WO2009016984A1 - 化合物及びその製造方法 - Google Patents

化合物及びその製造方法 Download PDF

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Publication number
WO2009016984A1
WO2009016984A1 PCT/JP2008/063069 JP2008063069W WO2009016984A1 WO 2009016984 A1 WO2009016984 A1 WO 2009016984A1 JP 2008063069 W JP2008063069 W JP 2008063069W WO 2009016984 A1 WO2009016984 A1 WO 2009016984A1
Authority
WO
WIPO (PCT)
Prior art keywords
compound
producing
same
general formula
compound represented
Prior art date
Application number
PCT/JP2008/063069
Other languages
English (en)
French (fr)
Inventor
Ken Maruyama
Daisuke Shimizu
Yukio Nishimura
Toshiyuki Kai
Tsutomu Shimokawa
Original Assignee
Jsr Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corporation filed Critical Jsr Corporation
Priority to JP2009525341A priority Critical patent/JP5375610B2/ja
Publication of WO2009016984A1 publication Critical patent/WO2009016984A1/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
    • C07C37/11—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms
    • C07C37/20—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms using aldehydes or ketones
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C35/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C35/22—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring polycyclic, at least one hydroxy group bound to a condensed ring system
    • C07C35/44—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring polycyclic, at least one hydroxy group bound to a condensed ring system with a hydroxy group on a condensed ring system having more than three rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/12—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols with polyhydric phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/92—Systems containing at least three condensed rings with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)

Abstract

　高精度にかつ安定して微細パターンを形成可能なレジスト膜を形成できることに加え、塗布性に優れた感放射線性組成物の材料である化合物であり、一般式（１）で表される化合物及び一般式（２）で表される化合物を縮合反応させ、水素添加して得られる化合物。
PCT/JP2008/063069 2007-07-27 2008-07-18 化合物及びその製造方法 WO2009016984A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009525341A JP5375610B2 (ja) 2007-07-27 2008-07-18 化合物及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007196540 2007-07-27
JP2007-196540 2007-07-27

Publications (1)

Publication Number Publication Date
WO2009016984A1 true WO2009016984A1 (ja) 2009-02-05

Family

ID=40304217

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063069 WO2009016984A1 (ja) 2007-07-27 2008-07-18 化合物及びその製造方法

Country Status (3)

Country Link
JP (1) JP5375610B2 (ja)
TW (1) TW200909403A (ja)
WO (1) WO2009016984A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011030683A1 (ja) * 2009-09-09 2011-03-17 三菱瓦斯化学株式会社 環状化合物、その製造方法、感放射線性組成物およびレジストパターン形成方法
JP2013018761A (ja) * 2011-07-14 2013-01-31 Jsr Corp 包接化合物およびその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005075398A1 (ja) * 2004-02-04 2005-08-18 Jsr Corporation カリックスアレーン系化合物、その製造方法、その中間体及びその組成物
JP2007008875A (ja) * 2005-06-30 2007-01-18 Jsr Corp カリックスアレーン系誘導体及びそれを含有する組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60101105T2 (de) * 2000-02-26 2004-08-19 Shipley Co., L.L.C., Marlborough Monomere,Polymere,Verfahren zu ihrer Synthese und Photoresistcompositionen
JP3458096B2 (ja) * 2000-08-11 2003-10-20 株式会社半導体先端テクノロジーズ レジスト組成物、及び半導体装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005075398A1 (ja) * 2004-02-04 2005-08-18 Jsr Corporation カリックスアレーン系化合物、その製造方法、その中間体及びその組成物
JP2007008875A (ja) * 2005-06-30 2007-01-18 Jsr Corp カリックスアレーン系誘導体及びそれを含有する組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011030683A1 (ja) * 2009-09-09 2011-03-17 三菱瓦斯化学株式会社 環状化合物、その製造方法、感放射線性組成物およびレジストパターン形成方法
US8748078B2 (en) 2009-09-09 2014-06-10 Mitsubishi Gas Chemical Company, Inc. Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
JP5786713B2 (ja) * 2009-09-09 2015-09-30 三菱瓦斯化学株式会社 環状化合物、その製造方法、感放射線性組成物およびレジストパターン形成方法
JP2013018761A (ja) * 2011-07-14 2013-01-31 Jsr Corp 包接化合物およびその製造方法

Also Published As

Publication number Publication date
JP5375610B2 (ja) 2013-12-25
JPWO2009016984A1 (ja) 2010-10-14
TW200909403A (en) 2009-03-01

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