TW201408642A - 4-[5-(吡啶-4-基)-1h-1,2,4-三唑-3-基]吡啶-2-碳腈之製造方法及中間體 - Google Patents
4-[5-(吡啶-4-基)-1h-1,2,4-三唑-3-基]吡啶-2-碳腈之製造方法及中間體 Download PDFInfo
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Abstract
本發明提供一種用作醫藥品之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈之工業上有利之製造方法及中間體。一種藉由下述反應式之式(1)之化合物之製造法、及下述式(4)所表示之中間體。□
Description
本發明係關於一種用作醫藥品之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈之製造方法及用於其製造之新穎中間體。
4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈(1)具有黃嘌呤氧化酶阻礙作用,作為降低血清尿酸值之藥劑而為人所知(專利文獻1)。
作為上述化合物(1)之製造方法,例如已知將異菸鹼酸甲酯N-氧化物藉由Reissert Henze反應製成2-氰基異菸鹼酸甲酯,繼而將其製成醯肼,並使其與4-氰基吡啶進行縮合之方法(專利文獻1、實施例12),及自異菸鹼酸N-氧化物獲得醯肼後,藉由Reissert Henze反應導入氰基後,與4-氰基吡啶縮合之方法(專利文獻1、實施例39)。又,亦報告有以4-氰基吡啶-N-氧化物為起始原料,與異菸鹼酸醯肼縮合構築三唑環後,保護(專利文獻2)或不保護(專利文獻3)環,藉由Reissert Henze反應導入氰基獲得化合物(1)之方法。
[專利文獻1]國際公開第2003/064410號
[專利文獻2]國際公開第2005/009991號
[專利文獻3]日本專利特開2005-41802號公報
然而,專利文獻1記載之方法係可以少量製造而達成充分目的之方法,但經取代或未經取代之2-氰基異菸鹼酸醯肼之製造煩雜,且必須根據於各步驟中生成化合物之物性選擇反應溶劑,有必須每個步驟進行單離等問題,進而,作為整體之產率未充分提高,故而於工業上生產時有問題。專利文獻2之方法由於保護三唑環而使反應步驟數增多,工業上生產時對成本亦有問題。專利文獻3之方法由於脫色或除去雜質而必需有複數個純化步驟,不適合於工業生產。
因此,本發明之課題在於提供一種用作醫藥之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈之工業上有用的製造方法。
因此,本發明者等人對4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈之製造方法進行努力研究,結果藉由經由新穎中間體4-吡啶羧酸N'-(2-氰基吡啶-4-羧酸醯亞胺基)醯肼,發現目標化合物之工業上有用之製造方法,從而完成本發明。
即,本發明提供以下[1]~[4]。
[1]一種4-吡啶羧酸N'-(2-氰基吡啶-4-羧酸醯亞胺基)醯肼,其係下述式(4)
[化2]
所表示。
[2]一種如[1]之化合物之製造方法,其特徵在於:將下述式(2)
所表示之化合物、與異菸鹼酸醯肼於鹼金屬烷氧化物之存在下進行反應,將所獲得之下述式(3)
所表示之化合物藉由氰基化劑進行氰基化。
[3]一種下述式(1)
所表示之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈之製造方法,其特徵在於:使下述式(2)
所表示之化合物、與異菸鹼酸醯肼於鹼金屬烷氧化物之存在下進行反應,將所獲得之下述式(3)
所表示之化合物藉由利用氰基化劑之氰基化反應獲得下述式(4)
所表示之化合物,繼而於酸觸媒下進行閉環反應。
[4]一種下述式(1)[化10]
所表示之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈之製造方法,其特徵在於:使下述式(4)
所表示之化合物於酸觸媒下進行閉環反應。
根據本發明之製造方法,用作具有黃嘌呤氧化酶阻礙作用之醫藥之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈藉由簡便之步驟,副生成物亦較少,可以高產率獲得。
以下,具體說明本發明。
本發明之方法係如下反應式表示。
[化11]
第一步驟係使4-氰基吡啶-N-氧化物(2)、與異菸鹼酸醯肼於鹼金屬烷氧化物之存在下進行反應獲得化合物(3)之步驟。
該反應所使用之4-氰基吡啶-N-氧化物(2)及異菸鹼酸醯肼之任一者均為已知化合物,可藉由其本身公知之方法而製造。
作為使用之鹼金屬烷氧化物,較佳為鹼金屬C1-C6烷氧化物,作為具體例,可列舉:甲醇鈉、乙醇鈉等。該反應較佳為於溶劑中進行,作為溶劑,較佳為甲醇、乙醇等醇系溶劑。
該反應較佳為首先於溶劑中,利用鹼金屬烷氧化物對化合物(2)進行處理,繼而與異菸鹼酸醯肼進行反應。首先,化合物(2)與鹼金屬烷氧化物之反應的反應溫度於冷卻下至加熱回流下,較佳為於15℃至80℃,通常反應30分鐘至12小時、較佳為1~4小時左右。接著與異菸鹼酸醯肼之反應於上述溫度條件下,使用當量或過剩量之一者,通常反應30分鐘至12小時、較佳為1~5小時左右。
第二步驟係將化合物(3)藉由氰基化劑氰基化獲得化合物(4)之步驟。
作為使用之氰基化劑,可列舉:氰化鈉、氰化鉀等鹼金屬氰化物,氰化鋅、氰化三甲基矽烷等三烷基氰化物。
該氰基化反應較佳為例如藉由Reissert Henze反應(Heterocycles,Vol.22,No.5,1994)而進行。該反應例如將化合物(3)於有機溶劑中,利用烷基胺甲醯鹵進行活化後,使氰基化劑進行反應,藉此獲得化合物(4)。作為Reissert Henze反應之最初步驟即胺甲醯基化所使用之烷基胺甲醯鹵,可使用二甲基胺甲醯氯、二丙基胺甲醯氯等二C1-C6烷基胺甲醯鹵,較佳為二甲基胺甲醯氯。作為本反應所使用之溶劑,可使用N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、四氫呋喃、乙腈等,較佳為N,N-二甲基甲醯胺。又,作為反應溫度,較佳為15~60℃,更佳為30~50℃。作為反應時間,較佳為1~24小時,更佳為1~3小時。作為接著氰基化反應所使用之氰基化劑,可使用上述氰基化劑,較佳為氰化鈉、氰化鉀、氰化鋅、三甲基矽烷基腈等,更佳為氰化鈉。反應溫度較佳為-20~60℃,更佳為-10~40℃,攪拌1~4小時。
該第二步驟中獲得之化合物(4)為新穎化合物,用作用以製造化合物(1)之中間體。化合物(4)於第二步驟中無需純化而可簡便且高產率合成,又,只要經由化合物(4),則可工業上高效製造化合物(1)。
第三步驟係藉由使化合物(4)於酸觸媒下進行閉環反應而獲得化合物(1)之步驟。
作為酸,可使用磷酸、對甲苯磺酸、鹽酸等有機酸、無機酸,較佳為無機酸,特佳為磷酸。作為反應溶劑,可使用水、2-丁醇、2-丙醇、乙醇等醇類,或水與醇類之混合溶劑,較佳為將水與2-丁醇混合成5:1~10:1之溶劑。反應溫度及時間為60~100℃、較佳為70~90℃下攪拌2~12小時、較佳為8~10小時。
本發明方法之中間體及化合物(1)可自反應混合物中藉由洗淨、再結晶、各種層析法等通常之方法進行單離、純化。
以下,列舉實施例說明本發明,但本發明並不限定於該等。
實施例之縮寫之意思如下所述。
1H-NMR:質子核磁共振光譜,DMSO-d6:氘化二甲基亞碸,Hz:赫茲,J:偶合常數,s:單峰,dd:雙雙峰,d:雙峰,br:寬峰。再者,NMR表示270MHz核磁共振光譜,使用TMS(四甲基矽烷)作為內部標準物質。MS表示質量分析,使用離子化法為ESI(電噴離子化法)之測定機器。
使4-氰基吡啶-N-氧化物(2)5.00g懸浮於甲醇40mL中,添加甲醇鈉22.4mg,於氮氣氛圍下40℃下攪拌2小時。於相同溫度下添加異菸鹼酸醯肼5.71g於40℃攪拌4小時。將反應液冷卻至室溫之後,濾取所析出之結晶,利用甲醇15mL進行洗淨後,於80℃下乾燥15小時,獲得N"-(4-吡啶羰基)-4-吡啶醯肼醯亞胺-1-氧化物(3)9.60g。
1H-NMR(DMSO-d6)δ(ppm):6.98(br,2H),7.81(d,2H,J=5.77Hz),7.85(d,2H,J=7.09Hz),8.29(d,2H,J=7.09Hz),8.73(d,2H,J=5.77Hz),10.37(br,1H)
MS m/z:256[M-H]-
使N"-(4-吡啶羰基)-4-吡啶醯肼醯亞胺-1-氧化物(3)10.0g懸浮於N,N-二甲基甲醯胺48mL中,於氮氣氛圍下,於40℃下添加二甲基胺甲醯氯9.20g並攪拌1小時。於相同溫度下添加氰化鈉2.48g,進而攪拌1小時。將反應液冷卻至5℃以下之後,依序滴加5%碳酸氫鈉水溶液100mL、水100mL。濾取析出之結晶,利用水100mL進行洗淨之
後,於80℃下減壓乾燥15小時,獲得4-吡啶羧酸N'-(2-氰基吡啶-4-羧酸醯亞胺基)醯肼(4)9.28g。
1H-NMR(DMSO-d6)δ(ppm):7.15(br,2H),7.82(d,2H,J=5.61Hz),8.14(d,1H,J=5.11Hz),8.37(s,1H),8.75(d,2H,J=5.61Hz),8.86(d,1H,J=5.11Hz),10.47(br,1H)
MS m/z:265[M-H]-
於4-吡啶羧酸N'-(2-氰基吡啶-4-羧酸醯亞胺基)醯肼(4)9.25g中添加水82mL、2-丁醇8.2mL、磷酸4.00g,於80℃下攪拌8小時。將反應液冷卻至室溫,濾取析出之結晶之後,利用水:2-丁醇=10:1之混合溶液92.5mL進行洗淨。將所獲得之結晶於80℃下減壓乾燥13小時,獲得4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈(1)7.89g。
1H-NMR(DMSO-d6)δ(ppm):8.02(dd,2H,J=4.59,1.62Hz),8.32(dd,1H,J=5.13,1.62Hz),8.55(dd,1H,J=1.62,1.08Hz),8.80(dd,2H,J=4.59,1.62Hz),8.93(dd,1H,5.13,1.08Hz)
MS m/z:247[M-H]-
Claims (4)
- 一種4-吡啶羧酸N'-(2-氰基吡啶-4-羧酸醯亞胺基)醯肼,其係以下 述式(4)
- 一種如請求項1之化合物之製造方法,其特徵在於:使下述式(2)
- 一種下述式(1)所表示之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡 啶-2-碳腈之製造方法,
- 一種下述式(1)所表示之4-[5-(吡啶-4-基)-1H-1,2,4-三唑-3-基]吡啶-2-碳腈之製造方法,
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CN105693699B (zh) * | 2015-03-30 | 2019-06-18 | 苏州晶云药物科技股份有限公司 | 托吡司他的晶型及其制备方法 |
CN104758263B (zh) * | 2015-04-22 | 2017-08-22 | 青岛正大海尔制药有限公司 | 一种托匹司他片及其制备方法 |
CN105294656A (zh) * | 2015-10-10 | 2016-02-03 | 大道隆达(北京)医药科技发展有限公司 | 一种托匹司他的制备工艺和方法 |
CN106008465A (zh) * | 2016-03-16 | 2016-10-12 | 江苏悦兴药业有限公司 | 一种托匹司他杂质的合成方法 |
CN108101840A (zh) * | 2018-01-26 | 2018-06-01 | 南京华威医药科技集团有限公司 | 托吡司他及其中间体制备方法 |
CN113666909B (zh) * | 2020-05-14 | 2024-07-02 | 鲁南制药集团股份有限公司 | 一种托匹司他的制备方法 |
CN115093399A (zh) * | 2022-07-29 | 2022-09-23 | 武汉工程大学 | 一种抗痛风药物托匹司他的制备方法 |
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JP2003064410A (ja) | 2001-08-22 | 2003-03-05 | Nippon Steel Corp | 転炉吹錬方法および上吹きランス |
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JP2005041802A (ja) * | 2003-07-25 | 2005-02-17 | Fujiyakuhin Co Ltd | 1,2,4−トリアゾール化合物の製造方法 |
US20060189811A1 (en) | 2004-07-23 | 2006-08-24 | Fujiyakuhin Co., Ltd. | Process for producing 1,2,4-triazole compound and intermediate therefor |
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EP2878595A1 (en) | 2015-06-03 |
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MY185203A (en) | 2021-04-30 |
CN104411686B (zh) | 2016-08-31 |
IN2014DN10530A (zh) | 2015-08-21 |
MX2015001114A (es) | 2015-04-08 |
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WO2014017516A1 (ja) | 2014-01-30 |
KR101719891B1 (ko) | 2017-03-24 |
EP2878595A4 (en) | 2015-12-09 |
US9428488B2 (en) | 2016-08-30 |
CN104411686A (zh) | 2015-03-11 |
CA2876268A1 (en) | 2014-01-30 |
IL236081A0 (en) | 2015-02-01 |
RU2015106138A (ru) | 2016-09-10 |
RU2644766C2 (ru) | 2018-02-14 |
AU2013293974A1 (en) | 2015-01-22 |
ZA201500462B (en) | 2016-10-26 |
TWI580675B (zh) | 2017-05-01 |
PH12015500160A1 (en) | 2015-03-16 |
IL236081A (en) | 2017-11-30 |
US20150166510A1 (en) | 2015-06-18 |
AU2013293974B2 (en) | 2017-06-01 |
JPWO2014017516A1 (ja) | 2016-07-11 |
BR112014032229A2 (pt) | 2017-06-27 |
CA2876268C (en) | 2016-12-20 |
MX362102B (es) | 2019-01-04 |
PH12015500160B1 (en) | 2015-03-16 |
JP5827407B2 (ja) | 2015-12-02 |
BR112014032229B1 (pt) | 2021-02-09 |
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