TW200911394A - Cleaning device, apparatus for manufacturing flat panel display and flat panel display - Google Patents
Cleaning device, apparatus for manufacturing flat panel display and flat panel display Download PDFInfo
- Publication number
- TW200911394A TW200911394A TW97116232A TW97116232A TW200911394A TW 200911394 A TW200911394 A TW 200911394A TW 97116232 A TW97116232 A TW 97116232A TW 97116232 A TW97116232 A TW 97116232A TW 200911394 A TW200911394 A TW 200911394A
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- cleaning
- cleaning liquid
- substrate
- slit
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 162
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000007788 liquid Substances 0.000 claims abstract description 293
- 239000000758 substrate Substances 0.000 claims abstract description 87
- 238000005406 washing Methods 0.000 claims description 50
- 238000003860 storage Methods 0.000 claims description 10
- 238000009826 distribution Methods 0.000 description 19
- 238000011282 treatment Methods 0.000 description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000005192 partition Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000007781 pre-processing Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007128995A JP4889565B2 (ja) | 2007-05-15 | 2007-05-15 | 洗浄装置、フラットパネルディスプレイの製造装置及びフラットパネルディスプレイ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200911394A true TW200911394A (en) | 2009-03-16 |
| TWI371318B TWI371318B (enrdf_load_stackoverflow) | 2012-09-01 |
Family
ID=40144651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97116232A TW200911394A (en) | 2007-05-15 | 2008-05-02 | Cleaning device, apparatus for manufacturing flat panel display and flat panel display |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4889565B2 (enrdf_load_stackoverflow) |
| TW (1) | TW200911394A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI615208B (zh) * | 2015-07-06 | 2018-02-21 | Shibaura Mechatronics Corp | 水刀、基板處理裝置及基板處理方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6672368B2 (ja) * | 2018-04-26 | 2020-03-25 | 光洋サーモシステム株式会社 | 洗浄装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63174324A (ja) * | 1987-01-13 | 1988-07-18 | Sumitomo Electric Ind Ltd | 半導体ウエハ−の化学処理方法 |
| JPH06338449A (ja) * | 1993-05-28 | 1994-12-06 | Chuo Riken:Kk | 方形の基板の表面に液状物を盛る方法及び方形基板用流出ノズル |
| JP4453013B2 (ja) * | 2004-12-24 | 2010-04-21 | 日本電気硝子株式会社 | ウエット処理装置およびウエット処理方法 |
-
2007
- 2007-05-15 JP JP2007128995A patent/JP4889565B2/ja not_active Expired - Fee Related
-
2008
- 2008-05-02 TW TW97116232A patent/TW200911394A/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI615208B (zh) * | 2015-07-06 | 2018-02-21 | Shibaura Mechatronics Corp | 水刀、基板處理裝置及基板處理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI371318B (enrdf_load_stackoverflow) | 2012-09-01 |
| JP2008284414A (ja) | 2008-11-27 |
| JP4889565B2 (ja) | 2012-03-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |