TW200704591A - Process for producing dispersion of hollow fine SiO2 particles, coating composition, and substrate with antireflection coating film - Google Patents

Process for producing dispersion of hollow fine SiO2 particles, coating composition, and substrate with antireflection coating film

Info

Publication number
TW200704591A
TW200704591A TW095110378A TW95110378A TW200704591A TW 200704591 A TW200704591 A TW 200704591A TW 095110378 A TW095110378 A TW 095110378A TW 95110378 A TW95110378 A TW 95110378A TW 200704591 A TW200704591 A TW 200704591A
Authority
TW
Taiwan
Prior art keywords
fine
particles
dispersion
sio2
hollow fine
Prior art date
Application number
TW095110378A
Other languages
English (en)
Other versions
TWI372726B (zh
Inventor
Yohei Kawai
Takashige Yoneda
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW200704591A publication Critical patent/TW200704591A/zh
Application granted granted Critical
Publication of TWI372726B publication Critical patent/TWI372726B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/0081—Composite particulate pigments or fillers, i.e. containing at least two solid phases, except those consisting of coated particles of one compound
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/04—Compounds of zinc
    • C09C1/043—Zinc oxide
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C01P2004/34—Spheres hollow
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24372—Particulate matter
    • Y10T428/24421—Silicon containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Dispersion Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
TW095110378A 2005-06-02 2006-03-24 Process for producing dispersion of hollow fine SiO2 particles, coating composition, and substrate with antireflection coating film TW200704591A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005162486A JP5057199B2 (ja) 2005-06-02 2005-06-02 中空状ＳｉＯ２微粒子分散液の製造方法、塗料組成物及び反射防止塗膜付き基材

Publications (2)

Publication Number Publication Date
TW200704591A true TW200704591A (en) 2007-02-01
TWI372726B TWI372726B (zh) 2012-09-21

Family

ID=37481341

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095110378A TW200704591A (en) 2005-06-02 2006-03-24 Process for producing dispersion of hollow fine SiO2 particles, coating composition, and substrate with antireflection coating film

Country Status (6)

Country Link
US (1) US8623312B2 (zh)
EP (1) EP1886972A4 (zh)
JP (1) JP5057199B2 (zh)
CN (1) CN101184695B (zh)
TW (1) TW200704591A (zh)
WO (1) WO2006129408A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI487664B (zh) * 2008-10-31 2015-06-11 Asahi Glass Co Ltd Hollow particles, methods for their manufacture, coating compositions and articles

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GB0617480D0 (en) 2006-09-06 2006-10-18 Univ Sheffield Novel nanoparticles
EP2128090B1 (en) * 2007-03-16 2012-05-16 Asahi Glass Company, Limited Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon
EP2128091B1 (en) 2007-03-16 2013-07-03 Asahi Glass Company, Limited Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon
JP5158075B2 (ja) * 2007-03-28 2013-03-06 コニカミノルタアドバンストレイヤー株式会社 反射防止フィルム、それを用いた偏光板、及び表示装置
WO2009001905A1 (ja) 2007-06-26 2008-12-31 Denki Kagaku Kogyo Kabushiki Kaisha 球状有機ポリマー－シリコン化合物複合粒子、中空粒子およびそれらの製造方法
JP5423945B2 (ja) * 2007-08-22 2014-02-19 Ｊｓｒ株式会社 シリカ系中空粒子分散体の製造方法
JP5240447B2 (ja) * 2007-08-22 2013-07-17 Ｊｓｒ株式会社 シリカ系中空粒子の製造方法
EP2298694A4 (en) * 2008-06-03 2011-06-01 Asahi Glass Co Ltd PROCESS FOR PRODUCTION OF CORE / ENVELOPE PARTICLES, CORE / ENVELOPE PARTICLES, METHOD FOR PRODUCTION OF HOLLOW PARTICLES, COMPOSITION OF PAINTS AND ARTICLE
JPWO2010007956A1 (ja) * 2008-07-17 2012-01-05 旭硝子株式会社 撥水性基体およびその製造方法
JP2010037137A (ja) * 2008-08-05 2010-02-18 Sony Corp 中空粒子及びその製造方法
WO2010018852A1 (ja) 2008-08-13 2010-02-18 旭硝子株式会社 塗料組成物および塗膜が形成された物品
JP5329896B2 (ja) * 2008-10-01 2013-10-30 帝人デュポンフィルム株式会社 光学用積層フィルム
JP5576799B2 (ja) * 2008-12-25 2014-08-20 電気化学工業株式会社 複合粒子及びその製造方法、中空粒子、その製造方法及び用途
WO2011043361A1 (ja) * 2009-10-09 2011-04-14 三菱レイヨン株式会社 転写フィルム、樹脂積層体及びそれらの製造方法
FR2958081B1 (fr) * 2010-03-23 2012-04-27 Polyrise Dispositifs photovoltaiques comportant une couche anti-reflet a base d'objets disperses presentant des domaines d'indices de refraction distincts
CN102213390B (zh) * 2010-04-02 2013-08-28 瑞安市天迪光电有限公司 太阳能led灯具装置
JP5627957B2 (ja) * 2010-09-02 2014-11-19 株式会社ブリヂストン 穴あき中空シリカ粒子
WO2012128642A1 (en) * 2011-03-18 2012-09-27 Sinvent As Thermal insulation materials
JP2013001840A (ja) * 2011-06-17 2013-01-07 Kao Corp 塗料組成物
US9529120B2 (en) 2011-08-11 2016-12-27 Canon Kabushiki Kaisha Light-shielding coating, light-shielding film, and optical element
BR112014029193A2 (pt) 2012-05-22 2017-06-27 Dsm Ip Assets Bv composição e processo para a produção de um revestimento de óxido inorgânico poroso
CN102719129B (zh) * 2012-07-05 2013-08-21 河南工业大学 一种二氧化硅气凝胶水性隔热涂料的制备方法
JP6030893B2 (ja) * 2012-09-04 2016-11-24 石原産業株式会社 内部に空隙を有するフルオロアルミン酸化合物粒子及びその製造方法並びに当該粒子を含有する組成物及び反射防止膜
JP2015222277A (ja) * 2012-09-14 2015-12-10 旭硝子株式会社 低反射膜を有する物品
JP2016001199A (ja) * 2012-10-15 2016-01-07 旭硝子株式会社 シリカ系多孔質膜、シリカ系多孔質膜付き物品およびその製造方法
CN103013270B (zh) * 2012-12-13 2015-06-24 陕西科技大学 一种高透水汽型聚丙烯酸酯纳米复合皮革涂饰剂的制备方法
WO2015093379A1 (ja) * 2013-12-19 2015-06-25 旭硝子株式会社 紫外線発光装置
JP6164120B2 (ja) * 2014-02-27 2017-07-19 旭硝子株式会社 反射防止膜付き基材および物品
WO2015138159A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Process for preparing functionalized hollow silica particles having low porosity using water-based silica precursors
WO2015138160A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Functionalized hollow silica particles with low porosity using water-based silica precursors
WO2015138141A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Process for preparing functionalized hollow silica particles with low porosity
EP3116956B1 (en) * 2014-03-11 2019-05-15 The Chemours Company FC, LLC Process for preparing recyclable template hollow particles using water-based silica precursors
JP6373650B2 (ja) * 2014-06-12 2018-08-15 日本化学工業株式会社 ナノ中空粒子の製造方法
JP2016027430A (ja) * 2015-10-26 2016-02-18 豊田通商株式会社 光透過性組成物
JP2021100892A (ja) * 2018-03-26 2021-07-08 Ａｇｃ株式会社 中空粒子の製造方法
JP7290289B2 (ja) * 2018-06-15 2023-06-13 国立大学法人東北大学 コアシェル型多孔質シリカ粒子の製造方法
JP7280127B2 (ja) * 2019-06-28 2023-05-23 日揮触媒化成株式会社 鈴状粒子、該粒子を含む塗布液及び該粒子を含む透明被膜付基材
CN110747652A (zh) * 2019-10-30 2020-02-04 江苏泛亚微透科技股份有限公司 二氧化硅微球/玻璃纤维布复合隔热保温膜材料的制备方法
CN111620342B (zh) * 2020-06-03 2021-11-19 南京特粒材料科技有限公司 一种小尺寸单分散中空二氧化硅微球及其制备方法和应用
CN113788631B (zh) * 2021-10-11 2023-05-05 上海西源新能源技术有限公司 一种ZnO-SiO2双涂层的下转换减反射膜及其制备方法
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI487664B (zh) * 2008-10-31 2015-06-11 Asahi Glass Co Ltd Hollow particles, methods for their manufacture, coating compositions and articles

Also Published As

Publication number Publication date
WO2006129408A1 (ja) 2006-12-07
US20080241474A1 (en) 2008-10-02
CN101184695A (zh) 2008-05-21
EP1886972A4 (en) 2010-11-10
EP1886972A1 (en) 2008-02-13
JP5057199B2 (ja) 2012-10-24
US8623312B2 (en) 2014-01-07
JP2006335605A (ja) 2006-12-14
CN101184695B (zh) 2011-01-05
TWI372726B (zh) 2012-09-21

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