551S1 (en) * 2011-11-18 2015-03-17 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
USD720308S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
TWD166332S (en) * 2013-03-22 2015-03-01 日立國際電氣股份有限公司 Part of the wafer boat for substrate processing equipment
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD167986S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD168774S (en) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 part of reaction tube
TWD167985S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD167987S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD167988S (en) * 2013-07-29 2015-05-21 日立國際電氣股份有限公司 Wafer boats for semiconductor manufacturing equipment
TWD168827S (en) * 2013-07-29 2015-07-01 日立國際電氣股份有限公司 Wafer boats for semiconductor manufacturing equipment
JP1535455S (en) * 2015-02-25 2015-10-19
JP1546512S (en) * 2015-09-04 2016-03-22
JP1546345S (en) * 2015-09-04 2016-03-22
JP1563649S (en) * 2016-02-12 2016-11-21
JP1563524S (en) 2016-03-30 2016-11-21
JP1605460S (en) * 2017-08-09 2021-05-31
JP1605461S (en) * 2017-08-10 2021-05-31
JP1605462S (en) * 2017-08-10 2021-05-31
JP1605982S (en) * 2017-12-27 2021-05-31
USD846514S1 (en) * 2018-05-03 2019-04-23 Kokusai Electric Corporation Boat of substrate processing apparatus
USD847105S1 (en) * 2018-05-03 2019-04-30 Kokusai Electric Corporation Boat of substrate processing apparatus
JP6856576B2 (en) * 2018-05-25 2021-04-07 株式会社Kokusai Electric Substrate processing equipment, semiconductor equipment manufacturing methods and programs
JP1638282S (en) * 2018-09-20 2019-08-05
JP1640260S (en) * 2018-11-19 2019-09-02
JP1644260S (en) 2019-03-20 2019-10-28
JP1658652S (en) * 2019-08-07 2020-04-27
JP1665228S (en) * 2019-11-28 2020-08-03
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1678273S (en) * 2020-03-10 2021-02-01 reaction tube
JP1678278S (en) * 2020-03-19 2021-02-01 Boat for substrate processing equipment
JP7461490B2 (en) * 2020-09-28 2024-04-03 株式会社Kokusai Electric Temperature control method, semiconductor device manufacturing method, program and substrate processing equipment
JP1700777S (en) * 2021-03-15 2021-11-29

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