WO2008114744A1 - 中空微粒子、その製造方法、塗料組成物および塗膜が形成された物品 - Google Patents
中空微粒子、その製造方法、塗料組成物および塗膜が形成された物品 Download PDFInfo
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- WO2008114744A1 WO2008114744A1 PCT/JP2008/054788 JP2008054788W WO2008114744A1 WO 2008114744 A1 WO2008114744 A1 WO 2008114744A1 JP 2008054788 W JP2008054788 W JP 2008054788W WO 2008114744 A1 WO2008114744 A1 WO 2008114744A1
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- WIPO (PCT)
- Prior art keywords
- microparticle
- core
- coating composition
- article
- sio2
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- 239000011859 microparticle Substances 0.000 title abstract 9
- 239000008199 coating composition Substances 0.000 title abstract 4
- 239000011248 coating agent Substances 0.000 title abstract 3
- 238000000576 coating method Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 8
- 229910052681 coesite Inorganic materials 0.000 abstract 4
- 229910052906 cristobalite Inorganic materials 0.000 abstract 4
- 239000000377 silicon dioxide Substances 0.000 abstract 4
- 235000012239 silicon dioxide Nutrition 0.000 abstract 4
- 229910052682 stishovite Inorganic materials 0.000 abstract 4
- 229910052905 tridymite Inorganic materials 0.000 abstract 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 2
- 230000003667 anti-reflective effect Effects 0.000 abstract 2
- 239000011258 core-shell material Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000002245 particle Substances 0.000 abstract 2
- 239000002585 base Substances 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 150000003755 zirconium compounds Chemical class 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62222—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic coatings
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B38/00—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof
- C04B38/009—Porous or hollow ceramic granular materials, e.g. microballoons
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/465—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase having a specific shape
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
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- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00482—Coating or impregnation materials
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/80—Optical properties, e.g. transparency or reflexibility
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3244—Zirconium oxides, zirconates, hafnium oxides, hafnates, or oxide-forming salts thereof
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- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3418—Silicon oxide, silicic acids, or oxide forming salts thereof, e.g. silica sol, fused silica, silica fume, cristobalite, quartz or flint
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/44—Metal salt constituents or additives chosen for the nature of the anions, e.g. hydrides or acetylacetonate
- C04B2235/449—Organic acids, e.g. EDTA, citrate, acetate, oxalate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
- C08K3/11—Compounds containing metals of Groups 4 to 10 or of Groups 14 to 16 of the Periodic Table
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Structural Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Wood Science & Technology (AREA)
- Dispersion Chemistry (AREA)
- Composite Materials (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Paints Or Removers (AREA)
- Silicon Compounds (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
屈折率が低く抑えられ、かつ耐アルカリ性に優れる中空微粒子、その製造方法、反射防止効果および耐アルカリ性に優れる塗膜を形成できる塗料組成物、および高い反射防止効果を長期間維持できる物品を提供する。
SiO2を主成分とし、Zrを含む中空微粒子であり、Zrの含有量(ZrO2換算)が、SiO2の100質量部に対して0.1~15質量部である中空微粒子;該中空微粒子と分散媒とを含む塗料組成物;基材上に該塗料組成物からなる塗膜が形成された物品;(a)SiO2前駆物質、ジルコニウム化合物、およびコア微粒子を含む分散液中にて、コア微粒子表面に、SiO2を主成分とし、Zrを含むシェルを析出させ、コア-シェル粒子を得る工程と、(b)コア-シェル粒子のコア微粒子を溶解または分解する工程とを有する中空微粒子の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES08722184T ES2384126T3 (es) | 2007-03-16 | 2008-03-14 | Micropartículas huecas, método para la producción de las mismas, composición de revestimiento y artículo sobre el que se ha formado una película de revestimiento |
EP08722184A EP2128090B1 (en) | 2007-03-16 | 2008-03-14 | Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon |
CN2008800083261A CN101636349B (zh) | 2007-03-16 | 2008-03-14 | 中空微粒及其制造方法、涂料组合物及形成有涂膜的物品 |
JP2009505205A JP5304638B2 (ja) | 2007-03-16 | 2008-03-14 | 中空微粒子、その製造方法、塗料組成物および塗膜が形成された物品 |
US12/557,648 US20100047555A1 (en) | 2007-03-16 | 2009-09-11 | Hollow fine particles, production process thereof, coating composition and article having coating film formed |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2007069317 | 2007-03-16 | ||
JP2007-069317 | 2007-03-16 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/557,648 Continuation US20100047555A1 (en) | 2007-03-16 | 2009-09-11 | Hollow fine particles, production process thereof, coating composition and article having coating film formed |
Publications (1)
Publication Number | Publication Date |
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WO2008114744A1 true WO2008114744A1 (ja) | 2008-09-25 |
Family
ID=39765852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/054788 WO2008114744A1 (ja) | 2007-03-16 | 2008-03-14 | 中空微粒子、その製造方法、塗料組成物および塗膜が形成された物品 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100047555A1 (ja) |
EP (1) | EP2128090B1 (ja) |
JP (1) | JP5304638B2 (ja) |
CN (1) | CN101636349B (ja) |
ES (1) | ES2384126T3 (ja) |
TW (1) | TWI423922B (ja) |
WO (1) | WO2008114744A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102135635A (zh) * | 2009-12-23 | 2011-07-27 | 罗门哈斯公司 | 用于光学带通滤波器的复合颗粒 |
WO2013031799A1 (ja) * | 2011-08-31 | 2013-03-07 | 住友大阪セメント株式会社 | 無機酸化物透明分散液と透明複合体形成用樹脂組成物及び透明複合体並びに光学部材 |
JP2013533909A (ja) * | 2010-06-18 | 2013-08-29 | ディーエスエム アイピー アセッツ ビー.ブイ. | 無機酸化物被膜 |
KR101461203B1 (ko) * | 2013-02-27 | 2014-11-18 | 주식회사 나노신소재 | 중공형 금속 산화물-실리케이트 나노입자 및 그 제조 방법 |
JP2018536733A (ja) * | 2015-11-11 | 2018-12-13 | Cqv株式会社Cqv Co., Ltd. | 中空構造を有する光沢顔料及びその製造方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010050263A1 (ja) * | 2008-10-31 | 2010-05-06 | 旭硝子株式会社 | 中空粒子、その製造方法、塗料組成物および物品 |
FR2958081B1 (fr) * | 2010-03-23 | 2012-04-27 | Polyrise | Dispositifs photovoltaiques comportant une couche anti-reflet a base d'objets disperses presentant des domaines d'indices de refraction distincts |
EP3141533A4 (en) * | 2014-05-08 | 2017-12-06 | Asahi Glass Company, Limited | Glass article |
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JP2001233611A (ja) | 2000-02-24 | 2001-08-28 | Catalysts & Chem Ind Co Ltd | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
JP2003298087A (ja) | 2002-03-29 | 2003-10-17 | Matsushita Electric Works Ltd | 太陽電池システム |
JP2005053737A (ja) * | 2003-08-04 | 2005-03-03 | Sud-Chemie Catalysts Inc | メソポーラス材料の製造方法 |
JP2007069317A (ja) | 2005-09-08 | 2007-03-22 | Senjo Seiki Kk | 加工装置 |
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US6652967B2 (en) * | 2001-08-08 | 2003-11-25 | Nanoproducts Corporation | Nano-dispersed powders and methods for their manufacture |
AU728616B3 (en) * | 2000-05-30 | 2001-01-11 | Karl Roes | A brush |
DE102004020961A1 (de) * | 2004-04-28 | 2005-11-24 | Ceram Ag | Anstrich- und/oder Beschichtungsmaterial |
US20070275257A1 (en) * | 2004-07-21 | 2007-11-29 | Catalysts & Chemicals Industries Co., Ltd | Silica-Based Particles, Method of Producing the Same, Paint for Forming Coating Film and Coated |
JP5057199B2 (ja) * | 2005-06-02 | 2012-10-24 | 旭硝子株式会社 | 中空状SiO2微粒子分散液の製造方法、塗料組成物及び反射防止塗膜付き基材 |
JP4883383B2 (ja) * | 2005-06-02 | 2012-02-22 | 旭硝子株式会社 | 中空状SiO2を含有する分散液、塗料組成物及び反射防止塗膜付き基材 |
JP5167812B2 (ja) * | 2005-07-15 | 2013-03-21 | コニカミノルタアドバンストレイヤー株式会社 | 光学フィルムの処理方法、光学フィルムの処理装置及び光学フィルムの製造方法 |
US20070048513A1 (en) * | 2005-08-25 | 2007-03-01 | Fuji Photo Film Co., Ltd. | Antireflective film and polarizing plate and image display using same |
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2008
- 2008-03-14 WO PCT/JP2008/054788 patent/WO2008114744A1/ja active Application Filing
- 2008-03-14 ES ES08722184T patent/ES2384126T3/es active Active
- 2008-03-14 TW TW097109270A patent/TWI423922B/zh active
- 2008-03-14 JP JP2009505205A patent/JP5304638B2/ja active Active
- 2008-03-14 CN CN2008800083261A patent/CN101636349B/zh not_active Expired - Fee Related
- 2008-03-14 EP EP08722184A patent/EP2128090B1/en active Active
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2009
- 2009-09-11 US US12/557,648 patent/US20100047555A1/en not_active Abandoned
Patent Citations (4)
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JP2001233611A (ja) | 2000-02-24 | 2001-08-28 | Catalysts & Chem Ind Co Ltd | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
JP2003298087A (ja) | 2002-03-29 | 2003-10-17 | Matsushita Electric Works Ltd | 太陽電池システム |
JP2005053737A (ja) * | 2003-08-04 | 2005-03-03 | Sud-Chemie Catalysts Inc | メソポーラス材料の製造方法 |
JP2007069317A (ja) | 2005-09-08 | 2007-03-22 | Senjo Seiki Kk | 加工装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102135635A (zh) * | 2009-12-23 | 2011-07-27 | 罗门哈斯公司 | 用于光学带通滤波器的复合颗粒 |
JP2013533909A (ja) * | 2010-06-18 | 2013-08-29 | ディーエスエム アイピー アセッツ ビー.ブイ. | 無機酸化物被膜 |
WO2013031799A1 (ja) * | 2011-08-31 | 2013-03-07 | 住友大阪セメント株式会社 | 無機酸化物透明分散液と透明複合体形成用樹脂組成物及び透明複合体並びに光学部材 |
JPWO2013031799A1 (ja) * | 2011-08-31 | 2015-03-23 | 住友大阪セメント株式会社 | 無機酸化物透明分散液と透明複合体形成用樹脂組成物及び透明複合体並びに光学部材 |
KR101461203B1 (ko) * | 2013-02-27 | 2014-11-18 | 주식회사 나노신소재 | 중공형 금속 산화물-실리케이트 나노입자 및 그 제조 방법 |
JP2018536733A (ja) * | 2015-11-11 | 2018-12-13 | Cqv株式会社Cqv Co., Ltd. | 中空構造を有する光沢顔料及びその製造方法 |
US10836912B2 (en) | 2015-11-11 | 2020-11-17 | Cqv Co., Ltd | Glossy pigment having hollow structure and method for producing same |
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Publication number | Publication date |
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CN101636349A (zh) | 2010-01-27 |
CN101636349B (zh) | 2013-07-10 |
EP2128090A1 (en) | 2009-12-02 |
EP2128090B1 (en) | 2012-05-16 |
EP2128090A4 (en) | 2010-05-26 |
JPWO2008114744A1 (ja) | 2010-07-08 |
JP5304638B2 (ja) | 2013-10-02 |
TWI423922B (zh) | 2014-01-21 |
US20100047555A1 (en) | 2010-02-25 |
ES2384126T3 (es) | 2012-06-29 |
TW200900353A (en) | 2009-01-01 |
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