TW563213B - Semiconductor device and its manufacturing method, circuit board and electronic machine - Google Patents
Semiconductor device and its manufacturing method, circuit board and electronic machine Download PDFInfo
- Publication number
- TW563213B TW563213B TW088115417A TW88115417A TW563213B TW 563213 B TW563213 B TW 563213B TW 088115417 A TW088115417 A TW 088115417A TW 88115417 A TW88115417 A TW 88115417A TW 563213 B TW563213 B TW 563213B
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- semiconductor device
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Classifications
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- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
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- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
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Description
563213 A7 B7 五、發明說明(1 ) (發明所屬技術領域) (請先閱讀背面之注意事項再填寫本頁) 本發明關於半導體裝置及其製造方法、電路基板及電 子機器。 (背景技術) 近年來隨電子機器之小型化,多數半導體晶片組成之 多模組之開發被進行。又,依據多模組,可使用既存之多 數半導體晶片,較新設計之積體電路更能降低成本。 但是,目前之多模組,係藉導線接合連接基板之配線 圖型與半導體晶片之電極。因此,配線圖型上,需具與導 線接合之接合焊墊,基板面積變大,不足以應付封裝小型 化之要求。 本發明係爲解決上述問題點’目的在於提供一種多數 半導體元件以高密度組裝之小型半導體裝置及其製造方法 ,電路基板及電子機器。 (發明之揭示) 經濟部智慧財產局員工消費合作社印製 本發明之半導體裝置’係具有: 具電極,並列於平面方向面朝下接合的多數半導體元 件; 形成具連接於上述半導體元件之上述電極之接合部’ 及電連接上述接合部之平坦部的配線圖型之基板;及 設於上述平坦部的外部電極。 依本發明,多數半導體元件並列於平面方向搭載於基 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -4 · 經濟部智慧財產局員工消費合作社印製 563213 A7 _ B7 五、發明說明(2 ) 板’各半導體元件以面朝下接合。因此,於半導體元件之 領域內進行接合,基板面積可縮至必要最低限。可實現半 導體裝置之小型化。 • ( 2 )於該半導體裝置中, 上述各外部電極可設於上述半導體元件之搭載領域內 〇 依此則對應各半導體元件之電極,可於半導體元件對 應之領域內設外部電極。 (3 )於該半導體裝置中’所有外部電極可設於所有 半導體元件對應領域之外側。 如此則可於基板外周端部配列外部電極。 (4 )於該半導體裝置中,上述基板爲可撓性基板, 形成較搭載上述多數半導體元件之領域大,可於外周端部 設有平坦保持構件。 如此則即使使用可撓性基板,亦可藉平坦保持構件確 保外部電極之高度平坦性。 (5 )於該半導體裝置中,所有外部電極可僅設於任 一半導體元件對應之領域內。 依此,於任一半導體元件對應領域內設所有外部電極 ,其他以外半導體元件對應領域內不設外部電極。 (6 )於該半導體裝置中,上述基板爲可撓性基板, 一部分被彎曲, 於設有上述外部電極之領域所對應上述1個半導體元 件中之電極之形成面之相反側之面,係與其餘半導體元件 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公嫠) -5 - --·---U---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 563213 A7 __ B7 五、發明說明(3 ) 中之至少1個之上述電極之形成面之相反側之面接著。 依此則於半導體元件上接著其他半導體元件,故可縮 小半導體裝置之平面方向尺寸。 • ( 7 )於該半導體裝置中,上述基板,可沿彎曲領域 形成至少1個孔。 依此,於基板形成孔,可縮小基板彈力,維持彎曲狀 態。 (8 )於該半導體裝置中,上述孔,係沿彎曲線延伸 之長孔, 上述配線圖型係通過上述孔上形成,上述長孔之沿上 述彎曲線延伸之邊,係成爲外形端之一部分。 依此,藉長孔之邊形成半導體裝置之外形端之一部分 ,故可正確決定端部之位置。 (9)於該半導體裝置中, 上述孔形成多數, 上述配線圖型係通過上述多數孔上形成, 上述多數孔,爲沿彎曲線延伸之長孔,並列形成亦可 0 如此則基板容易彎曲。 (1 0 )於該半導體裝置中, 上述基板,係沿彎曲領域形成有間隙, 基板依該間隙被切斷,於對向之切斷端部間隔開間隔 亦可。 如此則切斷之基板設爲一體時’該基板容易彎曲。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -6 - --·----Γ--------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) Α7 Β7 經濟部智慧財產局員工消費合作社印製 563213 五、發明說明(4 ) (11)於該半導體裝置中, 亦可設有橫跨上述間隙之連接構件。 依此,藉連接構件可補強基板之彎曲部分。 • (12)於該半導體裝置中, 介由上述孔,於上述配線圖型設具柔軟性之樹脂, 上述樹脂係與上述基板同時彎曲亦可。 如此則藉樹脂可補強基板之彎曲部分。 (13) 於該半導體裝置中, 介由導電性或熱傳導性接著劑,使上述半導體元件接 著亦可。 使用導電性接著劑時,接著之半導體元件表面之電位 可設爲相同,使用熱傳導性接著劑時,可使發熱量大之半 導體元件之熱傳至發熱量少之半導體元件以冷卻之。 (14) 於該半導體裝置中, 上述半導體元件中之一個,其平面積較其他半導體元 件爲大, 上述外部電極,僅設於上述平面積較大半導體元件對 應之領域亦可。 如此則在不超過半導體元件之平面積之範圍內可確保 最大之外部電極之設置領域。 (15) 於該半導體裝置其中, 上述半導體元件之電極,係介由接著劑分散有導電粒 子之異方性導電材料連接上述接合部。 依此,藉異方性導電材料使接合部與電極導通,則可 本^張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
563213 A7 _B7 五、發明說明(6 ) 如此則即使使用可撓性基板,亦可確保外部電極之高 度之平坦性。令所有外部電極設於所有半導體元件對應領 域外側時,於平坦保持構件之黏著領域設外部電極亦可。 (1 8)於該半導體裝置之製造方法中, 將上述半導體元件搭載於基板之工程後,包含令上述 基板之一部分彎曲,使任一上述半導體元件中之電極形成 面之相反側之面,與其他1個上述半導體元件中之電極形 成面之相反側之面接著的工程亦可。 依此則可於半導體元件上接著其他半導體元件,可以 縮小半導體裝置之平面方向尺寸。 (1 9 )於該半導體裝置之製造方法中, 上述基板,可沿彎曲領域至少形成1個孔。 如此,於基板形成孔,可使基板彈力變小,容易彎曲 〇 (2 0 )本發明之電路基板,係安裝有上述半導體裝 置者。 (2 1 )本發明之電子機器,係具有上述電路基板者 -I II — If — — — — — ·1111111 ^ ·1111111 (請先閱讀背面之注意事項再填寫t頁) 經濟部智慧財產局員工消費合作社印製 態 形 施 實 佳 較 明 發 本 明 } 說 態面 形圖 施依 實 ’ 之下 明以 發 第 圖
態 1 形一 施 A 第 之 用 適 明 發 本 爲 體 導 半 之 態 形 施 9 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 563213 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(7 ) 裝置之圖。圖1 A爲半導體裝置之平面圖,圖1 B爲沿圖 1A之I B — I B線斷面圖,圖1 C爲半導體裝置之底面 圖。半導體裝置1係包含基板1 〇、多數(例如2個)半 •導體元件20、30,及多數外部電極40。 基板1 0 ’可以有機系或無機系材料構成,亦可由其 複合構造構成。有機系材料形成之基板1 〇,有例如聚醯 亞氨樹脂構成之可撓性基板。無機系材料構成之基板1 〇 ’有例如陶瓷基板或玻璃基板。有機系與無機系材料之復 合構造爲例如玻璃環氧基板。 於基板1 0形成配線圖型1 2。配線圖型1 2,係形 成於基板1 0之一方之面。又,除基板之一方之面之配線 圖型1 2以外,於另一方之面形成配線圖型亦可。 配線圖型1 2,係藉濺射法等於基板1 0披覆銅等導 電性膜,蝕刻形成,此情況下,於基板1 0直接形成配線 圖型12,不介由接著劑成爲2層基板。或於基板10與 配線圖型1 2間介由接著劑使用3層基板亦可。或者使用 在基板積層絕緣樹脂與配線圖型構成之加高多層構造基板 或多數基板積層而成之多層基板亦可。 配線圖型1 2,包含多數接合部1 4及多數平坦部 1 6。任一接合部1 4至少電連接任一平坦部1 6。各接 合部1 4及平坦部1 6係以大於配線部分之較大面積形成 。又,於接合部1 4上形成突起亦可。 接合部1 4及平坦部1 6,係位於基板1 0之半導體 元件2 0,3 0之搭載領域,未形成於該領域外。又,位 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -10- --.---.---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 563213 A7 ___ B7 五、發明說明(8 ) 於半導體元件2 0、3 0之搭載領域內之接合部1 4,係 連接位於該搭載領域內之平坦部1 6。或者位於半導體元 件2 0、3 0中任一搭載領域內之接合部1 4,與位於半 •導體元件2 0、3 0中其餘之1個搭載領域內之平坦部1 6連接亦可。基板1 〇,爲模型之簡化起見,可爲圖示之 方形。要求極小型化時,設爲沿半導體元件2 0、3 0之 外形之形狀亦可。 於基板1 0形成貫穿孔1 8,平坦部1 6位於貫穿孔 1 8上。亦即,平坦部1 6,係介由貫穿孔1 8連接配線 圖型1 2之形成面之相反側之面。如此,在基板1 〇之配 線圖型1 2之形成面之相反側之面,可形成電連接配線圖 型12之多數外部電極40(參照圖1C)。 多數半導體元件2 0、3 0,爲例如快閃記憶體與 SRAM、SRAM、DRAM、記憶體與 AS I C、或 MPU與記憶體等,分別具多數電極22、32。電極 2 2、3 2,係位於任一接合部1 4之上方,介由異方性 導電材料50電連接。亦即,半導體元件20、30,係 以電極2 2、3 2之形成面朝下,相對基板1 〇之配線圖 型12,設爲面朝下接合。又,圖示之半導體元件20、 30,其尺寸及形狀雖不同,但相同亦可。電極22、 3 2大多爲以電鍍或導線形成之金,亦可使用n i 、焊錫 等材料。 異方性導電材料5 0,爲將導電粒子分散於接著劑者 ’有時添加分散劑。異方性導電材料5 0,事先形成薄片 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -11· --.---·---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 563213 經濟部智慧財產局員工消費合作社印製 A7 B7 •5·、發明說明(9 ) 狀後黏貼於基板1 〇,或以液狀設於基板1 〇亦可。又, 異方性導電材料5 0之接著劑,可使用熱硬化性接著劑。 異方性導電材料5 0,至少設於各接合部1 4上,或覆蓋 •基板1 0全體般設異方性導電材料5 0,則該工程可簡單 進行。又’除基板1 〇之外周端部以外設異方性導電材料 5 0時’基板1 〇之外周端部未付著異方性導電材料5 0 ’則其後之基板1 〇之處理情況較好。 異方性導電材料5 0,係於電極2 2、3 2與接合部 1 4間被擠壓,藉導電粒子達成兩者間之電導通。本實施 形態中以半導體元件2 0、3 0做面朝下接合爲特徵。面 朝下接合時,取代異方性導電材料5 0,改以藉由光、熱 、壓力、或振動之熱一接合電極22、32與接合部14 亦可。此時,金屬間接合之信賴性高。此情況下,於半導 體元件2 0、3 0與基板1 0間大多塡充底層塡料樹脂。 外部電極4 0,設於配線圖型1 2之平坦部1 6。詳 言之,外部電極4 0設於基板1 0之配線圖型1 2之形成 面之相反側之面,介由貫穿孔1 8電連接平坦部1 6。外 部電極4 0與平坦部1 6之電連接,大多於半導體元件安 裝面之相反側之基板之貫穿孔上,搭載助焊劑及焊錫球, 通過焊錫爐而形成,但亦可於貫穿孔1 8內面藉鍍金或銅 等導電構件而達成。以焊錫球爲外部電極4 〇時,將焊錫 球材料之焊錫塡充於貫穿孔1 8內,將與焊錫球一體化之 導電構件形成於貫穿孔1 8內亦可。 又,於半導體元件安裝面之相反側,形成以配線圖型 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -12 - —.---·---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 563213 A7 ____________ B7 五、發明說明(1〇 ) 12、貫穿孔、貫通孔連接之外部電極用平坦部,再於其 上形成外部電極亦可。又,外部電極40,可由上述焊錫 以外之金屬或導電性樹脂形成。 如上述,所有平坦部1 6位於半導體元件2 0、3 0 之搭載領域內時,外部電極4 0亦位於半導體元件2 0、 30之搭載領域內(FAN—IN)構造。又,設於任一 半導體元件2 0、3 0之搭載領域內之接合部1 4,連接 設於該搭載領域內之平坦部1 6時,外部電極4 0亦電連 接設有該外部電極4 0之搭載領域所對應半導體元件2 0 、30之電極22、32。 依本實施形態,多數半導體元件2 0、3 0並列於平 面方向,搭載於基板10,各半導體元件20、30之電 極22、32與接合部14做面朝下接合。因此,接合係 於半導體元件2 0、3 0之領域內進行,基板1 0之面積 可縮至最小限。結果,半導體裝置1之小型化爲可能。 本實施形態,係如上述構成,以下說明其製造方法之 1例。首先,準備形成有具多數接合部1 4、及連接該接 合部1 4之多數平坦部1 6的配線圖型1 2之基板1 0。 於基板1 0之配線圖型1 2之形成面設異方性導電材料 5 0。詳言之爲,至少於接合部1 4上設異方性導電材料 5 0° 之後,準備具多數電極2 2、3 2之多數半導體元件 2 0、3 0。於異方性導電材料5 0之接合部1 4上定位 電極22、32,將半導體元件20、30載於基板10 --.---.---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -13- 經濟部智慧財產局員工消費合作社印製 563213 A7 B7 五、發明說明(11 ) 上。 之後,按壓半導體元件20、30及基板10之至少 一方,介由異方性導電材料5 0之導電粒子使接合部1 4 •與電極22、32做電接合。 之後,由基板1 0之配線圖型1 2之形成面之相反側 ,介由貫穿孔1 8,於平坦部1 6形成外部電極4 0。 藉上述工程可得半導體裝置1。依本實施形態,藉異 方性導電材料5 0使接合部1 4與電極2 2、3 2導通, 故可以具較佳信賴性及生產性之方法製造半導體裝置1。 (第2實施形態) 圖2 A - 2 C爲本發明適用之第2實施形態之半導體 裝置之圖。圖2A爲半導體裝置之平面圖,圖2 B爲沿圖 2A之IIB—IIB線斷面圖,圖2C爲半導體裝置之 底面圖。半導體裝置2係包含基板1 1 0、外部電極 1 4 0、及第1實施形態使用之多數(例如2個)半導體 元件(半導體晶片)2 0、3 0。 於基板1 1 0形成配線圖型1 1 2。配線圖型1 1 2 包含接合部1 1 4及平坦部1 1 6。接合部1 1 4,係設 於半導體元件20、30之電極22、32之對應位置。 另外,平坦部1 1 6僅形成於半導體元件2 0、3 0中之 一方之搭載領域內。因此,該一方之搭載領域內之平坦部 1 16,與另一方搭載領域內之接合部1 14,係介由配 線部1 1 5做電連接。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -14 - --.---.---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 563213 A7 __ B7 五、發明說明(12 ) 平坦部1 1 6係如上述形成,故外部電極1 4 0亦僅 形成於半導體元件2 〇、3 〇中之一方之搭載領域內。又 ’圖2 C中,爲簡化起見僅圖示較少之外部電極1 4 0 ’ •貫際上設有更多之外部電極1 4 0。 除此之外之構成及製造方法均同第1實施形態。因安 裝基板或母板之配線圖型,如半導體裝置2之半導體裝置 2般,將所有外部電極1 4 0配置於1處較有利。 爲防止基板安裝時之重心不平衡引起之半導體裝置2 之傾斜,於基板1 1 0中之半導體元件2 0側之安裝面之 相反面上,形成與外部電極1 4 0同樣尺寸、高度、或形 狀之突起亦可。該突起可以樹脂或黏帶等形成。 (第3實施形態) 圖3 A — 3 C爲本發明適用之第3實施形態之半導 體裝置之圖。圖3A爲半導體裝置之平面圖,圖3 B爲沿 圖3A之I I IB - I I IB線斷面圖,圖3C爲半導體 裝置之底面圖。半導體裝置3係包含基板2 1 0、外部電 極2 4 0、及第1實施形態使用之多數(例如2個)半導 體元件(半導體晶片)20、30。 於基板2 1 0形成配線圖型2 1 2。配線圖型2 1 2 包含接合部2 1 4及平坦部2 1 6。接合部2 1 4,係設 於半導體元件20、30之電極22、32之對應位置。 另外,平坦部2 1 6係形成於半導體元件2 0、3 0之搭 載領域外側。因此,該搭載領域外側之平坦部2 1 6,與 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -15- --:---·---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 563213 Α7 ------ Β7 五、發明說明(13 ) 半導體元件20、30之搭載領域內之接合部214,係 介由配線部1 1 5做電連接。又,基板2 1 〇,係形成較 半導體元件2 〇、3 0之搭載領域爲大。 (請先閱讀背面之注意事項再填寫本頁) ’ 平坦部2 1 6係如上述形成,故外部電極2 4 〇亦形 成於半導體元件2 〇、3 0之搭載領域外側(F A N — ◦UT構造)。又,圖3C中,爲簡化起見僅圖示較少之 外部電極240,實際上設有更多之外部電極24〇。 經濟部智慧財產局員工消費合作社印製 又’於基板2 1 〇設有金屬等具康剛性之平坦保持構 件2 0 〇。平坦保持構件2 〇 〇,係爲補強基板2 1 〇以 確保平坦性者,只要具剛性即可,不限定材料。例如大多 使用不銹鋼或銅系合金等金屬,但亦可使用以塑膠或陶瓷 等具絕緣性之材料。本實施形態中,於配線圖形2 1 2上 設異方性導電材料5 0,若異方性導電材料5 0之導電粒 子不導通時,即使使用金屬製平坦保持構件2 0 0,亦可 遮斷配線圖形2 1 2與平坦保持構件2 0 0間之電氣導通 。或者,平坦保持構件2 0 0以具絕緣性材料構成時,即 使存在異方性導電材料5 0之導電粒子引起之電連接亦可 。又,於平坦保持構件2 0 0中之至少與異方性導電材料 5 0之接觸面形成絕緣層時,即使平坦保持構件2 0 0爲 金屬製,以可遮斷配線圖形2 1 2與平坦保持構件2 0 0 間之電氣導通。又,平坦保持構件2 0 0 ’亦可以異方性 導電材料5 0以外之一般絕緣性接著劑接著於基板2 1 0 〇 平坦保持構件2 0 0 ’係介由異方性導電材料5 0黏 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -16 - 經濟部智慧財產局員工消費合作社印製 563213 A7 _ B7 五、發明說明(14 ) 貼於半導體元件2 0、3 0之搭載領域外側或基板2 1 0 之外周端部。因此,即使基板2 1 0爲可撓性基板,亦可 確保半導體元件2 0、3 0外側部分或基板2 1 0之外周 •端部之平坦性。本實施形態中,基板2 1 0中之外部電極 2 4 0之設置領域之平毯性,可由平坦保持構件2 0 0確 保,故可確保外部電極2 4 0之高度之均一性。以外之構 成及製造方法均同第1實施形態,故省略其說明。 又,本實施形態中,於基板2 1 0中之半導體元件 20、30之搭載領域未設外部電極240,但於該領域 設外部電極240亦可(FAN—IN/OUT構造)。 此外,或者另外於半導體元件2 0與半導體元件3 0間之 領域,設外部電極2 4 0亦可。圖4之半導體裝置4,爲 在半導體元件2 0、3 0之搭載領域內側、外側及半導體 元件2 0、3 0間設外部電極2 4 0之例。 又,於第3實施形態中,若基板2 1 0本身具平坦保 持性(例如基板2 1 0由陶瓷、玻璃環氧構成)時,平坦 保持構件2 0 0不設亦可。 (第4實施形態) 圖5爲本發明適用之第4實施形態之半導體裝置之圖 。圖6 A — 6 C爲圖5所示半導體裝置之基板之展開圖。 圖6A爲平面圖,圖6B爲圖6A之VB — V線之斷面圖 ,圖6 C爲底面圖。半導體裝置5包含基板3 1 0、半導 體元件320、330及外部電極340。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ^17 - --------^--------- (請先閱讀背面之注意事項再填寫本頁) 、 563213 A7 B7 五、發明說明(15 ) (請先閱讀背面之注意事項再填寫本頁) 基板310,如圖5所示,係由可彎曲之材質形成’ 2層之可撓性基板,或配線密度需更高時’較好設爲加高 型可撓性基板。又,基板3 1 0爲單方向較長之長方形。 •於該基板3 1 0之長邊方向兩端部,搭載半導體元件 320、3 30。本實施形態中,半導體元件320、 3 3 0爲相同尺寸、相同形狀,但亦可爲不同形狀。 於基板3 1 0,形成配線圖形3 1 2。配線圖形胃 3 1 2包含接合部3 1 4及平坦部3 1 6。接合部3 1 4 係設於半導體元件320、330之電極322、332 對應之位置,介由異方性導電材料3 5 0做電連接,另外 ,平坦部3 1 6僅形成於半導體元件3 2 0、3 3 0中之 一方之搭載領域內。因此,該一方搭載領域內之平坦部 3 1 6,與位於另一方搭載領域內之接合部3 1 4,係介 由配線部3 1 5電連接。配線部3 1 5,係形成於半導體 元件3 2 0、3 3 0間,不被其覆蓋,故以阻劑膜等保護 膜302覆蓋保護。 經濟部智慧財產局員工消費合作社印製 平坦部3 1 6如上形成,故外部電極3 4 0亦僅形成 於半導體元件320、330中之一方之搭載領域內。圖 中爲簡化起見,圖示較少之外部電極3 4 0,但實際上設 有更多之外部電極3 4 0。關於外部電極3 4 0之配置, 如第3實施形態所示,可用平坦保持構件配置於半導體元 件之外側。 本實施形態中,以搭載基板3 1 0中之半導體元件 320、330之面爲底,該基板3 10之半導體元件 本:紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -18- " 563213 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(16 ) 3 2 0、3 3 0間之領域被彎曲。又,圖示之基板3 1 0 之彎曲狀態未附著折疊處。基板3 1 〇上,如圖6A及 6 C所示,於彎曲領域形成至少1個或多數孔3 〇 〇亦可 •。如此則基板3 1 0之彈力變小容易彎曲,且容易保持彎 曲狀態。又,配線部3 1 5之形成,較好避開孔3 0 0 , 但配線部3 1 5形成於孔3 0 0上亦可。 基板3 1 0被彎曲,半導體元件3 2 0之電極3 2 2 之形成面之相反側之面,與半導體元件3 3 0之電極 3 3 2之形成面之相反側之面,係介由接著劑3 0 4黏接 ,藉接著劑3 0 4之接著力使基板3 1 0維持彎曲狀態。 又,半導體元件320、330之面爲平坦,容易接著。 接著劑3 0 4爲導電性接著劑,可使接著之半導體元件 320、330之接著面電位相同。接著劑304爲熱傳 導性接著劑時,半導體元件3 2 0、3 3 0間之熱傳導爲 可能。例如半導體元件3 2 0、3 3 0中之一方之發熱量 大,另一方之發熱量小時,熱由一方傳至另一方可達冷卻 。接著劑3 0 4,亦可爲黏著劑。薄片狀或液狀接著劑 3 0 4時,如圖6A_6 C之狀態,黏著於半導體元件 320、330背面後,再將兩方之半導體元件背面黏著 亦可。或者,將半導體元件於定位狀態下塡充液狀接著劑 3 0 4亦可。 除以上構成之外均同第1實施形態故省略其說明。亦 可使用不同尺、士之半導體元件。此情況下,較大半導體元 件配置於外部電極3 4 0形成側,就幾何學而言較安定。 本^張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) =19- -I I ! !訂 ί I! I I I - j (請先閱讀背面之注意事項再填寫本頁) 563213 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明〇7 ) 本實施形態中,使用2個半導體元件320、33〇 ,但亦可使用2個以上半導體元件,此時將1個半導體元 件中之電極形成面之相反側之面,與其餘多數半導體元件 •中之1個或多數之電極形成面之相反側之面黏著亦可。如 此形成時,可將多數半導體元件積層於窄面積。 又,不依每一半導體元件彎曲基板予以積層,將多數 半導體元件搭載於一平面後,彎曲基板積層亦可。 本實施形態中之半導體裝置5,多數半導體元件 3 2 0、3 3 0被積層,故較上述實施形態更小形化。又 ,半導體裝置5之製造方法,除基板3 1 0之彎曲之點外 適用第1實施形態之方法。 (第5實施形態) 圖7爲本發明適用之第5實施形態之半導體裝置之基 板之展開圖。本實施形態之半導體裝置,和圖5之半導體 裝置5同樣,基板410被彎曲。於基板410,和第4 實施形態同樣,搭載半導體元件3 2 0、3 3 0。 圖7之基板4 1 0,至少形成1個孔4 0 〇。孔 4 0 0爲沿基板4 1 0之彎曲線之長孔。換言之,沿長孔 之孔400 ,基板410被彎曲。圖7中,多數孔400 以串連形成。孔4 0 0,係形成於較基板4 1 0之端部之 更內側’故基板4 1 0之端部殘留。因此,基板4 1 0成 爲連接之未切斷狀態。 於基板4 1 0,形成配線圖形4 1 2。配線圖形 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -20 - --------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 563213 A7 -—^ B7 五、發明說明(18 ) 4 1 2係通過孔4 0 0上形成。即使形成孔4 0 〇 ,基板 4 1 0亦成連接狀態,故配線圖形4丨2爲不容易切斷之 狀態。 ' 將上述構成之基板4 1 0彎曲成圖5之基板3 1 0時 ’孔4 〇 〇之形成邊,成爲半導體裝置之外形端之一部份 °因此’半導體裝置之外形可漂亮顯現,定位容易。 其他內容可適用第4實施形態說明之內容。 (第6實施形態) 圖8爲本發明適用之第6實施形態之半導體裝置之基 板之展開圖。本實施形態之半導體裝置,和圖5之半導體 裝置5同樣,基板510被彎曲。於基板510,和第4 實施形態同樣,搭載半導體元件3 2 0、3 3 0。 圖8所示基板5 1 0,形成有間隙5 0 0被切斷。換 言之,於基板5 1 0之切斷端部間隔開間隔形成間隙 5 0 0。間隙5 0 0,係沿基板5 1 0之彎曲線延伸。換 言之,基板5 1 0沿間隙5 0 0彎曲。 於基板5 1 0形成配線圖形5 1 2。配線圖形5 1 2 係通過間隙5 0 0上形成。因基板5 1 0被切斷,配線圖 形5 1 2之寬較好大於圖7之配線圖形4 1 2之寬。 將上述構成之基板5 1 0如圖5之基板3 1 0彎曲時 ,形成間隙5 0 0之邊成爲半導體裝置之外形端之一部份 ,因此,半導體裝置之外形漂亮,定位容易。 其他內容適用第4實施形態說明之內容。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐1 · 21 - ---:------------------訂---------線* (請先閱讀背面之注意事項再填寫r頁) 經濟部智慧財產局員工消費合作社印製 563213 A7 _ B7 五、發明說明(19 ) (第7實施形態) 圖9爲本發明適用之第6實施形態之半導體裝置之基 •板之展開圖。本實施形態中,和第6實施形態不同處爲, 設有橫跨圖8所示基板5 1 0之間隙5 0 0的連接構件 620,藉連接構件620之設置’來連接、補強切斷之 基板5 1 0。因此,配線圖形6 1 2之寬較圖8之配線圖 形5 1 2之寬爲細亦可。連接構件6 2 0可以和配線圖形 6 1 2相同之材料構成。配線圖形6 1 2 ’以銅箔等金屬 箔蝕刻形成時,連接構件6 2 0可同時形成’故不增加工 程。 其他內容則適用第6實施形態說明之內容。又,本實 施形態中,係針對橫跨切斷基板5 1 0之間隙5 0 0的連 接構件6 1 0做說明,但連接構件6 1 0橫跨未切斷基板 5 10之孔400 (參照圖7)亦可。將該孔400稱爲 間隙以可。 (第8實施形態) 圖10爲本發明適用之第8實施形態之半導體裝置。 圖1 0所示半導體裝置,除基板7 1 0及孔7 0 0外,均 同圖5之半導體裝置5。 於基板7 10,於彎曲領域形成多數孔7〇〇。多數 孔7 0 0,爲沿彎曲線延長之長孔,以並列形成。又,孔 7 0 0以可稱爲間隙。取代孔7 0 0改形成切斷基板 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -22 - ---------------------訂---------線* (請先閲讀背面之注意事項再填寫y頁) 563213 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(2〇 ) 7 1 0之間隙亦可。藉此種孔7 0 0之形成’基板7 1 〇 容易彎曲。又,配線圖形3 12通過孔700。本實施形 態可適用圖5說明之內容。 (第9實施形態) 圖1 1爲本發明適用之第9實施形態之半導體裝置。 圖1 1所示半導體裝置中,係介由基板8 1 0上形成之孔 8 0 0,於配線圖形3 1 2上形成具柔軟性之樹脂8 2 0 。樹脂8 2 0,可使用例如柔軟性之聚醯亞氨樹脂。 孔800形成於基板810之彎曲領域。孔800亦 稱爲間隙。取代孔8 0 0,改形成切斷基板8 1 0之間隙 亦可。本實施形態中,於基板8 1 0之彎曲內側形成配線 圖形3 1 2 ,沒有樹脂8 2 0時,配線圖形3 1 2將介由 孔8 0 0露出於外部。因此,可將樹脂8 2 0設於孔 8 0 0內以保護配線圖形3 1 2。而5 ,樹脂8 2 0爲具 柔軟性,可於基板8 1 0展開爲平面狀態下設置樹脂 8 2 0後,再彎曲基板8 1 0,作業性較好。 又,本實施形態中說明之內容亦適用其他實施形態。 本發明適用面朝下接合半導體裝置或其模組。面朝下 接合之半導體裝置,有例如C〇F(chip on flex/film)構造或 C〇B(chip on board)構造等。 本實施形態中係針對具外部電極之半導體裝置加以說 明,但將基板之一部分延伸,於此進行外部連接亦可。以 基板之一部分爲連接器引腳,將連接器實裝於基板上,將 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -23: ---------------I----訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 563213 A7 ___ B7 五、發明說明(21 ) 基板之配線圖形連接於其他電子機器亦可。 又’不特別形成外部端子於母基板實裝時,利用母基 板側塗敷之焊糊,以其熔融時之表面張力形成外部端子亦 •可。該半導體裝置,爲所謂平坦柵陣列型半導體裝置。 圖1 2爲安裝有上述第1實施形態之半導體裝置1之 電路基板1 0 0 0。電路基板1 〇 〇 〇 —般使用玻璃環氧 基板等有機系基板。於電路基板1 〇 〇 〇,以特定電路形 成例如銅構成之配線圖型。將配線圖型與半導體裝置1之 外部電極4 0 (參照圖1 B )以機械式連接,以達成電氣 導通。 又’半導體裝置i ,實裝面積可縮小至以裸晶片安裝 之面積。使用該電路基板1 〇 〇 〇於電子機器可實現電子 機器之小型化。又,同一面積內可確保安裝空間,實現高 機能化。 具該電路基板1 0 0 0之電子機器有如圖1 3所示之 筆記簿型個人電腦1 1 〇 〇。 又,上述實施形態爲本發明適用半導體裝置之例。但 ’只要是和半導體裝置同樣需具多數外部電極之面安裝用 之電子元件,不論主動或被動元件均可適用本發明。電子 元件有例如電阻器、電容器、線圈、振盪器、濾波器、溫 度感知器、熱敏電阻、變阻器、可變電阻或保護裝置等。 雖然上述實施形態中,半導體元件之安裝方法係適用 面朝下接合型,但亦可採用導線接合或TAB(tape automated Bonding)方式。又,構成上述半導體元件與半導體元件以外 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -24- -I------------------^« — — 1 —--— 線赢 (請先閱讀背面之注意事t再填寫本頁) 563213 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(22 ) 之電子元件混載之安裝模組型半導體裝置亦可 (圖面之簡單說明) 圖1 A - 1 c ··本發明適用之第1實施形態之半導胃 裝置之圖。 圖2 A — 2 C :本發明適用之第2實施形態之半導體 裝置之圖。 圖3A—3C:本發明適用之第3實施形態之半導體 裝置之圖 圖4 :本發明適用之第3實施形態之變形例。 圖5:本發明適用之第4實施形態之半導體裝置之® 〇 圖6 A — 6 C :本發明適用之第4實施形態之半導18 裝置之展開圖。 圖7 :本發明適用之第5實施形態之半導體裝置t胃 開圖。 圖8:本發明適用之第6實施形態之半導體裝 開圖。 圖9:本發明適用之第7實施形態之半導體裝置 開圖。 圖10:本發明適用之第8實施形態之半導體裝 圖。 圖1 1 :本發明適用之第9實施形態之半導體裝 圖。 --------訂---------線秦 f請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -25 - 563213 A7 B7 五、發明說明(23 ) 圖12:安裝有本實施形態之半導體裝置之電路基板 之圖。 圖13:具安裝有本實施形態之半導體裝置之電路基 •板的電子機器之圖。 (符號說明) 1、半導體裝置 1 0、基板 1 2、配線圖型 1 4、接合部 1 6、平坦部 2 0、半導體元件 2 2、電極 3 0、半導體元件 3 2、電極 4 0、外部電極 5 0、異方性導電材料 --------------------訂---------線 (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -26 -
Claims (1)
- 563213 A8 B8 C8 D8 有煩’ 無讀 t牟 ,雷 否i,’ 准》6 予:Ί 正止+ ?本至 申請專利範圍 第881 1 541 7號專利申請案…一 中文申請專利範圍修正本 民國92年8月26日修正 1·一種半導體裝置,係具有: 具電極並列於平面方向,面朝下接合的多數半導體元件 形成具連接於上述半導體元件之上述電極之接合部,及 連接上述接合部之平坦部的配線圖型之基板;及 設於上述平坦部的外部電極; ’ 所有外部電極係僅設於任一半導體元件對應之領域內 於設有上述外部電極之領域所對應上述1個半導體元件 之電極之形成面之相反側之面,係與其餘半導體元件中之 少1個之上述電極之形成面之相反側之面接著, ’ 上述基板爲可撓性基板,一部分被彎曲,沿彎曲領域 形成至少1個孔。 2 .如申請專利範圍第1項之半導體裝置,其中 上述各外部電極係設於上述半導體元件之搭載領域內。 3 .如申請專利範圍第1項之半導體裝置,其中 所有外部電極係設於所有半導體元件對應領域之外側。 4 .如申請專利範圍第3項之半導體裝置,其中 上述基板爲可撓性基板,形成較搭載上述多數半導體元 件之領域大,於外周端部設有平坦保持構件。 5 ·如申請專利範圍第1項之半導體裝置,其中 本紙張尺度適用中國國家樑準(CNS ) A4規格(210X297公釐) ----------^------1T------0 (請先閲讀背面之注意事項再填窝本頁) 經濟部智慧財產局員工消費合作社印製 563213 A8 B8 C8 D8 六、申請專利範圍 上述孔,係沿彎曲線延伸之長孔, 上述配線圖型,係通過上述孔上形成, (請先聞讀背面之注意事項再填寫本頁) 上述長孔之沿上述彎曲線延伸之邊,係成爲外形端之一 部分。 6 .如申請專利範圍第1項之半導體裝置,其中 上述孔形成多數, 上述配線圖型係通過上述多數孔上形成, 上述多數孔,爲沿彎曲線延伸之長孔,並列形成。 7 .如申請專利範圍第1項之半導體裝置,其中_ 上述基板,係沿彎曲領域形成有間隙, 基板依該間隙被切斷,於對向之切斷端部間隔開間隔。 8 .如申請專利範圍第7項之半導體裝置,其中 設有橫跨上述間隙之連接構件。 9 .如申請專利範圍第5項之半導體裝置,其中 介由上述孔,於上述配線圖型設具柔軟性之樹脂, 上述樹脂係與上述基板同時彎曲。 經濟部智慧財產局員工消費合作社印製 1 0 ·如申請專利範圍第1項之半導體裝置,其中 介由導電性或熱傳導性接著劑,使上述半導體元件接著 〇 i 1 .如申請專利範圍第1項之半導體裝置,其中 上述半導體元件中之一個,其平面積較其他半導體元件 爲大, 上述外部電極,僅設於上述平面積較大半導體元件對應 之領域。 -2- 本紙張尺度適用中國國家橾準(CNS ) A4说格(210X297公釐) 563213 A8 B8 C8 D8 六、申請專利範圍 (請先閲讀背面之注意事項再填寫本頁) 1 2 ·如申請專利範圍第1項之半導體裝置,其中 上述半導體元件之電極,係介由接著劑分散有導電粒子 之異方性導電材料連接上述接合部。 13·—種半導體裝置之製造方法,係包含以下工程: 準備形成有具多數接合部及電連接上述接合部之多數平 坦部的配線圖型之基板,以及具電極之多數半導體元件的工 程; 至少於上述接合部上,設接著劑上分散有導電粒子之異 方性導電材料的工程; ’ 於上述異方性導電材料中之上述接合部上定位上述電極 ,使上述半導體元件搭載於上述基板上的工程; 壓接上述半導體元件與上述基板之任一方,介由上述導 電粒子,使上述接合部與電極做電連接的工程;及 於上述平坦部形成外部電極的工程。 _ 14.如申請專利範圍第13項之半導體裝置之製造方 法,其中 經濟部智慧財產局員工消費合作社印製 上述基板爲可撓性基板,形成較搭載上述多數半導體元 件之領域爲大, * 包含於上述基板之外周端部設平坦保持構件的工程。 1 5 .如申請專利範圍第1 3項之半導體裝置之製造方 法,其中 將上述半導體元件搭載於基板之工程後,包含令上述基 板之一部分彎曲,使任一上述半導體元件中之電極形成面之 相反側之面,與其他1個上述半導體元件中之電極形成面之 ¥紙張尺度適用中國國家梂準(CNS )八4規格(210X297公釐) 77^ 563213 A8 B8 C8 D8 六、申請專利範圍 相反側之面接著的工程。 1 6 ·如申請專利範圍第1 5項之半導體裝置之製造方 法,其中 上述基板,係於沿彎曲領域至少形成1個孔。 17·—種安裝有半導體裝置之電路基板,其中,該半 導體裝置具有: 具電極並列於平面方向,面朝下接合的多數半導體元件 f 形成具連接於上述半導體元件之上述電極之接合部,及 電連接上述接合部之平坦部的配線圖型之基板;及 設於上述平坦部的外部電極; 所有外部電極係僅設於任一半導體元件對應之領域內 於設有上述外部電極之領域所對應上述1個半導體元件 中之電極之形成面之相反側之面,係與其餘半導體元件中之 至少1個之上述電極之形成面之相反側之面接著, 上述基板爲可撓性基板,一部分被彎曲,沿彎曲領域 形成至少1個孔。 18·—種具備半導體裝置之電子機器,其中,該半導 體裝置具有: 具電極並列於平面方向,面朝下接合的多數半導體元件 y 形成具連接於上述半導體元件之上述電極之接合部,及 電連接上述接合部之平坦部的配線圖型之基板;及 本^張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ^ ----------^------訂------^ (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 563213 A8 B8 C8 D8 六、申請專利範圍 設於上述平坦部的外部電極; 所有外部電極係僅設於任一半導體元件對應之領域內 於設有上述外部電極之領域所對應上述1個半導體元件 中之電極之形成面之相反側之面,係與其餘半導體元件中之 至少1個之上述電極之形成面之相反側之面接著, 上述基板爲可撓性基板,一部分被彎曲,沿彎曲領域 形成至少1個孔。 (請先聞讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -5- 本紙張尺度適用中國國家標準(CNS ) A4規格(210 X 297公釐)
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-
1999
- 1999-09-03 DE DE69938582T patent/DE69938582T2/de not_active Expired - Lifetime
- 1999-09-03 KR KR10-2000-7004842A patent/KR100514558B1/ko not_active IP Right Cessation
- 1999-09-03 WO PCT/JP1999/004785 patent/WO2000014802A1/ja active IP Right Grant
- 1999-09-03 US US09/530,609 patent/US6486544B1/en not_active Expired - Fee Related
- 1999-09-03 CN CNB998015601A patent/CN1229863C/zh not_active Expired - Fee Related
- 1999-09-03 EP EP99940645A patent/EP1041633B1/en not_active Expired - Lifetime
- 1999-09-07 TW TW088115417A patent/TW563213B/zh not_active IP Right Cessation
-
2002
- 2002-10-10 US US10/267,641 patent/US20030030137A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
DE69938582D1 (de) | 2008-06-05 |
KR20010031776A (ko) | 2001-04-16 |
EP1041633B1 (en) | 2008-04-23 |
EP1041633A4 (en) | 2001-10-31 |
CN1277737A (zh) | 2000-12-20 |
CN1229863C (zh) | 2005-11-30 |
KR100514558B1 (ko) | 2005-09-13 |
US6486544B1 (en) | 2002-11-26 |
US20030030137A1 (en) | 2003-02-13 |
EP1041633A1 (en) | 2000-10-04 |
WO2000014802A1 (fr) | 2000-03-16 |
DE69938582T2 (de) | 2009-06-04 |
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