CN2492564Y - Electrochemical etching flattening device for indium-tin oxide electrode on organic electroluminescent display panel - Google Patents
Electrochemical etching flattening device for indium-tin oxide electrode on organic electroluminescent display panel Download PDFInfo
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- CN2492564Y CN2492564Y CN01232335U CN01232335U CN2492564Y CN 2492564 Y CN2492564 Y CN 2492564Y CN 01232335 U CN01232335 U CN 01232335U CN 01232335 U CN01232335 U CN 01232335U CN 2492564 Y CN2492564 Y CN 2492564Y
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Abstract
The design provides an electrochemical etch planarization device, which is used to make electrochemical etch planarization on the indium and tin oxide (ITO) electrode layer with electroluminescent element. Wherein, an electrochemical etching unit is included and is used to provide electrochemical etching liquid, a cleaning unit, a transfer unit and a control unit. The electrochemical etching liquid is distributed evenly on the surface of electroluminescent display panel ITO electrode layer. The cleaning unit is used to spray cleaning liquid to remove residual electrochemical etching liquid. The transfer unit transfers the electroluminescent display panels one after another continuously to the electrochemical etch planarization unit and the cleaning unit. The control unit is used to control the sequence and the transfer time of the transfer unit, through which the treatment time of the electroluminescent display panel in every unit can be controlled accurately.
Description
Technical field
The design provides a kind of chemical etching planarizer, refers in particular to the chemical etching planarizer of indium tin oxide (ITO) electrode layer that a kind of organic electroluminescent device uses.
Background technology
Display of organic electroluminescence (organic electroluminescent display) is because in light weight, and height contrasts, speed of answer is fast, power consumption is low the brightness advantages of higher, becomes in recent years to enjoy the new generation flat-panel screens of gazing at.Yet organic electroluminescent device is because its technology is new, development is compared to other indicating meter evening, and technology is fully matured not as yet, so at present in commercialization process and mass production process, it is to be overcome to also have many obstacles to have.
The primary structure of organic EL display panel includes a plurality of indium tin oxide parallel to each other (ITO) anode electrodes, a plurality of are parallel to each other but intercept wall with the vertical photoresistance of anode electrode, one electroluminescent organic material layer evaporation intercepts within the walls in adjacent photoresistance, and a plurality of cathode electrodes parallel to each other, evaporation is on the electroluminescent organic material layer.The sandwich structure of anode electrode, electroluminescent organic material layer and cathode electrode just constitutes the luminous picture element (pixel) of organic EL display panel.
The ito anode electrode that a plurality of of the primary structure of organic EL display panel are parallel to each other, because thereafter need be on its surface further evaporation or be formed with the organic electro luminescent material layer, therefore want high than the requirement of other kinds flat-panel screens for the requirement of the surface flatness of ito anode electrode.Because if the surface of organic EL display panel ito anode electrode is smooth inadequately; when its shaggy part tip (spike) regular meeting forms in follow-up electroluminescent organic material layer; cause the serious consequence that pierces through the electroluminescent organic material layer; thereby reduce the quality that shows, even cause the element short circuit.This situation is obvious especially when the electroluminescent organic material layer thickness of follow-up formation reduces.In addition, the ITO electrode except follow-up luminescent material is pierced through in meeting, still can cause the concentrated heat effect of internal field, the life-span of reducing organic electroluminescent device greatly if large-sized relatively crystal grain projection is arranged.
Therefore, needs are a kind of can be with the method for the fast effective planarization of organic EL display panel ito anode electrode surface, because the uneven surface of ito anode electrode destroys or reduce the display quality of organic EL display panel, promote the making yield of display panel to avoid organic EL display panel.In the past, carry out the processing of planarization for organic EL display panel ito anode electrode, once there was proposal to process to reach planarization with lapping mode, but because the ITO rete is very thin, known mechanical mill or cmp can not be dealt with problems fully, and usually cause the over-mastication breakage of ITO rete, can't optionally carry out planarization at the shaggy most advanced and sophisticated jut of ITO.Yet, for the mass production of organic EL display panel continous way,, need better ito anode electrode flattening method particularly for the large size area, make yield to promote.
In addition, the ito anode electrode of the primary structure of organic EL display panel, it is more than forming a plurality of vertical bar shapes parallel to each other on the panel, or forms other pattern (pattern).And on the ito anode electrode of organic EL display panel or by it, often follow to form a plurality of supporting electrodes to add the conducting of strong current.These supporting electrodes are also mostly to be to form and ito anode electrode vertical bar shape pattern (pattern) parallel to each other, can certainly be that other patterns (pattern) are to reach the conducting effect that adds strong current.
At present, no matter be the ito anode electrode or the supporting electrode of organic EL display panel structure, all be the processing that needs pattern (pattern) forming process.General industry common method is for forming ito anode electrode layer or auxiliary electrode layer prior to organic EL display panel in the mode of thin film deposition, in ito anode electrode that forms or auxiliary electrode layer coating photoresistance and the formation corresponding pattern (pattern) that develops, form electrode pattern with the dry-etching or the method for Wet-type etching afterwards again.
And traditional chemical etching or chemical milling system carry out among being immersed in different etching baths and washing bath, but can't each step of operate continuously, must display panel be taken out and be loaded in another board by the mode of artificial transmission, therefore the time-histories of whole chemical etching or chemical milling making can prolong many.If organic EL display panel is also processed with this device, and is unfavorable for the volume production operation of organic EL display panel, also be unfavorable for large-area display panel manufacturing.In addition; because human factor is wayward; regular meeting produces in transport process and incurs loss through delay or damage, and therefore general electrochemical apparatus can't accurately be controlled the chemical etching planarization time at all, can not guarantee the quality of flat evolution of chemical etching or chemical milling processing procedure.
Moreover, special in the ITO electrode layer in the display of organic electroluminescence structure, because the chemical etching of ITO electrode layer or the destruction that traditional chemical etching meeting is subjected to chemical agent.So need do precise time control, to promote the making yield and the specification stability of indicating meter, suffer over etching when avoiding chemical etching or traditional chemical etching, make the specification change of ITO electrode layer even cause the ITO electrode layer to come off.
Summary of the invention
The design's main purpose is to provide a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode, can transmit organic EL display panel continuously to each unit, with the time-histories of effective shortening chemical etching planarization processing procedure, promote the turndown ratio of different size substrate.
The design's secondary objective is to provide a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode, can accurately control the predetermined chemical etching planarization time.
The design's another purpose is to provide a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode, can come requirement elasticity to select to use according to maintenance needs and chemical etching planarization processing procedure.
The design's another purpose is to provide a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode, can reach environmental protection and cost-effective effect.
The design's another purpose is to provide a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode, can promote the work-ing life and the service efficiency of chemical etching planarizer.
The design is used for an organic EL display panel is carried out the planarization and the etch process of an ITO electrode layer, it includes a chemical etching unit, be used to provide chemical etching liquid or traditional chemical etching solution, so that it is uniformly distributed on the organic EL display panel, one cleaning unit, be used for spraying a cleaning solution to remove residual chemical etching liquid or traditional chemical etching solution, one delivery unit, mode with continuous transmission is orderly sent to organic EL display panel in chemical etching unit and the cleaning unit, an and control unit, be used for controlling the transmission order and the delivery time of delivery unit, transmitting organic EL display panel to each unit, and accurately control the treatment time of organic EL display panel in each unit.
In addition, the chemical etching planarizer can be provided with a plurality of preceding latter linked chemical etching unit, the foundation maintenance needs and electrochemistry erosion Liao planarization processing procedure requires elasticity to select use chemical etching unit, and control the unitary treatment time of chemical etching that this selection is used by control unit, with chemical etching planarization or the etched time of traditional chemical of accurately controlling this organic EL display panel.
In addition, the electrochemical planarization makeup is put and cleaning unit can be arranged to one first cleaning unit and one second section cleaning unit.Utilize first section cleaning unit to spray a circulation earlier and reclaim solution, with tentatively remove on the organic EL display panel surface residual chemical etching liquid or traditional chemical etching solution.Spray a fresh cleaning solution when utilizing second section cleaning unit again, with remove fully on the organic EL display panel residual chemical etching liquid or traditional chemical etching solution.Wherein used fresh cleaning solution in second section cleaning unit is circulated in first section cleaning unit, is used as circulate soln.
The design's device novelty can provide on the industry and utilize, and truly has the enhancement effect.
Description of drawings
Fig. 1 is the block schematic diagram of ITO electrode layer chemical etching planarizer of the organic EL display panel of embodiment 1;
Fig. 2 is the chemical etching cell schematics of Fig. 1;
Fig. 3 is the block schematic diagram of ITO electrode layer chemical etching planarizer of the organic EL display panel of embodiment 2;
Fig. 4 is the block schematic diagram of ITO electrode layer chemical etching planarizer of the organic EL display panel of embodiment 3;
Fig. 5 is the block schematic diagram of ITO electrode layer chemical etching planarizer of the organic EL display panel of embodiment 4;
Fig. 6 is the cross-sectional elevational view of carrying organic EL display panel conveying roller among the embodiment 1, and edge wheel limits outer edge wheel in order to the horizontal relative position of fixed display panel in the conveying roller unit in order to accept display panel in wherein accepting.
Embodiment
The detailed description of preferred embodiment:
The design comprises at least one chemical etching unit, be used to provide chemical etching liquid or traditional chemical etching solution, so that it is uniformly distributed on the ITO surface of organic EL display panel, it soaks organic EL display panel and places chemical etching liquid or spray chemical etching liquid in this organic EL display panel, and making current makes electric current pass through the ITO surface electrode of organic EL display panel; At least one cleaning unit is connected with the chemical etching unit of this least significant end, is used for spraying a cleaning soln, with remove on this organic EL display panel surface residual chemical etching liquid or traditional chemical etching solution; One delivery unit is connected with this a plurality of chemical etchings unit, this cleaning unit respectively, and in the mode of continuous transmission organic EL display panel is orderly sent in this a plurality of chemical etchings unit and this cleaning unit; And a control unit, be used for controlling the transmission order and the delivery time of delivery unit, accurately to control the treatment time of this organic EL display panel in each unit.Wherein this delivery unit is orderly sent to organic EL display panel in this chemical etching unit and this cleaning unit in the mode of continuous transmission, to finish this chemical milling planarization processing procedure, therefore the chemical etching planarizer can accurately be controlled this predetermined chemical etching time and chemical etching planarization effect, makes the ITO surfaceness reduce to following 20nm.
The chemical etching unit of the chemical etching planarizer of the design's organic EL display panel indium tin oxide (ITO) electrode, when delivery unit is sent to the chemical etching unit with panel, soak the method that places chemical etching liquid required chemical etching liquid when the chemical etching planarization is provided in the mode of organic EL display panel or with organic EL display panel to spray chemical etching liquid.The design wait to transmit the unit with chemical etching liquid on average be sprayed on organic EL display panel or organic EL display panel soak place chemical etching liquid after, supply required electric current to carry out the chemical etching planarization by chemical etching power supply provisioning controller.The time of this chemical etching is by the control unit management and control.
The chemical etching unit of the chemical etching planarizer of the design's organic EL display panel indium tin oxide (ITO) electrode, the mode of its conducting electric current can be the mode of any chemical etching, be preferably individual or a plurality of dangling with odd number, but be contacted with the bus of electrode substance (as ITO electrode substance or supporting electrode material) of panel or the electrode substance (as ITO electrode substance or supporting electrode material) of the restriction delivery roller touch panel made with conductive material, and cooperating another electrode (for example graphite), making current is to carry out electrochemical planarizationization or chemical etching.
The design is because have the chemical etching unit, so the chemical etching that also can carry out organic EL display panel ITO electrode is to form ITO electrode pattern (pattern) or supporting electrode pattern (pattern).It only need provide the etching solution of related electrode material-mix to carry out when implementing.So the design can be used in the electrochemical planarizationization of display panel ITO electrode surface separately, or being used in the auxiliary chemical etching that shows that pattern forms of display panel ITO electrode pattern, display panel, the electrochemical planarizationization of display panel ITO electrode surface and the chemical etching that forms in display panel ITO electrode pattern carry out simultaneously even.
If in not conducting of chemical etching unit electric current, and add the traditional chemical etching solution, just can use same device that organic EL display panel ITO electrode is carried out traditional chemical milling.This application can be used for the formation of organic EL display panel ITO electrode pattern, especially forms the organic EL display panel of photoresistance pattern to having to develop, and can directly be formed the pattern (patterns) of ITO electrode by the design.
This chemical etching unit also optionally is provided with the eliminating of chemical etching liquid pipeline, chemical etching liquid circulation line and pumping or chemical etching liquid receiving tank, to reclaim or to utilize chemical etching.This chemical etching unit chemical etching liquid shower nozzle optionally uses portable shower nozzle or fixed sprinkler to spray chemical etching in substrate.This chemical etching unit also optionally cooperates the temperature holding unit to be in stable temperature constant state when the chemical etching to keep the chemical etching unit, with the quality of control chemical etching.The unitary chemical etching liquid of this chemical etching can be optionally optionally with batch or continous way supply.The chemical etching unit and can be optionally setting device chemical etching liquid blending unit optionally, with modulation or store the chemical etching liquid that chemical etching is used.
The design's chemical etching unit can optionally be provided with a plurality of chemical etchings unit, thinks the usefulness of elasticity production.The design then can be controlled the load mode and the delivery time of delivery unit by control unit, and accurately control the treatment time of this organic EL display panel in each chemical etching unit if having a plurality of chemical etchings unit.So, if there is the chemical etching unit to need repairing, or additional soup, the design still to handle continuously and to produce, as long as adjust the control of control unit, need not all shut down whole device, saves the complexity and the time of handling.
The design's cleaning unit, can be provides fresh cleaning solution, with remove fully on this organic EL display panel residual chemical etching liquid.
The design's cleaning unit also can be divided into first section cleaning unit and second section cleaning unit.Wherein first section cleaning unit is connected with the chemical etching unit of this least significant end, is used for spraying a circulate soln, with tentatively remove on this organic EL display panel residual chemical etching liquid; And second cleaning unit is connected with this first cleaning unit, is used for spraying a fresh cleaning solution, with remove fully on this organic EL display panel residual chemical etching liquid.
The circulate soln that this first section cleaning unit uses can be the scavenging solution of the collected cleaning of second section cleaning unit or fresh scavenging solution.When the scavenging solution that uses by the collected cleaning of second section cleaning unit, can relatively conserve water.The scavenging solution that second section cleaning unit cleaned is because for cleaning through the preliminary panel that cleans, so pollution level is not higher comparatively speaking, thereby recyclablely is used for first section cleaning unit and cleans.
This first section cleaning unit and second section cleaning unit also are provided with optionally that scavenging solution is got rid of pipeline, scavenging solution utilizes pipeline and pumping or scavenging solution receiving tank again, to reclaim or to utilize scavenging solution.The scavenging solution shower nozzle of this first section cleaning unit and second section cleaning unit optionally uses portable shower nozzle or fixed sprinkler to spray scavenging solution in substrate.This first section cleaning unit and second section cleaning unit and optionally cooperate the temperature holding unit with keep first section cleaning unit and second section cleaning unit when cleaning in stablizing temperature constant state.
The design is provided with first section cleaning unit and second section cleaning unit, and panel is reduced when cleaning from first section cleaning unit and second section cleaning unit pollution of cell wall all around.Because main contaminant particles and major part stain in around the contaminant particles of cell wall in first section cleaning unit, and the contaminant particles numbers of poles of cell wall is low around second section cleaning unit, so can significantly remove from first section cleaning unit and second section cleaning unit pollution of cell wall all around.The scavenging solution of the cleaning unit of the design's setting, first section cleaning unit or second section cleaning unit is preferably deionized water.
The design can comprise also that one is connected in the unit that dries up of cleaning unit, with the panel after the dry cleansing unit cleaning.If cleaning unit is divided into first section cleaning unit and second section cleaning unit, this dries up the unit and also can be connected in after first section cleaning unit or the second section cleaning unit, with the panel after the dry cleansing unit cleaning.This dries up the unit and is preferably the mode of utilizing air knife drying, with on this organic EL display panel residual cleaning solution remove.
The design can also comprise a download unit, with this cleaning unit,, first section cleaning unit or second section cleaning unit be connected, can load the display panel that this finishes electrochemical etch process, or provide a buffer zone to make this panel substrate directly enter follow-up processing procedure module.
The design can also comprise a load bearing unit, and load bearing unit is to be used for loading the display panel for the treatment of the chemical milling planarization, or replaces load bearing unit to provide display panel after a buffer zone has developed photoresistance directly to carry out chemical milling planarization processing procedure.In addition, can comprise a download unit, download unit is to be used for loading the display panel that the chemical milling planarization is finished, or peel off module with the photoresistance that provides a buffer zone to make display panel directly enter the downstream and replace download unit, so that polyphone production continuously before and after the whole processing procedure energy, and impel the production capacity increase.
The design's chemical etching unit optionally includes at least one air knife, is located at the unitary end of this chemical etching, is used for blowing down chemical etching liquid unnecessary on the surface of this organic EL display panel.
The design's delivery unit can be known transport unit, such as conveying belt, and conveying roller or mechanical arm.Be preferably the conveying roller unit of forming by a plurality of tools edge wheel and the outer edge wheel of restriction in the accepting of wheel shaft two ends, wherein accept interior edge wheel in order to accept display panel, as shown in Figure 6.Interior edge wheel 202 in the chemical etching unit is also made by conducting metal, and in order to the ito transparent electrode layer of contact display panel, energising makes current flowing ito transparent electrode layer, finishes chemical etching planarization processing procedure.Limit outer edge wheel 204 in order to the horizontal relative position of fixed display panel in the conveying roller unit.In the use, the wheel shaft two ends roller spacing of this transport unit can adjust, and can possess the turndown ratio of the volume production of different size substrate.
And be applicable to the organic EL display panel of the design's chemical etching planarizer, can be for plate the organic EL display panel of ITO comprehensively, or organic EL display panel with pattern (pattern) ITO electrode to handle through the gold-tinted micro-photographing process, if adopt ito substrate to cooperate the design's chemical etching processing procedure with the good photoresistance pattern that develops in advance, can reach the circuit that defines ito anode simultaneously and planarization ito anode circuit pair take advantage of benefits.
If in not conducting of chemical etching unit electric current, and add the traditional chemical etching solution, the design just can use same device that organic EL display panel ITO electrode is carried out traditional chemical milling.The organic EL display panel that is applicable to the design's chemical etching planarizer not conducting electric current and carries out chemical milling, still can comprise the organic EL display panel that comprehensively plates auxiliary electrode material, or the organic EL display panel of having handled through the gold-tinted micro-photographing process with pattern (patterns) supporting electrode.When its chemical etching planarizer in the design's organic EL display panel ITO electrode is operated, can use the high chemical etching liquor of supporting electrode chemical milling selectivity so that supporting electrode is carried out chemical milling, to reach the benefit that defines the supporting electrode circuit.The design's chemical Milling appts can be handled the chemical milling of supporting electrode or ITO electrode, and its conversion only need be done corresponding conversion with the chemical etching liquor that is used and get final product.
The working method of the etching planarizer of the design's organic EL display panel ITO electrode, the ito substrate that comprises the organic EL display panel of the photoresistance pattern that will develop in advance earlier soaks and places chemical etching liquid, wherein the indium tin oxide rete that has electroconductibility on this organic EL display panel surface; Making current makes electric current by the indium tin oxide rete on the organic EL display panel afterwards; And at last with the residual chemical etching liquid on the indium-tin oxide electrode on water cleaning organic EL display panel surface.The traditional chemical etching operation method of the chemical etching planarizer of the design's organic EL display panel ITO, the not conducting electric current, all the other are all identical with chemical etching planarization working method during except that adding traditional chemical etching solution and etching.
The ITO etching electrode flattening method of the design's organic EL display panel is used in the characteristic of ITO material conduction itself as etched electrodes, on the ITO electrode, feed impressed current and cause electrical effect, ITO rete in the feasible chemical etching electrolytic solution that soaks, utilize the electric field concentration effect of extra electric field at the most advanced and sophisticated position of ITO surface microstructure, significantly promote the erosion rate at the sharp-pointed position of ITO, reach the planarization effect of tool selectivity to ITO sharpened surface position, and significantly reduce injury, and make surfaceness less than below the 20nm to the ITO of otherwise flat place rete.
The engraving method of not conducting of the ITO electrode electric current of the design's organic EL display panel comprises will covering with photoresistance in advance earlier and the organic EL display panel that contains ITO or auxiliary electrode material of the good corresponding photoresistance pattern that develops soaks to place the chemical milling unit that contains a chemical etching liquor or spray chemical etching liquor with the delivery unit of stupefied continuous transmission organic EL display panel and contains the organic EL display panel of ITO or auxiliary electrode material in this; And in one first section cleaning unit and one second section cleaning unit with the residue chemistry etching solution on the indium tin oxidizing electrode on water cleaning organic EL display panel surface.Wherein first section cleaning unit is connected with the chemical milling unit of this least significant end, is used for spraying a circulate soln, with tentatively remove on this organic EL display panel surface residual chemical etching liquor; And second section cleaning unit is connected with first section cleaning unit, is used for spraying a fresh cleaning solution, with remove fully on this organic EL display panel surface residual chemical etching liquor.
The engraving method utilization of not conducting of the chemical etching planarizer electric current of the design's organic EL display panel ITO electrode will comprise the ITO rete has organic EL display panel to be soaked in the chemical milling electrolytic solution, or spray chemical etching liquor in this organic EL display panel that contains ITO or auxiliary electrode material, reach the tool selectivity ITO etching electrode is become pattern.Also even have auxiliary electrode material to exist down, only need to select the etching solution low to the supporting electrode selectivity, can reach the tool selectivity ITO etching electrode is become pattern, vice versa.
Chemical etching liquid in the chemical etching flattening method of the design's organic EL display panel ITO electrode can be any chemical etching liquid that can carry out chemical etching to indium tin oxidizing electrode, is preferably to comprise HCl, HNO
3With the mixed solution of HCl, 85% H
3PO
4, 48% HBr or 21% FeCl
3Mixed solution with 12% HCl.
Chemical etching liquid in the chemical etching flattening method of the design's organic EL display panel ito substrate, it also optionally adds the chemical etching liquid of electrochemical stability agent with the stable electrical etching process, keeps the stable of chemical etching environment.Suitable electrochemical stability agent is preferably acetic anhydride, acetic acid, glycerine or picric acid.
Service temperature during chemical etching in the chemical etching flattening method of the design's organic EL display panel ito substrate is 15-50 ℃, is preferably 20-30 ℃.
Electrical current density during chemical etching in the chemical etching flattening method of the design's organic EL display panel ito substrate is 5-30A/dm
2, be preferably 8-16A/dm
2
Embodiment 1
Please refer to Fig. 1, Fig. 1 puts 10 block schematic diagram for the electrochemical planarization makeup of embodiment 1.The design provides a kind of chemical etching planarizer 10, be used for an organic EL display panel (not shown) is carried out a chemical etching planarization processing procedure, etching the organic EL display panel anode line, and reduce the roughness of luminous zone of the ito anode electrode of panel surface.Electrochemical planarization makeup is put 10 and is included a load bearing unit 12 and be used for carrying display panel, one chemical etching unit 14 is connected with load bearing unit 12, one cleaning unit 16 is connected with chemical etching unit 14, one dries up unit 18 is connected with cleaning unit 16, one download unit 19 with dry up unit 18 and be connected, one delivery unit 20 is respectively with chemical etching unit 14, cleaning unit 16 and dry up unit 18 and be connected, and a control unit 22 is connected with delivery unit 20.
Chemical etching planarizer 10 utilizes control unit 22 to control the transmission order and the delivery time of delivery unit 20, the mode that delivery unit 20 is transmitted continuously, display base plate is orderly sent to chemical etching unit 14, cleaning unit 16 and dries up in the unit 18, and accurately control display panel chemical etching liquid in each unit, so that chemical etching liquid is evenly distributed on the surface of display panel, and continues one with chemical etching power supply provisioning controller 292 received currents and set chemical etching time and current density.The chemical etching that present embodiment uses is 21% FeCl
3With 12% HCl, etch temperature is set at 30 ℃, and the current density of etched making current is 10A/dm
2Cleaning unit 16 is used for spraying a cleaning solution, with remove on the panel surface residual chemical etching liquid.Dry up unit 18 be used for drying up on the display panel residual cleaning solution.Download unit 19 is used for loading the intact display panel of handling of chemical etching planarization, makes display panel directly enter follow-up module so that a buffer zone to be provided.Delivery unit 20 is a kind of conveying roller unit, is arranged in the accepting of arbor wheel 206 two ends edge wheel 202 and the outer edge wheel 204 of restriction is formed by a plurality of, wherein accepts interior edge wheel 202 in order to accept display panel.Edge wheel 202 and made in chemical etching is unitary by conducting metal, ito transparent electrode layer in order to the contact display panel, make current flowing ito transparent electrode layer by 292 energisings of chemical etching power supply provisioning controller, finish chemical etching planarization processing procedure.Limit outer edge wheel 204 in order to the horizontal relative position of fixed display panel in the conveying roller unit.In the use, the wheel shaft 206 two ends roller spacings of this e Foerderanlage can adjust, and the panel width of visual OLED is adjusted two roller spacings, can possess the turndown ratio of the volume production of different size substrate.
Please refer to Fig. 2, Fig. 2 is the block schematic diagram of chemical etching unit 14 shown in Figure 1.Chemical etching unit 14 includes a cavity 24, one aeration equipments 26 and is connected with cavity 24, provides the rare gas element of required feeding in the cavity 24 when being used for handling under needing the inert gas environment, as nitrogen (N
2), argon gas (Ar) etc., one chemical etching liquid heating and temperature control device 29 is connected with cavity 24, be used for controlling the chemical etching temperature of chemical etching liquid, and one chemical etching liquid reclaim unit 28 and be connected with cavity 24, be used for reclaiming used chemical etching liquid and recycling be provided.Be provided with a nozzle 30 in the cavity 24, be used for spraying chemical etching liquid, one spray pressure-controlled device 31, utilizing pumping to control chemical etching liquid presses in the spray of nozzle 30, one chemical etching groove 32, being used for jolting has sprayed the display panel of chemical etching liquid, one with chemical etching power supply provisioning controller 292, with received current to the chemical etching groove, and at least one air knife 34 is located at the end of cavity 24, be used for blowing down chemical etching liquid unnecessary on the panel surface, reduce used chemical etching liquid and pollute next groove.When display panel is sent to chemical etching unit 14 in load bearing unit 12 after, nozzle 30 in the cavity 24 can spray chemical etching liquid to display panel, spray pressure-controlled device 31 can be pressed in the spray of nozzle 30 by control chemical etching liquid, makes chemical etching liquid obtain best uniformity coefficient.And in chemical etching groove 32, can come the jolting display panel in the mode of waving, so that chemical etching liquid is evenly distributed on the panel surface.Another kind of mode is to insert chemical etching liquid in chemical etching groove 32, can directly display panel be immersed in the chemical etching groove 32, and wave the jolting of mode, also can reach the effect that distributes equably.In addition, can also adopt above-mentioned sprinkling simultaneously and soak chemical etching liquid dual mode, can reach the effect of even announcement quickly.And the function of air knife 34, then be before display panel is sent to cleaning unit 16, be used for blowing down chemical etching liquid unnecessary on the panel surface, not only can improve the rate of recovery of chemical etching liquid, also can reduce the consumption of the scavenging solution of the required use of subsequent step.
In chemical etching unit 14, control unit 22 can control chemical etching liquid spraying times, jolting time and electric current conduction time, and set chemical etching after the time in arriving, and by delivery unit 20 display panel are sent in the cleaning unit 16 at once.Subsequently, cleaning unit 16 can be sprayed a high pressure de-ionized water, cleans the chemical etching liquid on the panel surface.And then, display panel can be sent to and dry up in the unit 18, and is dried up by the mode with air blow drying or air knife drying, just finishes the chemical etching processing procedure.Because control unit 22 can be controlled the treatment time of display panel in each unit, and delivery unit 20 can transmit in the display panel continuously to each unit, therefore the electrochemical planarization makeup is put 10 and can accurately be controlled the required predetermined chemical etching time of display panel, produce the chemical etching time error to avoid manual operation, with the cost of manual work.In addition, the mode of operation that transmits can effectively shorten the time-histories of chemical etching processing procedure continuously, quite is applicable to the volume production operation of the volume production operation, particularly large-area display panel of factory.
And in addition in the traditional chemical etching liquor of chemical etching unit adding that the electrochemical planarization makeup is put, and input has the pattern photoresistance panel through developing, under not conducting current conditions, put 10 through the electrochemical planarization makeup and accurately control the required predetermined chemical etching period of display panel, the simple mode of operation that still transmits continuously in the chemical milling mode is to etch the corresponding pattern of ITO electrode, it can effectively shorten the time-histories of chemical milling processing procedure, quite be applicable to the volume production operation of the volume production operation, particularly large-area display panel of factory.This electrochemical planarization makeup that shows the design places under the situation of not conducting electric current, can also be as the usefulness of the continuous mass production of chemical milling.
Embodiment 2
Please refer to Fig. 3, Fig. 3 puts 40 block schematic diagram for the electrochemical planarization makeup of embodiment 2.The electrochemical planarization makeup is put 40 and is included a load bearing unit 42, one first chemical etching unit 441 is connected with load bearing unit 42, one second chemical etching unit 442 is connected with the first chemical etching unit 441, one the 3rd chemical etching unit 443 is connected with the second chemical etching unit 442, one cleaning unit 46 is connected with the 3rd chemical etching unit 443, one dries up unit 48 is connected with cleaning unit 46, one download unit 49 with dry up unit 48 and be connected, one delivery unit 50 respectively with each chemical etching unit 441-443, cleaning unit 46 and dry up unit 48 and be connected, and a control unit 52 is connected with delivery unit 50.
Chemical etching planarizer 40 utilizes control unit 52 to control the transmission order and the delivery time of delivery unit 50, the mode that delivery unit 50 is transmitted continuously, display panel is orderly sent to the first chemical etching unit 441, the second chemical etching unit 442, the 3rd chemical etching unit 443, cleaning unit 46 and dries up in the unit 48, accurately to control the treatment time of display panel in each unit.Wherein, each chemical etching unit 441-443, cleaning unit 46, to dry up unit 48 identical with embodiment 1 with the equipment and the function of download unit 49.
Because 40 latter linked first, second and the 3rd chemical etching unit 441,442,443 before being provided with are put in electrochemical planarization makeup, therefore can need and the chemical etching processing procedure requires elasticity to select to use first, second or the 3rd chemical etching unit 441,442,443 according to maintenance, and control unitary the carrying out mode and treatment time of chemical etching of select using by control unit 52, accurately to control required chemical etching liquid measure and predetermined chemical etching time.The makeup of this electrochemical planarization is put can be when carrying out mass production, can simultaneously in each chemical etching, spray chemical etching liquid, jolting step and the control of predetermined chemical etching time, make the electrochemical planarization makeup put 40 production capacity and improve three times.In addition, this electrochemical planarization makeup is put also and can remembered when an electrochemistry erosion that the unit need keep in repair or during additional chemical etching liquid, can in other two display units, spray chemical etching liquid and substrate jolting step, put 40 because of stopping and to operate in a chemical etching unit to avoid the electrochemical planarization makeup.The makeup of this electrochemical planarization is put also and can be made the electrochemical planarization makeup put 40 and can carry out three kinds of chemical etching processing procedures simultaneously in the different types of chemical etching liquid in different chemical etching unit when chemical etching liquid the time.The electric current that the prescription of the chemical etching liquid of present embodiment and chemical etching are implemented, temperature are as embodiment 1.
In sum, at least two chemical etching unit of continuous load mode collocation setting of 40 are put in the electrochemical planarization makeup, not only can effectively shorten the time-histories of chemical etching processing procedure, can also increase the usage space of chemical etching planarizer 40, put 40 work-ing life and service efficiency very big benefiting all arranged for promoting the electrochemical planarization makeup.
And present embodiment adds traditional chemical etching liquor in the chemical etching unit that the electrochemical planarization makeup is put, and input has the pattern photoresistance panel through developing, under the situation of not conducting electric current, put 10 through the electrochemical planarization makeup and accurately control the required predetermined chemical etching period of display panel, in the chemical milling mode but the mode of operation that transmits continuously is to etch the corresponding pattern of ITO electrode, it can shorten the time-histories of chemical milling processing procedure effectively, can also increase chemical etching planarizer 40 and be used for the etched use of display panel traditional chemical and select the space, put 40 and be used for etched work-ing life of display panel traditional chemical and service efficiency all has very big benefiting for promoting the electrochemical planarization makeup.This electrochemical planarization makeup that shows the design places under the situation of not conducting electric current, can be used as the continuous mass production of chemical milling, increases and uses the usefulness of selecting the space.
Embodiment 3
With reference to figure 4, Fig. 4 puts 60 block schematic diagram for the electrochemical planarization makeup of embodiment 3 clearly.The electrochemical planarization makeup is put 60 and is included a load bearing unit 62, one chemical etching unit 64 is connected with load bearing unit 62, one first section cleaning unit 661 is connected with chemical etching unit 64, one second section cleaning unit 662 is connected with first section cleaning unit 661, one download unit 69 with dry up unit 68 and be connected, one delivery unit 70 is respectively with chemical etching unit 64, first section cleaning unit 661, second section cleaning unit 662 and dry up unit 68 and be connected, and a control unit 72 is connected with delivery unit 70.The electric current that the prescription of the chemical etching liquid of present embodiment and chemical etching are implemented, temperature are with embodiment 1.
In sum, electrochemistry is flat buries makeup and puts 60 continuous load mode collocation two stage cleaning units are set, and not only can control the time-histories of planarization processing procedure effectively, can also reach environmental protection and cost-effective effect.Put 60 work-ing life and service efficiency very big benefiting all arranged for promoting the electrochemical planarization makeup.
And present embodiment adds traditional chemical etching liquor in the chemical etching unit that the electrochemical planarization makeup is put, and input has the pattern photoresistance panel through developing, accurately control the required predetermined chemical etching period of display panel through electrochemical planarization device 10, in the chemical milling mode but the mode of operation that transmits continuously is to etch the corresponding pattern of ITO electrode, it also can effectively control the time-histories of planarization processing procedure, can also reach environmental protection and cost-effective effect, put 60 work-ing life and service efficiency very big benefiting all arranged for promoting the electrochemical planarization makeup.
Embodiment 4
Please refer to Fig. 5, Fig. 5 puts 80 block schematic diagram for the electrochemical planarization makeup of embodiment 4.The electrochemical planarization makeup is put 80 and is included a load bearing unit 82, one first chemical etching unit 841 is connected with load bearing unit 80, one second chemical etching unit 842 is connected with the first chemical etching unit 841, one the 3rd chemical etching unit 843 is connected with the second chemical etching unit 842, one first section cleaning unit 861 is connected with the 3rd chemical etching unit 843, one second section cleaning unit 862 is connected with first section cleaning unit 861, one dries up unit 88 is connected with second section cleaning unit 862, one download unit 89 with dry up unit 88 and be connected, one delivery unit 90 respectively with each chemical etching unit 841-843, each cleaning unit 861,862 and dry up unit 88 and be connected, and each control unit 92 is connected with delivery unit 90.
The electrochemical planarization makeup is put 80 and is utilized control unit 92 to control the transmission order and the delivery time of delivery unit 90, the mode that delivery unit 90 is transmitted continuously, display panel is orderly sent to first, second, third chemical etching unit 841,842,843, first, second section cleaning unit 861,862 and dries up in the unit 88, accurately to control the treatment time of display panel in each unit.Wherein, each chemical etching unit 841-843, to dry up unit 88 described as embodiment 3 with the equipment and the function of download unit 89.Electric current, temperature that the chemical etching liquid formula of present embodiment and chemical etching are implemented are described as embodiment 1.
In sum, electrochemical planarization makeup is put 80 continuous load mode collocation three chemical etching unit and two stage cleaning units is set, can require elasticity to select to use the chemical etching unit according to maintenance needs and chemical etching processing procedure, and utilize the cycle of higher pressure aqueous solution to reach environmental protection and cost-effective effect, put 80 work-ing life and service efficiency very big benefiting all arranged for promoting the electrochemical planarization makeup.
In not conducting of chemical etching unit electric current, and adding traditional chemical etching solution, input has the pattern photoresistance panel through developing, under not conducting current conditions, put 10 through the electrochemical planarization makeup and accurately control the required predetermined chemical etching period of display panel, the simple mode of operation that still transmits continuously in the chemical milling mode just can use same device that organic EL display panel ITO electrode is carried out traditional chemical milling to etch the corresponding pattern of ITO electrode.Electrochemical planarization makeup is put 80 continuous load mode collocation three chemical etching unit and two stage cleaning units is set, can require elasticity to select to use the chemical milling unit according to maintenance needs and processing procedure, and utilize the cycle of higher pressure aqueous solution to reach environmental protection and cost-effective effect, 80 work-ing life and service efficiencies in traditional chemical milling are put in makeup for the lifting electrochemical planarization all very big benefiting.
In sum, no matter the design is with regard to purpose, means and effect, show that all it is totally different in the feature of known technology, it should be noted, above-mentioned many embodiment only give an example for convenience of explanation, the claim that the design advocated should be as the criterion so that claim is described certainly, but not only limits to the foregoing description.
Claims (16)
1, a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode comprises:
One chemical etching unit, be used to provide a chemical etching liquid, so that this chemical etching liquid is evenly distributed on the organic EL display panel surface, it soaks organic EL display panel and places chemical etching or spray chemical etching liquid in this organic EL display panel, and making current makes electric current pass through the lip-deep indium-tin oxide electrode of organic EL display panel;
One cleaning unit is connected with this rearmost end chemical etching unit, is used for spraying a circulating cleaning fluid or fresh cleaning solution, with remove on this organic EL display panel residual chemical etching liquid;
One delivery unit is connected with this a plurality of chemical etchings unit, this cleaning unit respectively, and in the mode of continuous transmission this organic EL display panel is orderly sent in this a plurality of chemical etchings unit and this cleaning unit; And
One control unit is used for controlling the load mode and the delivery time of this delivery unit, accurately to control the treatment time of this organic EL display panel in each unit;
2, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 1 is characterized in that, also comprises a unit that dries up that is connected in after the cleaning unit, with the panel after the dry cleansing unit cleaning.
3, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 1, it is characterized in that, wherein comprise a download unit in addition, be connected with this cleaning unit, can load the display panel that this finishes electrochemical etch process, or provide a buffer zone to make this panel substrate directly enter follow-up processing procedure module.
4, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 1, it is characterized in that, wherein comprise a chemical etching power supply provisioning controller, electric current is imported the indium-tin oxide electrode of organic electroluminescent display substrate.
5, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 1, it is characterized in that, wherein include at least one air knife, be located at the unitary end of this chemical etching, be used for blowing down the air knife of chemical etching liquid unnecessary on this organic EL display panel surface.
6, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 1, it is characterized in that, wherein include a chemical etching liquid and reclaim the unit, be used for reclaiming this used chemical etching liquid and recycling being provided, and a chemical etching liquid temp heating controller, be used for controlling the temperature condition of electrochemical etch process.
7, a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode comprises:
One chemical etching unit, be used to provide a chemical etching liquid, so that this chemical etching liquid is evenly distributed on the organic EL display panel surface, it soaks organic EL display panel and places chemical etching or spray chemical etching liquid in this organic EL display panel, and making current makes electric current pass through the lip-deep indium tin of organic EL display panel oxidizing electrode;
One first section cleaning unit is connected with this rearmost end chemical etching unit, is used for spraying a wash cycles, with tentatively remove on this organic EL display panel residual chemical etching liquid;
One second section cleaning unit is connected with this first section cleaning unit, is used for spraying a fresh cleaning solution, with remove fully on this organic EL display panel residual chemical etching liquid
One delivery unit, be connected with this a plurality of chemical etchings unit, this cleaning unit respectively, and this organic EL display panel is orderly sent in this a plurality of chemical etchings unit and this first section cleaning unit, in second cleaning unit in the mode of continuous transmission; And
One control unit is used for controlling the load mode and the delivery time of this delivery unit, accurately to control the treatment time of this organic EL display panel in each unit;
Wherein this delivery unit is in the mode of continuous transmission, this organic EL display panel is orderly sent to this chemical etching unit, in first cleaning unit and second cleaning unit, finishing this planarization processing procedure, so this electrochemistry erosion planarizer can accurately be controlled this predetermined chemical etching time.
8, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 7 is characterized in that, comprises also that wherein one is connected in the unit that dries up of cleaning unit, with the panel after the dry cleansing unit cleaning.
9, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 7, it is characterized in that, another download unit wherein, a download unit that is connected with this cleaning unit, can load the display panel that this finishes electrochemical etch process, or provide a buffer zone to make this panel substrate directly enter follow-up processing procedure module.
10, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 7, it is characterized in that, wherein include at least one air knife in addition, be located at the unitary end of this chemical etching, be used for blowing down chemical etching liquid unnecessary on this organic EL display panel surface.
11, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 7, it is characterized in that, wherein comprise a chemical etching liquid and reclaim the unit, be used for reclaiming this used chemical etching liquid and recycling being provided, and a chemical etching liquid temp heating controller, be used for controlling the temperature condition of electrochemical etch process.
12, a kind of chemical etching planarizer of organic EL display panel indium-tin oxide electrode comprises:
A plurality of chemical etching unit that are used to provide a chemical etching liquid, be used to provide a chemical etching liquid, so that this chemical etching liquid is evenly distributed on the organic EL display panel surface, it soaks organic EL display panel and places chemical etching liquid or spray chemical etching liquid in this organic EL display panel, and making current makes electric current pass through the lip-deep indium tin of organic EL display panel oxidizing electrode;
One first section cleaning unit is connected with this rearmost end chemical etching unit, is used for spraying a circulating cleaning fluid, with tentatively remove on this organic EL display panel residual chemical etching liquid;
One second section cleaning unit is connected with this first section cleaning unit, is used for spraying a fresh cleaning solution, with remove fully on this organic EL display panel residual chemical etching liquid
One delivery unit, be connected with this a plurality of chemical etchings unit, this cleaning unit respectively, and this organic EL display panel is orderly sent to this a plurality of chemical etchings unit, and in this first section cleaning unit, in second cleaning unit in the mode of continuous transmission; And a control unit, be used for controlling the load mode and the delivery time of this delivery unit, accurately to control the treatment time of this organic EL display panel in each unit.
13, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 12, it is characterized in that, comprise also that wherein one is connected in the unit that dries up after the cleaning unit, with the panel after dry second section cleaning unit cleaning.
14, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 12, it is characterized in that, wherein include a download unit in addition, be connected with this cleaning unit, can load the display panel that this finishes electrochemical etch process, or provide a buffer zone to make this panel substrate directly enter follow-up processing procedure module.
15, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 12, it is characterized in that, wherein include at least one air knife in addition, be located at the unitary end of this chemical etching, be used for blowing down chemical etching liquid unnecessary on this organic EL display panel surface.
16, the chemical etching planarizer of organic EL display panel indium-tin oxide electrode according to claim 12, it is characterized in that, wherein comprise a chemical etching liquid and reclaim the unit, be used for reclaiming this used chemical etching liquid and recycling being provided, and a chemical etching liquid temp heating controller, be used for controlling the temperature condition of electrochemical etch process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN01232335U CN2492564Y (en) | 2001-08-16 | 2001-08-16 | Electrochemical etching flattening device for indium-tin oxide electrode on organic electroluminescent display panel |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN01232335U CN2492564Y (en) | 2001-08-16 | 2001-08-16 | Electrochemical etching flattening device for indium-tin oxide electrode on organic electroluminescent display panel |
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| CN2492564Y true CN2492564Y (en) | 2002-05-22 |
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|---|---|---|---|
| CN01232335U Expired - Fee Related CN2492564Y (en) | 2001-08-16 | 2001-08-16 | Electrochemical etching flattening device for indium-tin oxide electrode on organic electroluminescent display panel |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100365847C (en) * | 2005-02-26 | 2008-01-30 | 吉林大学 | Method for treating indium-tin oxide electrode of organic electroluminescent device |
| CN100513340C (en) * | 2004-03-17 | 2009-07-15 | 西山不锈化学股份有限公司 | Glass panel surface etching method and apparatus, glass panel and flat display |
| CN102163614A (en) * | 2011-01-13 | 2011-08-24 | 昆山维信诺显示技术有限公司 | Non-silicon-based organic light-emitting micro-display device as well as preparation method and application thereof |
| CN101221355B (en) * | 2007-11-28 | 2012-02-01 | 上海广电电子股份有限公司 | Cleaning method and device for photo-etching mask plate in manufacture process of organic electroluminescence device |
| CN102691093A (en) * | 2012-06-20 | 2012-09-26 | 哈尔滨工业大学 | Method for rapidly corroding and patterning indium tin oxide surface by using electrochemical technology |
| CN104124147A (en) * | 2013-04-27 | 2014-10-29 | 上海和辉光电有限公司 | An etching machine and a method for cleaning crystals of the etching machine |
| CN113106533A (en) * | 2021-04-06 | 2021-07-13 | 南京航空航天大学 | Flat jet flow electrolytic etching device and method for metal electric heating wire |
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2001
- 2001-08-16 CN CN01232335U patent/CN2492564Y/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100513340C (en) * | 2004-03-17 | 2009-07-15 | 西山不锈化学股份有限公司 | Glass panel surface etching method and apparatus, glass panel and flat display |
| CN100365847C (en) * | 2005-02-26 | 2008-01-30 | 吉林大学 | Method for treating indium-tin oxide electrode of organic electroluminescent device |
| CN101221355B (en) * | 2007-11-28 | 2012-02-01 | 上海广电电子股份有限公司 | Cleaning method and device for photo-etching mask plate in manufacture process of organic electroluminescence device |
| CN102163614A (en) * | 2011-01-13 | 2011-08-24 | 昆山维信诺显示技术有限公司 | Non-silicon-based organic light-emitting micro-display device as well as preparation method and application thereof |
| CN102691093A (en) * | 2012-06-20 | 2012-09-26 | 哈尔滨工业大学 | Method for rapidly corroding and patterning indium tin oxide surface by using electrochemical technology |
| CN104124147A (en) * | 2013-04-27 | 2014-10-29 | 上海和辉光电有限公司 | An etching machine and a method for cleaning crystals of the etching machine |
| CN113106533A (en) * | 2021-04-06 | 2021-07-13 | 南京航空航天大学 | Flat jet flow electrolytic etching device and method for metal electric heating wire |
| CN113106533B (en) * | 2021-04-06 | 2022-02-18 | 南京航空航天大学 | Flat jet flow electrolytic etching device and method for metal electric heating wire |
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