TW200600337A - Antireflection film and process for producing the same - Google Patents

Antireflection film and process for producing the same

Info

Publication number
TW200600337A
TW200600337A TW094106997A TW94106997A TW200600337A TW 200600337 A TW200600337 A TW 200600337A TW 094106997 A TW094106997 A TW 094106997A TW 94106997 A TW94106997 A TW 94106997A TW 200600337 A TW200600337 A TW 200600337A
Authority
TW
Taiwan
Prior art keywords
refractive
antireflection film
low
index
index layer
Prior art date
Application number
TW094106997A
Other languages
English (en)
Chinese (zh)
Other versions
TWI356769B (enExample
Inventor
Masato Asai
Original Assignee
Teijin Dupont Films Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Dupont Films Japan Ltd filed Critical Teijin Dupont Films Japan Ltd
Publication of TW200600337A publication Critical patent/TW200600337A/zh
Application granted granted Critical
Publication of TWI356769B publication Critical patent/TWI356769B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2301/08—Cellulose derivatives
    • C08J2301/10—Esters of organic acids
    • C08J2301/12—Cellulose acetate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW094106997A 2004-03-09 2005-03-08 Antireflection film and process for producing the same TW200600337A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004065417 2004-03-09
JP2004116732 2004-04-12

Publications (2)

Publication Number Publication Date
TW200600337A true TW200600337A (en) 2006-01-01
TWI356769B TWI356769B (enExample) 2012-01-21

Family

ID=34921730

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094106997A TW200600337A (en) 2004-03-09 2005-03-08 Antireflection film and process for producing the same

Country Status (6)

Country Link
US (1) US20070196667A1 (enExample)
EP (1) EP1724613A4 (enExample)
JP (1) JP4362509B2 (enExample)
KR (1) KR101111929B1 (enExample)
TW (1) TW200600337A (enExample)
WO (1) WO2005085913A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4580263B2 (ja) * 2005-03-29 2010-11-10 リンテック株式会社 光触媒ハードコートフィルム
JP2009199001A (ja) * 2008-02-25 2009-09-03 Fujifilm Corp プリズムシート用積層フィルム、プリズムシート、及び表示装置
EP2716645A4 (en) * 2011-05-25 2014-06-04 Mitsubishi Rayon Co METHOD FOR PRODUCING SILOXANE OLIGOMERS
CN102702966B (zh) * 2012-05-24 2014-08-06 长兴化学材料(珠海)有限公司 减反射组合物及其制造方法与用途
KR101523819B1 (ko) * 2012-09-04 2015-05-28 (주)엘지하우시스 실록산 화합물을 포함하는 반사 방지 코팅 조성물, 이를 이용한 반사 방지 필름
JP6000839B2 (ja) 2012-12-21 2016-10-05 メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 ケイ素酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体およびその製造方法、ならびにその複合体を用いて製造した複合材料
JP5685631B2 (ja) * 2013-09-04 2015-03-18 日東電工株式会社 光学フィルムの製造方法
JP6337454B2 (ja) * 2013-12-12 2018-06-06 大日本印刷株式会社 表示装置用前面板およびその製造方法
JP6599699B2 (ja) 2014-12-26 2019-10-30 日東電工株式会社 触媒作用を介して結合した空隙構造フィルムおよびその製造方法
JP6604781B2 (ja) 2014-12-26 2019-11-13 日東電工株式会社 積層フィルムロールおよびその製造方法
JP6713871B2 (ja) 2015-07-31 2020-06-24 日東電工株式会社 光学積層体、光学積層体の製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法
JP6713872B2 (ja) 2015-07-31 2020-06-24 日東電工株式会社 積層フィルム、積層フィルムの製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法
JP6892744B2 (ja) 2015-08-24 2021-06-23 日東電工株式会社 積層光学フィルム、積層光学フィルムの製造方法、光学部材、および画像表示装置
JP7152130B2 (ja) 2015-09-07 2022-10-12 日東電工株式会社 低屈折率層、積層フィルム、低屈折率層の製造方法、積層フィルムの製造方法、光学部材および画像表示装置
KR101813707B1 (ko) * 2015-11-04 2017-12-29 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
KR20180118104A (ko) 2015-12-08 2018-10-30 네덜란제 오르가니자티에 포오르 토에게파스트-나투우르베텐샤펠리즈크 온데르조에크 테엔오 Ｏｌｅｄ에서의 발광 향상
CN108474870A (zh) 2016-03-09 2018-08-31 株式会社Lg化学 抗反射膜
JP6503128B1 (ja) 2018-02-13 2019-04-17 日本板硝子株式会社 膜、液状組成物、光学素子、及び撮像装置
CN116333360B (zh) * 2023-04-04 2025-01-24 贵州省材料产业技术研究院 一种抗反射光学膜

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2693558B1 (fr) * 1992-07-09 1994-08-19 Commissariat Energie Atomique Procédé de fabrication de couches minces présentant des propriétés optiques.
US6383559B1 (en) * 1995-12-07 2002-05-07 Fuji Photo Film Co., Ltd. Anti-reflection film and display device having the same
US6087010A (en) * 1996-06-10 2000-07-11 Nof Corporation Fluorine-containing polyfunctional (meth) acrylate composition low refractivity material and reflection reducing film
US5925438A (en) * 1996-06-17 1999-07-20 Dai Nippon Printing Co., Ltd. Antireflection film
KR100783714B1 (ko) * 2001-10-25 2007-12-07 마츠시다 덴코 가부시키가이샤 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품
JP2003266606A (ja) * 2002-03-13 2003-09-24 Sumitomo Chem Co Ltd 硬化被膜付き透明基材
JP3963759B2 (ja) * 2002-04-01 2007-08-22 株式会社日本触媒 低屈折率組成物及び反射防止膜

Also Published As

Publication number Publication date
JP4362509B2 (ja) 2009-11-11
US20070196667A1 (en) 2007-08-23
KR101111929B1 (ko) 2012-02-17
EP1724613A4 (en) 2009-06-24
KR20070011303A (ko) 2007-01-24
TWI356769B (enExample) 2012-01-21
JPWO2005085913A1 (ja) 2008-01-24
EP1724613A1 (en) 2006-11-22
WO2005085913A1 (ja) 2005-09-15

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees