TW593603B - Waveguide and composition - Google Patents

Waveguide and composition Download PDF

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Publication number
TW593603B
TW593603B TW091106117A TW91106117A TW593603B TW 593603 B TW593603 B TW 593603B TW 091106117 A TW091106117 A TW 091106117A TW 91106117 A TW91106117 A TW 91106117A TW 593603 B TW593603 B TW 593603B
Authority
TW
Taiwan
Prior art keywords
composition
hydroxyphenyl
oligomer
silsesquioxane
weight
Prior art date
Application number
TW091106117A
Other languages
English (en)
Chinese (zh)
Inventor
James G Shelnut
Matthew L Moynihan
Original Assignee
Shipley Co Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Llc filed Critical Shipley Co Llc
Application granted granted Critical
Publication of TW593603B publication Critical patent/TW593603B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
TW091106117A 2001-03-29 2002-03-28 Waveguide and composition TW593603B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom

Publications (1)

Publication Number Publication Date
TW593603B true TW593603B (en) 2004-06-21

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091106117A TW593603B (en) 2001-03-29 2002-03-28 Waveguide and composition

Country Status (7)

Country Link
US (1) US6731857B2 (https=)
EP (1) EP1251155B1 (https=)
JP (1) JP4557487B2 (https=)
KR (1) KR100831937B1 (https=)
CN (1) CN1277886C (https=)
DE (1) DE60208628T2 (https=)
TW (1) TW593603B (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI398732B (zh) * 2004-04-14 2013-06-11 羅門哈斯電子材料有限公司 波導組成物及自其形成之波導
TWI420133B (zh) * 2006-07-21 2013-12-21 Tokyo Ohka Kogyo Co Ltd 高折射率構件及影像感測器

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US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
EP1405446A4 (en) * 2001-07-06 2006-07-19 Viasystems Group Inc SYSTEM AND METHOD FOR INTEGRATING OPTICAL LAYERS IN A PRINTED CIRCUIT BOARD FOR CARD COMMUNICATIONS
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US6856745B2 (en) * 2002-07-02 2005-02-15 Lucent Technologies Inc. Waveguide and applications therefor
JP4014519B2 (ja) * 2002-07-17 2007-11-28 日東電工株式会社 ポリマー光導波路の製造方法
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
JP2004185000A (ja) * 2002-12-02 2004-07-02 Rohm & Haas Electronic Materials Llc 導波路を形成する方法及びそれから形成される導波路
JP2005092177A (ja) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc 光学部品形成方法
KR100869882B1 (ko) * 2003-10-07 2008-11-24 히다치 가세고교 가부시끼가이샤 방사선 경화성 조성물, 경화막 형성방법 및 패턴 형성방법
US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 導波路組成物およびこれから形成された導波路
JP2005181958A (ja) * 2003-12-22 2005-07-07 Rohm & Haas Electronic Materials Llc レーザーアブレーションを用いる電子部品および光学部品の形成方法
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
EP1772482B1 (en) * 2004-04-14 2009-06-17 Rohm and Haas Electronic Materials, L.L.C. Waveguide compositions and waveguides formed therefrom
US20050272179A1 (en) * 2004-05-24 2005-12-08 Andrew Frauenglass Three-dimensional lithographic fabrication technique
TWI294258B (en) * 2004-08-03 2008-03-01 Rohm & Haas Elect Mat Methods of forming devices having optical functionality
TW200623993A (en) * 2004-08-19 2006-07-01 Rohm & Haas Elect Mat Methods of forming printed circuit boards
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
DE602005011393D1 (de) * 2004-12-22 2009-01-15 Rohm & Haas Elect Mat Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen
DE602005010378D1 (de) * 2004-12-22 2008-11-27 Rohm & Haas Elect Mat Verfahren zur Herstellung optischer Vorrichtungen mit Polymerschichten
JP2006178466A (ja) * 2004-12-22 2006-07-06 Rohm & Haas Electronic Materials Llc 光学乾燥フィルム及び乾燥フィルムを有する光学デバイス形成方法
KR20070103069A (ko) * 2005-02-15 2007-10-22 알피오 피티와이 리미티드 중합체 물질의 포토리소그래픽 패턴화
EP1693484A3 (en) * 2005-02-15 2007-06-20 Rohm and Haas Electronic Materials, L.L.C. Plating Method
US7212723B2 (en) * 2005-02-19 2007-05-01 The Regents Of The University Of Colorado Monolithic waveguide arrays
US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
EP1950587B1 (en) * 2006-12-31 2017-11-08 Rohm and Haas Electronic Materials LLC Methods of forming printed circuit boards having embedded optical waveguides
US8415010B2 (en) * 2008-10-20 2013-04-09 Molecular Imprints, Inc. Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
JP7753219B2 (ja) * 2019-12-31 2025-10-14 ドンジン セミケム カンパニー リミテッド シルセスキオキサンオリゴマーを含む湿式コーティング用撥水コーティング組成物

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI398732B (zh) * 2004-04-14 2013-06-11 羅門哈斯電子材料有限公司 波導組成物及自其形成之波導
TWI420133B (zh) * 2006-07-21 2013-12-21 Tokyo Ohka Kogyo Co Ltd 高折射率構件及影像感測器
US8760763B2 (en) 2006-07-21 2014-06-24 Tokyo Ohka Kogyo Co., Ltd. High refractive index material

Also Published As

Publication number Publication date
DE60208628T2 (de) 2006-11-02
JP2003048984A (ja) 2003-02-21
US6731857B2 (en) 2004-05-04
KR100831937B1 (ko) 2008-05-23
DE60208628D1 (de) 2006-04-06
CN1399439A (zh) 2003-02-26
KR20020077168A (ko) 2002-10-11
US20020172492A1 (en) 2002-11-21
CN1277886C (zh) 2006-10-04
JP4557487B2 (ja) 2010-10-06
EP1251155A1 (en) 2002-10-23
EP1251155B1 (en) 2006-01-11

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