TW202216812A - 共聚物、共聚物溶液、感光性樹脂組成物、硬化物、共聚物之製造方法、及共聚物溶液之製造方法 - Google Patents

共聚物、共聚物溶液、感光性樹脂組成物、硬化物、共聚物之製造方法、及共聚物溶液之製造方法 Download PDF

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Publication number
TW202216812A
TW202216812A TW110128526A TW110128526A TW202216812A TW 202216812 A TW202216812 A TW 202216812A TW 110128526 A TW110128526 A TW 110128526A TW 110128526 A TW110128526 A TW 110128526A TW 202216812 A TW202216812 A TW 202216812A
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Taiwan
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group
copolymer
parts
acid
mentioned
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TW110128526A
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English (en)
Chinese (zh)
Inventor
松浦洋樹
前田順啓
寺田拓真
平岡隆一
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日商日本觸媒股份有限公司
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Publication of TW202216812A publication Critical patent/TW202216812A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/52—Phosphorus bound to oxygen only
    • C08K5/521—Esters of phosphoric acids, e.g. of H3PO4
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW110128526A 2020-08-03 2021-08-03 共聚物、共聚物溶液、感光性樹脂組成物、硬化物、共聚物之製造方法、及共聚物溶液之製造方法 TW202216812A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP2020-132001 2020-08-03
JP2020132001 2020-08-03
JPJP2021-033804 2021-03-03
JP2021033804 2021-03-03

Publications (1)

Publication Number Publication Date
TW202216812A true TW202216812A (zh) 2022-05-01

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TW110128526A TW202216812A (zh) 2020-08-03 2021-08-03 共聚物、共聚物溶液、感光性樹脂組成物、硬化物、共聚物之製造方法、及共聚物溶液之製造方法

Country Status (5)

Country Link
JP (2) JP7415014B2 (ja)
KR (1) KR20230015406A (ja)
CN (1) CN116057088A (ja)
TW (1) TW202216812A (ja)
WO (1) WO2022030445A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024024195A1 (ja) * 2022-07-25 2024-02-01 株式会社レゾナック 感光性樹脂組成物、樹脂硬化膜、及び画像表示素子
CN117069918B (zh) * 2023-08-21 2024-04-26 广东嘉元新材料有限公司 一种改性丙烯酸树脂及其制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52123427A (en) * 1976-04-09 1977-10-17 Dainippon Ink & Chem Inc Resin composition for powder coating
JPH0726042B2 (ja) * 1984-11-05 1995-03-22 三井東圧化学株式会社 粉体塗料組成物
JPS62256806A (ja) * 1986-04-30 1987-11-09 Japan Synthetic Rubber Co Ltd アクリル系ランダム共重合体および該共重合体を用いた熱硬化性樹脂組成物
JPH0425846A (ja) 1990-05-21 1992-01-29 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JP3363211B2 (ja) * 1993-08-06 2003-01-08 東京応化工業株式会社 感光性樹脂組成物およびその製造方法
JP3939269B2 (ja) * 1993-09-10 2007-07-04 関西ペイント株式会社 自己架橋性樹脂
JP4347923B2 (ja) * 1998-04-27 2009-10-21 共栄社化学株式会社 新規カルボキシル基含有エポキシ（メタ）アクリレートオリゴマー
JP4207604B2 (ja) * 2003-03-03 2009-01-14 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの形成方法
JP4492393B2 (ja) 2005-03-08 2010-06-30 チッソ株式会社 感光性組成物およびそれを用いた表示素子
JP5930786B2 (ja) * 2012-03-22 2016-06-08 株式会社日本触媒 硬化性樹脂組成物および感光性樹脂組成物
JP2014010200A (ja) * 2012-06-28 2014-01-20 Fujifilm Corp 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP6157193B2 (ja) 2013-04-22 2017-07-05 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途
JP2017057305A (ja) * 2015-09-17 2017-03-23 株式会社日本触媒 二重結合含有樹脂の製造方法
JP6644406B2 (ja) * 2015-09-29 2020-02-12 株式会社日本触媒 アルカリ可溶性樹脂及び感光性樹脂組成物
JP6807791B2 (ja) * 2017-03-23 2021-01-06 株式会社日本触媒 アルカリ可溶性樹脂、感光性樹脂組成物及びその用途
JP7216480B2 (ja) * 2018-03-29 2023-02-01 太陽インキ製造株式会社 光硬化性熱硬化性樹脂組成物及びドライフィルム及び硬化物ならびにプリント配線板
CN114341215A (zh) * 2019-08-27 2022-04-12 株式会社日本触媒 固化性组合物

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Publication number Publication date
WO2022030445A1 (ja) 2022-02-10
KR20230015406A (ko) 2023-01-31
JP7415014B2 (ja) 2024-01-16
JPWO2022030445A1 (ja) 2022-02-10
CN116057088A (zh) 2023-05-02
JP2024038213A (ja) 2024-03-19

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