200911394 九、發明說明 【發明所屬之技術領域】 本發明是關於將洗淨液供應至基板之洗淨裝置，尤其 是關於對基板均勻地供應洗淨液之洗淨裝置、應用該洗淨 裝置的平面面板顯示器之製造裝置及利用該平面面板顯示 器之製造裝置進行製造之平面面板顯示器。 【先前技術】 液晶顯示器的製程中其中一個爲配向處理。配向處理 具有將聚醯亞胺等的配向膜薄薄地塗佈在玻璃基板的表面 ，在液晶分子固定在玻璃基板的狀態下，用柔軟的布等施 予朝一個方向摩擦配向膜之所謂的摩擦處理，以使液晶分 子朝一定方向並排之處理。然後，進行摩擦處理之後，爲 了要除去殘渣而進行基板的洗淨，過去洗淨是用異丙醇（ isopropyl alcohol: IPA)等。但是，用異丙醇等的洗淨方 法，使用上受到限制，又基於無法應用超音波洗淨等的觀 點，洗淨方法使用水或純水等的洗淨液已變成主流。 用前述的洗淨液來洗淨基板表面的情況，對基板表面 進行洗淨會造成不均勻，因該不均勻的原因導致製造之液 晶顯示器的品質降低。於是，曰本專利文獻1中揭示的發 明爲用洗淨液來洗淨基板時達到抑制不均勻的發生。曰本 專利文獻1係在用洗淨液進行洗淨之前，預先將附著在基 板表面的異物予以除去，再供應純水，以達到防止因界面 活性劑的溶解而造成的不均勻。 200911394 專利文獻1 :日本專利特開平7一 77677號公報 【發明內容】 <發明所欲解決之課題> 如同前述，日本專利文獻1中’爲了要防止界面活性 劑的溶解，前置階段必須對基板施予異物除去及純水供應 的2個處理。因而，如同日本專利文獻1 ’進行基板的洗 淨之前置處理必須要用來除去異物的氣動刮刀，又必須要 用來進行純水供應的高壓噴管。氣動刮刀或高壓噴管並不 是用來進行基板洗淨的機構，而是只用來進行前置處理的 機構。因而，就洗淨裝置而言，前置處理機構並不是本來 就必要的機構，該機構會導致洗淨裝置之機構上的複雜化 或高成本化的諸多問題。 然後，進行過前置處理的基板，用洗淨液進行洗淨， 不過仍會因洗淨液的供應方式而發生不均勻。作爲配向膜 的聚醯亞胺膜疏水性很高，無法以一樣的分佈來供應洗淨 液而成爲不均勻的原因。另外，對配向膜施予摩擦處理， 爲了要對施予過摩擦處理的基板以一定方向配向液晶分子 而形成微細的溝槽，故無法使洗淨液的分佈成爲一樣，這 點也是成爲不均勻的原因。進而，在配向膜的下面還形成 有特定的電路圖案等，導致無法以一樣的分佈來供應洗淨 液。 另外，近年的液晶顯示器有既要薄型化又要大型化的 趨勢，構成液晶顯示器的基板也採用既薄型又大型的基板 -5- 200911394 。以很快的速度令洗淨液對於既薄型又大型的基板衝擊的 話，基板會因衝擊時的能量而造成彎曲，且洗淨液無法成 爲均等的分佈狀態。因此，會有既薄型又大型的基板尤其 容易造成不均勻的問題。 於是，本發明是以既不必要複雜的機構又會對表面均 勻地進行洗淨爲目的。 <用以解決課題之手段> 爲了要解決以上的課題，具有：被設置在基板之搬送 路的上部，且被設置成供應至前述基板之成爲洗淨液的流 出口之液體流出開口至少長於前述基板的其中一邊之液體 供應手段、及調整從前述液體流出開口流出的洗淨液流以 成爲整流狀態之整流手段、及一面維持經由前述整流手段 來調整洗淨液流之洗淨液的整流狀態，一面控制洗淨液的 流下速度之流速控制手段。 利用以上的整流手段及流速控制手段來調整液流之洗 淨液一面維持整流狀態一面朝向基板流下，故可以在洗淨 液的分佈均勻化的狀態下對基板進行供應。然後，利用流 速控制手段適當地控制洗淨液的流下，故對於基板衝擊時 的速度受到控制。因而，不會依隨基板表面的狀態，可以 以一樣的分佈來供應洗淨液，且可以防止不均勻的發生。 另外’可以從液體流出開口令大量的洗淨液流出來供應至 基板，故可以迅速地對於基板供應必要的洗淨液。因此’ 可以既迅速又均勻地對於基板供應洗淨液。 -6- 200911394 流速控制手段所控制之洗淨液的流 可能緩慢，不過洗淨液的流下速度過度 供應時洗淨液會局部引起疏液，又液體 落部，導致分佈不均等。因而，洗淨液 會發生不均勻，故必須要有與衝擊到基 度。於是，流速控制手段則是依照基板 緩慢又分佈不會不均等的程度對於洗淨 速度的方式進行控制。 本發明的申請專利範圍第2項之洗 專利範圍第1項之洗淨裝置，其中，前 有輸送洗淨液之液體輸送手段、及儲存 所輸送的洗淨液之液體儲存手段，前述 在則述液體輸送手段，以儲存在前述液 液的液面成爲高於前述液體流出開口的 控制洗淨液的輸送量。 最好是從液體流出口漸漸地溢出洗 輸送手段則是以液體儲存手段所儲存之 高於液體流出開口若干的位置的方式， 量。藉由此方式，從液體流出口以漸漸 式溢出，故可以減低從液體流出口所流 〇 本發明的申請專利範圍第3項之洗 專利範圍第2項之洗淨裝置，其中，在 的內部，設有：將儲存在前述液體儲存 下速度，最好是儘 緩慢的話，對基板 無法遍及凹凸的角 的流下速度過慢也 板時相同程度的速 的表面狀態，以既 液維持最小限度的 淨裝置係如同申請 述液體供應手段具 從該液體輸送手段 液體流出開口設置 體儲存手段之洗淨 位置附近的方式， 淨液，因而，液體 洗淨液的液面成爲 調整洗淨液的輸送 地溢出洗淨液的方 出之洗淨液的壓力 淨裝置係如同申請 前述液體儲存手段 手段之洗淨液分割 200911394 成從前述液體輸送手段所輸送之洗淨液的區域及從前述液 體流出開口所流出之洗淨液的區域之區域分割手段。 液體儲存手段所儲存的洗淨液，從液體輸送手段輸送 洗淨液，則儲存的洗淨液會發生亂流。洗淨液亂流的話， 無法讓洗淨液以均等的壓力流出，且無法讓整流手段流動 之洗淨液的分佈成爲一樣。於是，設置區域分割手段，將 區域分割成從液體輸送手段所排出的洗淨液之區域（流入 側區域）及從液體流出開口所流出的洗淨液之區域（流出 側區域），以使液體輸送手段所發生之洗淨液的亂流，不 會傳達到從液體流出開口所流出的洗淨液之區域。因而， 形成爲洗淨液以一樣的分佈流往整流手段。例如想到隔間 板等作爲區域分割手段的一個例子。 本發明的申請專利範圍第4項之洗淨裝置係如同申請 專利範圍第1項之洗淨裝置，其中，前述整流手段係設置 來作爲從前述液體流出開口所流出的洗淨液朝水平方向流 動之水平流路，前述流速控制手段係設置來將朝水平方向 流動之洗淨液的流路轉換成垂直方向的液流，作爲控制洗 '淨液的流下速度的長度之垂直流路。 將整流手段連接至液體流出開口來形成爲水平流路， 從液體流出開口所流出的洗淨液流往水平流路使分佈均等 化。然後，讓分佈均等化的洗淨液朝向基板流下時，洗淨 液流往作爲流速控制手段的垂直流路，洗淨液則會維持分 佈均等化的狀態，朝向基板流下。 另外，衝擊到基板時洗之淨液的流速係依照作爲流速 -8- 200911394 控制手段之垂直流路的長度而改變。垂直流路過長的話， 洗淨液的速度會過度變慢，垂直流路過短的話，則無法施 予洗淨液所必要最小限度的速度。應對洗淨液施予的速度 會因基板的狀態而改變，故依照基板的狀態適切地設定垂 直流路的長度。 本發明的申請專利範圍第5項之洗淨裝置係如同申請 專利範圍第1項之洗淨裝置，其中，在前述液體供應手段 與前述搬送路之間設有2片垂直板，形成洗淨液在2片垂 直板之間流動之狹縫狀通路，前述基板係在朝前述狹縫狀 通路的兩側寬度方向傾斜的狀態下進行搬送，以與前述基 板的傾斜方向成平行的方式，設置前述狹縫狀通路的流入 口和流出口，令前述狹縫狀通路有前述整流手段及前述流 速控制手段的功能。 該申請專利範圍第5項之洗淨裝置係令基板在朝狹縫 裝通路的寬度方向傾斜的狀態下進行搬送。基板在傾斜狀 態下進行搬送，則對於供應至基板的洗淨液利用自重而從 基板上除去的這點有效。整流手段的功能爲在流通狹縫狀 通路之間調整洗淨液流，故會發揮該功能。另外’流速控 制手段的功能係適當地設定狹縫狀通路的長度來控制速度 ，發揮流速控制功能。 另外，狹縫狀通路在任何的場所均必須是均等的長度 。此處，基板係朝狹縫狀通路的寬度方向傾斜’故狹縫狀 通路的流入口（與狹縫狀通路的上端’也就是與承接液體 部的連接部）和流出口（與狹縫狀通路的下端’也就是與 -9- 200911394 基板相對面的部分）形成爲與基板的傾斜方向成平行。藉 由此方式，形成爲流往狹縫狀通路的洗淨液流過完全相等 的距離。 本發明的申請專利範圍第6項的平面面板顯示器之製 造裝置具有申請專利範圍第1至5項中任一項所述之洗淨 裝置。洗淨裝置能夠應用於各種製造裝置，尤其是適合應 用於平面面板顯示器之製造裝置。另外，發明的申請專利 範圍第6項的平面面板顯示器係利用申請專利範圍第6項 所述的平面面板顯示器之製造裝置進行製造。 以上的洗淨裝置可以作爲對基板塗佈配向膜而在進行 摩擦處理之後進行基板的洗淨之洗淨裝置來使用。另外， 本發明不僅可以應用於摩擦處理的洗淨步驟，還可以應用 於任意的洗淨步驟。例如，對於基板塗佈顯影液來將特定 圖案予以顯影之顯影步驟，接著沖洗顯影而置換成水之水 置換步驟也可以應用。在顯影步驟，將特定圖案顯影在基 板上，又由於疏水性也很高，故適當地應用本發明的洗淨 裝置，以達到有助益的效果。 [發明效果] 如同以上所說明過，本發明係用整流手段及流速控制 手段，不必用複雜的機構，就可以將依照基板表面的狀態 而以適當的速度來調整液體流之洗淨液供應至基板，故可 以防止對於基板發生不均勻。 -10- 200911394 【實施方式】 以下’參考圖面來說明本發明的實施形態。首先，針 對最初的第1實施形態進行說明，接著再針對第2實施形 態進行說明。第1實施形態和第2實施形態的任一實施形 態’也是針對進行摩擦處理後的洗淨之洗淨裝置，作爲應 用洗淨裝置的一個例子進行說明。 <本發明的第1實施形態> 第1圖中，洗淨裝置1設有搬送滾輪2，藉由該搬送 滾輪2來依序搬送基板B。搬送滾輪2係從進行前段的處 理之處理裝置（例如，摩擦處理）起連續設置，被設置成 連接至進行後段的處理之處理裝置以進行所謂的成行處理 。後段的處理包括將例如供應洗淨液而成爲濕潤狀態的基 板B予以乾燥之乾燥處理等。 搬送滾輪2的上部設有作爲液體供應手段的液槽30。 液槽3 0連接噴嘴3 1及水平流路3 2，水平流路3 2連接垂 直流路3 3。如第2圖所示，液槽3 0發揮的功能係作爲儲 存洗淨液的液體儲存手段。液槽3 0連接複數個作爲液體 輸送手段的噴嘴31，洗淨液從噴嘴31供應至液槽30，使 儲存在液槽3 0之以洗淨的量維持一定。液槽3 0設有作爲 液體流出開口之狹縫開口 3 4，液槽3 0內的洗淨液從狹縫 開口 3 4流出。 針對水平流路3 2進行說明。水平流路3 2爲使洗淨液 朝水平方向流動之流路，從狹縫開口 3 4所流出的洗淨液 -11 - 200911394 逐漸流往水平流路3 2。水平流路3 2所發揮的功能爲作爲 調整洗淨液流而成爲整流狀態之整流手段。洗淨液在流往 水平流路3 2之間予以擴散，使分佈成爲均等。因而，水 平流路3 2最好是應用親水性很高的素材。使用親水性很 高的素材的話’從狹縫開口 3 4所流出的洗淨液瞬間擴散 而成爲整流狀態。 針對垂直流路3 3進行說明。垂直流路3 3連接至水平 流路3 2。因此，流往水平流路3 2之洗淨液的行進方向由 水平方向改變成垂直方向，朝向基板B流下。也就是垂直 流路3 3具有的功能爲對於洗淨液施予朝向基板b的速度 。另外’洗淨液流到垂直流路3 3而流下，在維持狀態的 狀態下逐漸流下。爲了要在洗淨液維持整流的狀態下予以 流下’垂直流路3 3也最好是用親水性很高的素材。 第2圖中表示洗淨裝置1的剖面。如同該圖所示，洗 淨液從垂直流路3 3的上端流下至下端，對洗淨液施予特 定的速度（也就是在垂直流路3 3流下之間，位置能量轉 變成運動能量，對於洗淨液施予特定的速度）。施加給洗 淨液的速度會因垂直流路33的長度L1而改變。長度L1 中，從垂直流路3 3的上端至液槽3 0的下面之間的長度 L2爲一定，故將其餘的長度L3(=L1—L2)設定成適當 的長度，以控制對於洗淨液所施予的速度。該長度L3形 成爲流速控制區域。 此時，因基板B表面的狀態而洗淨液以很快的速度衝 擊，則無法以一樣的分佈供應洗淨液，又衝擊速度過慢’ -12- 200911394 分佈狀態則會變成爲不均勻。於是’將基板B表面的狀氣 設定成：洗淨液會依照基板B表面的狀態’以既緩慢又分 佈均等的程度，衝擊到基板B之適當的長度。 另外，如第2圖所示’垂直流路3 3的下部設有傾斜 部3 3 S。洗淨液流利用傾斜部3 3 S來施加若千與基板B的 搬送方向相反方向的角度。由於會因傾斜部33S而對於洗 淨液流造成與基板B的搬送方向相反方向的角速度成分’ 故洗淨液在基板B上擴散的時間變早。因而’能夠迅速地 對於基板B供應洗淨液。此外，不考慮洗淨液的擴散時間 的情況，也可以不設置傾斜部3 3 S (也可以將傾斜部3 3 S 的部位設定成垂直狀態）。 針對狹縫開口 3 4進行說明。如同前述過，洗淨液從 狹縫開口 3 4流出，流往水平流路3 2。如第2圖所示，朝 對於基板B的搬送方向成垂直交叉的方向令洗淨液流下， 利用基板B的搬送，對於基板b的全面供應洗淨液。因而 ，在對於基板B的搬送方向成垂直交叉的方向上，狹縫開 口 34形成爲長於基板B。因此，狹縫開口 34形成爲細長 的開口，可以令大量的洗淨液流出。 其次’針對狹縫開口 3 4與液槽3 0所儲存之洗淨液的 液面的位置關係進行說明。爲了要補充從狹縫開口 3 4所 iiu出的洗淨液厘’洗淨液從噴嘴3 1補給至液槽3 〇。讓從 噴嘴3 1所補給的洗淨液量與從狹縫開口 3 4所流出的洗淨 液里一致，則儲存在液槽3 〇之洗淨液的液面可以隨時保 持一定。此時，從噴嘴3丨補給洗淨液，以使洗淨液的液 -13- 200911394 面隨時位於高於狹縫開口 3 4若干的位置。洗淨液的液面 與狹縫開口 3 4的間隔變長的話，從狹縫開口 3 4所流出之 洗淨液的壓力則會變高，在高壓狀態下從狹縫開口 3 4噴 射洗淨液。這樣的話，在水平流路3 2洗淨液不會以一樣 的分佈流動。於是，洗淨液的液面保持在高於狹縫開口 34 若干的位置附近，可以減低從狹縫開口 34所流出之洗淨 液的壓力，成爲從狹縫開口 3 4逐漸溢出洗淨液的狀態。 因而，在水平流路3 2，洗淨液會以一樣的分佈流動。 針對液槽3 0的內部進行說明。參考第2圖，液槽3 0 連接作爲輸送洗淨液的噴嘴3 1，隨時輸送洗淨液以使洗淨 液的液面保持一定。由於從噴嘴31以特定的壓力噴射洗 淨液，故會因噴射的洗淨液而對於儲存在液槽3 0的洗淨 液造成亂流。這樣的話，會因狹縫開口 3 4的處所而成爲 不一定的洗淨液流，導致無法使洗淨液的分佈一樣。因而 ，如第2圖所示，將分割洗淨液的區域之作爲區域分割手 段的隔間板3 6設置在液槽3 0中。設置隔間板3 6則可以 以隔間板3 6爲交界，分割成從噴嘴31流入洗淨液側的區 域（流入側區域）與從狹縫開口 3 4流出洗淨液側的區域 (流出側區域）。從噴嘴31對於流入側區域內噴射洗淨 液，故會對於該區域內的洗淨液造成亂流’對於流出側區 域的洗淨液則不會造成亂流。因此’從狹縫開口 3 4所流 出的洗淨液可以形成一定的分佈。 另外，隔間板3 6係如第2圖所示形成爲L形狀。藉 由此方式，隔間板3 6可以將從流入側區域流到流出側區 -14- 200911394 域之移行部中的亂流予以緩衝，能夠更加提高洗淨液分 的均等化效果。 利用以上的洗淨裝置，經由整流手段使洗淨液流形 爲整流狀態，經由流速控制手段對於洗淨液施予適當的 度，故供應至基板時可以既均勻又確實地供應洗淨液。 <本發明的第2實施形態> 其次，針對第2實施形態進行說明。第2實施形態 ，如第3圖所示，基板B係以朝後述狹縫狀通路5 5的 度方向傾斜的狀態（傾斜角Θ )進行搬送。本實施形態 是具有橫板50及第1垂直板51及第2垂直板52及液 承接部5 3及液體排出部54。 如第3圖和第4圖所示，橫板5 0爲使從液槽3 0的 縫開口 3 4所流出的洗淨液在水平方向上流動之板構件 第1垂直板5 1爲連接至橫板5 0之朝垂直方向流動洗淨 之板構件，朝水平方向流動的洗淨液朝垂直方向改變液 。第2垂直板5 2爲在與第1垂直板5 1相互鄰近的狀態 平行地配置之板構件，在第1垂直板5 1與第2垂直板 之間形成狹小的空間也就是狹縫狀通路5 5。液體承接 5 3爲暫時貯存流下第1垂直板5 1的洗淨液之承接部。 體承接部5 3連接第2垂直板5 2，貯存在液體承接部5 3 洗淨液流下狹縫狀通路5 5。液體承接部5 3能夠一體安 在第2垂直板5 2，例如使第2垂直板5 2的上端朝向離 第1垂直板51的方向突出而形成突出部52T ’可以將 佈 成 速 中 寬 則 體 狹 〇 液 流 下 5 2 板 液 的 裝 閧 該 -15- 200911394 突出部5 2 T與第1垂直板51之間的區域作爲液體承 53 〇 狹縫狀通路5 5的功能爲作爲整流手段和流速控 段。針對功能作爲整流手段的情況進行說明，狹縫狀 5 5爲狹窄之狹縫狀的空間，故在流下狹縫狀通路5 5 ’洗淨液流成爲整流狀態。其次，針對功能作爲流速 手段的情況進行說明，狹縫狀通路5 5爲朝垂直方向 ’故變成用液體承接部5 3暫時貯存的狀態之洗淨液 流下狹縫狀通路5 5之間施予特定的速度。依照基板 狀態適當地設定狹縫狀通路5 5的長度，衝擊到基板 的洗淨液則會成爲適切的速度。 另外，如第3圖所示，將狹縫狀通路5 5的流入 洗淨液的流入口）和流出口（洗淨液的流出口）設置 基板Β的傾斜方向成平行（依傾斜角Θ設置）。伴隨 狀通路5 5的上端依照傾斜角θ設置，液體承接部5 3 傾斜角Θ設置。也就是狹縫狀通路5 5的功能爲作爲 手段和流速控制手段，故必須對於流下的全部洗淨液 相等的整流功能和流速控制功能。這樣的話’在與基 的搬送方向垂直交叉的方向（圖中的X方向），狹縫 路5 5的長度在任何的處所均必須相等。因而’依照 角Θ設置狹縫狀通路5 5的流入口和流出口。 在液體承接部5 3設有排出洗淨液之液體排出口 在液體承接部5 3貯存從液槽3 0所流出的洗淨液，不 存之洗淨液的液面也必須成爲傾斜角Θ。液面不是傾 接部 制手 通路 之間 控制 設置 ，在 Β的 Β時 Ρ ( 成與 狹縫 也依 整流 作用 板Β 狀通 傾斜 54 ° 過貯 斜角 -16- 200911394 Θ的情況，在圖中的X方向，液體承接部5 3與液面之間 的間隔會因處所而有所不同，液壓會因液體承接部5 3的 處所而有所不同。液壓因處所而有所不同，則洗淨液不會 以一樣的液流在狹縫狀通路5 5流動，故在液體承接部5 3 的最下側，設置排出洗淨液的液體排出部54。 設置液體排出部54來將洗淨液排出，從液槽3 0流出 足量的洗淨液，可以將貯存在液體承接部53之洗淨液的 液面形成爲傾斜角Θ。此時，從液槽3 0所流出的洗淨液量 爲供應至基板Β的洗淨液供應量與從液體排出部5 4所排 出的洗淨液量之總和。因而，爲了要令從液槽3 〇流出足 量的洗淨液，例如使狹縫開口 34的開口面積增大。 如同以上所說明過，基板以傾斜的狀態進行搬送的情 況，採用前述過的構成，可以對於基板均勻地瞬間供應洗 淨液。 【圖式簡單說明】 第1圖爲說明第1實施形態中之液槽、水平流路和垂 直流路的構成之圖。 第2圖爲第1圖之剖面圖。 第3圖爲說明第2實施形態中之液槽、第1垂直流路 和第2垂直流路的構成之圖。 第4圖爲第3圖之剖面圖。 【主要元件符號說明】 -17- 200911394 1 :洗淨裝置 2 :搬送滾輪 3 〇 :液槽 3 1 :噴嘴 3 2 :水平流路 3 3 :垂直流路 3 4 :狹縫開口 5 1 :第1垂直板 5 2 :第2垂直板 5 3 :液體承接部 54 :液體排出部 5 5 :狹縫狀通路 B :基板 -18BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device for supplying a cleaning liquid to a substrate, and more particularly to a cleaning device for uniformly supplying a cleaning liquid to a substrate, and applying the cleaning device A flat panel display manufactured by a flat panel display manufacturing apparatus and a manufacturing apparatus using the flat panel display. [Prior Art] One of the processes of the liquid crystal display is an alignment process. In the alignment treatment, an alignment film such as polyimide or the like is applied to the surface of the glass substrate, and the liquid crystal molecules are fixed to the glass substrate, and a so-called rubbing treatment for rubbing the alignment film in one direction with a soft cloth or the like is applied. In order to process the liquid crystal molecules side by side in a certain direction. Then, after the rubbing treatment, the substrate is washed in order to remove the residue, and in the past, isopropyl alcohol (IPA) or the like is used for washing. However, the cleaning method using isopropyl alcohol or the like is limited in use, and based on the viewpoint that ultrasonic cleaning cannot be applied, the cleaning method using water or pure water has become mainstream. When the surface of the substrate is washed with the above-mentioned cleaning liquid, the surface of the substrate is washed to cause unevenness, and the quality of the liquid crystal display to be manufactured is lowered due to the unevenness. Then, the invention disclosed in Patent Document 1 discloses that the occurrence of suppression unevenness is achieved when the substrate is washed with the cleaning liquid. In Patent Document 1, before the washing with the cleaning liquid, the foreign matter adhering to the surface of the substrate is removed in advance, and pure water is supplied to prevent the unevenness due to the dissolution of the surfactant. [Patent Document 1] Japanese Patent Application Laid-Open No. Hei 7-77677. SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] As described above, in Japanese Patent Laid-Open No. </RTI> In order to prevent dissolution of the surfactant, the pre-stage must be Two treatments of foreign matter removal and pure water supply were applied to the substrate. Therefore, as in the case of the Japanese Patent Publication No. 1, the cleaning of the substrate is performed before the pneumatic blade for removing the foreign matter, and the high-pressure nozzle for supplying the pure water. Pneumatic scrapers or high pressure nozzles are not used to clean the substrate, but are used only for pre-processing. Therefore, in the case of the cleaning device, the pre-processing mechanism is not a mechanism which is originally necessary, and this mechanism causes problems in the mechanism of the cleaning device or the cost of the cleaning device. Then, the substrate subjected to the pretreatment is washed with the cleaning solution, but unevenness may occur due to the supply method of the cleaning liquid. The polyimide film which is an alignment film is highly hydrophobic, and it is not possible to supply the cleaning liquid in the same distribution and cause unevenness. In addition, the rubbing treatment is applied to the alignment film, and in order to form the fine grooves in the liquid crystal molecules in a certain direction in the substrate subjected to the rubbing treatment, the distribution of the cleaning liquid cannot be made uniform, which is also uneven. s reason. Further, a specific circuit pattern or the like is formed under the alignment film, so that the cleaning liquid cannot be supplied in the same distribution. In addition, in recent years, liquid crystal displays have become thinner and larger, and substrates constituting liquid crystal displays are also thin and large substrates -5 - 200911394. When the cleaning liquid is impacted on a thin and large substrate at a rapid rate, the substrate is bent by the energy at the time of impact, and the cleaning liquid cannot be uniformly distributed. Therefore, there is a problem that a thin and large substrate is particularly prone to unevenness. Thus, the present invention has the object of cleaning the surface uniformly without requiring a complicated mechanism. <Means for Solving the Problem> In order to solve the above problems, the liquid outflow opening provided in the upper portion of the substrate conveyance path and supplied to the outlet of the substrate to be the cleaning liquid is at least a liquid supply means that is longer than one of the substrates, and a rectifying means that adjusts the flow of the cleaning liquid flowing out from the liquid outflow opening to be in a rectified state, and a cleaning liquid that maintains the flow of the cleaning liquid via the rectifying means In the rectified state, the flow rate control means for controlling the downflow speed of the washing liquid. By the above-described rectifying means and flow rate controlling means, the cleaning liquid for adjusting the liquid flow flows down toward the substrate while maintaining the rectification state, so that the substrate can be supplied while the distribution of the cleaning liquid is uniform. Then, the flow rate control means is used to appropriately control the flow of the cleaning liquid, so that the speed at the time of impact on the substrate is controlled. Therefore, the cleaning liquid can be supplied in the same distribution without depending on the state of the surface of the substrate, and unevenness can be prevented from occurring. Further, a large amount of the cleaning liquid can be supplied from the liquid outflow opening to the substrate, so that the necessary cleaning liquid can be quickly supplied to the substrate. Therefore, the cleaning liquid can be supplied to the substrate both quickly and uniformly. -6- 200911394 The flow rate of the cleaning liquid controlled by the flow rate control means may be slow, but the flow rate of the cleaning liquid is excessively supplied. The cleaning liquid locally causes lyophobic liquid, and the liquid falls, resulting in uneven distribution. Therefore, the washing liquid will be uneven, so it is necessary to have an impact to the base. Therefore, the flow rate control means controls the washing speed in accordance with the degree that the substrate is slow and the distribution is not uneven. The cleaning device of the first aspect of the invention of claim 2, wherein the liquid transporting means for transporting the cleaning liquid and the liquid storing means for storing the transported cleaning liquid, The liquid transport means stores the transport amount of the control cleaning liquid which is stored in the liquid surface of the liquid liquid to be higher than the liquid outflow opening. It is preferable to gradually overflow from the liquid outflow port. The conveying means is a means for storing the liquid storage means at a position higher than the liquid outflow opening. In this way, the liquid discharge port is gradually overflowed, so that the cleaning device of the second paragraph of the scope of the patent application of claim 3 of the present invention can be reduced. And a surface state in which the speed of the storage of the liquid is stored, preferably at a slower rate, when the speed at which the substrate does not spread over the unevenness is too slow, and the surface is at the same speed as the plate, and the liquid is kept to a minimum. The net device is a liquid liquid supply means, and the liquid level of the liquid washing liquid becomes a conveying place for adjusting the washing liquid. The pressure net cleaning device for overflowing the cleaning liquid is the same as the cleaning liquid partitioning 200911394 for applying the liquid storage means, and the cleaning liquid from the liquid conveying means and the liquid outflow opening. The area division means of the area where the washing liquid flows out. When the cleaning liquid stored in the liquid storage means conveys the cleaning liquid from the liquid transfer means, the stored cleaning liquid may be turbulent. When the cleaning liquid is turbulent, the washing liquid cannot flow out at an equal pressure, and the distribution of the washing liquid which cannot flow the rectifying means becomes the same. Then, the area dividing means is provided to divide the area into a region (inflow side region) of the washing liquid discharged from the liquid transport means and a region (outflow side region) of the washing liquid which flows out from the liquid outflow opening to make the liquid The turbulent flow of the washing liquid generated by the conveying means is not transmitted to the area of the washing liquid which flows out from the liquid outflow opening. Therefore, it is formed that the cleaning liquid flows to the rectifying means in the same distribution. For example, a partition plate or the like is considered as an example of the area dividing means. The cleaning device of the fourth aspect of the invention is the cleaning device according to the first aspect of the invention, wherein the rectifying means is provided to flow in a horizontal direction as a cleaning liquid flowing out from the liquid outflow opening. In the horizontal flow path, the flow rate control means is provided to convert the flow path of the washing liquid flowing in the horizontal direction into the liquid flow in the vertical direction as a vertical flow path for controlling the length of the flow rate of the washing liquid. The rectifying means is connected to the liquid outflow opening to form a horizontal flow path, and the washing liquid flowing out from the liquid outflow opening flows to the horizontal flow path to equalize the distribution. Then, when the cleaning liquid having the equalized distribution flows down the substrate, the cleaning liquid flows to the vertical flow path as the flow rate control means, and the cleaning liquid maintains the distribution equalization state and flows down toward the substrate. Further, the flow rate of the cleaned liquid which is washed when hitting the substrate is changed in accordance with the length of the vertical flow path as the flow rate of the control means -8 - 200911394. If the vertical flow path is too long, the speed of the washing liquid will be excessively slow, and if the vertical flow path is too short, the minimum speed necessary for the washing liquid cannot be applied. Since the speed at which the cleaning liquid is applied is changed depending on the state of the substrate, the length of the vertical DC path is appropriately set in accordance with the state of the substrate. The cleaning device of the fifth aspect of the invention is the cleaning device of the first aspect of the invention, wherein two vertical plates are provided between the liquid supply means and the conveying path to form a cleaning liquid. The slit-shaped passage that flows between the two vertical plates, the substrate is conveyed in a state of being inclined in the width direction of both sides of the slit-shaped passage, and is provided in parallel with the inclination direction of the substrate. The inflow port and the outflow port of the slit-like passage have the slit-shaped passage function as the rectifying means and the flow rate controlling means. In the cleaning device of the fifth aspect of the invention, the substrate is conveyed in a state of being inclined toward the width direction of the slit-mounted passage. When the substrate is conveyed in an inclined state, it is effective that the cleaning liquid supplied to the substrate is removed from the substrate by its own weight. The function of the rectifying means is to adjust the flow of the cleaning liquid between the slit-like passages, so that this function is exerted. Further, the function of the flow rate control means is to appropriately set the length of the slit-like passage to control the speed, and to exert the flow rate control function. In addition, the slit-like passage must have an equal length at any place. Here, the substrate is inclined in the width direction of the slit-like passage, so the inflow port of the slit-like passage (the upper end of the slit-shaped passage, that is, the connection portion with the liquid receiving portion) and the outflow port (with the slit shape) The lower end of the via, that is, the portion opposite to the -9-200911394 substrate, is formed in parallel with the oblique direction of the substrate. In this way, the cleaning liquid formed to flow into the slit-like passage flows at exactly equal distances. The apparatus for manufacturing a flat panel display according to claim 6 of the present invention has the cleaning apparatus according to any one of claims 1 to 5. The cleaning device can be applied to various manufacturing devices, and particularly to a manufacturing device applied to a flat panel display. Further, the flat panel display of the sixth aspect of the invention is manufactured by the manufacturing apparatus of the flat panel display according to the sixth aspect of the invention. The above cleaning device can be used as a cleaning device that applies an alignment film to a substrate and performs a rubbing treatment to clean the substrate. Further, the present invention can be applied not only to the washing step of the rubbing treatment but also to any washing step. For example, a development step of applying a developer to a substrate to develop a specific pattern, followed by rinsing and developing to replace water into water may be applied. In the developing step, the specific pattern is developed on the substrate, and since the hydrophobicity is also high, the cleaning device of the present invention is suitably applied to achieve a beneficial effect. [Effects of the Invention] As described above, the present invention uses a rectifying means and a flow rate controlling means to supply a cleaning liquid for adjusting the liquid flow at an appropriate speed in accordance with the state of the surface of the substrate without using a complicated mechanism. The substrate can prevent unevenness from occurring on the substrate. -10-200911394 [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. First, the first first embodiment will be described, and then the second embodiment will be described. The embodiment of the first embodiment and the second embodiment is also a cleaning device for cleaning after the rubbing treatment, and will be described as an example of the application washing device. <First Embodiment of the Invention> In the first embodiment, the cleaning device 1 is provided with a transport roller 2, and the substrate B is sequentially transported by the transport roller 2. The transport roller 2 is continuously provided from a processing device (e.g., a rubbing process) that performs the processing of the preceding stage, and is provided to be connected to a processing device that performs the processing of the subsequent stage to perform a so-called line processing. The treatment in the subsequent stage includes, for example, a drying treatment for drying the substrate B in a wet state by supplying a cleaning liquid. The liquid tank 30 as a liquid supply means is provided in the upper part of the conveyance roller 2. The liquid tank 30 is connected to the nozzle 3 1 and the horizontal flow path 3 2 , and the horizontal flow path 3 2 is connected to the vertical DC path 33. As shown in Fig. 2, the function of the liquid tank 30 serves as a liquid storage means for storing the washing liquid. The liquid tank 30 is connected to a plurality of nozzles 31 as a liquid transport means, and the cleaning liquid is supplied from the nozzle 31 to the liquid tank 30, so that the amount of washing stored in the liquid tank 30 is maintained constant. The liquid tank 30 is provided with a slit opening 34 as a liquid outflow opening, and the washing liquid in the liquid tank 30 flows out from the slit opening 34. The horizontal flow path 3 2 will be described. The horizontal flow path 3 2 is a flow path through which the cleaning liquid flows in the horizontal direction, and the cleaning liquid -11 - 200911394 flowing out of the slit opening 34 gradually flows to the horizontal flow path 3 2 . The function of the horizontal flow path 32 is a rectifying means for adjusting the flow of the cleaning liquid to be in a rectified state. The cleaning liquid is diffused between the horizontal flow paths 3 2 to make the distribution uniform. Therefore, it is preferable that the horizontal flow path 32 is a material having a high hydrophilicity. When a material having a high hydrophilicity is used, the cleaning liquid flowing out from the slit opening 34 instantaneously diffuses and becomes a rectified state. The vertical flow path 3 3 will be described. The vertical flow path 3 3 is connected to the horizontal flow path 3 2 . Therefore, the traveling direction of the cleaning liquid flowing to the horizontal flow path 32 is changed from the horizontal direction to the vertical direction, and flows toward the substrate B. That is, the vertical flow path 33 has a function of imparting a velocity toward the substrate b to the cleaning liquid. Further, the "cleaning liquid flows down to the vertical flow path 33 and flows down, and gradually flows down while maintaining the state. It is also preferable to use a material having high hydrophilicity in order to flow down the vertical flow path 3 3 while the cleaning liquid is maintained in a rectified state. Fig. 2 shows a cross section of the cleaning device 1. As shown in the figure, the cleaning liquid flows down from the upper end to the lower end of the vertical flow path 3 3 to impart a specific speed to the cleaning liquid (that is, between the vertical flow path 3 3 and the positional energy is converted into the kinetic energy, Apply a specific speed to the cleaning solution). The speed applied to the cleaning liquid changes due to the length L1 of the vertical flow path 33. In the length L1, the length L2 from the upper end of the vertical flow path 3 3 to the lower surface of the liquid tank 30 is constant, so the remaining length L3 (= L1 - L2) is set to an appropriate length to control the cleaning. The speed at which the liquid is applied. This length L3 is formed as a flow rate control area. At this time, since the cleaning liquid hits at a rapid speed due to the state of the surface of the substrate B, the cleaning liquid cannot be supplied in the same distribution, and the impact speed is too slow. -12-200911394 The distribution state becomes uneven. Then, the gas on the surface of the substrate B is set such that the cleaning liquid impacts the appropriate length of the substrate B to such an extent that it is slow and distributed in accordance with the state of the surface of the substrate B. Further, as shown in Fig. 2, the lower portion of the vertical flow path 3 3 is provided with an inclined portion 3 3 S. The washing liquid flow is applied by the inclined portion 3 3 S to apply an angle of a direction opposite to the conveying direction of the substrate B. Since the angular velocity component in the direction opposite to the transport direction of the substrate B is caused to the flow of the cleaning liquid by the inclined portion 33S, the time during which the cleaning liquid diffuses on the substrate B becomes earlier. Therefore, it is possible to supply the cleaning liquid to the substrate B quickly. Further, the inclined portion 3 3 S may not be provided irrespective of the diffusion time of the cleaning liquid (the portion of the inclined portion 3 3 S may be set to the vertical state). The slit opening 3 4 will be described. As described above, the cleaning liquid flows out of the slit opening 34 and flows to the horizontal flow path 32. As shown in Fig. 2, the washing liquid flows down in a direction perpendicular to the conveying direction of the substrate B, and the cleaning liquid is supplied to the entire substrate b by the conveyance of the substrate B. Therefore, the slit opening 34 is formed longer than the substrate B in the direction in which the conveying direction of the substrate B is perpendicularly intersected. Therefore, the slit opening 34 is formed as an elongated opening, allowing a large amount of washing liquid to flow out. Next, the positional relationship between the slit opening 34 and the liquid level of the washing liquid stored in the liquid tank 30 will be described. In order to replenish the washing liquid PCT from the slit opening 34, the washing liquid is supplied from the nozzle 3 1 to the liquid tank 3 〇. When the amount of the cleaning liquid supplied from the nozzle 31 is the same as that of the washing liquid flowing out of the slit opening 34, the liquid level of the washing liquid stored in the liquid tank 3 can be kept constant at any time. At this time, the cleaning liquid is supplied from the nozzle 3 so that the liquid -13 - 200911394 surface of the cleaning liquid is located at a position higher than the slit opening 34 at any time. When the interval between the liquid surface of the cleaning liquid and the slit opening 34 is increased, the pressure of the cleaning liquid flowing out from the slit opening 34 is increased, and the cleaning is performed from the slit opening 34 in a high pressure state. liquid. In this case, the cleaning liquid does not flow in the same distribution in the horizontal flow path 32. Therefore, the liquid level of the cleaning liquid is maintained at a position higher than the position of the slit opening 34, and the pressure of the washing liquid flowing out from the slit opening 34 can be reduced, and the washing liquid gradually overflows from the slit opening 34. status. Therefore, in the horizontal flow path 32, the washing liquid flows in the same distribution. The inside of the liquid tank 30 will be described. Referring to Fig. 2, the liquid tank 30 is connected to the nozzle 3 1 for conveying the cleaning liquid, and the washing liquid is supplied at any time to keep the liquid level of the washing liquid constant. Since the cleaning liquid is ejected from the nozzle 31 at a specific pressure, the washing liquid stored in the liquid tank 30 is turbulent due to the ejected cleaning liquid. In this case, the flow of the washing liquid is not necessarily caused by the position of the slit opening 34, and the distribution of the washing liquid cannot be made the same. Therefore, as shown in Fig. 2, the partition plate 36 as the area dividing means in the region where the washing liquid is divided is placed in the liquid tank 30. The partition plate 36 can be divided into a region from the nozzle 31 into the cleaning liquid side (inflow side region) and a region from the slit opening 34 to the cleaning liquid side (outflow). Side area). Since the cleaning liquid is ejected from the nozzle 31 in the inflow side region, turbulent flow is caused to the cleaning liquid in the region, and no turbulent flow is caused to the cleaning liquid in the outflow side region. Therefore, the cleaning liquid discharged from the slit opening 34 can form a certain distribution. Further, the partition plate 36 is formed into an L shape as shown in Fig. 2 . By this means, the partition plate 36 can buffer the turbulent flow from the inflow side region to the transition portion of the outflow side region -14 - 200911394 domain, and the effect of equalizing the washing liquid component can be further enhanced. According to the above cleaning device, the flow of the cleaning liquid is rectified by the rectifying means, and the cleaning liquid is applied to the cleaning liquid by the flow rate control means. Therefore, the cleaning liquid can be supplied uniformly and surely when supplied to the substrate. <Second embodiment of the present invention> Next, a second embodiment will be described. In the second embodiment, as shown in Fig. 3, the substrate B is conveyed in a state (inclination angle Θ) inclined in the direction of the slit-like passage 55 to be described later. In the present embodiment, the horizontal plate 50, the first vertical plate 51, the second vertical plate 52, the liquid receiving portion 513, and the liquid discharge portion 54 are provided. As shown in Fig. 3 and Fig. 4, the horizontal plate 50 is a plate member in which the cleaning liquid flowing out from the slit opening 34 of the liquid tank 30 flows in the horizontal direction, and the first vertical plate 51 is connected to The plate member of the horizontal plate 50 flows in the vertical direction, and the washing liquid flowing in the horizontal direction changes the liquid in the vertical direction. The second vertical plate 52 is a plate member that is disposed in parallel with the first vertical plate 51, and forms a narrow space between the first vertical plate 51 and the second vertical plate, that is, a slit-like passage. 5 5. The liquid receiving portion 5 3 is a receiving portion for temporarily storing the washing liquid of the first vertical plate 51. The body receiving portion 53 is connected to the second vertical plate 5 2 and stored in the liquid receiving portion 5 3 to wash the slit-like passage 5 5 . The liquid receiving portion 53 can be integrally attached to the second vertical plate 52. For example, the upper end of the second vertical plate 52 is protruded in a direction away from the first vertical plate 51 to form a protruding portion 52T'. The installation of the 5 2 plate liquid under the narrow liquid flow is the function of the -15-200911394 protruding portion 5 2 T and the first vertical plate 51 as a liquid bearing 53 〇 slit-like passage 5 5 as a rectifying means and Flow rate control section. In the case where the function is a rectifying means, the slit shape 5 5 is a narrow slit-like space, so that the flow path of the slit-like passage 5 5 ' is reduced to a rectified state. Next, the case where the function is used as the flow rate means will be described. The slit-like passages 5 5 are in the vertical direction, so that the cleaning liquid is temporarily stored in the state in which the liquid receiving portion 53 is temporarily stored. Specific speed. The length of the slit-like passages 55 is appropriately set in accordance with the state of the substrate, and the washing liquid impinging on the substrate becomes an appropriate speed. Further, as shown in Fig. 3, the inflow port of the inflow cleaning liquid of the slit-like passage 55 and the outflow port (the outlet of the cleaning liquid) are arranged in parallel with the inclination direction of the substrate ( (in accordance with the inclination angle Θ) ). The upper end of the accompanying passage 55 is set in accordance with the inclination angle θ, and the liquid receiving portion 5 3 is provided at an inclination angle Θ. That is, the function of the slit-like passages 5 5 is as a means and a flow rate control means, so that it is necessary to have the same rectification function and flow rate control function for all the cleaning liquids flowing down. In this case, the length of the slit path 55 must be equal in any direction in the direction perpendicular to the direction in which the base is conveyed (the X direction in the drawing). Therefore, the inflow port and the outflow port of the slit-like passage 55 are provided in accordance with the corner. The liquid discharge port of the liquid receiving portion 53 is provided with a liquid discharge port for discharging the cleaning liquid. The liquid receiving portion 53 stores the cleaning liquid flowing out of the liquid tank 30. The liquid level of the cleaning liquid which does not exist must also be inclined. . The liquid level is not the control setting between the hand passages of the tipping portion, and the squatting time is Ρ (the slit and the slit are also inclined by 54 ° according to the rectifying plate). In the X direction, the interval between the liquid receiving portion 53 and the liquid surface may vary depending on the location, and the hydraulic pressure may vary depending on the location of the liquid receiving portion 53. The hydraulic pressure varies depending on the location, and the washing is performed. Since the clean liquid does not flow in the slit-like passage 55 in the same liquid flow, the liquid discharge portion 54 that discharges the cleaning liquid is provided on the lowermost side of the liquid receiving portion 53. The liquid discharge portion 54 is provided to be cleaned. The liquid is discharged, and a sufficient amount of the cleaning liquid is discharged from the liquid tank 30 to form a liquid level of the cleaning liquid stored in the liquid receiving portion 53 at an inclination angle Θ. At this time, the liquid is discharged from the liquid tank 30. The amount of liquid is the sum of the amount of the cleaning liquid supplied to the substrate 与 and the amount of the cleaning liquid discharged from the liquid discharge unit 54. Therefore, in order to allow a sufficient amount of the cleaning liquid to flow out from the liquid tank 3, for example, The opening area of the slit opening 34 is increased. As explained above, the substrate is inclined In the case of the above-described configuration, the cleaning liquid can be uniformly supplied to the substrate in an instant. [Brief Description] FIG. 1 is a view showing the liquid tank, the horizontal flow path, and the vertical flow path in the first embodiment. Fig. 2 is a cross-sectional view of Fig. 1. Fig. 3 is a view showing a configuration of a liquid tank, a first vertical flow path, and a second vertical flow path in the second embodiment. Section 3 of the figure. [Description of main components] -17- 200911394 1 : Cleaning device 2: conveying roller 3 〇: liquid tank 3 1 : nozzle 3 2 : horizontal flow path 3 3 : vertical flow path 3 4 : narrow Slot opening 5 1 : first vertical plate 5 2 : second vertical plate 5 3 : liquid receiving portion 54 : liquid discharge portion 5 5 : slit-like passage B : substrate -18