TW200909403A - Compounds and process for producing the same - Google Patents

Compounds and process for producing the same Download PDF

Info

Publication number
TW200909403A
TW200909403A TW097127625A TW97127625A TW200909403A TW 200909403 A TW200909403 A TW 200909403A TW 097127625 A TW097127625 A TW 097127625A TW 97127625 A TW97127625 A TW 97127625A TW 200909403 A TW200909403 A TW 200909403A
Authority
TW
Taiwan
Prior art keywords
substituted
unsubstituted
compound represented
formula
compound
Prior art date
Application number
TW097127625A
Other languages
English (en)
Chinese (zh)
Inventor
Ken Maruyama
Daisuke Shimizu
Yukio Nishimura
Toshiyuki Kai
Tsutomu Shimokawa
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200909403A publication Critical patent/TW200909403A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
    • C07C37/11—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms
    • C07C37/20—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms using aldehydes or ketones
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C35/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C35/22—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring polycyclic, at least one hydroxy group bound to a condensed ring system
    • C07C35/44—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring polycyclic, at least one hydroxy group bound to a condensed ring system with a hydroxy group on a condensed ring system having more than three rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/12—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols with polyhydric phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/92—Systems containing at least three condensed rings with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
TW097127625A 2007-07-27 2008-07-21 Compounds and process for producing the same TW200909403A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007196540 2007-07-27

Publications (1)

Publication Number Publication Date
TW200909403A true TW200909403A (en) 2009-03-01

Family

ID=40304217

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097127625A TW200909403A (en) 2007-07-27 2008-07-21 Compounds and process for producing the same

Country Status (3)

Country Link
JP (1) JP5375610B2 (ja)
TW (1) TW200909403A (ja)
WO (1) WO2009016984A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8748078B2 (en) 2009-09-09 2014-06-10 Mitsubishi Gas Chemical Company, Inc. Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
JP5820171B2 (ja) * 2011-07-14 2015-11-24 Jsr株式会社 包接化合物およびその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1127870B1 (en) * 2000-02-26 2003-11-05 Shipley Company LLC Novel monomers, polymers, methods of synthesis thereof and photoresist compositions
JP3458096B2 (ja) * 2000-08-11 2003-10-20 株式会社半導体先端テクノロジーズ レジスト組成物、及び半導体装置の製造方法
KR101135771B1 (ko) * 2004-02-04 2012-04-20 각고우호우진 가나가와 다이가쿠 칼릭스아렌계 화합물, 그의 제조 방법, 그의 중간체 및그의 조성물
JP4657030B2 (ja) * 2005-06-30 2011-03-23 Ｊｓｒ株式会社 カリックスアレーン系誘導体及びそれを含有する組成物

Also Published As

Publication number Publication date
JPWO2009016984A1 (ja) 2010-10-14
WO2009016984A1 (ja) 2009-02-05
JP5375610B2 (ja) 2013-12-25

Similar Documents

Publication Publication Date Title
JP4657030B2 (ja) カリックスアレーン系誘導体及びそれを含有する組成物
US20090042123A1 (en) Calixresorcinarene compound, photoresist base comprising the same, and composition thereof
KR20120080163A (ko) 환상 화합물, 그 제조 방법, 감방사선성 조성물 및 레지스트 패턴 형성 방법
TW200912538A (en) Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
US8829247B2 (en) Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
TW200905398A (en) Photoresist base material and photoresist composition containing the same
JP3139319B2 (ja) テトラフェノール系化合物、その製法および用途
TW201241049A (en) Resin composition of photoresist
TW200909403A (en) Compounds and process for producing the same
JP3652071B2 (ja) ノボラック樹脂前駆体およびノボラック樹脂の製造方法
JP2009046395A (ja) レゾルシノール誘導体の製造方法
TWI311689B (en) Chemical amplification type positive photoresist composition
JP2009196904A (ja) 環状化合物及びその製造方法
JP5530084B2 (ja) フラーレン誘導体並びにその溶液、及びその膜
JP3377265B2 (ja) 感光性樹脂組成物の製造方法
JPH07333842A (ja) 感光性樹脂組成物
JP3799644B2 (ja) フェノール系２核体化合物、その製法および用途
JP3799643B2 (ja) ペンタフェノール系化合物、その製法及び用途
JP3921710B2 (ja) ６核体ノボラック化合物およびその用途
JP3319092B2 (ja) ポジ型レジスト組成物
JP4168193B2 (ja) １，２−ナフトキノン−２−ジアジドスルホン酸エステル系感光剤及びその製造方法
TW200305060A (en) 1, 2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition
JP3921705B2 (ja) 多価フェノール系化合物およびその用途
JP3799635B2 (ja) 多価フェノール化合物、その製法および用途
JPH09188642A (ja) フェノール系非対称多核体化合物、その製法および用途