TW370691B - Method for removing photoresist and plasma etch residues - Google Patents
Method for removing photoresist and plasma etch residuesInfo
- Publication number
- TW370691B TW370691B TW087107958A TW87107958A TW370691B TW 370691 B TW370691 B TW 370691B TW 087107958 A TW087107958 A TW 087107958A TW 87107958 A TW87107958 A TW 87107958A TW 370691 B TW370691 B TW 370691B
- Authority
- TW
- Taiwan
- Prior art keywords
- plasma etch
- etch residues
- removing photoresist
- substrate
- contacting
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 3
- 238000004140 cleaning Methods 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 150000007514 bases Chemical class 0.000 abstract 1
- -1 hydroxylammonium compound Chemical class 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/046—Salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/38—Cationic compounds
- C11D1/62—Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/24—Organic compounds containing halogen
- C11D3/245—Organic compounds containing halogen containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/06—Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW087107958A TW370691B (en) | 1996-09-06 | 1998-08-18 | Method for removing photoresist and plasma etch residues |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/709,053 US5780406A (en) | 1996-09-06 | 1996-09-06 | Non-corrosive cleaning composition for removing plasma etching residues |
PCT/US1997/014758 WO1998010050A1 (en) | 1996-09-06 | 1997-08-22 | Non-corrosive cleaning composition for removing plasma etching residues |
TW086112763A TW394793B (en) | 1996-09-06 | 1997-09-04 | Non-corrosive cleaning composition for removing plasma etching residues |
TW087107958A TW370691B (en) | 1996-09-06 | 1998-08-18 | Method for removing photoresist and plasma etch residues |
Publications (1)
Publication Number | Publication Date |
---|---|
TW370691B true TW370691B (en) | 1999-09-21 |
Family
ID=24848294
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086112763A TW394793B (en) | 1996-09-06 | 1997-09-04 | Non-corrosive cleaning composition for removing plasma etching residues |
TW087107958A TW370691B (en) | 1996-09-06 | 1998-08-18 | Method for removing photoresist and plasma etch residues |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086112763A TW394793B (en) | 1996-09-06 | 1997-09-04 | Non-corrosive cleaning composition for removing plasma etching residues |
Country Status (8)
Country | Link |
---|---|
US (1) | US5780406A (zh) |
EP (1) | EP0944708B1 (zh) |
JP (1) | JP4147320B2 (zh) |
KR (1) | KR100323326B1 (zh) |
AU (1) | AU4156497A (zh) |
DE (1) | DE69718202T2 (zh) |
TW (2) | TW394793B (zh) |
WO (1) | WO1998010050A1 (zh) |
Families Citing this family (50)
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-
1996
- 1996-09-06 US US08/709,053 patent/US5780406A/en not_active Expired - Lifetime
-
1997
- 1997-08-22 JP JP51269898A patent/JP4147320B2/ja not_active Expired - Fee Related
- 1997-08-22 WO PCT/US1997/014758 patent/WO1998010050A1/en active IP Right Grant
- 1997-08-22 EP EP97939489A patent/EP0944708B1/en not_active Expired - Lifetime
- 1997-08-22 KR KR1019997001828A patent/KR100323326B1/ko not_active IP Right Cessation
- 1997-08-22 AU AU41564/97A patent/AU4156497A/en not_active Abandoned
- 1997-08-22 DE DE69718202T patent/DE69718202T2/de not_active Expired - Lifetime
- 1997-09-04 TW TW086112763A patent/TW394793B/zh not_active IP Right Cessation
-
1998
- 1998-08-18 TW TW087107958A patent/TW370691B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69718202T2 (de) | 2003-11-13 |
KR100323326B1 (ko) | 2002-02-06 |
EP0944708A1 (en) | 1999-09-29 |
JP2001501649A (ja) | 2001-02-06 |
EP0944708A4 (en) | 2001-09-19 |
TW394793B (en) | 2000-06-21 |
US5780406A (en) | 1998-07-14 |
WO1998010050A1 (en) | 1998-03-12 |
KR20000068454A (ko) | 2000-11-25 |
AU4156497A (en) | 1998-03-26 |
DE69718202D1 (de) | 2003-02-06 |
EP0944708B1 (en) | 2003-01-02 |
JP4147320B2 (ja) | 2008-09-10 |
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