200531945 (1) 九、發明說明 【發明所屬之技術領域】 本發明是玻璃表面的蝕刻方法、和用於該鈾刻方法的 玻璃板蝕刻裝置、和平面顯示器用玻璃板及平面顯示器。 【先前技術】 用來顯示影像的顯示器，正朝向薄形化的目標發展。 已達成薄形化的顯示器爲平面顯示器（FPD )，而FPD中 譬如有電激發光顯示器（ELD )、和液晶顯示器（LCD ) 及電漿顯示器（PDP )。 FPD所採用的顯示面板，是採用玻璃板作爲構成構件 。第9圖，是顯示FPD中ELD面板的其中一例。第9 ( a )圖爲E L D面板的斜視圖，第9 ( b )則是第9 ( a )圖中 E-E線的剖面示意圖。第9圖的ELD面板，是形成在作爲 畫像顯示面的透明板26表面上積層EL (電子激光）元件 2 9的構造。該EL元件2 9連接著用來連接外部電源的延 伸導線2 7、2 8。此外，E L元件2 9利用帽蓋2 5形成由外 部封閉的結構。 帽蓋2 5是採用金屬、有機高分子及玻璃作爲材料。 當使用玻璃作爲玻璃帽蓋封閉透明板2 6表面上的El元 件2 9時，可藉由f虫刻使玻璃板的表面形成凹陷的方式來 製造玻璃帽蓋。在專利文獻1中，記載著利用對玻璃板表 面實施蝕刻來製造玻璃帽蓋的製造方法。 【專利文獻1】 -4- 200531945 (2) 日本特開2 0 0 4 - 2 2 2 9 1號公報 專利文獻]所記載的玻璃帽蓋製造方法，是於玻璃板 表面上利用掩蓋劑披覆特定圖形後，將該玻璃板浸漬入會虫 刻液中而在未披覆掩蓋劑的玻璃板表面上形成凹部的玻Ϊ离 帽蓋製造方法。 【發明內容】 〔發明所欲解決的課題〕 在對玻璃板進行蝕刻的場合中，當進行於玻璃板表面 形成穩定凹部的過程中，必須將蝕刻液的溫度控制成一定 溫度，並使蝕刻液內的溫度分布一致。使蝕刻液中溫度分 布一致的方法，譬如可採用藉由機械性攪拌或使蝕刻液中 產生氣泡的攪拌方法。倘若是採用專利文獻1中所記載對 蝕刻液進行攪拌的方法，將容易產生以下所述的2種問題 :凹部的底面形成曲面化、掩蓋劑剝離。 第1 〇圖，是顯示將玻璃板浸漬於蝕刻液中進行蝕刻 的狀態下，玻璃表面上之變化的剖面示意圖。第10(a) 圖，是顯示將披覆著掩蓋劑3 1的玻璃板3 0浸漬入蝕刻液 後，於玻璃板3 0的表面形成凹部的過程圖，第]〇 ( b ) 圖，是顯示於表面形成凹部之玻璃板3 0的圖。第1]圖， 是第1 〇圖中虛線部分的放大圖，第1 1 ( a )圖爲第〗〇 ( a )圖中虛線部分的放大圖，第1 1 ( b )圖爲爲第10(b) 圖中虛線部分的放大圖。 如第]](a )圖所示，在將表面由硏蓋劑3 ]覆蓋的 -5- 200531945 (3) 玻璃板3 0浸漬入蝕刻液內對玻璃板3 0的表面執行蝕刻的 過程中，蝕刻液的流動液3 4，將沿著形成過程中的凹部 側面流動。該流動液3 4中，有部分從垂直方向衝擊凹部 底面的流動液，由於存在不被蝕刻的掩蓋劑，因此該部分 的流動液將形成「y」字形的流動。 倘若流動液3 4形成「y」字形的流動，當成形過程 中存在玻璃表面上凹部之底部角3 2的蝕刻液，其流動較 其它的蝕刻液緩慢，而使該部分由蝕刻所溶解的玻璃濃度 ，形成高濃度的蝕刻液。如此一來，將降低凹部之角32 的蝕刻速度。而該速度的下降將導致形成於玻璃板表面之 凹部的形狀產生曲面化的問題。 另外，披覆於玻璃板3 0表面之掩蓋劑3 1的剝離，是 由於蝕刻液進入存在於玻璃板3 0與掩蓋劑3 1之間的微小 間隙3 3內所造成的。由於掩蓋劑的剝離，將導致原本無 須蝕刻之玻璃板3 0的表面受到蝕刻的問題產生。 當把玻璃板浸漬於以上述方式攪拌後的蝕刻液中進行 蝕刻時，將容易導致：形成於玻璃板表面的凹部形狀曲面 化、及掩蓋劑剝離的2種問題產生。當產生上述問題時， 由於難以預測形成於玻璃板3 0表面上之凹部的形狀，將 衍生出所成之凹部其形狀一致化不佳的問題。 LCD面板也是採用玻璃板。將該玻璃板浸漬於蝕刻液 中可達成L C D面板的薄形化。第]2圖，是將玻璃板浸漬 於蝕刻液中的狀態下，顯示蝕刻進行狀況之玻璃板剖面示 意圖。第]2(a)圖，是顯示剛浸漬入蝕刻液內之平坦玻 -6 - 200531945 (4) 璃板3 5的圖，而由於蝕刻液受到攪拌，將於玻璃表面上 形成「/」字形與反「/」字形的流動液3 6。第12 ( b ) 圖，是顯示第1 2 ( a )圖所示之玻璃板3 5表面經鈾刻後 的狀態圖，在玻璃板3 5的表面，由於液體流動的緣故形 成波浪狀的凹凸。換言之，當浸漬於蝕刻液內對玻璃板表 面進行蝕刻時，由於LCD面板用玻璃板所需的玻璃板表 面平坦性受損，因此期待能提供一種可抑制平坦性受損的 蝕刻技術。 有鑑於上述的狀況，本發明的第1個目的，是提供一 種··可於玻璃表面的蝕刻過程中，可一致地對玻璃表面供 給蝕刻液，並可執行一致的蝕刻之蝕刻方法及適用於該蝕 刻方法的蝕刻裝置。 而本發明的第2個目的，是提供一種：即使玻璃板表 面以特定的圖案披覆著掩蓋劑時，也能抑制因蝕刻液進入 玻璃板與掩蓋劑間之間隙所衍生之掩蓋劑剝離的蝕刻方法 ;及適用於該蝕刻方法的蝕刻裝置。 〔解決課題之手段〕 本發明是玻璃板表面的蝕刻方法，其特徵爲具備：將 蝕刻液噴附於玻璃板表面後對前述玻璃板表面進行蝕刻的 蝕刻步騾；及從前述玻璃板去除前述噴附之蝕刻液的蝕刻 液去除步驟。蝕刻液的的噴附，最好是噴附霧狀的蝕刻液 〇 前述的触刻法，是對收納於玻璃板收納單元內之玻璃 -7- 200531945 (5) 板表面進行蝕刻的方法，前述的玻璃板收納單元具有開口 部，且是以挾持玻璃板端部形成固定的方式收納玻璃板。 根據上述以挾持固定端部的方式收納於玻璃板收納單元內 之玻璃板進行蝕刻的方法，由於玻璃板是在不會與外部產 生接觸的狀態下進行蝕刻，故可防止蝕刻過程中玻璃板受 到損傷，此外，由於可防止玻璃板往玻璃板收納單元內移 動，因此可防止玻璃板撞擊玻璃板收納單元所產生的破損 〇 上述的蝕刻方法，亦可在上述蝕刻步驟前，具備在玻 璃板表面上以特定的圖案披覆掩蓋劑的掩蓋劑披覆步驟。 當採用上述的方法時，未披覆掩蓋劑的玻璃表面，將因爲 蝕刻而形成凹部。 上述的蝕刻步驟，最好是使前述玻璃板形成略水平狀 態，並對前述玻璃板的底面噴附蝕刻液後對前述玻璃板的 表面進行蝕刻。當利用特定圖案披覆著掩蓋劑時，最好是 將披覆有掩蓋劑的表面作爲底面，並使玻璃板形成略水平 的狀態。此外，亦可對前述玻璃板之底面的相反面噴附蝕 刻液後對該玻璃板表面進行蝕刻。前述的玻璃板，最好是 形成完全水平。 此外，前述的蝕刻步驟，亦可使前述玻璃板形成略垂 直狀態，再對該玻璃板的表面噴附蝕刻液。在上述的狀態 下，對欲執行蝕刻的蝕刻目標面噴附蝕刻液即可。 此外，本發明的玻璃板蝕刻裝置，具備：可支承玻璃 板的玻璃板支承部；和可對支承於前述支承部之玻璃板噴 200531945 (6) 射蝕刻液的蝕刻液噴射噴嘴；和可控制該蝕刻液溫度並加 以貯留的蝕刻液貯留槽；及回收前述所噴射之蝕刻液的蝕 刻液回收裝置。 前述玻璃板支承部，是可將玻璃板支承成略水平狀態 1¾勺支承部，前述的蝕刻液噴射噴嘴，最好是從前述玻璃板 的下方朝前述玻璃板的底面噴射蝕刻液。此外，前述噴嘴 亦可從前述玻璃板的上方朝前述玻璃板底面的相反面噴射 蝕刻液。 前述的支承部，最好是可支承玻璃板端部的支承部。 當支承玻璃板的端部時，可避免妨礙對玻璃板執行蝕刻液 的噴射。此外，前述支承部也能是可搬送玻璃板的搬送裝 置c 前述搬送裝置，最好是從搬送方向之左右兩側支承玻 璃板兩纟而的搬送滾子。倘若爲上述的搬送滾子，除了可安 定地進行搬送，還能確保可噴附蝕刻液之最大玻璃板表面 積。 則述的搬送滾子，是由具有平面的基部、和外徑較該 基部之平面間隙的略圓柱形滾子所連結的搬送滾子，該搬 送滾子是利用前述基部的平面與前述滾子的平面形成連結 ’且該小外徑的滾子最好是可支承玻璃板的滾子。即使搬 达的滾子左右搖動，亦可藉由該滾子將上述搖動抑制至最 小限度。 此外，前述玻璃板支承部，也可以是將玻璃板支承成 略垂直狀的支承部。當爲上述狀態時’玻璃板支承部也能 -9- 200531945 (7) 是可搬送玻璃板的搬送裝置。 前述回收裝置’最好是可將回收後的蝕刻液輸送至前 述蝕刻液貯留槽的回收裝置。此外’前述的回收裝置’最 好具有一種以上的淤泥去除裝置，以便於去除蝕刻液中的 淤泥。而淤泥去除裝置’舉例來說’濾網、壓濾機、液體 分離機或沉澱槽。 本發明的玻璃板’是利用前述蝕刻方法所蝕刻後的平 面顯示器用玻璃板。該玻璃板’並非僅針對以玻璃板所構 成的對象，而是包含在玻璃表面上積層平面顯示器構成構 件的玻璃板。 此外，本發明的平面顯示器，是採用前述平面顯示器 用玻璃板的平面顯示器。 〔發明的功效〕 根據上述所說明的蝕刻方法，由於並非將玻璃板浸漬 於蝕刻液內，而是均等地對玻璃板表面噴附蝕刻液後進行 蝕刻，因此可實現一致性高的玻璃板表面蝕刻。當玻璃板 披覆有掩蓋劑時，由於掩蓋劑受到噴附蝕刻液所按壓，故 可於蝕刻過程中抑制掩蓋劑的剝離。 此外，上述的蝕刻裝置，由於並非將玻璃板浸漬於蝕 刻液內，而是均等地對玻璃板表面噴附蝕刻液後進行蝕刻 ，因此可實現一致性高的玻璃板表面蝕刻。當玻璃板披覆 有掩蓋劑時，由於掩蓋劑受到噴附蝕刻液所按壓，故是可 於蝕刻過程中抑制掩蓋劑剝離的蝕刻裝置。 -10- 200531945 (8) 【實施方式】 〔用以實施發明的最佳形態〕 本發明之玻璃板表面的蝕刻方法，是藉由以下的步驟 執行：利用特定的圖案將掩蓋劑披覆於玻璃板表面的掩蓋 劑披覆步驟；和對披覆著前述特定圖案之掩蓋劑的玻璃板 表面噴附蝕刻液後，對前述玻璃板表面進行蝕刻的蝕刻步 驟；和從前述玻璃板去除前述噴附後之蝕刻液的蝕刻液去 除步驟；及去除披覆於前述玻璃板表面之掩蓋劑的掩蓋劑 去除步驟。蝕刻步驟中之蝕刻液的噴附，最好是從略垂直 於玻璃板表面的方向噴附蝕刻液。 弟2圖’是顯不披覆著掩蓋劑2 0之玻璃板1 9的圖。 第2(a)圖爲玻璃板19的平面圖，第2(b)圖爲第2( a )圖中A — A線剖面圖。第2圖中的玻璃板1 9，是採取 在特定的位置配置9個未經披覆的矩形開口部的方式來披 覆掩蓋劑2 0。倘若披覆著掩蓋劑2 0之玻璃板I 9表面的 相反面不能產生蝕刻時，亦可對該相反面披覆掩蓋劑，當 相反面上形成特定凹部圖案時，亦可對應該凹部圖案執行 掩蓋劑的披覆。 在掩蓋劑披覆步驟中掩蓋劑的披覆，可利用網目印刷 法、層合薄膜法 '塗布光阻的光刻法來執行。此外，亦可 採周其他常用的掩蓋劑披覆方法。 網目印刷法，是將具備可供掩蓋劑通過及無法通過部 份的網板按壓於玻璃板表面，由該網板上可供掩蓋劑通過 的部分押出掩蓋劑使其披覆於玻璃板表面的方法。層合薄 200531945 Ο) 膜法，是採用於其中一面具有黏著層的薄膜當作掩蓋劑’ 並將該薄膜黏貼於玻璃板表面的方法。塗布光阻的光刻法 ，是將光阻劑塗布於玻璃板表面後，對以塗布的光組劑照 射光線的蝕刻法。最好是使用網目印刷法來披覆掩蓋劑。 蝕刻步驟，最好是將披覆著掩蓋劑20之玻璃板1 9的 表面當作底面，是玻璃板1 9形成略水平狀，並對該玻璃 板1 9的底面噴附蝕刻液後對前述玻璃板表面進行蝕刻。 當對形成略水平狀之玻璃板1 9底面的相反面進行鈾刻時 ，亦可對該相反面噴附蝕刻劑。 此外，蝕刻步驟亦可令玻璃板1 9形成垂直狀，並對 該玻璃板的表面噴附蝕刻液。在上述的狀態下，可藉由對 欲實施蝕刻的·對象面噴附蝕刻液來進行蝕刻。 蝕刻步驟及蝕刻液去除步驟，最好使用本發明的蝕刻 裝置來執行。第1圖，爲本發明鈾刻裝置的槪略圖。第1 圖的蝕刻裝置具備：對玻璃板表面執行蝕刻的蝕刻室1、 和貯留送往蝕刻室1之蝕刻液的蝕刻液貯留槽3、和從蝕 刻室1回收使用後之蝕刻液的蝕刻液回收裝置4、和蝕刻 液去除室2、及貯留用來將蝕刻液送入蝕刻液去除室2之 水的水貯留槽5。 在蝕刻室1內，具備玻璃板支承部、及朝玻璃板噴射 蝕刻液的蝕刻液噴射噴嘴8。此外在蝕刻室1內的出口附 近，配置有用來促使蝕刻液分離的風刀（air knife )，該 風刀可對蝕刻後的玻璃板噴附空氣。爲了能有效率地回收 由噴嘴8噴往玻璃版的蝕刻液，該蝕刻室].內部的底面乃 - 12 - 200531945 (10) 形成傾斜的底面。 玻璃板支承部，是在可固定或移動玻璃板的狀態下對 玻璃板形成支承。該玻璃板支承部，最好是可將玻璃板支 承成略水平狀或略垂直狀。其中又以支承成略水平狀最爲 合適。此外’玻璃板支承部，最好可將支承玻璃板並收納 入後數的玻璃板收單元6。本實施形態中蝕刻室1內的 玻璃板支承部，具有作爲玻璃板搬送裝置的搬送滾子7， 該搬送滾子7可水平地搬送收 著玻璃板的玻璃板收 單 元。 一但從搬送方向的前後利用搬送滾子支承玻璃板收納 單元’恐有造成玻璃板收納單元從搬送滾子之間落下之虞 ’不僅如此，更降低可噴附蝕刻液的玻璃板表面積，因此 搬送滾子形成可支承玻璃板收納單元6之搬送方向左.右兩 端的結構。在本實施形態中，搬送滾子7是以適當的間隔 配置成可支承玻璃板收納單元6的底面端並搬送玻璃板收 納單兀 6。該搬送滾子 7，是由作爲基部的圓柱形滾子與 外徑小於前述滾子之圓柱形滾子，以上述兩個滾子的平面 形成連結。構成搬送滾子之2個圓柱形滾子的中心軸，是 位在同一直線上。搬送滾子7是利用外徑較小的滾子來支 承玻璃板收納單元6。此外，本實施形態的搬送滾子7， 雖然是配置成可支承玻璃板收納單元6的底面端，但爲了 可挾持玻璃板進行搬送，故亦可設置與支承玻璃板收納單 元6之底面端的搬送滾子7形成對峙狀（相對狀）的其他 搬送滾子。在上述的狀態中，可抑制玻璃板收納單元6因 -13- 200531945 (11) 飩刻液而產生移動。 蝕刻液噴射噴嘴8，可選擇使蝕刻液形成霧狀噴射的 噴嘴，無論是僅噴射蝕刻液的單一流體噴嘴、或混合蝕刻 液與氣體後噴射的混合流體噴嘴均可使用。 噴嘴8的配置方式，是配置成從搬送中的玻璃板下方 朝玻璃板噴附蝕刻液。該噴嘴的配置，最好是配置成從略 垂直於玻璃板表面的方向將蝕刻液噴附於玻璃板的表面。 並且，最好是採用可均等地對玻璃板欲進行蝕刻的對象面 噴附蝕刻液的方式來適當地配置噴嘴8。此外，亦可將噴 嘴8配置成從搬送中之玻璃板的上方噴射，當使玻璃板呈 略垂直狀支承或搬送時，亦可變更噴嘴8的配置位置使其 對玻璃板的表面平均噴附蝕刻液。此外，噴嘴8以可設置 成與玻璃板表面保持平行地往復移動。 噴嘴8係利用配管與蝕刻液貯留槽3形成連接。再噴 嘴8與蝕刻液貯留槽3間的配管途中，具備可將蝕刻液貯 留槽3內之蝕刻液送往噴嘴8的泵9。 蝕刻液貯留槽3，具備作爲貯留蝕刻液淤泥去除裝置 的泵】]與過濾器12，其用途是用來去除蝕刻液貯留槽3 內之蝕刻液所產生的淤泥。此外，由於過濾器1 2是用來 去除淤泥的構件，故可從同樣可去除淤泥的濾網、壓濾機 、液體分離機及沉澱槽等淤泥去除裝置中選擇一種以上的 裝置來置換過濾器1 2。 蝕刻液貯留槽3，進一步具備可對蝕刻液貯留槽3內 部之蝕刻液進行攪拌的攪拌裝置]〇。並且具備圖面中未 -14- 200531945 (12) 顯示之可控制並保持一定餓刻液溫度的蝕刻液加熱或冷卻 裝置。藉由使鈾刻液保持一定的溫度，可使玻璃板表面的 蝕刻速度安定化。 爲了使蝕刻液產生循環，泵11及過濾器I 2係與配管 一起設置於蝕刻液貯留槽3的外側。貯留槽3內的蝕刻液 ，是利用泵1 1吸引並送往過濾器12，當通過過濾器12 後則流入貯留槽3。藉由以上述的方式使蝕刻液通過過濾 器〗2，可去除事後形成於蝕刻液貯留槽3內的淤泥。 蝕刻液貯留槽3內，貯留著含有玻璃溶解性之藥品的 水溶液作爲蝕刻液。玻璃溶解性的藥品，可採用含有氟化 物的水溶液，而所謂的氟化物，舉例來說如氟化氫、氟化 銨、.氟化鉀、氟化鈉。此外，蝕刻液中亦可含有無機酸及 /或有機酸。所謂的無機酸，可由鹽酸、硫酸、磷酸或硝 酸等中選擇1或2種以上即可，而所謂的有機酸，可由醋 酸、琥珀酸等中選擇1或2種以上即可。甚至鈾刻液中， 亦可添加陰離子系界面活性劑或兩性界面活性劑中的其中 一種以上。所謂的陰離子界面活性劑，譬如磺酸鹽系的界 面活性劑。而所謂的兩性界面活性劑，譬如胺系的界面活 性劑。上述的蝕刻液保持於]〇〜5 範圍內的一定溫度。 倉虫刻液回收裝置4，是利用配管連接：從蝕刻液室} 送出触刻液的泵1 3 ;和開關閥1 5 a、1 5 b ;及過濾器14a 1 4 b的裝置。該配管的其中_端，是連接於蝕刻液室1 的底部。配管的另一端則連接於蝕刻液貯留槽3或圖面中 木顯不的触刻液回收槽，在本實施形態中是連接於蝕刻液 -15- 200531945 (13) 貯留室3。泵1 3、開關閥1 4及過濾器]5 ’是從餒 側起按上述順序形成配置。結上述的鈾刻裝置，當 1內的蝕刻液被回收至蝕刻液貯留槽時’可由過濾 、15b去除飩刻液內的淤泥。· 蝕刻裝置中的開關閥與過濾器’是具備複數個 與過濾器，在本實施形態中，則是各自具備2個 ]5 a、1 5 b與過濾器1 4 a、1 4 b。開關閥1 5 a、1 5 b與 14a、14b，其中一個開關閥1 5 a與其中一個過濾、器 形成直列連接，.另.一個開關閥1 5b與另一個過濾器 成直列連接。不僅如此，連接成直列的開關閥]5 a 器1 4 a更與連接成直列的開關閥1 5 b、過攄器1 4 b 列連接。在使用本實施形態之蝕刻裝置的場合中， 放其中1個開關閥時，關閉另一個開關閥的狀態下 因此，可在不間斷的狀態下進行蝕刻室1內的蝕刻 〇 此外，用於蝕刻液回收裝置4的過濾器，由於 去除使用後蝕刻液內所存在的淤泥，因此可採用其 泥去除裝置來置換。而淤泥去除裝置.，舉例來說如 壓濾機、液體分離機及淤泥沉澱槽。 在蝕刻液去除室2內，具備可水平搬送由蝕刻: 搬出之玻璃板收綢單元6的搬送滾子]8。此外， 中之玻璃板收納單元6上下噴射水的淸洗用噴嘴 配置成可平均地對玻璃板收納單元6及收納於其中i 板進行噴水。蝕刻液去除室2內的底部，爲了有效. !刻室1 蝕刻室 器 1 5 a 開關閥 開關閥 過濾器 14a是 14b形 、過濾 形成並 是在開 使用。 液回收 是用來 他的淤 濾網、 室1內 從搬送 1 6，是 的玻璃 地回 -16- 200531945 (14) 收由噴嘴1 6噴附於玻璃板的水，乃形成傾斜的底部. 會虫刻液去除室2內的搬送滾子1 8，是可支承玻璃板 收納單元6之搬送方向左右兩端的搬送滾子。該搬送滾子 1 8，是配置成可從收納單元6的底面支承。此外，亦可與 倉虫刻室1內的搬送滾子相同，上下對峙且保持適當間隔地 配置搬送滾子以便於從玻璃板收納裝置的端部上下形成 挾持並搬送玻璃板收納單元6。 蝕刻液去除室2內的噴嘴〗6，是利用配管與水貯留 槽5形成連接。在上述噴嘴1 6與水貯留槽5間的配管途 中’具備可將水貯留槽5內之蝕刻液送往噴嘴1 6的泵1 7 〇 玻璃板表面蝕刻及從玻璃板.去除蝕刻液，均可使用上 述的触刻裝置來執行。玻璃板表面的蝕刻，是藉由將披覆 著上述掩蓋劑的玻璃板搬送入上述蝕刻裝置的蝕刻室1內 執行。另外’從玻璃板去除蝕刻液，是藉由將搬送入蝕刻 室1內的玻璃板收納裝置6，搬送至蝕刻液去除室2內執 行。在本實施形態中，是藉由將收納於玻璃板收納單元6 的玻璃板搬送至蝕刻室1與蝕刻液去除室2內，來對玻璃 板的表面實施蝕刻並從玻璃板去除蝕刻液。 第3圖’是用來說明收納第2圖中經掩蓋劑2 0覆蓋 之玻璃板I 9的玻璃板收納單元6的圖。第3 ( a )圖，是 第2圖中用來收納已披覆掩蓋劑2 〇之玻璃板1 9的玻璃板 收納單元6的分解圖，第3 ( b )圖則是第3 ( a )圖中玻 璃板收納單元6之容器6b的B-B線剖面圖。玻璃板收納 « 17- 200531945 (15) 單元6 ’具有略大於經披覆掩蓋劑2 〇之玻璃板]9底部的 底部，並且是由底部上具有開口部6c的容器6b'及當玻 璃板]9收容於前述容器6 b後用來固定玻璃板1 9的壓扳 6 a所構成。玻璃板]9是在收納於上述收納單元6的狀態 下由搬送滾子7所搬送，由於玻璃板1 9的表面並未接觸 搬送滾子7，故可防止玻璃板1 9的表面受損。此外，當 玻璃板1 9收納於容器6b後利用壓板6a挾持固定玻璃板 1 9的端部’因此可防止玻璃板I 9在玻璃板收容單元6內 移動’如此一來，也能防止玻璃板丨9之端部的破損。 爲了可對未披覆掩蓋劑之玻璃板1 9的表面噴附鈾刻 液，容器6 b底部上的開口部6 c乃於容器6 b的底部形成 格子狀的外觀。在本實施形態中，由於在玻璃板1 9的表 面上存在9個未披覆掩蓋劑的部分，因此容器6b底部上 的開口部6 c是平均地配置成9個。此外，當對未披覆掩 蓋劑2 0的玻璃板表面進行蝕刻時，只要在可支承玻璃板 的狀態下，亦可在容器6b的底面設置較大的開口部6c。 壓扳6a是不具貫穿孔的一張板子，當需要對披覆著 掩蓋劑2 0之玻璃板1 9的另一面進行蝕刻時，亦可在前述 的另一面上設置開口部。 將玻璃板1 9收納入玻璃板收納單元6，是將披覆有 掩蓋劑2 0的表面當作底面將玻璃板1 9嵌入容器6 b，再 利用壓板6 a按壓玻璃板1 9來組裝玻璃板收納單元。將玻 璃板1 9收納入上述玻璃板收納單元6的進行方式，與將 玻璃板水平地搬入蝕刻室I的方式相同。 -18- 200531945 (16) 玻璃板是在將玻璃板收納單元6搬入蝕刻裝置之飽刻 室1與蝕刻液去除室2內的過程中，執行蝕刻與蝕刻液的 去除。 貯留於触刻液貯留槽3且保持一定溫度的触刻液，是 利用泵9供給至蝕刻室1內的噴嘴8。經供給蝕刻液後的 噴嘴8，是以略垂直於玻璃板表面的方式平均地對玻璃扳 噴附蝕刻液。經噴附後的蝕刻液，將集中於蝕刻室1的底 部，集中後的蝕刻液將由蝕刻液回收裝置4的泵1 3從蝕 刻室1內吸出，由泵1 3所吐出的蝕刻液將於通過過濾器 1 4 a或1 4 b後，流入蝕刻液貯留槽3。 貯留於水貯留槽5的水，是通過泵1 7而供給至噴嘴 】6。經供給的水，則由噴嘴1 6朝玻璃板噴附。而噴附後 的水，市集終於蝕刻液去除室2的底部，集中於該底部的 水，可藉由開啓設置於蝕刻液去除室2底部的閥而從蝕刻 液去除室2排出。 第4圖，是顯示利用搬送滾子7將玻璃板收納裝置6 搬送至玻璃蝕刻室內的狀態平面圖。第5圖是第4圖中C 一 C線剖面圖。玻璃板收納單元6，是一邊由搬送滾子7 中外徑較小的圓柱形滾子支承其底面一邊進行搬送。在上 述的狀態中，由於玻璃板收納單元6朝行進方向左右兩側 的搖動，將受到連結於較小外徑之圓柱形滾子的圓柱形滾 子限制其左右搖動範圍，故受到抑制° 此外，隨著玻璃板收納單元6的水平搬送’單元6內 的玻璃板1 9也形成水平搬送。由於玻璃板表面的融刻量 -19- 200531945 (17) 關係著玻璃板表面與蝕刻液的接觸時間’故可依據玻璃板 表面的蝕刻目標量來適當地變更搬送速度。玻璃板收納單 元6，是藉由搬送入蝕刻室1後，接著搬送入蝕刻液去除 室2的方式來去除蝕刻液。 第6圖，是說明對玻璃板1 9表面進行蝕刻過程的說 明圖。第6(a)圖，是第2(b)圖中經披覆掩蓋劑20之 玻璃板1 9上下翻轉的圖。該玻璃板1 9，是呈現蝕刻前的 表面形狀。 第6 ( b )圖，是顯示對披覆著掩蓋劑20之玻璃板]9 噴附蝕刻液的狀態圖。藉由對未披覆掩蓋劑2 0之玻璃板 1 9的表面噴附蝕刻液來進行蝕刻，並於玻璃板1 9的表面 形成凹陷部分。第7圖是第6圖中虛線部分的放大圖。由 於對玻璃板]9執行蝕刻液的噴附22，因此蝕刻液可抵達 所形成之凹部的角落，而形成可抑制凹陷部分曲面化的凹 部。此外，因爲玻璃與蝕刻液之反應所產生的淤泥，即使 附著於凹陷部分也能即時去除。此外，即使玻璃板1 9與 掩室劑2 0之間存在間隙2 1，掩蓋劑2 0也將被戟刻液的 噴附22所按壓，而可抑制蝕刻液侵入間隙2 ]內所造成的 間隙2 1擴大，故可抑制掩蓋劑2 0的剝離。 第6 ( c )圖，是顯示玻璃板〗9表面的蝕刻結束後， 已去除蝕刻液及掩蓋劑2 0之玻璃板丨9的表面。 經上述蝕刻後的玻璃板1 9，根據特定的切斷圖案進 行切斷’可用於E L D面板的玻璃帽蓋。此外，可採用使 用上述玻璃帽蓋的ELD面板來製造ELD。 200531945 (18) 在上述的實施形態中’雖然是針對在玻璃板表面披覆 掩蓋劑的形態進行說明，但同樣適用於玻璃板上未披覆掩 蓋劑的場合。此外，未披覆掩蓋劑的玻璃板，也適用於 LCD面板與PDP面板。 第8圖，是用來說明收納未經掩蓋劑覆蓋之玻璃板 2 4的玻璃板收納單元2 3的圖。第8 ( a )圖，是已收納玻 璃板24之玻璃板收納單元23的分解圖，第8 ( b )圖則 是第8 (〇圖中玻璃板收納單元23之容器23b的D-D線 剖面圖。可用於LCD面板及PDP面板的玻璃板，可採用 如第8圖所示的玻璃板收納單元來進行蝕刻。玻璃板收納 單元2 3與第3圖所示的收納單元6相同，是由可收容玻 璃板24的容器23b、與可按壓收容於容器23b之玻璃板 2 4的壓板2 3 a所構成。容器2 3 b設有開口 2 3 c以便於對 玻璃板噴附蝕刻液。第8圖所示的收納單元23，其容器 2 3之開口部2 3 c的形狀僅形成單一的矩形，故不同於第3 圖所示的收納單元6，除了上述的差異之外，其餘均與第 3圖所示的收納單元相同。 此外’雖然上述的實施形態是針對用於製造ELD面 板用玻璃帽蓋的餓刻方法，但可因應掩蓋劑的披覆圖案在 玻璃板上形成各種形狀的凹部。舉例來說，可於玻璃板表 面形成圓柱狀的凹陷部分，而該凹陷部分可當作對準符號 (align in e n t mark)使用。 〔實施例〕 -21 200531945 (19) 接下來，根據實施例對利用本發明蝕刻方法所形成的 凹部進彳了說明。在4 0 0 m m X 5 0 0 m m X 0.7 m m的玻璃板表 面披覆掩蓋劑後，藉由按蝕刻、蝕刻液去除、掩蓋劑去除 的順序進行操作，而於玻璃板的表面形成凹部。披覆掩蓋 劑及蝕刻的詳細實施過程則如下所述。 (掩蓋劑的披覆） 採用網目印刷法將掩蓋劑披覆於玻璃板的其中一面。 此時將形成未經掩蓋劑披覆的矩形部分。 (蝕刻） 將已披覆掩蓋劑的玻璃板收納入由壓板及具有開口部 之容器所構成的玻璃板收納單元後，藉由對未披覆掩蓋劑 的矩形部分噴附霧狀的蝕刻液來進行蝕刻。 將玻璃板收納入玻璃板收納單元的收納動作，是藉由 將玻璃板放入具有開口部的容器內，並利用壓板來挾持固 定玻璃板的方式進行。將玻璃板附入容器內的動作，是藉 由使披覆著掩蓋劑的玻璃表面朝向開口部側的方式進行。 對未披覆掩蓋劑的矩形部分所進行的霧狀蝕刻液噴附 ，是使玻璃收納單元形成水平且將開口部作爲底面，並略 對矩形部分形成垂直後僅對矩形部分噴附蝕刻液。矩形部 分是形成：曝露出玻璃板的表面，並可使蝕刻液完全噴附 於該曝露的玻璃板表面。 蝕刻液的噴附，是使用含有4.0重量％之氟化氫及 - 22 - 200531945 (20) 3 . 0重量％之硝酸的水溶液作爲蝕刻液，保持2 5 ± 1 的 溫度，以3.2 L /分的速度由噴嘴噴射蝕刻液的方式來進 行。此時，玻璃板表面約形成3 0 0 // m的蝕刻。 經上述蝕刻後的玻璃表面上，形成可用肉眼辨識的凹 部。此外，經肉眼辨識後，可確認出掩蓋劑並無剝離，且 所形成的凹部之底部角落並未產生曲面化。 【圖式簡單說明】 第1圖：爲本發明蝕刻裝置的槪略圖。 第2圖：是顯示經掩蓋劑覆蓋之玻璃板的圖。 第3圖：是用來說明收納第2圖中經掩蓋劑覆蓋之玻 璃板的玻璃板收納單元的圖。 第4圖：是顯示利用搬送裝置將玻璃板收納裝置搬送 至玻璃蝕刻室內的狀態平面圖。 第5圖：爲第4圖中C — C線剖面圖。 第6圖：是說明對玻璃板表面進行蝕刻過程的說明圖 〇 第7圖：爲第6圖中虛線部分的放大圖。 第8圖：是用來說明收納未經掩蓋劑覆蓋之玻璃板的 玻璃板收納單元的圖。 第9圖：爲顯示平面顯示器（FPD )中電激發光顯示 器（E L D )的其中一例。 第1 0圖：是顯示將玻璃板浸漬於蝕刻液中進行蝕刻 的狀態下，玻璃表面上之變化的剖面示意圖° -23- 200531945 (21) 弟】1圖·爲弟10圖中虛線部分的放大圖。 第]2圖：是將玻璃板浸漬於蝕刻液中的狀態下，顯 示蝕刻進行狀況之玻璃板剖面示意圖。 【主要元件符號說明】 1 :蝕刻室 2 :蝕刻液去除室200531945 (1) IX. Description of the invention [Technical field to which the invention belongs] The present invention relates to an etching method for a glass surface, a glass plate etching device used for the uranium etching method, a glass plate for a flat display, and a flat display. [Prior art] Displays for displaying images are moving towards thinner targets. The display that has achieved thinness is a flat display (FPD), and the FPD includes, for example, an electroluminescent display (ELD), a liquid crystal display (LCD), and a plasma display (PDP). The display panel used by FPD uses a glass plate as a constituent member. Fig. 9 shows an example of the ELD panel in the FPD. Fig. 9 (a) is an oblique view of the EL panel, and Fig. 9 (b) is a schematic cross-sectional view taken along line E-E in Fig. 9 (a). The ELD panel of Fig. 9 has a structure in which EL (electron laser) elements 29 are laminated on the surface of a transparent plate 26 as an image display surface. The EL element 29 is connected to extension wires 27, 28 for connecting an external power source. In addition, the EL element 29 uses a cap 25 to form a structure closed by the outside. The cap 25 is made of metal, organic polymer, and glass. When glass is used as the glass cap to close the El element 29 on the surface of the transparent plate 26, the glass cap can be manufactured by f-cutting the surface of the glass plate to form a depression. Patent Document 1 describes a method for manufacturing a glass cap by etching the surface of a glass plate. [Patent Document 1] -4- 200531945 (2) Japanese Patent Application Publication No. 2004- 2 2 2 9 Patent Document 1] The method for manufacturing a glass cap is to cover the surface of a glass plate with a masking agent After the pattern is specified, the glass plate is immersed in an insect-contaminating solution to form a glass lid that forms a recess on the surface of the glass plate that is not covered with a masking agent. [Summary of the Invention] [Problems to be Solved by the Invention] When etching a glass plate, it is necessary to control the temperature of the etchant to a certain temperature and make the etchant in the process of forming a stable recess on the surface of the glass plate. The temperature distribution is uniform. As a method for uniformizing the temperature distribution in the etching solution, for example, a stirring method that mechanically stirs or generates bubbles in the etching solution can be used. If the method of stirring the etching solution described in Patent Document 1 is adopted, two problems described below are likely to occur: the bottom surface of the recessed portion is curved, and the masking agent is peeled off. Fig. 10 is a schematic cross-sectional view showing changes on the glass surface in a state where a glass plate is immersed in an etchant for etching. Fig. 10 (a) is a view showing a process of forming a recess on the surface of the glass plate 30 after the glass plate 30 covered with the masking agent 31 is immersed in an etching solution. Fig. 10 (b) is The figure which shows the glass plate 30 in which the recessed part was formed in the surface. Fig. 1] is an enlarged view of the dotted line in Fig. 10; Fig. 1 (a) is an enlarged view of the dotted line in Fig. 0 (a); and Fig. 1 (b) is 10 (b) An enlarged view of the dotted line in the figure. As shown in the figure]] (a), in the process of immersing the surface of the glass plate 30 in the etching solution -5- 200531945 (3), the surface of the glass plate 30 is immersed in the etching solution. The flowing liquid 34 of the etching solution will flow along the side surface of the recess during the formation process. In this flowing liquid 34, there is a portion of the flowing liquid that hits the bottom surface of the recessed portion from a vertical direction. Since there is a masking agent that is not etched, the flowing liquid in this portion will form a "y" shape flow. If the flowing liquid 3 4 forms a "y" -shaped flow, when there is an etching liquid at the bottom corner 32 of the recess on the glass surface, the flow is slower than other etching liquids, so that the part of the glass dissolved by the etching Concentration to form a high concentration etching solution. As a result, the etching speed of the corner 32 of the recessed portion will be reduced. This decrease in speed will cause a problem in that the shape of the concave portion formed on the surface of the glass plate becomes curved. In addition, the peeling of the masking agent 31 on the surface of the glass plate 30 is caused by the etchant entering the minute gap 33 between the glass plate 30 and the masking agent 31. The peeling of the masking agent will cause the problem that the surface of the glass plate 30 which does not need to be etched is etched. When the glass plate is immersed in the etching solution stirred in the above-mentioned manner to perform etching, two problems, that is, the shape of the concave portion formed on the surface of the glass plate is curved and the masking agent peels off. When the above-mentioned problems occur, it is difficult to predict the shape of the recessed portions formed on the surface of the glass plate 30, resulting in a problem that the formed recessed portions have poor uniformity in shape. The LCD panel also uses a glass plate. The glass plate can be thinned by immersing the glass plate in an etching solution. Fig. 2 is a schematic cross-sectional view of a glass plate showing the progress of etching in a state where the glass plate is immersed in an etching solution. Fig. 2 (a) shows the flat glass-6-200531945 (4) glass plate 5 just immersed in the etching solution, and the "/" shape will be formed on the glass surface because the etching solution is stirred Flowing liquid with reverse "/" shape 3 6. Fig. 12 (b) is a view showing the state of the surface of the glass plate 35 shown in Fig. 12 (a) after being engraved with uranium. On the surface of the glass plate 35, wavy irregularities are formed due to liquid flow. . In other words, when the surface of a glass plate is immersed in an etching solution, the flatness of the glass plate surface required for the glass plate for an LCD panel is impaired. Therefore, it is expected to provide an etching technique capable of suppressing the deterioration of flatness. In view of the above-mentioned circumstances, a first object of the present invention is to provide an etching method capable of uniformly supplying an etching solution to a glass surface during the etching process of a glass surface, and performing a consistent etching, and is applicable to An etching device of this etching method. The second object of the present invention is to provide a method for suppressing the peeling of the masking agent caused by the etchant entering the gap between the glass plate and the masking agent even when the masking agent is coated on the surface of the glass plate with a specific pattern. An etching method; and an etching apparatus suitable for the etching method. [Means for Solving the Problem] The present invention is an etching method for a glass plate surface, comprising: an etching step for spraying an etching solution on the glass plate surface and etching the glass plate surface; and removing the glass plate from the glass plate. An etching solution removing step of the sprayed etching solution. The spraying of the etching solution is preferably spraying with a mist-like etching solution. The aforementioned touch-etching method is a method for etching the glass surface stored in a glass plate storage unit. 7- 200531945 (5) The glass plate accommodating unit has an opening portion, and stores the glass plate in such a manner as to hold and fix the glass plate end portion. According to the above-mentioned method for etching a glass plate stored in a glass plate storage unit by holding a fixed end portion, since the glass plate is etched without causing contact with the outside, the glass plate can be prevented from being exposed during the etching process. In addition, since the glass plate can be prevented from moving into the glass plate storage unit, damage caused by the glass plate striking the glass plate storage unit can be prevented. The above-mentioned etching method can also be provided on the surface of the glass plate before the etching step A masker coating step of coating the masker in a specific pattern is performed. When the above-mentioned method is adopted, a recessed portion will be formed on the glass surface not covered with the masking agent by etching. In the above-mentioned etching step, it is preferable that the glass plate is formed in a slightly horizontal state, and the bottom surface of the glass plate is sprayed with an etching solution, and then the surface of the glass plate is etched. When the masking agent is coated with a specific pattern, it is preferable that the surface coated with the masking agent is used as the bottom surface and the glass plate is formed in a slightly horizontal state. Alternatively, the surface of the glass plate may be etched by spraying an etching solution on the opposite surface of the bottom surface of the glass plate. The aforementioned glass plate is preferably formed completely horizontally. In addition, in the aforementioned etching step, the glass plate may be brought into a vertical state, and an etching solution may be sprayed on the surface of the glass plate. In the above state, an etching solution may be sprayed on the etching target surface to be etched. In addition, the glass plate etching apparatus of the present invention includes: a glass plate supporting portion capable of supporting a glass plate; and an etching solution spray nozzle capable of spraying a glass plate supported by the supporting portion with a 200531945 (6) etching solution; and a controllable An etching solution storage tank for storing the temperature of the etching solution; and an etching solution recovery device for recovering the sprayed etching solution. The glass plate supporting portion is a support portion that can support the glass plate in a slightly horizontal state, and the etching liquid spraying nozzle preferably sprays the etching liquid from below the glass plate toward the bottom surface of the glass plate. In addition, the nozzle may spray an etchant from above the glass plate toward the opposite surface of the bottom surface of the glass plate. It is preferable that the said support part is a support part which can support the edge part of a glass plate. When the end portion of the glass plate is supported, it is possible to avoid obstructing the spraying of the etchant on the glass plate. In addition, the support portion may be a conveying device capable of conveying the glass sheet. The conveying device may preferably be a conveying roller that supports the glass sheet from both right and left sides in the conveying direction. In the case of the above-mentioned transfer roller, in addition to the stable transfer, the maximum surface area of the glass plate on which the etchant can be sprayed can be ensured. The conveying roller is a conveying roller connected by a flat base and a slightly cylindrical roller having an outer diameter larger than the plane clearance of the base. The conveying roller uses the flat surface of the base and the roller. The flat surfaces are connected, and the roller with a small outer diameter is preferably a roller that can support a glass plate. Even if the conveyed roller is shaken from side to side, the above-mentioned shake can be suppressed to a minimum by the roller. The glass plate support portion may be a support portion that supports the glass plate in a substantially vertical shape. In the above state, the glass plate supporting portion can also be used. -9- 200531945 (7) It is a conveying device that can convey glass plates. The recovery device 'is preferably a recovery device that can transport the recovered etching solution to the etching solution storage tank. In addition, it is preferable that the aforementioned recovery device has more than one type of sludge removal device to facilitate removal of sludge in the etching solution. And the sludge removing device is, for example, a screen, a filter press, a liquid separator, or a sedimentation tank. The glass plate of the present invention is a glass plate for a flat panel display etched by the aforementioned etching method. This glass plate 'is not only for an object constituted by a glass plate, but a glass plate including a flat display display member laminated on a glass surface. The flat display of the present invention is a flat display using the aforementioned glass plate for a flat display. [Effect of the Invention] According to the etching method described above, since the glass plate is not immersed in the etching solution, the glass plate surface is uniformly sprayed with the etching solution and then etched. Therefore, a highly uniform glass plate surface can be realized. Etching. When the glass plate is covered with a masking agent, the masking agent is pressed by the sprayed etching solution, so that the peeling of the masking agent can be suppressed during the etching process. In addition, since the above-mentioned etching device does not immerse the glass plate in the etching solution, it sprays the surface of the glass plate with the etching solution uniformly and then performs etching, so that the surface of the glass plate with high consistency can be etched. When the glass plate is covered with a masking agent, the masking agent is pressed by the sprayed etching solution, so it is an etching device that can suppress the peeling of the masking agent during the etching process. -10- 200531945 (8) [Embodiment] [The best form for implementing the invention] The etching method of the glass plate surface of the present invention is performed by the following steps: using a specific pattern to cover the masking agent on the glass A masking agent coating step on the surface of the plate; and an etching step of etching the surface of the glass plate after spraying an etching solution on the surface of the glass plate covered with the masking agent of the specific pattern; and removing the spraying from the glass plate An etching solution removing step of the subsequent etching solution; and a masking agent removing step of removing the masking agent covering the surface of the glass plate. It is preferable to apply the etchant during the etching step by applying the etchant from a direction slightly perpendicular to the surface of the glass plate. Figure 2 is a view showing a glass plate 19 covered with a masking agent 20. Fig. 2 (a) is a plan view of the glass plate 19, and Fig. 2 (b) is a cross-sectional view taken along the line A-A in Fig. 2 (a). The glass plate 19 in Fig. 2 covers the masking agent 20 by arranging nine uncoated rectangular openings at specific positions. If the opposite surface of the surface of the glass plate I 9 covered with the masking agent 20 cannot be etched, the masking agent can also be coated on the opposite surface. When a specific recessed pattern is formed on the opposite surface, the corresponding recessed pattern can be executed Covering agent. The masking agent coating in the masking agent coating step can be performed by a screen printing method, a laminated film method, or a photolithography method of applying a photoresist. In addition, other common masking methods can be used. The screen printing method is to press the screen with a part through which the masking agent can pass and cannot pass, and press the masking agent from the part on the screen where the masking agent can pass, so as to cover the surface of the glass plate. method. Laminated thin film 200531945 0) The film method is a method in which a film having an adhesive layer on one side is used as a masking agent and the film is adhered to the surface of a glass plate. A photoresist coating method is an etching method in which a photoresist is applied to the surface of a glass plate, and then light is irradiated with the applied photoresist. It is best to use a screen printing method to cover the masking agent. In the etching step, the surface of the glass plate 19 covered with the masking agent 20 is preferably used as the bottom surface. The glass plate 19 is formed in a slightly horizontal shape, and the bottom surface of the glass plate 19 is sprayed with an etching solution. The surface of the glass plate is etched. When the uranium engraving is performed on the opposite surface of the bottom surface of the glass plate 19 forming a slightly horizontal shape, an etchant may be sprayed on the opposite surface. In addition, the etching step may form the glass plate 19 vertically, and spray an etching solution on the surface of the glass plate. In the above state, etching can be performed by spraying an etching solution on the target surface to be etched. The etching step and the etching solution removal step are preferably performed using the etching apparatus of the present invention. FIG. 1 is a schematic view of plutonium of the uranium engraving device of the present invention. The etching apparatus of FIG. 1 includes an etching chamber 1 that performs etching on a glass plate surface, an etching solution storage tank 3 that stores an etching solution sent to the etching chamber 1, and an etching solution that recovers the used etching solution from the etching chamber 1. The recovery device 4, the etchant removal chamber 2, and a water storage tank 5 that stores water for feeding the etchant into the etchant removal chamber 2. The etching chamber 1 includes a glass plate supporting portion and an etching solution spray nozzle 8 that sprays an etching solution onto the glass plate. An air knife is provided near the outlet in the etching chamber 1 to promote the separation of the etching solution. The air knife can spray air on the glass plate after the etching. In order to efficiently recover the etching solution sprayed from the nozzle 8 to the glass plate, the etching chamber]. The bottom surface of the interior is-12-200531945 (10) The sloped bottom surface is formed. The glass plate supporting portion supports the glass plate in a state where the glass plate can be fixed or moved. The glass plate supporting portion is preferably capable of supporting the glass plate into a slightly horizontal shape or a substantially vertical shape. Among them, the support is slightly horizontal. In addition, it is preferable that the glass plate support portion can support the glass plate and store the glass plate receiving unit 6 in the last number. In the present embodiment, the glass plate supporting portion in the etching chamber 1 has a conveying roller 7 as a glass plate conveying device, and the conveying roller 7 can horizontally convey the glass plate receiving unit that holds the glass plate. Once the glass plate storage unit is supported by the transportation rollers from the front and back of the transportation direction, "the glass plate storage unit may fall from between the transportation rollers." The conveying roller is formed to support the glass plate storage unit 6 in the conveying direction to the left. Structure on the right end. In this embodiment, the conveying rollers 7 are arranged at appropriate intervals so as to support the bottom end of the glass plate accommodating unit 6, and convey the glass plate receiving unit 6. The conveying roller 7 is connected by a cylindrical roller as a base and a cylindrical roller having an outer diameter smaller than that of the aforementioned roller, and is connected by the plane of the two rollers. The center axis of the two cylindrical rollers constituting the transfer rollers is located on the same straight line. The conveying roller 7 supports the glass plate storage unit 6 with a roller having a small outer diameter. In addition, although the conveyance roller 7 of the present embodiment is arranged to support the bottom end of the glass plate storage unit 6, in order to support the glass plate for conveyance, the conveyance roller 7 may be provided to support the bottom surface end of the glass plate storage unit 6. The rollers 7 form other conveying rollers which are opposed to each other (opposite). In the above state, the glass plate storage unit 6 can be prevented from moving due to the etching liquid. As the etching liquid spraying nozzle 8, a nozzle for spraying the etching liquid into a mist can be selected, and either a single fluid nozzle spraying only the etching liquid or a mixed fluid nozzle spraying a mixture of the etching liquid and a gas can be used. The nozzles 8 are arranged so that an etching solution is sprayed onto the glass plate from below the glass plate being conveyed. The nozzle is preferably arranged to spray the etchant on the surface of the glass plate from a direction slightly perpendicular to the surface of the glass plate. In addition, it is preferable to appropriately arrange the nozzles 8 by spraying an etchant on the target surface to be etched evenly on the glass plate. In addition, the nozzle 8 may be arranged to spray from above the glass plate being transported. When the glass plate is supported or transported in a vertical direction, the arrangement position of the nozzle 8 may be changed to evenly spray the surface of the glass plate. Etching solution. Further, the nozzle 8 can be reciprocated so as to be provided in parallel with the surface of the glass plate. The nozzle 8 is connected to the etching solution storage tank 3 by a pipe. In the middle of the piping between the re-nozzle 8 and the etching solution storage tank 3, a pump 9 is provided which can send the etching solution in the etching solution storage tank 3 to the nozzle 8. The etching solution storage tank 3 is provided with a pump serving as a device for removing the etching solution sludge]] and a filter 12 for removing sludge generated by the etching solution in the etching solution storage tank 3. In addition, since the filter 12 is a component for removing sludge, more than one device can be selected to replace the filter from a sludge removal device such as a filter, a filter press, a liquid separator, and a sedimentation tank that can also remove the sludge. 1 2. The etching solution storage tank 3 further includes a stirring device capable of stirring the etching solution inside the etching solution storage tank 3]. It also has an etching solution heating or cooling device that can control and maintain a certain temperature of the etching solution, which is not shown in the figure -14- 200531945 (12). By maintaining the uranium etching liquid at a constant temperature, the etching rate on the surface of the glass plate can be stabilized. In order to circulate the etching solution, the pump 11 and the filter I 2 are installed outside the etching solution storage tank 3 together with the piping. The etching solution in the storage tank 3 is sucked by the pump 11 and sent to the filter 12, and after passing through the filter 12, it flows into the storage tank 3. By passing the etchant through the filter 2 as described above, the sludge formed in the etchant storage tank 3 afterwards can be removed. In the etching solution storage tank 3, an aqueous solution containing a glass-soluble drug is stored as an etching solution. Glass-soluble drugs can use aqueous solutions containing fluoride, and the so-called fluoride, for example, such as hydrogen fluoride, ammonium fluoride ,. Potassium fluoride, sodium fluoride. In addition, the etching solution may contain an inorganic acid and / or an organic acid. The so-called inorganic acid may be selected from one or two or more kinds of hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid, and the like, and the so-called organic acid may be one or two or more kinds of acetic acid, succinic acid, and the like. One or more of anionic surfactants and amphoteric surfactants may be added to the uranium etching solution. The so-called anionic surfactant is, for example, a sulfonate-based surfactant. The so-called amphoteric surfactants are, for example, amine-based surfactants. The above-mentioned etching solution is maintained at a constant temperature in the range of 0 to 5. The silt engraving liquid recovery device 4 is a device connected by piping: a pump 13 for sending the etching liquid from the etching liquid chamber}, an on-off valve 15a, 15b, and a filter 14a 1 4b. The _ end of the pipe is connected to the bottom of the etching liquid chamber 1. The other end of the pipe is connected to the etching liquid storage tank 3 or the etching liquid recovery tank in the drawing. In this embodiment, it is connected to the etching liquid -15- 200531945 (13) storage chamber 3. The pump 1 3, the on-off valve 14 and the filter] 5 'are arranged in the above order from the 馁 side. According to the uranium etching device described above, when the etching solution in 1 is recovered to the etching solution storage tank ', the sludge in the etching solution can be removed by filtration and 15b. · The on-off valve and the filter in the etching apparatus are provided with a plurality of filters and filters, and in this embodiment, they are each provided with two] 5 a, 1 5 b, and filters 1 4 a, 1 4 b. On-off valve 1 5 a, 1 5 b and 14a, 14b, one of the on-off valve 1 5 a is in line with one of the filters and filters. another. One on-off valve 15b is connected in line with the other filter. Not only that, the on-off valves connected in a row] 5 a and 1 4 a are also connected to the on-off valves 1 5 b and the relay 1 4 b in a row. In the case of using the etching apparatus of this embodiment, when one of the on-off valves is placed, the other on-off valve is closed, so that the etching in the etching chamber 1 can be performed without interruption. Furthermore, it is used for etching. Since the filter of the liquid recovery device 4 removes the sludge present in the etching solution after use, the filter can be replaced by the mud removal device. And the sludge removal device. , Such as filter presses, liquid separators and sludge sedimentation tanks. The etching solution removal chamber 2 is provided with a transport roller 8 capable of horizontally transporting the glass plate take-up unit 6 carried out by etching: unloading. Moreover, the cleaning nozzle which sprays water up and down in the glass plate storage unit 6 is arrange | positioned so that the glass plate storage unit 6 and the i plate accommodated in it may spray water evenly. The etchant removes the bottom of the chamber 2 in order to be effective. ! Engraving chamber 1 Etching chamber 1 5 a On-off valve On-off valve The filter 14a is 14b, formed by filtering, and is in use. The liquid recovery is used to transport the silt screen and the inside of the chamber 1 from the 16 to the glass. -16- 200531945 (14) The water sprayed on the glass plate by the nozzle 16 is collected to form a slanted bottom. The transfer rollers 18 in the parasitic insect solution removing chamber 2 are transfer rollers that can support the left and right ends of the glass plate storage unit 6 in the transfer direction. The transfer rollers 18 are arranged so as to be able to be supported from the bottom surface of the storage unit 6. In addition, similar to the transport rollers in the hamster engraving chamber 1, the transport rollers may be arranged facing each other up and down at an appropriate interval so that the glass plate storage unit 6 can be gripped and transferred from the end of the glass plate storage device. The nozzle 6 in the etching solution removal chamber 2 is connected to the water storage tank 5 by a pipe. In the middle of the piping between the nozzle 16 and the water storage tank 5, a pump 17 is provided which can etch the etching solution in the water storage tank 5 to the nozzle 16 and etch the glass surface and remove the glass plate. The etching solution can be removed by using the above-mentioned engraving device. The etching of the glass plate surface is carried out by transferring the glass plate covered with the masking agent into the etching chamber 1 of the etching apparatus. The removal of the etching solution from the glass plate is carried out by transferring the glass plate storage device 6 into the etching solution removal chamber 2 into the etching solution removal chamber 2. In this embodiment, the glass plate accommodated in the glass plate storage unit 6 is transferred to the etching chamber 1 and the etching solution removal chamber 2 to etch the surface of the glass plate and remove the etching solution from the glass plate. Fig. 3 'is a view for explaining a glass plate storage unit 6 for storing a glass plate I 9 covered with a masking agent 20 in Fig. 2. Fig. 3 (a) is an exploded view of the glass plate storage unit 6 for accommodating the glass plate 19 coated with the masking agent 2 in Fig. 2, and Fig. 3 (b) is the third (a) A sectional view taken along the line BB of the container 6b of the glass plate storage unit 6 in the figure. Glass plate storage «17- 200531945 (15) Unit 6 'has a glass plate slightly larger than the covered masking agent 2] 9 bottom, and is a container 6b' with an opening 6c on the bottom and a glass plate] 9 is formed by the pressure plate 6 a which is used to fix the glass plate 19 after being stored in the container 6 b. The glass plate 9 is conveyed by the conveying roller 7 in a state of being accommodated in the storage unit 6. Since the surface of the glass plate 19 does not contact the conveying roller 7, the surface of the glass plate 19 can be prevented from being damaged. In addition, when the glass plate 19 is stored in the container 6b, the end portion of the glass plate 19 is held and held by the pressing plate 6a. Therefore, the glass plate I 9 can be prevented from moving in the glass plate storage unit 6. In this way, the glass plate can also be prevented.丨 The end of 9 is broken. In order to spray the uranium engraving liquid on the surface of the non-covered glass plate 19, the opening 6c on the bottom of the container 6b forms a grid-like appearance on the bottom of the container 6b. In this embodiment, since there are nine portions not covered with the masking agent on the surface of the glass plate 19, the openings 6c on the bottom of the container 6b are evenly arranged. In addition, when the surface of the glass plate not covered with the masking agent 20 is etched, a large opening 6c may be provided on the bottom surface of the container 6b as long as the glass plate can be supported. The pressure plate 6a is a plate without a through hole. When the other side of the glass plate 19 covered with the masking agent 20 needs to be etched, an opening may be provided on the other side. The glass plate 19 is put into the glass plate storage unit 6, and the glass plate 19 is embedded in the container 6 b with the surface covered with the masking agent 20 as the bottom surface, and the glass plate 19 is pressed by the pressing plate 6 a to assemble the glass. Board storage unit. The method of collecting the glass plate 19 into the glass plate storage unit 6 is the same as the method of carrying the glass plate horizontally into the etching chamber 1. -18- 200531945 (16) The glass plate is to remove the etching and etching solution during the process of moving the glass plate storage unit 6 into the etching chamber 1 and the etching solution removal chamber 2 of the etching apparatus. The etching liquid stored in the etching liquid storage tank 3 and kept at a constant temperature is supplied to a nozzle 8 in the etching chamber 1 by a pump 9. The nozzle 8 after supplying the etching solution sprays the etching solution evenly on the glass so as to be slightly perpendicular to the surface of the glass plate. The sprayed etching solution will be concentrated on the bottom of the etching chamber 1. The concentrated etching solution will be sucked out of the etching chamber 1 by the pump 13 of the etching solution recovery device 4, and the etching solution discharged by the pump 13 will be After passing through the filter 1 4 a or 1 4 b, it flows into the etching solution storage tank 3. The water stored in the water storage tank 5 is supplied to the nozzle by the pump 17. The supplied water is sprayed onto the glass plate from the nozzle 16. With the sprayed water, the bazaar is finally at the bottom of the etching solution removal chamber 2. The water concentrated at the bottom can be discharged from the etching solution removal chamber 2 by opening a valve provided at the bottom of the etching solution removal chamber 2. FIG. 4 is a plan view showing a state where the glass plate storage device 6 is transferred into the glass etching chamber by the transfer roller 7. Fig. 5 is a sectional view taken along the line C-C in Fig. 4. The glass plate storage unit 6 is conveyed while supporting the bottom surface by a cylindrical roller having a small outer diameter among the conveying rollers 7. In the above-mentioned state, the swing of the glass plate storage unit 6 to the right and left sides in the travelling direction is restricted by the cylindrical rollers connected to the cylindrical rollers with a smaller outer diameter. As the glass plate storage unit 6 is horizontally conveyed, the glass plate 19 in the unit 6 is also horizontally conveyed. The melting amount of the glass plate surface -19- 200531945 (17) The contact time between the glass plate surface and the etchant is related to the conveying speed. The conveying speed can be appropriately changed according to the target amount of etching on the glass plate surface. The glass plate storage unit 6 is transferred to the etching chamber 1 and then transferred to the etching solution removal chamber 2 to remove the etching solution. Fig. 6 is an explanatory diagram illustrating a process of etching the surface of the glass plate 19; Fig. 6 (a) is a view in which the glass plate 19 covered with the masking agent 20 in Fig. 2 (b) is turned upside down. The glass plate 19 has a surface shape before etching. Fig. 6 (b) is a view showing a state where the etchant is sprayed on the glass plate covered with the masking agent 20] 9. Etching is performed by spraying an etching solution on the surface of the glass plate 19 not covered with the masking agent 20, and a recessed portion is formed on the surface of the glass plate 19. Fig. 7 is an enlarged view of a dotted line portion in Fig. 6. Since the etching solution is sprayed 22 on the glass plate 9, the etching solution can reach the corner of the formed recessed portion, thereby forming a recessed portion that can suppress the curved surface of the recessed portion. In addition, the sludge generated by the reaction between the glass and the etching solution can be removed immediately even if it adheres to the recessed portion. In addition, even if there is a gap 21 between the glass plate 19 and the masking agent 20, the masking agent 20 will be pressed by the spraying of the halberd engraving solution 22, and the infiltration of the etching solution into the gap 2 can be suppressed. Since the gap 21 is enlarged, peeling of the masking agent 20 can be suppressed. Fig. 6 (c) shows the surface of the glass plate 9 in which the etching solution and the masking agent 20 have been removed after the surface of the glass plate 9 has been etched. The glass plate 19 which has been etched as described above can be cut according to a specific cutting pattern 'and can be used as a glass cap for an EL panel. In addition, an ELD panel using the above-mentioned glass cap can be used to manufacture the ELD. 200531945 (18) In the above-mentioned embodiment, although the description is made of the form in which the masking agent is coated on the surface of the glass plate, the same applies to the case where the masking agent is not coated on the glass plate. In addition, glass plates that are not covered with a masking agent are also suitable for LCD panels and PDP panels. Fig. 8 is a view for explaining a glass plate storage unit 23 for storing glass plates 24 covered with no masking agent. Fig. 8 (a) is an exploded view of the glass plate storage unit 23 that has accommodated the glass plate 24, and Fig. 8 (b) is a DD line sectional view of the container 23b of the glass plate storage unit 23 in Fig. 8 (0) Glass plates that can be used for LCD panels and PDP panels can be etched using the glass plate storage unit shown in Figure 8. The glass plate storage unit 23 is the same as the storage unit 6 shown in Figure 3. The container 23b that houses the glass plate 24 and the pressure plate 2 3a that can press the glass plate 24 that is housed in the container 23b. The container 2 3b is provided with an opening 2 3c for spraying an etching solution to the glass plate. In the storage unit 23 shown in the figure, the shape of the opening portion 2 3 c of the container 23 is only a single rectangle, so it is different from the storage unit 6 shown in FIG. 3 except for the differences described above. The storage unit shown in FIG. 3 is the same. In addition, although the above-mentioned embodiment is directed to a method for engraving a glass cap for manufacturing an ELD panel, various shapes of recesses can be formed on a glass plate in accordance with a coating pattern of a masking agent For example, a cylindrical depression can be formed on the surface of the glass plate The recessed portion can be used as an align in ent mark. [Example] -21 200531945 (19) Next, the recessed portion formed by the etching method of the present invention will be described based on the embodiment. . At 4 0 0 mm X 5 0 0 mm X 0. After the surface of the 7 mm glass plate was covered with a masking agent, recesses were formed on the surface of the glass plate by performing operations in the order of etching, etching solution removal, and masking agent removal. The detailed implementation process of coating mask and etching is as follows. (Covering of masking agent) The masking agent is applied to one side of the glass plate by a screen printing method. A rectangular portion that is not covered by the masking agent will be formed. (Etching) After the glass plate covered with the masking agent is contained in a glass plate storage unit composed of a pressure plate and a container having an opening, the mist-shaped etching solution is sprayed on the rectangular portion not covered with the masking agent. Etching. The accommodating operation of incorporating the glass plate into the glass plate accommodating unit is performed by placing the glass plate in a container having an opening portion and holding the fixed glass plate by a pressing plate. The operation of attaching the glass plate to the container is performed by bringing the glass surface covered with the masking agent toward the opening side. The spraying of the mist-like etching solution on the rectangular portion not covered with the masking agent is to form the glass storage unit horizontally with the opening portion as the bottom surface, and to form the vertical portion of the rectangular portion slightly, and spray the etching solution on the rectangular portion only. The rectangular portion is formed by exposing the surface of the glass plate and allowing the etchant to be completely sprayed on the surface of the exposed glass plate. Spraying of etching solution is used containing 4. 0% by weight of hydrogen fluoride and-22-200531945 (20) 3. A 0% by weight aqueous solution of nitric acid is used as an etching solution, maintaining a temperature of 25 ± 1 to 3. The speed of 2 L / min was performed by spraying the etching solution from the nozzle. At this time, an etching of about 3 0 0 // m is formed on the surface of the glass plate. On the surface of the glass after the above-mentioned etching, recesses can be recognized by the naked eye. In addition, after visual inspection, it was confirmed that the masking agent did not peel off, and the bottom corners of the formed recesses did not become curved. [Brief Description of the Drawings] FIG. 1 is a schematic view of an etching apparatus according to the present invention. FIG. 2 is a view showing a glass plate covered with a masking agent. Fig. 3 is a view for explaining a glass plate accommodating unit for accommodating a glass plate covered with a masking agent in Fig. 2; Fig. 4 is a plan view showing a state where the glass plate storage device is transferred into the glass etching chamber by the transfer device. Figure 5: Section C-C in Figure 4. Fig. 6 is an explanatory diagram illustrating the etching process on the surface of the glass plate. Fig. 7 is an enlarged view of a dotted line in Fig. 6. Fig. 8 is a diagram for explaining a glass plate storage unit for storing a glass plate not covered with a masking agent. Fig. 9 is an example of an electro-luminescent display (ELD) in a flat panel display (FPD). Fig. 10: A schematic cross-sectional view showing changes on the glass surface in a state where a glass plate is immersed in an etchant for etching. -23- 200531945 (21) Brother] Figure 1 is a dashed part of Figure 10 Zoom in. Fig. 2 is a schematic cross-sectional view of a glass plate showing the progress of etching in a state where the glass plate is immersed in an etching solution. [Description of main component symbols] 1: Etching chamber 2: Etching liquid removal chamber
3 :蝕刻液貯留室 4 :蝕刻液回收裝置 5 :水貯留室 6、 2 3 :玻璃板收納單元 7、 1 8 :搬送滾子 8、 1 6 :噴嘴 9、 1 1、1 3 :泵3: Etching solution storage chamber 4: Etching solution recovery device 5: Water storage chamber 6, 2 3: Glass plate storage unit 7, 1 8: Transport roller 8, 1 6: Nozzle 9, 1 1, 1 3: Pump
1 2、1 4 a、1 4 b :過濾器 ]5 a、] 5 b :開關閥 1 9、2 4 :玻璃板 2 0 :掩蓋劑 -24-1 2, 1 4 a, 1 4 b: Filter] 5 a,] 5 b: On-off valve 1 9, 2 4: Glass plate 2 0: Covering agent -24-