TW201831551A - 環氧樹脂組成物 - Google Patents
環氧樹脂組成物 Download PDFInfo
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- TW201831551A TW201831551A TW106139497A TW106139497A TW201831551A TW 201831551 A TW201831551 A TW 201831551A TW 106139497 A TW106139497 A TW 106139497A TW 106139497 A TW106139497 A TW 106139497A TW 201831551 A TW201831551 A TW 201831551A
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- Prior art keywords
- group
- epoxy resin
- resin composition
- naphthalene
- compound
- Prior art date
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- 239000003822 epoxy resin Substances 0.000 title claims abstract description 119
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 119
- 239000000203 mixture Substances 0.000 title claims abstract description 111
- 150000001875 compounds Chemical class 0.000 claims abstract description 87
- -1 glycidyloxy group Chemical group 0.000 claims abstract description 81
- 239000004593 Epoxy Substances 0.000 claims abstract description 65
- 125000001624 naphthyl group Chemical group 0.000 claims abstract description 38
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims abstract description 16
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims abstract description 16
- 229920005989 resin Polymers 0.000 claims description 123
- 239000011347 resin Substances 0.000 claims description 123
- 239000000463 material Substances 0.000 claims description 48
- 239000004065 semiconductor Substances 0.000 claims description 34
- 239000003566 sealing material Substances 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 239000012783 reinforcing fiber Substances 0.000 claims description 20
- 239000011888 foil Substances 0.000 claims description 17
- 239000004848 polyfunctional curative Substances 0.000 claims description 17
- 239000003733 fiber-reinforced composite Substances 0.000 claims description 14
- 125000005336 allyloxy group Chemical group 0.000 claims description 12
- 239000011256 inorganic filler Substances 0.000 claims description 12
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 8
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract description 20
- 238000000465 moulding Methods 0.000 abstract description 12
- 125000004104 aryloxy group Chemical group 0.000 abstract description 6
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 35
- 239000000758 substrate Substances 0.000 description 32
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 31
- 238000000034 method Methods 0.000 description 31
- 239000010410 layer Substances 0.000 description 30
- 239000000047 product Substances 0.000 description 30
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 28
- 239000003063 flame retardant Substances 0.000 description 25
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 23
- 150000001336 alkenes Chemical class 0.000 description 18
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 17
- 150000002148 esters Chemical class 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 229920003986 novolac Polymers 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 14
- 125000003700 epoxy group Chemical group 0.000 description 14
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 13
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 12
- 238000002156 mixing Methods 0.000 description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229920000877 Melamine resin Polymers 0.000 description 10
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 9
- 239000007795 chemical reaction product Substances 0.000 description 8
- 239000005011 phenolic resin Substances 0.000 description 8
- 229910052698 phosphorus Inorganic materials 0.000 description 8
- 239000011574 phosphorus Substances 0.000 description 8
- 229920001296 polysiloxane Polymers 0.000 description 8
- 239000002966 varnish Substances 0.000 description 8
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 7
- 239000000835 fiber Substances 0.000 description 7
- 239000005350 fused silica glass Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- 238000003475 lamination Methods 0.000 description 7
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 7
- 229920000049 Carbon (fiber) Polymers 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000004917 carbon fiber Substances 0.000 description 6
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 6
- 238000011049 filling Methods 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 150000003335 secondary amines Chemical group 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 150000003512 tertiary amines Chemical group 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 5
- 125000005605 benzo group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 5
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 5
- 239000000347 magnesium hydroxide Substances 0.000 description 5
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000006735 epoxidation reaction Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 150000002484 inorganic compounds Chemical class 0.000 description 4
- 239000012796 inorganic flame retardant Substances 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 125000002524 organometallic group Chemical group 0.000 description 4
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 4
- 230000003014 reinforcing effect Effects 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001639 boron compounds Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 150000002440 hydroxy compounds Chemical class 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 229910000000 metal hydroxide Inorganic materials 0.000 description 3
- 150000004692 metal hydroxides Chemical class 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 3
- 238000001721 transfer moulding Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 3
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 3
- 229940007718 zinc hydroxide Drugs 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
- QWMFKVNJIYNWII-UHFFFAOYSA-N 5-bromo-2-(2,5-dimethylpyrrol-1-yl)pyridine Chemical compound CC1=CC=C(C)N1C1=CC=C(Br)C=N1 QWMFKVNJIYNWII-UHFFFAOYSA-N 0.000 description 2
- 239000004254 Ammonium phosphate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 2
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical class [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 2
- 235000019289 ammonium phosphates Nutrition 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229910000416 bismuth oxide Inorganic materials 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000002788 crimping Methods 0.000 description 2
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 2
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 2
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 2
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 2
- MWSPFHZPVVWJCO-UHFFFAOYSA-M hydron;methyl(trioctyl)azanium;sulfate Chemical compound OS([O-])(=O)=O.CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC MWSPFHZPVVWJCO-UHFFFAOYSA-M 0.000 description 2
- 229910001701 hydrotalcite Inorganic materials 0.000 description 2
- 229960001545 hydrotalcite Drugs 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Natural products OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 2
- 239000001095 magnesium carbonate Substances 0.000 description 2
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- MBKDYNNUVRNNRF-UHFFFAOYSA-N medronic acid Chemical compound OP(O)(=O)CP(O)(O)=O MBKDYNNUVRNNRF-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 239000005078 molybdenum compound Substances 0.000 description 2
- 150000002752 molybdenum compounds Chemical class 0.000 description 2
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 2
- VSWALKINGSNVAR-UHFFFAOYSA-N naphthalen-1-ol;phenol Chemical compound OC1=CC=CC=C1.C1=CC=C2C(O)=CC=CC2=C1 VSWALKINGSNVAR-UHFFFAOYSA-N 0.000 description 2
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002239 polyacrylonitrile Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
- 238000009461 vacuum packaging Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- XAEWLETZEZXLHR-UHFFFAOYSA-N zinc;dioxido(dioxo)molybdenum Chemical compound [Zn+2].[O-][Mo]([O-])(=O)=O XAEWLETZEZXLHR-UHFFFAOYSA-N 0.000 description 2
- DEQUKPCANKRTPZ-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1O DEQUKPCANKRTPZ-UHFFFAOYSA-N 0.000 description 1
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- KGSFMPRFQVLGTJ-UHFFFAOYSA-N 1,1,2-triphenylethylbenzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 KGSFMPRFQVLGTJ-UHFFFAOYSA-N 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- WMPGCOIUVFJFMG-UHFFFAOYSA-N 1-(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)naphthalene-2,7-diol Chemical compound O1C2=CC=CC=C2C2=CC=CC=C2P1(=O)C1=C(O)C=CC2=CC=C(O)C=C21 WMPGCOIUVFJFMG-UHFFFAOYSA-N 0.000 description 1
- XHTUOWXUBNMVEU-UHFFFAOYSA-N 1-benzoyl-5-ethyl-5-(3-methylbutyl)-1,3-diazinane-2,4,6-trione Chemical group O=C1C(CC)(CCC(C)C)C(=O)NC(=O)N1C(=O)C1=CC=CC=C1 XHTUOWXUBNMVEU-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 1
- IVORCBKUUYGUOL-UHFFFAOYSA-N 1-ethynyl-2,4-dimethoxybenzene Chemical compound COC1=CC=C(C#C)C(OC)=C1 IVORCBKUUYGUOL-UHFFFAOYSA-N 0.000 description 1
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- WEWIXTGTGYBOPU-UHFFFAOYSA-N 2,3-dihydroxypropyl triethyl silicate Chemical compound CCO[Si](OCC)(OCC)OCC(O)CO WEWIXTGTGYBOPU-UHFFFAOYSA-N 0.000 description 1
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- KMRIWYPVRWEWRG-UHFFFAOYSA-N 2-(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(P2(=O)C3=CC=CC=C3C3=CC=CC=C3O2)=C1 KMRIWYPVRWEWRG-UHFFFAOYSA-N 0.000 description 1
- MEVBAGCIOOTPLF-UHFFFAOYSA-N 2-[[5-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C1OC1COC(C=C1C=CC=2)=CC=C1C=2OCC1CO1 MEVBAGCIOOTPLF-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- ODGCZQFTJDEYNI-UHFFFAOYSA-N 2-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1(C)C=CCCC1C(O)=O ODGCZQFTJDEYNI-UHFFFAOYSA-N 0.000 description 1
- GSKNLOOGBYYDHV-UHFFFAOYSA-N 2-methylphenol;naphthalen-1-ol Chemical compound CC1=CC=CC=C1O.C1=CC=C2C(O)=CC=CC2=C1 GSKNLOOGBYYDHV-UHFFFAOYSA-N 0.000 description 1
- ODJQKYXPKWQWNK-UHFFFAOYSA-N 3,3'-Thiobispropanoic acid Chemical compound OC(=O)CCSCCC(O)=O ODJQKYXPKWQWNK-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- XFZVQMVEKCAHDA-UHFFFAOYSA-N 3-phenylsulfanylbenzene-1,2-diamine Chemical compound NC1=CC=CC(SC=2C=CC=CC=2)=C1N XFZVQMVEKCAHDA-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004114 Ammonium polyphosphate Substances 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- RZOHUCYWTBSXAG-UHFFFAOYSA-N C1(=CC=CC=C1O)C.C1(=CC=CC=C1)O.C1=CC=CC2=CC=CC=C12 Chemical compound C1(=CC=CC=C1O)C.C1(=CC=CC=C1)O.C1=CC=CC2=CC=CC=C12 RZOHUCYWTBSXAG-UHFFFAOYSA-N 0.000 description 1
- QWOJMRHUQHTCJG-UHFFFAOYSA-N CC([CH2-])=O Chemical compound CC([CH2-])=O QWOJMRHUQHTCJG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 244000241257 Cucumis melo Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 239000005696 Diammonium phosphate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical class ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- CWGIUBWDKGFONI-UHFFFAOYSA-N S(=O)(=O)([O-])[O-].N1=C(N)N=C(N)N=C1N.N1=C(N)N=C(N)N=C1N.N1=C(N)N=C(N)N=C1N.S(=O)(=O)([O-])[O-].[NH4+].[NH4+].[NH4+].[NH4+] Chemical compound S(=O)(=O)([O-])[O-].N1=C(N)N=C(N)N=C1N.N1=C(N)N=C(N)N=C1N.N1=C(N)N=C(N)N=C1N.S(=O)(=O)([O-])[O-].[NH4+].[NH4+].[NH4+].[NH4+] CWGIUBWDKGFONI-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000003490 Thiodipropionic acid Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- 229940118662 aluminum carbonate Drugs 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- 235000019826 ammonium polyphosphate Nutrition 0.000 description 1
- 229920001276 ammonium polyphosphate Polymers 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- RAVIAPREMXDHPY-UHFFFAOYSA-N anthracene cyanic acid Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C12.C(#N)O RAVIAPREMXDHPY-UHFFFAOYSA-N 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QBLDFAIABQKINO-UHFFFAOYSA-N barium borate Chemical compound [Ba+2].[O-]B=O.[O-]B=O QBLDFAIABQKINO-UHFFFAOYSA-N 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 150000003937 benzamidines Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229940049676 bismuth hydroxide Drugs 0.000 description 1
- TZSXPYWRDWEXHG-UHFFFAOYSA-K bismuth;trihydroxide Chemical compound [OH-].[OH-].[OH-].[Bi+3] TZSXPYWRDWEXHG-UHFFFAOYSA-K 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910021446 cobalt carbonate Inorganic materials 0.000 description 1
- 150000001869 cobalt compounds Chemical class 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- ZOTKGJBKKKVBJZ-UHFFFAOYSA-L cobalt(2+);carbonate Chemical compound [Co+2].[O-]C([O-])=O ZOTKGJBKKKVBJZ-UHFFFAOYSA-L 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
- 235000019838 diammonium phosphate Nutrition 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000010459 dolomite Substances 0.000 description 1
- 229910000514 dolomite Inorganic materials 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- JDVIRCVIXCMTPU-UHFFFAOYSA-N ethanamine;trifluoroborane Chemical compound CCN.FB(F)F JDVIRCVIXCMTPU-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- RAQDACVRFCEPDA-UHFFFAOYSA-L ferrous carbonate Chemical compound [Fe+2].[O-]C([O-])=O RAQDACVRFCEPDA-UHFFFAOYSA-L 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000003976 glyceryl group Chemical group [H]C([*])([H])C(O[H])([H])C(O[H])([H])[H] 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 238000009787 hand lay-up Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- RXPAJWPEYBDXOG-UHFFFAOYSA-N hydron;methyl 4-methoxypyridine-2-carboxylate;chloride Chemical compound Cl.COC(=O)C1=CC(OC)=CC=N1 RXPAJWPEYBDXOG-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 208000023463 mandibuloacral dysplasia Diseases 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 239000006012 monoammonium phosphate Substances 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical group 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000001477 organic nitrogen group Chemical group 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- LYKRPDCJKSXAHS-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrahydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC(C(=O)C=2C=CC=CC=2)=C1O LYKRPDCJKSXAHS-UHFFFAOYSA-N 0.000 description 1
- 150000003002 phosphanes Chemical class 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- LTURHSAEWJPFAA-UHFFFAOYSA-N sulfuric acid;1,3,5-triazine-2,4,6-triamine Chemical compound OS(O)(=O)=O.NC1=NC(N)=NC(N)=N1 LTURHSAEWJPFAA-UHFFFAOYSA-N 0.000 description 1
- 235000019303 thiodipropionic acid Nutrition 0.000 description 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical class SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- FOZHTJJTSSSURD-UHFFFAOYSA-J titanium(4+);dicarbonate Chemical compound [Ti+4].[O-]C([O-])=O.[O-]C([O-])=O FOZHTJJTSSSURD-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000002383 tung oil Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- PZRXQXJGIQEYOG-UHFFFAOYSA-N zinc;oxido(oxo)borane Chemical compound [Zn+2].[O-]B=O.[O-]B=O PZRXQXJGIQEYOG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
- C08G59/245—Di-epoxy compounds carbocyclic aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3218—Carbocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/04—Reinforcing macromolecular compounds with loose or coherent fibrous material
- C08J5/06—Reinforcing macromolecular compounds with loose or coherent fibrous material using pretreated fibrous materials
- C08J5/08—Reinforcing macromolecular compounds with loose or coherent fibrous material using pretreated fibrous materials glass fibres
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/02—Fibres or whiskers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/02—Fibres or whiskers
- C08K7/04—Fibres or whiskers inorganic
- C08K7/06—Elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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Abstract
本發明提供一種硬化成形時之收縮率、硬化物之耐熱性、及硬化物之熱時彈性模數之平衡優異之環氧樹脂組成物。具體而言,提供一種環氧樹脂組成物,其含有萘型環氧化合物與環氧樹脂用硬化劑,萘型環氧化合物具有萘環、選自由與萘環直接鍵結之烯丙基及縮水甘油基所組成之群中之至少一種基(A)、及選自由與萘環直接鍵結之烯丙氧基及縮水甘油氧基所組成之群中之至少一種基(B),且具有烯丙基及烯丙氧基中至少一種、與縮水甘油基及縮水甘油氧基中至少一種。
Description
本發明係關於一種環氧樹脂組成物。又,本發明係關於一種利用環氧樹脂組成物之樹脂材料、半導體密封材料、半導體裝置、預浸體、電路基板、增層膜、纖維強化複合材料、及纖維強化樹脂成形品。
環氧樹脂組成物除用於接著劑、成形材料、塗料、光阻材料、顯色材料等以外,其硬化物由於耐熱性及耐濕性優異,故而亦廣泛用於半導體密封材料、印刷配線板用絕緣材料等電氣、電子領域。
為了用於該等各種用途,在此之前亦對各種環氧樹脂組成物有所研究。例如,於專利文獻1記載有一種硬化性樹脂組成物,其含有具有鍵結於分子內之同一芳香環之縮水甘油基及縮水甘油醚基的多元縮水甘油基化合物(A)、於酚性羥基之鄰位不具有取代基之酚系硬化劑(B)。又,於專利文獻2記載有一種烷氧基矽基系環氧化合物,其具有至少1個烷氧基矽基及至少2個環氧基。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2015-127397號公報
[專利文獻2]日本特表2015-535814號公報
隨著近年來之電子機器之小型化、輕量化之潮流,藉由半導體裝置之配線間距之狹小化而實現高密度化之傾向顯著,而作為與此對應之半導體安裝方法,廣泛使用有藉由焊料球使半導體裝置與基板接合之倒裝晶片連接方式。
該倒裝晶片連接方式係藉由在配線板與半導體之間配置焊料球並加熱整體使其熔融接合之所謂回焊方式而進行之半導體安裝方式。因此存在回焊時配線板本身暴露於高熱環境下,因配線板之熱收縮產生翹曲,對連接配線板與半導體之焊料球產生較大之應力,而引起配線之連接不良之情形。為了抑制此種配線板之翹曲,要求熱時彈性模數及收縮率較高之密封材料作為密封材料。
又,於半導體密封材料之領域中,由於向無鉛焊料移行,故而回焊處理溫度成為高溫,而要求提高耐焊裂性(耐回焊性)。因此,對於半導體密封材料,要求硬化物之耐熱性及熱穩定性優異之樹脂材料。
本發明之目的之一在於提供一種硬化成形時之收縮率、硬化物之耐熱性、及硬化物之熱時彈性模數之平衡優異之環氧樹脂組成物。又,本發明之另一目的在於提供一種使用上述環氧樹脂組成物或其硬化物之樹脂材料、半導體密封材料、半導體裝置、預浸體、電路基板、增層膜、纖維強化複合材料及纖維強化樹脂成形品。
本發明之一個方面係關於一種含有萘型環氧化合物及環氧樹脂用硬化劑之環氧樹脂組成物。於該環氧樹脂組成物中,萘型環氧化合物具有萘環、選自由與上述萘環直接鍵結之烯丙基及縮水甘油基所組成之群中之至少一種基(A)、及選自由與上述萘環直接鍵結之烯丙氧基及縮水甘油氧基所組成之 群中之至少一種基(B),且具有上述烯丙基及上述烯丙氧基中至少一種、及上述縮水甘油基及上述縮水甘油氧基中至少一種。
該環氧樹脂組成物由於含有以剛直之萘環作為核心結構之萘型環氧化合物,故而對其硬化物賦予優異之耐熱性。又,該萘型環氧化合物不僅具有含環氧基之基(縮水甘油基、縮水甘油氧基),亦具有含烯烴之基(烯丙基、烯丙氧基),因此,不僅藉由含環氧基之基彼此之交聯反應,藉由含烯烴之基彼此之交聯反應亦能夠形成交聯結構,而能夠形成具有複雜之交聯結構之硬化物。可認為藉由該複雜之交聯結構,環氧樹脂組成物之硬化成形時之收縮率及硬化物之熱時彈性模數變高。進而,上述萘型環氧化合物具有與萘環鍵結之樣式不同之基(A)及基(B),可認為因該鍵結樣式之不同而交聯結構進一步複雜化,而使硬化成形時之收縮率及硬化物之熱時彈性模數進一步提高。
於一個態樣中,上述萘型環氧化合物亦可具有上述縮水甘油基及上述縮水甘油氧基兩者。
於一個態樣中,上述基(A)亦可鍵結於上述萘環之與上述基(B)相鄰之位置。
本發明之另一方面係關於一種樹脂材料,其含有上述環氧樹脂組成物之硬化物。
本發明之又一方面係關於一種半導體密封材料,其包含上述環氧樹脂組成物,且上述環氧樹脂組成物進而含有無機填充材料。
本發明之又一方面係關於一種半導體裝置,其具備含有上述半導體密封材料之硬化物之密封材料。
本發明之又一方面係關於一種預浸體,其係含有補強基材、及含浸至上述補強基材中之上述環氧樹脂組成物的含浸基材之半硬化物。
本發明之又一方面係關於一種電路基板,其具備金屬箔、及設置 於上述金屬箔上之硬化樹脂層、該硬化樹脂層含有上述環氧樹脂組成物之硬化物。
本發明之又一方面係關於一種增層膜,其含有上述環氧樹脂組成物。
本發明之又一方面係關於一種纖維強化複合材料,其含有上述環氧樹脂組成物之硬化物及強化纖維。
本發明之又一方面係關於一種導電膏,其含有上述環氧樹脂組成物及導電性粒子。
根據本發明,提供一種硬化成形時之收縮率、硬化物之耐熱性、及硬化物之熱時彈性模數之平衡優異之環氧樹脂組成物。
以下,對本發明之較佳之一實施形態進行說明。再者,本發明並不限定於以下之實施形態,例如,於不脫離發明之主旨之範圍內,可對以下之實施形態適當變更而實施。
<環氧樹脂組成物>
本實施形態之環氧樹脂組成物含有萘型環氧化合物及環氧樹脂用硬化劑。
於本實施形態中,萘型環氧化合物具有萘環、選自由與萘環直接鍵結之烯丙基及縮水甘油基所組成之群中之至少一種基(A)、及選自由與萘環直接鍵結之烯丙氧基及縮水甘油氧基所組成之群中之至少一種基(B)。又,萘 型環氧化合物具有選自由與萘環直接鍵結之縮水甘油基及縮水甘油氧基所組成之群中之至少一種含環氧基之基、及選自由與萘環直接鍵結之烯丙基及烯丙氧基所組成之群中之至少一種含烯烴之基。
本實施形態之環氧樹脂組成物由於含有以剛直之萘環作為核心結構之萘型環氧化合物,故而其硬化物之耐熱性優異。又,該萘型環氧化合物不僅具有含環氧基之基,亦具有含烯烴之基,因此,不僅藉由含環氧基之基彼此之交聯反應,藉由含烯烴之基彼此之交聯反應亦能夠形成交聯結構,而能夠形成具有複雜之交聯結構之硬化物。可認為藉由該複雜之交聯結構,環氧樹脂組成物之硬化成形時之收縮率及硬化物之熱時彈性模數變高。進而,萘型環氧化合物具有與萘環鍵結之樣式不同之基(A)及基(B),可認為因該鍵結樣式之不同而交聯結構進一步複雜化,而使硬化成形時之收縮率及硬化物之熱時彈性模數進一步提高。
(萘型環氧化合物)
萘型環氧化合物具有萘環、選自由與萘環直接鍵結之烯丙基及縮水甘油基所組成之群中之至少一種基(A)、及選自由與萘環直接鍵結之烯丙氧基及縮水甘油氧基所組成之群中之至少一種基(B)。基(A)係以碳原子鍵結於萘環,基(B)係以氧原子鍵結於萘環。
此處,烯丙基為下式(1-1)所表示之基,烯丙氧基為下式(1-2)所表示之基。再者,式(1-1)及(1-2)中之波浪線意指於其端處與萘環直接鍵結。又,縮水甘油基為烯丙基之烯烴部分經環氧化之基,縮水甘油氧基為烯丙氧基之烯烴部分經環氧化之基。
又,於萘型環氧化合物中,基(A)及基(B)中至少一者係選 自由縮水甘油基及縮水甘油氧基所組成之群中之至少一種含環氧基之基。萘型環氧化合物藉由含環氧基之基與環氧樹脂用硬化劑之反應,而具有使環氧樹脂組成物硬化之功能。
又,於萘型環氧化合物中,基(A)及基(B)中至少一者係選自由烯丙基及烯丙氧基所組成之群中之至少一種含烯烴之基。萘型環氧化合物不僅具有含環氧基之基,亦具有含烯烴之基,故而能夠形成具有複雜之交聯結構之硬化物。
萘型環氧化合物可為具有上述特徵之一種化合物,亦可為多種化合物之混合物。
於萘型環氧化合物中,含烯烴之基之合計數量C2相對於含環氧基之基及含烯烴之基之合計數量C1+2之比C2/C1+2例如可為0.1以上,較佳為0.2以上,例如可為0.9以下,較佳為0.8以下。有藉由增大比C2/C1+2而硬化成形時之收縮率及硬化物之熱時彈性模數變大之傾向,且有藉由減小比C2/C1+2而硬化物之玻璃轉移溫度變高之傾向。
萘型環氧化合物較佳為基(A)之至少一者為縮水甘油基,且基(B)之至少一者為縮水甘油氧基。即,作為萘型環氧化合物,較佳為具有與萘環直接鍵結之縮水甘油基及縮水甘油氧基。此種萘型環氧化合物具有與萘環鍵結之樣式不同之含環氧基之基,且由於該鍵結樣式而能夠形成複雜之交聯結構。
於萘型環氧化合物中,基(A)較佳為鍵結於萘環之與基(B)相鄰之位置。例如,於萘型環氧化合物中,於在萘環之1位鍵結有基(B)之情形時,基(A)較佳為鍵結於萘環之2位。又,於在萘環之2位鍵結有基(B)之情形時,基(A)較佳為鍵結於萘環之1位或3位,更佳為鍵結於1位。此種萘型環氧化合物能夠藉由Synlett,2006,14,2211.所記載之方法等而容易地合成原料化合物,故而生產性優異。
萘型環氧化合物較佳為於分子內具有2個以上之基(A)。基(A)之數量較佳為2~4個,更佳為2~3個。
萘型環氧化合物較佳為於分子內具有2個以上之基(B)。基(B)之數量較佳為2~4個,更佳為2~3個。
萘型環氧化合物較佳為於分子內具有2個以上之含環氧基之基。含環氧基之基之數量較佳為2~4個,更佳為2~3個。
於萘型環氧化合物之萘環,亦可縮合其他環。又,於萘型環氧化合物之萘環上亦可進而鍵結有除基(A)及基(B)以外之基(以下,亦稱為其他基)。其他基只要為不會妨礙環氧樹脂組成物之硬化之基即可。作為其他基,例如可列舉:鹵素基(例如,氟基、氯基、溴基、碘基等)、烷氧基(例如,碳數1~10之烷氧基)、芳氧基(例如,碳數6~10之芳氧基)、醯基(例如,碳數1~10之醯基)、醯氧基(例如,碳數1~10之醯氧基)、烴基(例如,碳數1~20之烴基)等。又,關於該等基,該基所具有之氫原子之一部分或全部可經鹵素基取代,且於該基之內部亦可插入有選自由二級胺基、三級胺基、氧基及羰基所組成之群中之至少一種。再者,所謂「亦可插入有選自由二級胺基、三級胺基、氧基及羰基所組成之群中之至少一種」,意指亦可於上述基所具有之C-C鍵或C-H鍵之間插入有二級或三級胺基(-NR-)、氧基(-O-)、羰基(-C(=O)-)、該等連結而成之醯胺基(-C(=O)NR-)、及氧基羰基(-OC(=O)-)等。
作為烷氧基,例如可列舉:甲氧基、乙氧基、第三丁氧基等。又,作為於烷氧基之內部插入有選自由二級胺基、三級胺基、氧基及羰基所組成之群中之至少一種之基,例如可列舉:甲氧基乙氧基、甲基羧基、乙基羧基等。
作為芳氧基,例如可列舉:苯氧基、甲苯氧基等。作為於芳氧基之內部插入有選自由二級胺基、三級胺基、氧基及羰基所組成之群中之至少一種之基,例如可列舉:甲氧基苯氧基、乙氧基苯氧基、第三丁氧基苯氧基等。
作為醯基,例如可列舉:乙醯基、丙醯基、苯甲醯基等。
作為醯氧基,例如可列舉:乙醯氧基、丙醯氧基、苯甲醯氧基等。
作為烴基,可列舉:飽和烴基、不飽和烴基。飽和烴基及不飽和烴基亦可分別為直鏈狀、支鏈狀或環狀。即,於烴基中含有烷基(例如,甲基、第三丁基、正己基等)、環烷基(例如,環己基等)、炔基(例如,乙炔基、丙炔基等)、烯基(例如,乙烯基、丙烯基等)、及芳基(例如,苯基、苄基、甲苯基等)。作為於烴基之內部插入有選自由二級胺基、三級胺基、氧基及羰基所組成之群中之至少一種之基,例如可列舉:甲氧基甲基、2-甲氧基乙氧基甲基等。
作為萘型環氧化合物,例如可列舉下式(2)所表示之化合物。
式(2)中,R1表示除基(A)及基(B)以外之基。又,j表示0~6之整數,k、l、m及n分別獨立地表示0~7之整數,j+k+l+m+n為2以上且8以下,k+m為1以上且7以下,l+n為1以上且7以下,k+l為1以上且7以下,m+n為1以上且7以下。
k及1分別較佳為1~4,更佳為1~3,進而較佳為1或2。又,較佳為k及l中至少一者為2,更佳為另一者為1或2。又,k+m較佳為2~4,更佳為2~3,進而較佳為2。又,l+n較佳為2~4,更佳為2~3,進而較佳為2。
作為萘型環氧化合物之具體例,可列舉:1-縮水甘油氧基-5-烯丙氧基-2,6-二縮水甘油基萘、1-縮水甘油氧基-5-烯丙氧基-2-縮水甘油基-6-烯丙基萘、1-縮水甘油氧基-5-烯丙氧基-2,6-二烯丙基萘、1,5-二烯丙氧基-2,6-二縮水甘油基萘等。
萘型環氧化合物之製造方法並無特別限定。例如,可藉由準備具有萘環及與萘環直接鍵結之烯丙基及烯丙氧基之原料化合物,並將該原料化合物中之烯丙基及烯丙氧基之一部分環氧化,而製造萘型環氧化合物。
環氧樹脂組成物中之萘型環氧化合物之含量例如可為10質量%以上,較佳為20質量%以上,更佳為30質量%以上。
(環氧樹脂用硬化劑)
環氧樹脂用硬化劑並無特別限定,只要為能夠使萘型環氧化合物所具有之含環氧基之基彼此交聯之成分即可。
作為環氧樹脂用硬化劑,例如可列舉胺系化合物、醯胺系化合物、酸酐系化合物、酚系化合物等各種公知之硬化劑。
具體而言,作為胺系化合物,可列舉:二胺基二苯甲烷、二伸乙基三胺、三伸乙基四胺、二胺基二苯基碸、異佛爾酮二胺、咪唑、BF3-胺錯合物、胍衍生物等。又,作為醯胺系化合物,可列舉:二氰二胺、由次亞麻油酸之二聚物與乙二胺合成之聚醯胺樹脂等。又,作為酸酐系化合物,可列舉:鄰苯二甲酸酐、偏苯三甲酸酐、均苯四甲酸二酐、順丁烯二酸酐、四氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、甲基耐地酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐等。又,作為酚系化合物,可列舉:苯酚酚醛清漆樹脂、甲酚酚醛清漆樹脂、芳香族烴甲醛樹脂改質酚樹脂、二環戊二烯苯酚加成型樹脂、苯酚芳烷基樹脂(ZYLOCK樹脂)、萘酚芳烷基樹脂、三酚基甲烷樹脂、四酚基乙烷樹脂、萘酚酚醛清漆樹脂、萘酚-苯酚共縮酚醛清漆樹脂、萘酚-甲酚共縮酚醛清漆樹脂、聯苯改質酚樹脂(以雙亞甲基連結酚核之含多元酚性羥基化合物)、聯苯改質萘酚樹脂(以雙亞甲基連結酚核之多元萘酚化合物)、胺基三改質酚樹脂(以三聚氰胺、苯胍胺等連結酚核之含多元酚性羥基化合物)或含烷氧基芳香環改質酚醛清漆樹脂(以甲醛連結酚核及含烷氧基芳香環之含多元酚性羥基化合物) 等含多元酚性羥基化合物。
環氧樹脂組成物中之環氧樹脂用硬化劑之含量例如可為0.001質量%以上,較佳為0.01質量%以上,更佳為0.1質量%以上。又,環氧樹脂組成物中之環氧樹脂用硬化劑之含量例如可為90質量%以下,較佳為80質量%以下,更佳為70質量%以下。
(其他成分)
環氧樹脂組成物亦可進而含有除萘型環氧化合物及環氧樹脂用硬化劑以外之其他成分。
例如,環氧樹脂組成物亦可進而含有除萘型環氧化合物以外之熱硬化性樹脂。
作為該熱硬化性樹脂,例如可列舉:氰酸酯樹脂、具有苯并 結構之樹脂、順丁烯二醯亞胺化合物、活性酯樹脂、乙烯基苄基化合物、丙烯酸化合物、苯乙烯與順丁烯二酸酐之共聚物等。於併用該等熱硬化性樹脂之情形時,其使用量只要為不妨礙上述效果之範圍,則並無特別限制,例如較佳為以環氧樹脂組成物之總量基準計未達50質量。
作為氰酸酯樹脂,例如可列舉:雙酚A型氰酸酯樹脂、雙酚F型氰酸酯樹脂、雙酚E型氰酸酯樹脂、雙酚S型氰酸酯樹脂、雙酚硫醚型氰酸酯樹脂、苯醚型氰酸酯樹脂、萘醚型氰酸酯樹脂、聯苯型氰酸酯樹脂、四甲基聯苯型氰酸酯樹脂、多羥基萘型氰酸酯樹脂、苯酚酚醛清漆型氰酸酯樹脂、甲酚酚醛清漆型氰酸酯樹脂、三苯甲烷型氰酸酯樹脂、四苯乙烷型氰酸酯樹脂、二環戊二烯-苯酚加成反應型氰酸酯樹脂、苯酚芳烷基型氰酸酯樹脂、萘酚酚醛清漆型氰酸酯樹脂、萘酚芳烷基型氰酸酯樹脂、萘酚-苯酚共縮酚醛清漆型氰酸酯樹脂、萘酚-甲酚共縮酚醛清漆型氰酸酯樹脂、芳香族烴甲醛樹脂改質酚樹脂型氰酸酯樹脂、聯苯改質酚醛清漆型氰酸酯樹脂、蒽型氰酸酯樹脂等。該等可分別 單獨使用,亦可將2種以上併用。
於該等氰酸酯樹脂中,尤其是於獲得耐熱性優異之硬化物之方面而言,較佳為使用雙酚A型氰酸酯樹脂、雙酚F型氰酸酯樹脂、雙酚E型氰酸酯樹脂、多羥基萘型氰酸酯樹脂、萘醚型氰酸酯樹脂、酚醛清漆型氰酸酯樹脂,於獲得介電特性優異之硬化物之方面而言,較佳為二環戊二烯-苯酚加成反應型氰酸酯樹脂。
作為具有苯并結構之樹脂,並無特別限制,例如可列舉:雙酚F與福馬林及苯胺之反應產物(F-a型苯并樹脂)、二胺基二苯甲烷與福馬林及苯酚之反應產物(P-d型苯并樹脂)、雙酚A與福馬林及苯胺之反應產物、二羥基二苯醚與福馬林及苯胺之反應產物、二胺基二苯醚與福馬林及苯酚之反應產物、二環戊二烯-苯酚加成型樹脂與福馬林及苯胺之反應產物、酚酞與福馬林及苯胺之反應產物、二苯硫醚與福馬林及苯胺之反應產物等。該等可分別單獨使用,亦可將2種以上併用。
作為順丁烯二醯亞胺化合物,例如可列舉下式(i)~(iii)所表示之化合物。順丁烯二醯亞胺化合物可單獨使用一種,或亦可將2種以上併用。
式(i)中,R表示s價之有機基,α及β分別獨立地表示氫原子、鹵素原子、烷基或芳基,s表示1以上之整數。
式(ii)中,R表示氫原子、烷基、芳基、芳烷基、鹵素原子、羥基或烷氧基,s表示1~3之整數,t係重複單元之平均值,為0~10。
式(iii)中,R表示氫原子、烷基、芳基、芳烷基、鹵素原子、羥基或烷氧基,s表示1~3之整數,t係重複單元之平均值,為0~10。
作為上述活性酯樹脂,並無特別限制,通常較佳地使用酚酯類、苯硫酚酯類、N-羥基胺酯類、雜環羥基化合物之酯類等在1個分子中具有2個以上之反應活性較高之酯基之化合物。活性酯樹脂較佳為藉由羧酸化合物及/或硫羧酸化合物與羥基化合物及/或硫醇化合物之縮合反應而獲得者。尤其是就提高耐熱性之觀點而言,較佳為由羧酸化合物或其鹵化物與羥基化合物之反應而獲得之活性酯樹脂,更佳為由羧酸化合物或其鹵化物與酚化合物及/或萘酚化合物之反應而獲得之活性酯樹脂。作為羧酸化合物,例如可列舉:苯甲酸、乙酸、丁二酸、順丁烯二酸、伊康酸、鄰苯二甲酸、間苯二甲酸、對苯二甲酸、均苯四甲酸等、或其鹵化物。作為酚化合物或萘酚化合物,可列舉:對苯二酚、間苯二酚、雙酚A、雙酚F、雙酚S、二羥基二苯醚、酚酞、甲基化雙酚A、甲基化雙酚F、甲基化雙酚S、苯酚、鄰甲酚、間甲酚、對甲酚、鄰苯二酚、α-萘酚、β- 萘酚、1,5-二羥基萘、1,6-二羥基萘、2,6-二羥基萘、二羥基二苯甲酮、三羥基二苯甲酮、四羥基二苯甲酮、間苯三酚、苯三醇、二環戊二烯-苯酚加成型樹脂等。
作為活性酯樹脂,具體而言,較佳為包含二環戊二烯-苯酚加成結構之活性酯系樹脂、包含萘結構之活性酯樹脂、作為苯酚酚醛清漆之乙醯化物之活性酯樹脂、作為苯酚酚醛清漆之苯甲醯化物之活性酯樹脂等,其中,於剝離強度之提高優異之方面而言,更佳為包含二環戊二烯-苯酚加成結構之活性酯樹脂、包含萘結構之活性酯樹脂。作為包含二環戊二烯-苯酚加成結構之活性酯樹脂,更具體而言,可列舉下述通式(iv)所表示之化合物。
式(iv)中,R表示苯基或萘基,u表示0或1,n係重複單元之平均值,為0.05~2.5。再者,就降低環氧樹脂組成物之硬化物之介電損耗正切,提高耐熱性之觀點而言,R較佳為萘基,u較佳為0,又,n較佳為0.25~1.5。
本實施形態之環氧樹脂組成物即便僅使用萘型環氧化合物及環氧樹脂用硬化劑,硬化亦會進行,但亦可併用硬化促進劑。作為硬化促進劑,可列舉:咪唑、二甲胺基吡啶等三級胺化合物;三苯基膦等磷系化合物;三氟化硼、三氟化硼單乙基胺錯合物等三氟化硼胺錯合物;硫代二丙酸等有機酸化合物;硫代聯苯酚苯并、磺醯基苯并等苯并化合物;磺醯基化合物等。該等可分別單獨使用,亦可將2種以上併用。該等觸媒之量較佳為以環氧樹脂組成物之總量基準計為0.001~15質量%之範圍。
本實施形態之環氧樹脂組成物為了獲得較高之難燃性,亦可摻合難燃劑。藉此,可較佳地用於要求較高之難燃性之用途。作為難燃劑,較佳為實質上不含有鹵素原子之非鹵素系難燃劑。
非鹵素系難燃劑例如可列舉:磷系難燃劑、氮系難燃劑、聚矽氧系難燃劑、無機系難燃劑、有機金屬鹽系難燃劑等。該等可單獨使用,亦可使用多個相同系之難燃劑,又,亦能夠將不同系之難燃劑組合使用。
磷系難燃劑可使用無機系、有機系之任一者。作為無機系化合物,例如可列舉:紅磷、磷酸一銨、磷酸二銨、磷酸三銨、多磷酸銨等磷酸銨類,磷酸醯胺等無機系含氮磷化合物。
為了防止水解等,紅磷較佳為實施過表面處理,作為表面處理方法,例如可列舉如下等方法:(i)使用氫氧化鎂、氫氧化鋁、氫氧化鋅、氫氧化鈦、氧化鉍、氫氧化鉍、硝酸鉍或該等之混合物等無機化合物進行被覆處理;(ii)使用氫氧化鎂、氫氧化鋁、氫氧化鋅、氫氧化鈦等無機化合物,及酚樹脂等熱硬化性樹脂之混合物進行被覆處理;(iii)於氫氧化鎂、氫氧化鋁、氫氧化鋅、氫氧化鈦等無機化合物之被膜上使用酚樹脂等熱硬化性樹脂進行雙重被覆處理。
有機磷系化合物例如可列舉:磷酸酯化合物、膦酸化合物、次膦酸化合物、氧化膦化合物、磷烷化合物、有機系含氮磷化合物等通用有機磷系化合物,以及9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物、10-(2,5-二羥基苯基)-10H-9-氧雜-10-磷雜菲-10-氧化物、10-(2,7-二羥基萘基)-10H-9-氧雜-10-磷雜菲-10-氧化物等環狀有機磷化合物及使其與環氧樹脂或酚樹脂等化合物進行反應而生成之衍生物等。
磷系難燃劑之摻合量係根據磷系難燃劑之種類、環氧樹脂組成物之其他成分、所需之難燃性之程度等而進行適當選擇,例如,以環氧樹脂組成物之總量基準計,於使用紅磷作為非鹵素系難燃劑之情形時,較佳為於0.1~2.0質量%之範圍內進行摻合,於使用有機磷化合物之情形時,同樣地較佳為於0.1~10.0質量%之範圍內進行摻合,更佳為於0.5~6.0質量%之範圍內進行摻合。
於使用磷系難燃劑之情形時,亦可併用水滑石、氫氧化鎂、硼化合物、氧化鋯、黑色染料、碳酸鈣、沸石、鉬酸鋅、活性碳等。
作為氮系難燃劑,例如可列舉:三化合物、三聚氰酸化合物、異三聚氰酸化合物、啡噻等,較佳為三化合物、三聚氰酸化合物、異三聚氰酸化合物。
作為三化合物,例如可列舉:三聚氰胺、乙醯胍胺、苯胍胺、三聚二氰亞胺(melon)、蜜白胺、琥珀醯胍胺、伸乙基二(三聚氰胺)、多磷酸三聚氰胺、三胍胺等,此外例如可列舉:(1)硫酸脒基三聚氰胺、硫酸蜜勒胺、硫酸蜜白胺等硫酸胺基三化合物;(2)苯酚、甲酚、二甲苯酚、丁基苯酚、壬基苯酚等酚類與三聚氰胺、苯胍胺、乙醯胍胺、甲醯胍胺(formguanamine)等三聚氰胺類及甲醛之共縮合物;(3)上述(2)之共縮合物與苯酚-甲醛縮合物等酚樹脂類之混合物;(4)進而使用桐油、異構化亞麻仁油等將上述(2)或(3)改質而得者。
作為三聚氰酸化合物,例如可列舉:三聚氰酸、三聚氰酸三聚氰胺等。
作為氮系難燃劑之摻合量,根據氮系難燃劑之種類、環氧樹脂組成物之其他成分、所需之難燃性之程度等而進行適當選擇,例如,以環氧樹脂組成物之總量基準計,較佳為於0.05~10質量%之範圍內進行摻合,更佳為於0.1~5質量%之範圍內進行摻合。
又,於使用氮系難燃劑時,亦可併用金屬氫氧化物、鉬化合物等。
聚矽氧系難燃劑只要為含有矽原子之有機化合物,則可並無特別限制地使用,例如可列舉:聚矽氧油、聚矽氧橡膠、聚矽氧樹脂等。作為聚矽氧系難燃劑之摻合量,根據聚矽氧系難燃劑之種類、環氧樹脂組成物之其他成分、所需之難燃性之程度等而進行適當選擇,例如,以環氧樹脂組成物之總量 基準計,較佳為於0.05~20質量%之範圍內進行摻合。又,於使用聚矽氧系難燃劑時,亦可併用鉬化合物、氧化鋁等。
作為無機系難燃劑,例如可列舉:金屬氫氧化物、金屬氧化物、金屬碳酸鹽化合物、金屬粉、硼化合物、低熔點玻璃等。
作為金屬氫氧化物,例如可列舉:氫氧化鋁、氫氧化鎂、白雲石、水滑石、氫氧化鈣、氫氧化鋇、氫氧化鋯等。
作為金屬氧化物,例如可列舉:鉬酸鋅、三氧化鉬、錫酸鋅、氧化錫、氧化鋁、氧化鐵、氧化鈦、氧化錳、氧化鋯、氧化鋅、氧化鉬、氧化鈷、氧化鉍、氧化鉻、氧化鎳、氧化銅、氧化鎢等。
作為金屬碳酸鹽化合物,例如可列舉:碳酸鋅、碳酸鎂、碳酸鈣、碳酸鋇、鹼性碳酸鎂、碳酸鋁、碳酸鐵、碳酸鈷、碳酸鈦等。
作為金屬粉,例如可列舉:鋁、鐵、鈦、錳、鋅、鉬、鈷、鉍、鉻、鎳、銅、鎢、錫等。
作為硼化合物,例如可列舉:硼酸鋅、偏硼酸鋅、偏硼酸鋇、硼酸、硼砂等。
低熔點玻璃例如可列舉:CEEPREE(Bokusui Brown公司)、水合玻璃SiO2-MgO-H2O、PbO-B2O3系、ZnO-P2O5-MgO系、P2O5-B2O3-PbO-MgO系、P-Sn-O-F系、PbO-V2O5-TeO2系、Al2O3-H2O系、硼矽酸鉛系等玻璃狀化合物。
無機系難燃劑之摻合量係根據無機系難燃劑之種類、環氧樹脂組成物之其他成分、所需之難燃性之程度等而進行適當選擇,例如,以環氧樹脂組成物之總量基準計,較佳為於0.05~20質量%之範圍內進行摻合,更佳為於0.5~15質量%之範圍內進行摻合。
有機金屬鹽系難燃劑例如可列舉:二茂鐵、乙醯丙酮金屬錯合物、有機金屬羰基化合物、有機鈷鹽化合物、有機磺酸金屬鹽、金屬原子與芳 香族化合物或雜環化合物進行離子鍵結或配位鍵結而成之化合物等。
有機金屬鹽系難燃劑之摻合量係根據有機金屬鹽系難燃劑之種類、環氧樹脂組成物之其他成分、所需之難燃性之程度等而進行適當選擇,例如,以環氧樹脂組成物之總量基準計,較佳為於0.005~10質量%之範圍內進行摻合。
於環氧樹脂組成物中亦可視需要摻合無機填充材料。作為無機填充材料,例如可列舉:熔融氧化矽、晶性氧化矽、氧化鋁、氮化矽、氫氧化鋁等。於特別增加無機填充材料之摻合量之情形時,較佳為使用熔融氧化矽。熔融氧化矽可使用破碎狀、球狀之任一者,但為了提高熔融氧化矽之摻合量且抑制成形材料之熔融黏度之上升,較佳為主要使用球狀之熔融氧化矽。進而為了增加球狀氧化矽之摻合量,較佳為適當地調整球狀氧化矽之粒度分佈。其填充率考慮到難燃性較佳為較高,特佳為以環氧樹脂組成物(包含無機填充材料)之總量基準計為20質量%以上。又,無機填充材料之填充率例如以環氧樹脂組成物之總量基準計可為95質量%以下。又,於使用於導電膏等用途之情形時,可使用銀粉或銅粉等導電性填充劑。
除此之外,環氧樹脂組成物視需要可添加矽烷偶合劑、脫模劑、顏料、乳化劑等各種摻合劑。
<環氧樹脂組成物之用途>
本實施形態之環氧樹脂組成物之硬化成形時之收縮率、硬化物之耐熱性、及硬化物之熱時彈性模數優異。因此,環氧樹脂組成物、環氧樹脂組成物之硬化物、及包含該硬化物之樹脂材料可分別較佳地使用於各種用途。例如,於本實施形態中,可將環氧樹脂組成物應用於半導體密封材料、半導體裝置、預浸體、電路基板(印刷電路基板、增層基板等)、增層膜、纖維強化複合材料、纖維強化樹脂成形品、導電膏等。
1.半導體密封材料
本實施形態之半導體密封材料含有上述環氧樹脂組成物。環氧樹脂組成物含有無機填充材料,亦可進而含有其他摻合劑。半導體密封材料例如亦可藉由使用擠出機、捏合機、輥等將萘型環氧化合物、環氧樹脂用硬化劑及無機填充材料(視需要進而其他摻合劑)進行熔融混合而製備。作為無機填充劑,通常使用熔融氧化矽。又,於用作功率電晶體、功率IC等所使用之高導熱半導體密封材料之情形時,亦可使用導熱率更高之晶性氧化矽、氧化鋁、氮化矽等而進行高填充化。
無機填充材料之填充率較佳為相對於環氧樹脂組成物100質量份例如為30~95質量份。又,就謀求提高難燃性、耐濕性及耐焊裂性以及降低線膨脹係數之觀點而言,無機填充材料之填充率更佳為相對於環氧樹脂組成物100質量份為70質量份以上,進而較佳為80質量份以上。
2.半導體裝置
本實施形態之半導體裝置具備含有上述半導體密封材料之硬化物之密封材料。密封材料之形成方法並無特別限定,例如可列舉如下方法:使用澆鑄成形機、轉移成形機、射出成形機等將半導體密封材料進行成形,於50~200℃加熱2~10小時之間。
於本實施形態中,密封材料以外之半導體裝置之構成並無特別限定,可為公知之構成。即,本實施形態之半導體裝置亦可將公知之半導體裝置中之密封材料替換為上述密封材料。
3.預浸體
本實施形態之預浸體係含有補強基材及含浸至該補強基材中之上述環氧樹脂組成物的含浸基材之半硬化物。預浸體之製造方法並無特別限定,例如可列舉如下方法:將摻合有機溶劑而經清漆化之環氧樹脂組成物含浸於補強基材 (紙、玻璃布、玻璃不織布、芳香族聚醯胺紙、芳香族聚醯胺布、玻璃氈、玻璃粗紗布等)中之後,於與所使用之溶劑種類對應之加熱溫度(例如50~170℃)下進行加熱。環氧樹脂組成物與補強基材之比率並無特別限定,例如,較佳為以預浸體中之樹脂成分成為20~60質量%之方式進行製備。
作為此處所使用之有機溶劑,例如可列舉:甲基乙基酮、丙酮、二甲基甲醯胺、甲基異丁基酮、甲氧基丙醇、環己酮、甲基賽璐蘇、二乙二醇乙醚乙酸酯、丙二醇單甲醚乙酸酯等。有機溶劑之種類及使用量可根據用途而適當選擇。例如,於由預浸體製造印刷電路基板之情形時,較佳為使用甲基乙基酮、丙酮、二甲基甲醯胺等沸點為160℃以下之極性溶劑,又,較佳為以不揮發成分成為40質量%~80質量%之比率而使用。
4.電路基板
本實施形態之電路基板具備金屬箔及設置於金屬箔上之硬化樹脂層,硬化樹脂層含有上述環氧樹脂組成物之硬化物。作為本實施形態之電路基板之具體例,可列舉:印刷電路基板、增層基板等。
4-1.印刷電路基板
本實施形態之印刷電路基板具備金屬箔及設置於金屬箔上之硬化樹脂層。於本實施形態中,例如硬化樹脂層可由上述預浸體之硬化物所構成。即,硬化樹脂層可含有環氧樹脂組成物之硬化物及補強基材。作為金屬箔,例如可列舉銅箔,較佳為銅箔。
本實施形態之印刷電路基板中,上述以外之構成並無特別限定,例如可進而具備公知之印刷電路基板所具有之構成。
印刷電路基板之製造方法並無特別限定。例如,印刷電路基板之製造方法可包括如下步驟:將上述預浸體與銅箔積層,於1~10MPa之加壓下且於170~300℃加熱壓接10分鐘~3小時。
4-2.增層基板
本實施形態之增層基板具備金屬箔及設置於金屬箔上之硬化樹脂層,且硬化樹脂層包含上述環氧樹脂組成物之硬化物。作為金屬箔,例如可列舉銅箔,較佳為銅箔。
關於本實施形態之增層基板,上述以外之構成並無特別限定,例如可進而具備公知之增層基板所具備之構成。
增層基板之製造方法並無特別限定。例如,增層基板之製造方法可包括以下之步驟1~3。於步驟1中,首先,使用噴塗法、淋幕式塗佈法等將適當地摻合有橡膠、填料等之上述環氧樹脂組成物塗佈於電路基板之後,使其硬化。藉由步驟1,於電路基板上形成包含環氧樹脂組成物之硬化物之硬化樹脂層。於步驟2中,視需要於塗佈有環氧樹脂組成物之電路基板上進行特定之通孔部等之開孔之後,藉由粗化劑進行處理,並將其表面用熱水洗淨,藉此於基板上形成凹凸,並使用銅等金屬進行鍍敷處理。藉由步驟2,而於硬化樹脂層上形成金屬箔。於步驟3中,視需要按順序反覆進行步驟1及步驟2之操作,將樹脂絕緣層(硬化樹脂層)及特定之電路圖案之導體層交替地堆疊而成形為增層基板。再者,於該製造方法中,通孔部之開孔較佳為例如於形成最外層之樹脂絕緣層後進行。
又,於增層基板之製造方法之另一態樣中,例如亦可藉由在170~300℃將於金屬箔上使環氧樹脂組成物半硬化而成之附樹脂之金屬箔加熱壓接至電路基板上而形成粗化面。藉此能夠省略鍍敷處理之步驟。
5.增層膜
本實施形態之增層膜含有上述環氧樹脂組成物。本實施形態之增層膜亦可具備基材膜及設置於基材膜上之含有上述環氧樹脂組成物之樹脂層。增層膜亦可於樹脂層之與基材膜相反側之面上進而具備保護膜。
關於增層膜,重要的是在真空層壓法中之層壓之溫度條件(通常為70~140℃)下軟化,且在對電路基板之層壓時,顯示出於電路基板之導孔或通孔內能夠填充樹脂之流動性(樹脂流動),環氧樹脂組成物較佳為以表現出此種特性之方式摻合各成分。
再者,電路基板之通孔之直徑通常為0.1~0.5mm、深度通常為0.1~1.2mm,增層膜較佳為能夠對此種通孔填充樹脂者。再者,於對電路基板之雙面進行層壓之情形時,只要填充至通孔之1/2左右之深度為止即可。
增層膜之製造方法並無特別限定。例如,作為增層膜之製造方法,可列舉如下方法:於在基材膜上塗佈環氧樹脂組成物之後,使其乾燥而形成樹脂層。環氧樹脂組成物可摻合有機溶劑並進行清漆化,而塗佈於基材膜上。又,有機溶劑之乾燥可藉由加熱、吹送熱風等而進行。
作為有機溶劑,例如較佳為使用:丙酮、甲基乙基酮、環己酮等酮類,乙酸乙酯、乙酸丁酯、乙酸賽璐蘇、丙二醇單甲醚乙酸酯、卡必醇乙酸酯等乙酸酯類,賽璐蘇、丁基卡必醇等卡必醇類,甲苯、二甲苯等芳香族烴類,二甲基甲醯胺,二甲基乙醯胺,N-甲基吡咯啶酮等,又,較佳為以不揮發成分成為30質量%~60質量%之比率而使用。
樹脂層之厚度通常需要設為電路基板所具有之導體層之厚度以上。電路基板之導體層之厚度通常為5~70μm之範圍,因此樹脂層較佳為具有10~100μm之厚度。
樹脂層亦可利用保護膜進行保護。藉由利用保護膜進行保護,能夠防止污物等對樹脂層表面之附著或劃痕。
基材膜及保護膜亦可為聚乙烯、聚丙烯、聚氯乙烯等聚烯烴,聚對苯二甲酸乙二酯(以下有簡稱為「PET」之情況)、聚萘二甲酸乙二酯等聚酯,聚碳酸酯、聚醯亞胺等樹脂膜。又,基材膜及保護膜亦可為脫模紙、金屬箔(例 如,銅箔、鋁箔等)等。基材膜及保護膜亦可實施MAD處理、電暈處理、脫模處理等表面處理。支持膜之厚度並無特別限定,通常為10~150μm,較佳為25~50μm。又,保護膜之厚度並無特別限定,較佳為設為1~40μm。
基材膜可於將增層膜層壓至電路基板之後,或藉由加熱硬化使樹脂層硬化而形成樹脂絕緣層之後被剝離。若於將增層膜之樹脂層加熱硬化之後將基材膜剝離,則可防止硬化步驟中之污物等之附著。於樹脂層之硬化後將基材膜剝離之情形時,較佳為預先對基材膜實施脫模處理。
增層膜之用途並無限定,例如可用於多層印刷電路基板之製造。例如於使用保護膜保護樹脂層之情形時,將保護膜剝離之後,增層膜以樹脂層與電路基板直接相接之方式層壓於電路基板之單面或雙面。層壓可藉由例如真空層壓法等而實施。又,層壓之方法可為批次式,亦可為使用輥之連續式。又,視需要亦可於進行層壓之前,對增層膜及電路基板進行加熱(預熱)。關於層壓之條件,較佳為將壓接溫度(層壓溫度)設為70~140℃,較佳為將壓接壓力設為1~11kgf/cm2(9.8×104~107.9×104N/m2),較佳為於氣壓為20mmH g(26.7hPa)以下之減壓下進行層壓。
6.纖維強化複合材料
本實施形態之纖維強化複合材料含有上述環氧樹脂組成物之硬化物及強化纖維。本實施形態之纖維強化複合材料可為使環氧樹脂組成物含浸於強化纖維中並進行硬化而得之複合材料,亦可為使強化纖維分散於環氧樹脂組成物中並進行硬化而得之複合材料。
纖維強化複合材料之製造方法並無特別限定,例如可藉由在將環氧樹脂組成物之清漆含浸至由強化纖維所構成之強化纖維基材中之後,使其進行聚合反應而製造。聚合反應之硬化溫度較佳為例如50~250℃,且較佳為以50~100℃使其硬化而製成不黏著狀之硬化物之後,進而於120~200℃進行處理。
強化纖維並無特別限定,可為有撚紗、解撚紗、無撚紗等,就兼具纖維強化樹脂成形品之成形性與機械強度之觀點而言,較佳為解撚紗及無撚紗。又,強化纖維之形態並無特別限定,例如可使用將纖維方向朝一個方向拉齊者或梭織物等。關於梭織物,可根據所使用之部位或用途,自平紋織物、緞紋織物等中自由地進行選擇。
作為強化纖維之材質,就機械強度或耐久性優異之方面而言,可列舉碳纖維、玻璃纖維、芳香族聚醯胺纖維、硼纖維、氧化鋁纖維、碳化矽纖維等,亦可併用該等之2種以上。該等中,尤其是就成形品之強度成為良好者之方面而言,較佳為碳纖維。又,碳纖維可使用聚丙烯腈系、瀝青系、嫘縈系等各種碳纖維。其中,較佳為容易獲得高強度之碳纖維之聚丙烯腈系碳纖維。將清漆含浸於由強化纖維所構成之強化纖維基材中而製成纖維強化複合材料時之強化纖維的使用量較佳為纖維強化複合材料中之強化纖維之體積含有率成為40%~85%之範圍之量。
7.纖維強化樹脂成形品
本實施形態之纖維強化樹脂成形品可為含有上述纖維強化複合材料者。本實施形態之纖維強化樹脂成形品亦可稱為含有強化纖維及上述環氧樹脂組成物之硬化物之成形品。
纖維強化樹脂成形品之製造方法並無特別限定。例如,纖維強化樹脂成形品可藉由使包含上述環氧樹脂組成物及強化纖維之複合材料加熱硬化而獲得。又,纖維強化樹脂成形品可藉由將纖維骨材鋪於模具內,且多重積層環氧樹脂組成物之清漆之手工塗佈法(hand lay-up method)或噴布法(spray up method)而製造。又,纖維強化樹脂成形品亦可藉由真空包裝法而製造,該真空包裝法係使用公模或母模,一面將清漆含浸於由強化纖維所構成之強化纖維基材中一面堆積成形,並覆蓋能夠使壓力作用於成形物之可撓性之模具而進行 氣密密封,對由此所得者進行真空(減壓)成型。又,纖維強化樹脂成形品亦可藉由將強化纖維摻合於環氧樹脂組成物之清漆中,使其成形為片狀並使用模具進行壓縮成型之SMC壓製法、及向鋪滿強化纖維之對模注入環氧樹脂組成物之清漆之RTM法等方法,而製造於強化纖維中含浸有清漆之預浸體,並使用大型之高壓釜等將其燒結固化而製造。
纖維強化樹脂成形品中之強化纖維之量較佳為40~70質量%,就強度之方面而言,較佳為50~70質量%。
8.導電膏
本實施形態之導電膏含有上述環氧樹脂組成物及導電性粒子。作為導電性粒子,例如可列舉銀粒子、銅粒子等。
導電膏可於例如電路連接用樹脂焊膏、各向異性導電接著劑等用途中使用。導電膏之導電性粒子可根據該等用途而適當選擇。
以上,對本發明之較佳之實施形態進行了說明,但本發明並不限定於上述實施形態。
[實施例]
以下,藉由實施例對本發明更具體地進行說明,但本發明並不限定於實施例。
<合成例1-1>
參照Synlett,2006,14,2211.所記載之方法,以1,5-二羥基萘作為原料,合成下式所表示之1,5-二烯丙氧基-2,6-二烯丙基萘。
<合成例2-1>
於2.0L之圓底燒瓶中,將鎢酸鈉二水合物(26.6g、80.6mmol)、甲基三正辛基銨硫酸氫鹽(38.5g、82.7mmol)、亞甲基二膦酸(3.5g、19.9mmol)、硫酸鈉(102.5g、721.8mmol)、及1,5-二烯丙氧基-2,6-二烯丙基萘(80.3g、250.6mmol)溶解於甲苯(500ml)中。繼而加入30%之過氧化氫水(192.3g、1.70mol),於40℃反應16小時。反應後,加入甲苯(1000ml),將有機層分離,並利用蒸餾水(500ml)進行3次分液洗淨,於減壓下蒸餾去除溶劑,而獲得褐色固體之環氧化合物A-1(75.3g)。
對環氧化合物A-1進行分析,結果為,含烯烴之基之轉化率為88%,含環氧基之基之產率為81%,環氧化選擇率為92%,環氧當量為128g/eq.。再者,含烯烴之基之轉化率、含環氧基之基之產率及環氧化選擇率係基於藉由1H NMR進行分析所得之結果,根據以下之計算式而求出。
含烯烴之基之轉化率(%)=(1-未反應之含烯烴之基之合計量(mol)/原料化合物之含烯烴之基之合計量(mol))×100
含環氧基之基之產率(%)=(所生成之含環氧基之基之合計量(mol)/原料化合物之含烯烴之基之合計量(mol))×100
環氧化選擇率(%)=(含環氧基之基之產率/含烯烴之基之轉化率)×100
<合成例2-2>
於2.0L之圓底燒瓶中,將鎢酸鈉二水合物(26.6g、80.6mmol)、甲基三- 正辛基銨硫酸氫鹽(38.5g、82.7mmol)、亞甲基二膦酸(3.5g、19.9mmol)、硫酸鈉(102.5g、721.8mmol)、及1,5-二烯丙氧基-2,6-二烯丙基萘(80.3g、250.6mmol)溶解於甲苯(500ml)中。繼而,加入30%之過氧化氫水(147.3g、1.1mol),於40℃反應16小時。反應後,加入甲苯(1000ml),將有機層分離,並利用蒸餾水(500ml)進行3次分液洗淨,於減壓下蒸餾去除溶劑,而獲得褐色固體之環氧化合物A-2(65.4g)。
對環氧化合物A-2進行分析,結果為,含烯烴之基之轉化率為58%,含環氧基之基之產率為53%,環氧化選擇率為91%,環氧當量為181g/eq.。
<實施例1>
於摻合環氧化合物A-1 104質量份、硬化劑(DIC股份有限公司製造,TD-2131:苯酚酚醛清漆樹脂,羥基當量:104g/eq)85質量份、硬化促進劑(北興化學股份有限公司製造,三苯基膦)3質量份、熔融氧化矽(電氣化學股份有限公司製造,球狀氧化矽FB-560)800質量份、矽烷偶合劑(信越化學工業股份有限公司製造,γ-縮水甘油氧基三乙氧基矽烷KBM-403)3質量份、巴西棕櫚蠟(電氣化學股份有限公司製造,PEARL WAX No.1-P)2質量份、碳黑(三菱化學製造,# 2600)3質量份之後,使用二輥研磨機於90℃之溫度熔融混練5分鐘而獲得目標之環氧樹脂組成物。
<玻璃轉移溫度、熱時彈性模數之測量>
其次,使用轉移成形機,於壓力70kg/cm2、溫度175℃、時間180秒之條件下,將粉碎所獲得之環氧樹脂組成物而得者成形為φ 50mm×3(t)mm之圓板狀,於180℃進而硬化5小時,而獲得環氧樹脂組成物之硬化成形物。
將環氧樹脂組成物之硬化成形物切割成厚度0.8mm、寬度5mm、長度54mm之尺寸,並將此作為試片1。使用黏彈性測量裝置(DMA:Rheometric公司製造,固體黏彈性測量裝置「RSAII」,矩形張力法:頻率1Hz、 升溫速度3℃/分鐘),將彈性模數變化達到最大(tanδ變化率最大)之溫度設為玻璃轉移溫度,且將260℃之儲存彈性模數設為熱時彈性模數而對該試片1進行測量。
<成形時之收縮率之測量>
成形時之收縮率係藉由以下之方法所測得。首先,使用轉移成形機(Kohtaki Precision Machine製造,KTS-15-1.5C),於模具溫度150℃、成形壓力9.8MPa、硬化時間600秒之條件下,將環氧樹脂組成物注入成形,製作縱110mm、橫12.7mm、厚1.6mm之試片。之後,將試片於175℃進行後硬化處理5小時,測量模具模腔之內徑尺寸。最後,於室溫(25℃)測量後硬化處理後之試片之外徑尺寸。根據以下之式,自25℃之模具之縱方向之尺寸(以下,25℃之模具尺寸)、後硬化處理後之試片之縱方向之尺寸(以下,25℃之硬化物尺寸)、175℃之模具之縱方向之尺寸(以下,175℃之模具尺寸)算出收縮率。
收縮率(%)={(25℃之模具尺寸)-(25℃之硬化物尺寸)}/(175℃之模具尺寸)×100(%)
<實施例2>
使用120質量份之環氧化合物A-2代替環氧化合物A-1,且將硬化劑之量設為69質量份,除此以外,以與實施例1同樣之方式製備環氧樹脂組成物,並進行評價。將評價結果示於表1。
<比較例1>
使用122質量份之下式所表示之化合物(DIC股份有限公司製造,EPICLON 850-S)代替環氧化合物A-1,且將硬化劑之量設為67質量份,除此以外,以與實施例1同樣之方式製備環氧樹脂組成物,並進行評價。將評價結果示於表1。
<比較例2>
使用109質量份之下式所表示之化合物(DIC股份有限公司製造,EPICLON HP-4032D)代替環氧化合物A-1,並將硬化劑之量設為80質量份,除此以外,以與實施例1同樣之方式製備環氧樹脂組成物,並進行評價。將評價結果示於表1。
<比較例3>
使用98質量份之下式所表示之4官能型(參照非專利文獻Synlett,2006,14,2211.,由雙酚A所合成之化合物)代替環氧化合物A-1,且將硬化劑之量設為91質量份,除此以外,以與實施例1同樣之方式製備環氧樹脂組成物,並進行評價。將評價結果示於表1。
[產業上之可利用性]
本發明之環氧樹脂組成物可較佳地利用於半導體密封材料、半導體裝置、預浸體、電路基板、增層膜、纖維強化複合材料、纖維強化樹脂成形品、導電膏等用途。
Claims (11)
- 一種環氧樹脂組成物,其含有萘型環氧化合物與環氧樹脂用硬化劑,上述萘型環氧化合物具有萘環、選自由與上述萘環直接鍵結之烯丙基及縮水甘油基所組成之群中之至少一種基(A)、及選自由與上述萘環直接鍵結之烯丙氧基及縮水甘油氧基所組成之群中之至少一種基(B),且具有上述烯丙基及上述烯丙氧基中至少一種、與上述縮水甘油基及上述縮水甘油氧基中至少一種。
- 如申請專利範圍第1項之環氧樹脂組成物,其中,上述萘型環氧化合物具有上述縮水甘油基及上述縮水甘油氧基兩者。
- 如申請專利範圍第1或2項之環氧樹脂組成物,其中,上述基(A)鍵結於上述萘環之與上述基(B)相鄰之位置。
- 一種樹脂材料,含有申請專利範圍第1至3項中任一項之環氧樹脂組成物之硬化物。
- 一種半導體密封材料,包含申請專利範圍第1至3項中任一項之環氧樹脂組成物,且上述環氧樹脂組成物進而含有無機填充材料。
- 一種半導體裝置,具備含有申請專利範圍第5項之半導體密封材料之硬化物之密封材料。
- 一種預浸體,其係含有補強基材、及含浸至上述補強基材中之申請專利範圍第1項之環氧樹脂組成物的含浸基材之半硬化物。
- 一種電路基板,具備金屬箔、及設置於上述金屬箔上之硬化樹脂層,該硬化樹脂層含有申請專利範圍第1項之環氧樹脂組成物之硬化物。
- 一種增層膜,含有申請專利範圍第1項之環氧樹脂組成物。
- 一種纖維強化複合材料,含有申請專利範圍第1項之環氧樹脂組 成物之硬化物及強化纖維。
- 一種導電膏,含有申請專利範圍第1項之環氧樹脂組成物及導電性粒子。
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JP6114037B2 (ja) | 2013-01-07 | 2017-04-12 | 旭化成株式会社 | エポキシ樹脂用硬化剤及びエポキシ樹脂組成物 |
CN103408510B (zh) * | 2013-07-26 | 2015-12-09 | 深圳先进技术研究院 | 含萘液晶环氧树脂化合物,其制备方法及组合物 |
JP6511760B2 (ja) | 2013-10-02 | 2019-05-15 | 三菱ケミカル株式会社 | エポキシ化合物の製造方法及びエポキシ化反応用触媒組成物 |
JP6529245B2 (ja) | 2013-11-27 | 2019-06-12 | 昭和電工株式会社 | 硬化性樹脂組成物 |
CN104163912B (zh) * | 2014-02-12 | 2016-09-14 | 安徽善孚新材料科技股份有限公司 | 一种双重网络交联型环氧树脂及其制备方法 |
JP2015172144A (ja) | 2014-03-12 | 2015-10-01 | パナソニックIpマネジメント株式会社 | プリプレグ、金属張積層板、プリント配線板 |
-
2017
- 2017-11-15 TW TW106139497A patent/TWI752114B/zh active
- 2017-11-28 WO PCT/JP2017/042549 patent/WO2018116757A1/ja active Application Filing
- 2017-11-28 JP JP2018512447A patent/JP6350776B1/ja active Active
- 2017-11-28 CN CN201780078724.XA patent/CN110088164B/zh active Active
- 2017-11-28 KR KR1020197015039A patent/KR102283388B1/ko active IP Right Grant
- 2017-11-28 US US16/470,479 patent/US20200115543A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20200115543A1 (en) | 2020-04-16 |
CN110088164A (zh) | 2019-08-02 |
JP6350776B1 (ja) | 2018-07-04 |
WO2018116757A1 (ja) | 2018-06-28 |
KR102283388B1 (ko) | 2021-08-02 |
CN110088164B (zh) | 2021-07-27 |
TWI752114B (zh) | 2022-01-11 |
KR20190093187A (ko) | 2019-08-08 |
JPWO2018116757A1 (ja) | 2018-12-20 |
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