DE60208628T2 - Verfahren zur Herstellung von Lichtwellenleitern unter Verwendung einer Silsesquioxanzusammensetzung - Google Patents

Verfahren zur Herstellung von Lichtwellenleitern unter Verwendung einer Silsesquioxanzusammensetzung Download PDF

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Publication number
DE60208628T2
DE60208628T2 DE60208628T DE60208628T DE60208628T2 DE 60208628 T2 DE60208628 T2 DE 60208628T2 DE 60208628 T DE60208628 T DE 60208628T DE 60208628 T DE60208628 T DE 60208628T DE 60208628 T2 DE60208628 T2 DE 60208628T2
Authority
DE
Germany
Prior art keywords
hydroxyphenyl
silsesquioxane
core
cladding
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60208628T
Other languages
German (de)
English (en)
Other versions
DE60208628D1 (de
Inventor
James G. Northboro Shelnut
Matthew L. Sterling Moynihan
George G. Jefferson Barclay
Dana A. Gronbeck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
DuPont Electronic Materials International LLC
Original Assignee
Shipley Co Inc
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc, Shipley Co LLC filed Critical Shipley Co Inc
Application granted granted Critical
Publication of DE60208628D1 publication Critical patent/DE60208628D1/de
Publication of DE60208628T2 publication Critical patent/DE60208628T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
DE60208628T 2001-03-29 2002-03-27 Verfahren zur Herstellung von Lichtwellenleitern unter Verwendung einer Silsesquioxanzusammensetzung Expired - Lifetime DE60208628T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
US821527 2001-03-29

Publications (2)

Publication Number Publication Date
DE60208628D1 DE60208628D1 (de) 2006-04-06
DE60208628T2 true DE60208628T2 (de) 2006-11-02

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60208628T Expired - Lifetime DE60208628T2 (de) 2001-03-29 2002-03-27 Verfahren zur Herstellung von Lichtwellenleitern unter Verwendung einer Silsesquioxanzusammensetzung

Country Status (7)

Country Link
US (1) US6731857B2 (https=)
EP (1) EP1251155B1 (https=)
JP (1) JP4557487B2 (https=)
KR (1) KR100831937B1 (https=)
CN (1) CN1277886C (https=)
DE (1) DE60208628T2 (https=)
TW (1) TW593603B (https=)

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US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
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EP1586603B1 (en) * 2004-04-14 2007-06-13 Rohm and Haas Electronic Materials LLC Waveguide compositions and waveguides formed therefrom
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US20050272179A1 (en) * 2004-05-24 2005-12-08 Andrew Frauenglass Three-dimensional lithographic fabrication technique
TWI294258B (en) * 2004-08-03 2008-03-01 Rohm & Haas Elect Mat Methods of forming devices having optical functionality
TW200623993A (en) * 2004-08-19 2006-07-01 Rohm & Haas Elect Mat Methods of forming printed circuit boards
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
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DE602005010378D1 (de) * 2004-12-22 2008-11-27 Rohm & Haas Elect Mat Verfahren zur Herstellung optischer Vorrichtungen mit Polymerschichten
JP2006178466A (ja) * 2004-12-22 2006-07-06 Rohm & Haas Electronic Materials Llc 光学乾燥フィルム及び乾燥フィルムを有する光学デバイス形成方法
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EP1693484A3 (en) * 2005-02-15 2007-06-20 Rohm and Haas Electronic Materials, L.L.C. Plating Method
US7212723B2 (en) * 2005-02-19 2007-05-01 The Regents Of The University Of Colorado Monolithic waveguide arrays
US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
JP5586820B2 (ja) * 2006-07-21 2014-09-10 東京応化工業株式会社 高屈折率材料
EP1950587B1 (en) * 2006-12-31 2017-11-08 Rohm and Haas Electronic Materials LLC Methods of forming printed circuit boards having embedded optical waveguides
US8415010B2 (en) * 2008-10-20 2013-04-09 Molecular Imprints, Inc. Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
JP7753219B2 (ja) * 2019-12-31 2025-10-14 ドンジン セミケム カンパニー リミテッド シルセスキオキサンオリゴマーを含む湿式コーティング用撥水コーティング組成物

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Also Published As

Publication number Publication date
JP2003048984A (ja) 2003-02-21
US6731857B2 (en) 2004-05-04
KR100831937B1 (ko) 2008-05-23
DE60208628D1 (de) 2006-04-06
CN1399439A (zh) 2003-02-26
KR20020077168A (ko) 2002-10-11
US20020172492A1 (en) 2002-11-21
CN1277886C (zh) 2006-10-04
JP4557487B2 (ja) 2010-10-06
EP1251155A1 (en) 2002-10-23
TW593603B (en) 2004-06-21
EP1251155B1 (en) 2006-01-11

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