JPS56115368A - Releasing agent of photosensitive polymer - Google Patents

Releasing agent of photosensitive polymer

Info

Publication number
JPS56115368A
JPS56115368A JP1815980A JP1815980A JPS56115368A JP S56115368 A JPS56115368 A JP S56115368A JP 1815980 A JP1815980 A JP 1815980A JP 1815980 A JP1815980 A JP 1815980A JP S56115368 A JPS56115368 A JP S56115368A
Authority
JP
Japan
Prior art keywords
agent
releasing agent
40w60wt
cyclohexanone
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1815980A
Other languages
Japanese (ja)
Inventor
Hideo Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
San Ei Kagaku Co Ltd
Sanei Kagaku Kogyo KK
Original Assignee
San Ei Kagaku Co Ltd
Sanei Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by San Ei Kagaku Co Ltd, Sanei Kagaku Kogyo KK filed Critical San Ei Kagaku Co Ltd
Priority to JP1815980A priority Critical patent/JPS56115368A/en
Publication of JPS56115368A publication Critical patent/JPS56115368A/en
Pending legal-status Critical Current

Links

Landscapes

  • Paints Or Removers (AREA)

Abstract

PURPOSE: The titled releasing agent suitable for easy release without using a dangerous oxidizing agent, e.g., nitric acid, etc., comprising a heterogeneous liquid substance consisting of a nonionic surface active agent, a solvent, e.g., cyclohexanone, and a swelling agent of the glycol compound type in a specific composition.
CONSTITUTION: The desired heterogeneous liquid releasing agent comprising (A) 0.5W10wt% nonionic surface active agent (e.g., polyethylene glycol ether, etc.), (B) 40W60wt% solvent, e.g., cyclohexanone, ethyl cellosolve acetate, etc.), and (C) 1W40wt% swelling agent, e.g., polyethylene glycol, etc. or penetrating agent, e.g., 2-aminoethanol, aminopropyl morpholine, etc. (40W60wt% swelling agent and 1W20wt% penetrating agent are used together).
COPYRIGHT: (C)1981,JPO&Japio
JP1815980A 1980-02-15 1980-02-15 Releasing agent of photosensitive polymer Pending JPS56115368A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1815980A JPS56115368A (en) 1980-02-15 1980-02-15 Releasing agent of photosensitive polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1815980A JPS56115368A (en) 1980-02-15 1980-02-15 Releasing agent of photosensitive polymer

Publications (1)

Publication Number Publication Date
JPS56115368A true JPS56115368A (en) 1981-09-10

Family

ID=11963822

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1815980A Pending JPS56115368A (en) 1980-02-15 1980-02-15 Releasing agent of photosensitive polymer

Country Status (1)

Country Link
JP (1) JPS56115368A (en)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61108674A (en) * 1984-10-31 1986-05-27 Koyo Kagaku Kogyo Kk Metal printing ink remover
JPS6250831A (en) * 1985-08-30 1987-03-05 Japan Synthetic Rubber Co Ltd Releasing liquid composition for resist
JPS6350838A (en) * 1986-08-21 1988-03-03 Japan Synthetic Rubber Co Ltd Removing solution
US5472830A (en) * 1994-04-18 1995-12-05 Ocg Microelectronic Materials, Inc. Non-corrosion photoresist stripping composition
US5507978A (en) * 1995-05-08 1996-04-16 Ocg Microelectronic Materials, Inc. Novolak containing photoresist stripper composition
US5545353A (en) * 1995-05-08 1996-08-13 Ocg Microelectronic Materials, Inc. Non-corrosive photoresist stripper composition
US5561105A (en) * 1995-05-08 1996-10-01 Ocg Microelectronic Materials, Inc. Chelating reagent containing photoresist stripper composition
US5597678A (en) * 1994-04-18 1997-01-28 Ocg Microelectronic Materials, Inc. Non-corrosive photoresist stripper composition
US5612304A (en) * 1995-07-07 1997-03-18 Olin Microelectronic Chemicals, Inc. Redox reagent-containing post-etch residue cleaning composition
US5648324A (en) * 1996-01-23 1997-07-15 Ocg Microelectronic Materials, Inc. Photoresist stripping composition
US5665688A (en) * 1996-01-23 1997-09-09 Olin Microelectronics Chemicals, Inc. Photoresist stripping composition
US5759973A (en) * 1996-09-06 1998-06-02 Olin Microelectronic Chemicals, Inc. Photoresist stripping and cleaning compositions
US5780406A (en) * 1996-09-06 1998-07-14 Honda; Kenji Non-corrosive cleaning composition for removing plasma etching residues
US5798323A (en) * 1997-05-05 1998-08-25 Olin Microelectronic Chemicals, Inc. Non-corrosive stripping and cleaning composition
US5817610A (en) * 1996-09-06 1998-10-06 Olin Microelectronic Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
US6030932A (en) * 1996-09-06 2000-02-29 Olin Microelectronic Chemicals Cleaning composition and method for removing residues
US6372050B2 (en) 1997-05-05 2002-04-16 Arch Specialty Chemicals, Inc. Non-corrosive stripping and cleaning composition
US6413923B2 (en) 1999-11-15 2002-07-02 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
CN102977672A (en) * 2012-09-29 2013-03-20 吴雅萍 Aluminum alloy surface treatment agent
CN113832471A (en) * 2021-09-26 2021-12-24 苏州至绒新能源科技有限公司 Cleaning agent for rapidly stripping polyimide film and application thereof

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61108674A (en) * 1984-10-31 1986-05-27 Koyo Kagaku Kogyo Kk Metal printing ink remover
JPS6250831A (en) * 1985-08-30 1987-03-05 Japan Synthetic Rubber Co Ltd Releasing liquid composition for resist
JPH0523431B2 (en) * 1985-08-30 1993-04-02 Japan Synthetic Rubber Co Ltd
JPS6350838A (en) * 1986-08-21 1988-03-03 Japan Synthetic Rubber Co Ltd Removing solution
JPH0524498B2 (en) * 1986-08-21 1993-04-08 Japan Synthetic Rubber Co Ltd
US5472830A (en) * 1994-04-18 1995-12-05 Ocg Microelectronic Materials, Inc. Non-corrosion photoresist stripping composition
US5597678A (en) * 1994-04-18 1997-01-28 Ocg Microelectronic Materials, Inc. Non-corrosive photoresist stripper composition
US5507978A (en) * 1995-05-08 1996-04-16 Ocg Microelectronic Materials, Inc. Novolak containing photoresist stripper composition
US5545353A (en) * 1995-05-08 1996-08-13 Ocg Microelectronic Materials, Inc. Non-corrosive photoresist stripper composition
US5561105A (en) * 1995-05-08 1996-10-01 Ocg Microelectronic Materials, Inc. Chelating reagent containing photoresist stripper composition
US5612304A (en) * 1995-07-07 1997-03-18 Olin Microelectronic Chemicals, Inc. Redox reagent-containing post-etch residue cleaning composition
US5665688A (en) * 1996-01-23 1997-09-09 Olin Microelectronics Chemicals, Inc. Photoresist stripping composition
US5648324A (en) * 1996-01-23 1997-07-15 Ocg Microelectronic Materials, Inc. Photoresist stripping composition
US6191086B1 (en) 1996-09-06 2001-02-20 Arch Specialty Chemicals, Inc. Cleaning composition and method for removing residues
US5759973A (en) * 1996-09-06 1998-06-02 Olin Microelectronic Chemicals, Inc. Photoresist stripping and cleaning compositions
US5780406A (en) * 1996-09-06 1998-07-14 Honda; Kenji Non-corrosive cleaning composition for removing plasma etching residues
US5817610A (en) * 1996-09-06 1998-10-06 Olin Microelectronic Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
US6020292A (en) * 1996-09-06 2000-02-01 Olin Microelectronic Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
US6030932A (en) * 1996-09-06 2000-02-29 Olin Microelectronic Chemicals Cleaning composition and method for removing residues
US5798323A (en) * 1997-05-05 1998-08-25 Olin Microelectronic Chemicals, Inc. Non-corrosive stripping and cleaning composition
US6372050B2 (en) 1997-05-05 2002-04-16 Arch Specialty Chemicals, Inc. Non-corrosive stripping and cleaning composition
US6413923B2 (en) 1999-11-15 2002-07-02 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
US7001874B2 (en) 1999-11-15 2006-02-21 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
US7402552B2 (en) 1999-11-15 2008-07-22 Fujifilm Electronic Materials U.S.A., Inc. Non-corrosive cleaning composition for removing plasma etching residues
CN102977672A (en) * 2012-09-29 2013-03-20 吴雅萍 Aluminum alloy surface treatment agent
CN113832471A (en) * 2021-09-26 2021-12-24 苏州至绒新能源科技有限公司 Cleaning agent for rapidly stripping polyimide film and application thereof
CN113832471B (en) * 2021-09-26 2024-03-08 苏州至绒新能源科技有限公司 Cleaning agent for rapidly stripping polyimide film and application thereof

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