JP4071220B2 - Manufacturing method of glass substrate - Google Patents

Description

  The present invention relates to a method for manufacturing a glass substrate for flat panel display, which etches the surface of a glass plate.

  A display for displaying an image is being made thinner. A thin display is a flat panel display (FPD). Examples of the FPD include an electroluminescence display (ELD), a liquid crystal display (LCD), and a plasma display (PDP).

  In a display panel used for FPD, a glass plate is used as a constituent member. FIG. 9 is a diagram illustrating an example of an ELD panel which is one of FPDs. FIG. 9A is a perspective view of an ELD panel, and FIG. 9B is a schematic cross-sectional view taken along line EE in FIG. 9A. The ELD panel shown in FIG. 9 has a structure in which an EL element 29 is laminated on the surface of a transparent plate 26 serving as an image display surface. The EL element 29 is connected to lead leads 27 and 28 for connection to an external power source. The EL element 29 is sealed from the outside by a cap 25.

The cap 25 is made of metal, organic polymer, or glass. When the EL element 29 on the surface of the transparent plate 26 is sealed using a glass cap using glass, the glass cap can be manufactured by forming a recess on the surface of the glass plate by etching. Patent Document 1 describes a method of manufacturing a glass cap by etching a glass plate surface.
JP 2004-22291 A

  The method for producing a glass cap described in Patent Document 1 is a glass plate on which the masking agent is coated with a predetermined pattern on the surface of the glass plate, and then the glass plate is dipped in an etching solution to cover the masking agent. In this method, a glass cap is manufactured by etching to form a recess on the surface.

  In the case of etching a glass plate, in order to form a stable recess on the glass plate surface, it is necessary to control the temperature of the etching solution to a constant temperature and make the temperature distribution in the etching solution uniform. In order to make the temperature distribution in the etching solution uniform, for example, mechanical stirring or a method of stirring by generating bubbles in the etching solution is used. If the method described in Patent Document 1 is used while stirring the etching solution, the following two problems are likely to occur: the bottom curved surface of the glass surface recess and the masking agent peeling off.

  FIG. 10 is a schematic cross-sectional view showing a change on the glass surface when a glass plate is etched by being immersed in an etching solution. FIG. 10A is a diagram showing a process in which a concave portion is formed on the surface of the glass plate 30 by immersing the glass plate 30 coated with the masking agent 31 in the etching solution, and FIG. It is a figure showing the glass plate 30 which formed the recessed part in the surface. FIG. 11 is an enlarged view of a broken line portion of FIG. FIG. 11A is an enlarged view of the broken line part of FIG. 10A, and FIG. 11B is an enlarged view of the broken line part of FIG.

  As shown in FIG. 11A, in the process of etching the surface of the glass plate 30 by immersing the glass plate 30 whose surface is coated with the masking agent 31 in the etching solution, the liquid flow 34 of the etching solution is being formed. It flows along the side surface of the recess. This liquid flow 34 has a liquid flow that collides with the bottom surface of the concave portion from the vertical direction, but since there is a masking agent that is not etched, the liquid flow 34 has a square shape so as to draw a gentle arc. There is also a flowing liquid stream.

  If the liquid flow 34 flows in the shape of a letter, the etching solution existing near the corner 32 at the bottom of the recess on the glass surface during the formation is slower in flow than other etching solutions and is dissolved by etching. The glass concentration is increased. As a result, the etching rate of the corner 32 of the recess is reduced. This decrease in speed causes a problem that the shape of the recess formed on the glass plate surface is curved.

  On the other hand, the peeling of the masking agent 31 covering the surface of the glass plate 30 is caused by the etching solution entering the slight gap 33 existing between the glass plate 30 and the masking agent 31. The peeling of the masking agent causes a problem that the surface of the glass plate 30 that does not need to be etched is etched.

  When etching is performed by immersing the glass plate in the etching solution thus stirred, two problems that the bottom surface of the recess is curved and the masking agent is peeled off easily occur. When these problems occur, the shape of the concave portion on the surface of the glass plate 30 becomes a shape that is difficult to predict, so the shape uniformity of the formed concave portion is deteriorated.

  In view of the circumstances as described above, the first object of the present invention is to provide a glass substrate for flat panel display capable of uniformly supplying an etching solution to the glass surface during the etching process of the glass surface and performing uniform etching. It is to provide a manufacturing method.

  In addition, the second object of the present invention is to peel off the masking agent when the etchant enters through the gap between the glass plate and the masking agent even when the masking agent is coated on the surface of the glass plate with a predetermined pattern. It is providing the manufacture of the glass substrate for flat panel displays which can suppress this.

The present invention comprises a masking step of forming a predetermined opening pattern to coat the surface of the glass plate with a masking agent, and supporting the glass plate surface coated with the masking agent substantially horizontally with the bottom surface facing the bottom surface. An etching solution is sprayed from below to etch an uncovered exposed portion of the glass plate surface and a cleaning step to remove the etching solution from the glass plate in this order, It is a manufacturing method of the glass substrate for flat panel displays which forms a recessed part in the surface . The spray of the etching solution is preferably sprayed with a mist-like etching solution.

It is preferable that the glass plate is stored and etched in a storage unit having an opening corresponding to the exposed portion . According to such a method, since the glass plate is etched without coming into contact with the outside, damage to the glass plate during etching can be prevented, and furthermore, the glass plate moves in the glass plate storage unit. This prevents the glass plate from colliding with the glass plate storage unit and being damaged.

When the method of the present invention is used, a glass exposed surface that is not coated with a masking agent becomes a recess by etching.

In the etching step, the glass plate is made substantially horizontal, and an etching solution is sprayed on the bottom surface of the glass plate to etch the surface of the glass plate . Further, the glass plate surface may be etched by spraying an etching solution on the opposite surface of the bottom surface of the glass plate. It is preferable that the glass plate is truly horizontal.

  It is preferable that the said collection | recovery apparatus is what sends the collect | recovered etching liquid to the said etching liquid storage tank. Further, it is preferable that the recovery device includes one or more sludge removing devices so that sludge in the etching solution can be removed. Examples of the sludge removal device include a filter, a filter press, a hydrocyclone, and a sedimentation tank.

According to the invention having the above configuration, etching is performed by spraying the etching solution uniformly on the surface of the glass plate without immersing the glass plate in the etching solution, so that highly uniform etching of the glass surface can be realized. Moreover, since the masking agent is pressed by the sprayed etchant, peeling of the masking agent during etching is suppressed.

  The glass plate surface etching method according to the present invention includes a masking agent coating step of coating a masking agent on the glass plate surface with a predetermined pattern, and spraying an etching solution onto the glass plate surface coated with the masking agent with the predetermined pattern. By passing through an etching step for etching the glass plate surface, an etching solution removal step for removing the sprayed etching solution from the glass plate, and a masking agent removal step for removing the masking agent coated on the glass plate surface Done. In the etching step, the etching solution is preferably sprayed from a substantially vertical direction with respect to the glass plate surface.

  FIG. 2 is a view showing the glass plate 19 coated with the masking agent 20. Fig.2 (a) is a top view of the glass plate 19, and FIG.2 (b) is sectional drawing between AA of Fig.2 (a). The glass plate 19 in FIG. 2 is coated with a masking agent 19 so that nine unmasked rectangular openings are arranged at predetermined positions. If it is necessary to prevent the opposite surface of the surface of the glass plate 19 coated with the masking agent 20 from being etched, the opposite surface may be coated with a masking agent, and a predetermined concave pattern is formed on the opposite surface. May be coated with a masking agent corresponding to the concave pattern.

  The masking agent can be coated in the masking agent coating step by a screen printing method, a laminate film method, or a resist coating photolithography method. In addition, a known masking agent coating method may be employed.

  In the screen printing method, a screen having a portion through which the masking agent passes and a portion through which the masking agent does not pass is brought into contact with the surface of the glass plate, and the masking agent is extruded from the portion of the screen through which the masking agent can pass. This is a method of coating. The laminate film method is a method in which a film having an adhesive layer on one side is used as a masking agent, and this film is attached to a glass surface. The resist coating photolithography method is a masking method in which a photoresist is applied to the surface of a glass plate and then light is applied to the applied photoresist. It is preferred to coat the masking agent using a screen printing method.

  It is preferable to use the etching apparatus according to the present invention in the etching step and the etching solution removing step. FIG. 1 is a schematic view of an etching apparatus according to the present invention. The etching apparatus of FIG. 1 collects from the etching chamber 1 an etching chamber 1 that etches the glass plate surface, an etching solution storage tank 3 that stores the etching solution fed into the etching chamber 1, and an etching solution after use. An etching solution recovery device 4, an etching solution removal chamber 2, and a water storage tank 5 that stores water fed into the etching solution removal chamber 2 are provided.

  In the etching chamber 1, an etching solution spray nozzle 8 that sprays a glass plate supporting portion and an etching solution toward the glass plate is provided. Further, in the vicinity of the outlet in the etching chamber 1, an air knife for removing the etching solution is arranged so that air can be blown onto the etched glass plate. The bottom surface in the etching chamber 1 is an inclined bottom surface for efficiently recovering the etching solution sprayed from the nozzle 8 and sprayed on the glass plate.

  A glass plate support part can support a glass plate in the state which can fix or move a glass plate. It is preferable that this glass plate support part can be supported substantially horizontally. In addition, it is good for a glass plate support part to accommodate and support a glass plate in the glass plate storage unit 6 mentioned later. The glass plate support part in the etching chamber 1 in this embodiment is provided with a transport roller 7 that can transport a glass plate storage unit 6 that stores a glass plate serving as a glass plate transport device in a horizontal position.

If the glass plate storage unit 6 is supported by the transfer rollers from the front and back in the transfer direction, the glass storage unit 6 may fall between the transfer rollers, and the glass plate surface area on which the etching solution can be sprayed is reduced. Therefore, the conveyance roller can support the left and right ends in the conveyance direction of the glass plate storage unit 6. In the present embodiment, the transport rollers 7 are arranged at an appropriate interval so that the glass plate storage unit 6 can be transported while supporting the bottom end of the glass plate storage unit 6. The transport roller 7 has a shape in which a cylindrical roller serving as a base and a cylindrical roller having a smaller diameter than that of the roller are connected by a vertical plane of both rollers. The central axes of the two cylindrical rollers constituting the transport roller are positioned on a straight line. The glass plate storage unit 6 is supported by the small-diameter roller of the transport roller 7. In addition, although the conveyance roller 7 of this embodiment is arrange | positioned so that the bottom end of the glass storage unit 6 may be supported, in order to pinch and convey the glass storage unit 6, another conveyance roller is glass-stored. The unit 6 may be provided to face the conveying roller 7 that supports the bottom end of the unit 6. In this case, it can suppress that the glass storage unit 6 moves with an etching liquid.

  The etchant spray nozzle 8 may be selected from a nozzle capable of spraying the etchant in a mist form. One-fluid nozzle for spraying only the etchant or a two-fluid nozzle for spraying the etchant and gas after mixing them Either of these may be used.

The arrangement of the nozzle 8 is arranged so that the etching solution can be sprayed toward the glass plate from below the glass plate being conveyed. The nozzles are preferably arranged so that the etching solution is sprayed onto the glass plate surface from a direction substantially perpendicular to the glass plate surface. And the nozzle 8 is suitably arrange | positioned so that etching liquid can be sprayed uniformly on the whole etching object surface of a glass plate. Incidentally, but it may also be arranged so that it can also be injected from above the glass plate carrying the nozzle 8. Further, the nozzle 8 may be provided so as to be reciprocally movable in parallel with the glass plate surface.

  The nozzle 8 is connected to the etching solution storage tank 3 by piping. A pump 9 for feeding the etching solution in the etching solution storage tank 3 to the nozzle 8 is provided in the middle of the piping between the nozzle 8 and the etching solution storage tank 3.

  The etchant storage tank 3 is provided with a pump 11 and a filter 12 that serve as a stored etchant sludge removal device for removing sludge generated in the etchant in the etchant storage tank 3. Since the filter 12 removes sludge, one or more kinds of sludge removing devices such as a filter, a filter press, a hydrocyclone, and a sedimentation tank that can remove sludge are selected, and the filter 12 It may be replaced.

  The etching solution storage tank 3 is further provided with a stirring device 10 capable of stirring the etching solution inside the etching solution storage tank 3. Further, an etching solution heating device and a cooling device for controlling the temperature of the etching solution (not shown) to keep them constant are provided. By keeping the temperature of the etching solution constant, the etching rate of the glass surface is stabilized.

  The pump 11 and the filter 12 are provided outside the etching solution storage tank 3 together with piping so that the etching solution can be circulated. The etching solution in the storage tank 3 is sucked and sent to the filter 12 by the pump 11, and flows into the storage tank 3 after passing through the filter 12. By allowing the etching solution to pass through the filter 12 in this way, it is possible to remove sludge that has been deposited in the etching reservoir 3 later.

  In the etching solution storage tank 3, an aqueous solution containing a glass-soluble chemical is stored as an etching solution. An aqueous solution containing a fluoride may be used as the glass-soluble chemical, and examples of the fluoride include hydrogen fluoride, ammonium fluoride, potassium fluoride, and sodium fluoride. Further, the etching solution may contain an inorganic acid and / or an organic acid. As the inorganic acid, one or more kinds may be selected from hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid and the like, and as the organic acid, one kind or two kinds or more may be selected from acetic acid, succinic acid and the like. Further, one or more of an anionic surfactant and an amphoteric surfactant may be added to the etching solution. Examples of the anionic surfactant include sulfonate surfactants. Examples of amphoteric surfactants include amine surfactants. This etching solution is kept at a constant temperature in a temperature range of 10 to 50 ° C.

  The etching solution recovery device 4 is a device in which a pump 13 for sending an etching solution from the etching chamber 1, open / close valves 15a and 15b, and filters 14a and 14b are connected by piping. One end of this pipe is connected to the bottom of the etching chamber 1. The other end of the pipe is connected to the etching solution storage tank 3 or an etching solution recovery tank (not shown), and is connected to the etching solution storage tank 3 in this embodiment. The pump 13, the on-off valve 14, and the filter 15 are arranged in this order from the etching chamber 1 side. With this etching apparatus, when the etching solution in the etching chamber 1 is sent and collected to the etching solution storage tank, sludge in this etching solution can be removed by the filters 15a and 15b.

  The on-off valves and filters in the etching apparatus are provided with a plurality of on-off valves and filters. In this embodiment, two on-off valves 15a and 15b and filters 14a and 14b are provided. The on-off valves 15a and 15b and the filters 14a and 14b have one on-off valve 15a and one filter 14a connected in series, and the other on-off valve 15b and another filter 14b connected in series. Furthermore, the on-off valve 15a and the filter 14a connected in series, and the on-off valve 15b and the filter 14b are connected in parallel. When the etching apparatus according to this embodiment is used, when one of the on-off valves is open, the other on-off valve is used in a closed state. For this reason, the etching solution in the etching chamber 1 can be recovered without interruption.

  Since the filter used in the etching solution recovery device 4 removes sludge present in the used etching solution, this filter may be replaced with another sludge removal device. Examples of the sludge removal device include a filter, a filter press, a hydrocyclone, and a sludge settling tank.

  The etchant removal chamber 2 is provided with a transport roller 18 that can transport the glass plate storage unit 6 unloaded from the etch chamber 1 in a horizontal position. Moreover, the nozzle 16 for injecting and cleaning water from the upper and lower sides of the glass plate conveyance unit 6 being conveyed can wipe the water uniformly on the glass plate conveyance unit 6 and the glass plate in the unit. Arranged appropriately. The bottom portion in the etching solution removal chamber 2 is an inclined bottom portion for efficiently collecting water sprayed from the nozzle 16 and sprayed onto the glass plate.

  The conveyance rollers 18 in the etching solution removal chamber 2 can support both left and right ends of the glass plate storage unit 6 in the conveyance direction. The transport roller 18 is arranged so as to be supported from the bottom surface of the storage unit 6. Similarly to the transport roller in the etching chamber 1, the glass plate storage unit 6 can be transported while sandwiching the top and bottom of the end of the glass plate storage unit 6 so as to face each other at an appropriate interval. And a conveyance roller may be arranged.

  The nozzle 16 in the etching solution removal chamber 2 is connected to the water storage tank 5 by piping. A pump 17 for feeding the etching solution in the water storage tank 5 to the nozzle 16 is provided in the middle of the piping between the nozzle 16 and the water storage tank 5.

  Etching of the glass plate surface and removal of the etchant from the glass plate are performed using the etching apparatus. Etching of the glass plate surface is performed by transporting the glass plate to which the masking agent has been applied in the etching chamber 1 of the glass etching apparatus. On the other hand, removal of the etching solution from the glass plate is performed by transporting the inside of the etching solution removing chamber 2 by the glass plate storage unit 6 after transporting the inside of the etching chamber 1. In the present embodiment, the glass plate stored in the glass plate storage unit 6 is transported through the etching chamber 1 and the etchant removal chamber 2 to etch the surface of the glass plate and remove the etchant from the glass plate.

  FIG. 3 is a view for explaining the glass plate storage unit 6 in which the glass plate 19 coated with the masking agent 20 of FIG. 2 is stored. 3A is an exploded view of the glass plate storage unit 6 that stores the glass plate 19 coated with the masking agent 20 of FIG. 2, and FIG. 3B is the glass plate shown in FIG. FIG. 6 is a cross-sectional view of the container 6b of the storage unit 6 between BB. The glass plate storage unit 6 has a container 6b having a bottom slightly larger than the bottom of the glass plate 19 coated with the masking agent 20 and having an opening 6c at the bottom, and the glass plate 19 is stored in the container 6b. After that, it consists of a pressing plate 6a for fixing the glass plate 19. Since the glass plate 19 is conveyed by the conveyance roller 7 in the state of being accommodated in the storage unit 6 and the surface of the glass plate 19 is not in contact with the conveyance roller 7, damage to the surface of the glass plate 19 is prevented. Moreover, since the edge part of the glass plate 19 is clamped and fixed by the holding plate 6a after accommodating the glass plate 19 in the container 6b, it will be prevented that the glass plate 6 moves within the glass plate storage unit 6, As a result, breakage of the end portion of the glass plate 19 is also prevented.

  The opening 6c at the bottom of the container 6b is formed by taking a lattice-like shape at the bottom of the container 6b so that the etching solution can be sprayed onto the surface of the glass plate 19 that is not coated with the masking agent. In the present embodiment, since there are nine portions on the surface of the glass plate 19 that are not covered with the masking agent 19, the nine openings 6c on the bottom surface of the container 6b are arranged uniformly. In addition, when etching the glass plate surface without coating the masking agent 20 on the glass plate surface, the opening 6c should be widely provided on the bottom surface of the container 6b to such an extent that the glass plate can be supported. good.

  The pressing plate 6a is a single plate having no through-holes. However, when it is necessary to etch the surface opposite to the masking agent 20 covering surface of the glass plate 19, an opening may be provided on the opposite surface. .

  The glass plate 19 is stored in the glass plate storage unit 6 by fitting the glass plate 19 into the container 6b with the masking agent 20-coated surface as the bottom surface, and pressing the glass plate 19 with the holding plate 6a. . The glass plate 19 is stored in the glass plate storage unit 6 so that the glass plate is conveyed horizontally in the etching chamber 1.

  The glass plate is etched and removed while the glass storage unit 6 is transported through the etching chamber 1 and the etching solution removal chamber 2 of the etching apparatus in which the following operation occurs.

  The etching liquid kept at a constant temperature stored in the etching liquid storage tank 3 is supplied to the nozzle 8 in the etching chamber 1 by the pump 9. The nozzle 8 to which the etching solution is supplied sprays the etching solution substantially perpendicularly to the glass plate surface and uniformly. The etchant after spraying gathers at the bottom of the etching chamber 1, the collected etching solution is sucked from the etching chamber 1 by the pump 13 of the etching solution recovery device 4, and the etching solution discharged from the pump 13 is filtered by the filter 14 a. Alternatively, after passing through 14b, the solution is sent to the etching solution storage tank 3.

  The water stored in the water storage tank 5 is supplied to the nozzle 16 through the pump 17. The supplied water is sprayed from the nozzle 16 toward the glass plate. The sprayed water collects at the bottom of the etchant removal chamber 2, and the water collected at the bottom is discharged from the etchant removal chamber by opening a valve provided at the bottom of the etchant removal chamber 2. The

FIG. 4 is a plan view illustrating a state in which the glass plate storage unit 6 is transported in the glass etching chamber by the transport roller 7. FIG. 5 is a schematic cross-sectional view taken along the line CC in FIG. The glass plate storage unit 6 is conveyed while its bottom surface is supported by a small-diameter cylindrical roller of the conveyance roller 7. At this time, it is suppressed that the glass plate storage unit 6 swings to the left and right in the traveling direction because the cylindrical roller connected to the small-diameter cylindrical roller restricts the swing range of the left and right. become.
Further, as the glass plate storage unit 6 is transported horizontally, the glass plate 19 in the unit 6 is transported horizontally. Since the etching amount on the glass surface is related to the contact time between the glass surface and the etching solution, the conveyance speed is appropriately changed depending on the target etching amount on the glass surface. After the glass storage unit 6 is transported through the etching chamber 1, the glass storage unit 6 is subsequently transported to the etchant removal chamber 2, whereby the etching solution is removed.

  FIG. 6 is a diagram for explaining a process in which the surface of the glass plate 19 is etched. FIG. 6A is a diagram in which the glass plate 19 covered with the masking agent 20 of FIG. 2B is turned upside down. The glass plate 19 has a surface shape before etching.

  FIG. 6B is a view showing a state where an etching solution is sprayed on the glass plate 20 coated with the masking agent 20. Etching is performed by spraying an etching solution on the surface of the glass plate 19 that is not coated with the masking agent 20, and a concave portion is formed on the surface of the glass plate surface 19. FIG. 7 is an enlarged view of a broken line portion of FIG. Since the etching liquid is sprayed 22 on the glass plate 19, the etching liquid reaches the corners of the concave portions to be formed, and the concave portions can be formed in which the curved bottom surface of the concave portions is suppressed. Moreover, even if the sludge generated by the reaction between the glass and the etching solution adheres to the concave portion to be formed, it is immediately removed. Even if there is a gap 21 between the glass plate 19 and the masking agent 20, the masking agent 20 is pressed by the spray 22 of the etching solution, and the etching solution enters the gap 21 and suppresses the expansion of the gap 21. , Peeling of the masking agent 20 is suppressed.

  FIG. 6C is a view showing the glass plate 19 from which the etching solution is removed and the masking agent 20 is removed after the etching of the surface of the glass plate 19 is completed.

  The glass plate 19 etched as described above can be cut with a predetermined cutting pattern and used for a glass cap of an ELD panel. Moreover, it is possible to manufacture ELD using the ELD panel using this glass cap.

In the above embodiment, an embodiment in which the masking agent is coated on the glass plate surface is shown, but the glass plate may not be coated with the masking agent. However, this is not within the scope of the present invention. In addition, the glass plate which is not coat | covered with a masking agent can be used for an LCD panel or a PDP panel.

  FIG. 8 is a view for explaining a glass plate storage unit 23 that stores a glass plate 24 that is not coated with a masking agent. Fig.8 (a) is an exploded view of the glass plate storage unit 23 which accommodated the glass plate 24, FIG.8 (b) is DD of the container 23b of the glass plate storage unit 23 shown to Fig.8 (a). FIG. A glass plate that can be used for an LCD panel or a PDP panel is etched using, for example, a glass plate storage unit shown in FIG. Similar to the storage unit 6 shown in FIG. 3, the glass plate storage unit 23 includes a container 23 b that can store the glass plate 24 and a pressing plate 23 a that presses the glass plate 24 stored in the container 23 b. The container 23b is provided with an opening 23c so that an etching solution can be sprayed onto the glass plate. The storage unit 23 shown in FIG. 8 is different from the storage unit 6 shown in FIG. 3 only in that the shape of the opening 23c of the container 23b is a single rectangle. There is no difference from the storage unit shown.

  Moreover, although the said embodiment is an etching method which can be utilized for manufacturing the glass cap used for an ELD panel, according to the pattern which coat | covers a masking agent, the recessed part of various shapes is a glass plate surface. It is also possible to form it on top. For example, a cylindrical concave portion can be formed on the glass surface, and this concave portion can be used as an alignment mark.

  Hereinafter, the recessed part formed by the etching method of this invention is demonstrated based on an Example. After covering the surface of a 400 mm × 500 mm × 0.7 mm glass plate with a masking agent, etching, removal of the etchant, and removal of the masking agent were sequentially performed to form recesses on the glass surface. Details of the masking agent coating and etching operations are as follows.

(Coating with masking agent)
A masking agent was coated on one surface of the glass using a screen printing method. At this time, a rectangular portion not coated with a masking agent was formed.

(etching)
After storing a glass plate coated with a masking agent in a glass plate storage unit consisting of a container having an opening and a pressing plate, etching was performed by spraying a mist-like etching solution on a rectangular portion not covered with the masking agent. .

  The glass plate was stored in the glass storage unit by storing the glass plate in a container having an opening and sandwiching and fixing the glass plate with a pressing plate. The glass plate was accommodated in the container with the glass surface coated with the masking agent facing the opening.

  Spray the mist-like etching solution onto the rectangular part that is not covered with the masking agent by spraying the etching solution onto the rectangular part with the glass storage unit horizontal and the opening at the bottom, almost perpendicular to the rectangular part. It was. The rectangular portion is exposed on the surface of the glass plate, and the etching solution was completely sprayed on the exposed surface of the glass plate.

  The etchant is sprayed using an aqueous solution of 4.0% by weight of hydrogen fluoride and 3.0% nitric acid as the etchant, maintaining the temperature at 25 ± 1 ° C., and etching at 3.2 L / min from the nozzle. The etching solution was sprayed by spraying the solution. At this time, the surface of the glass plate was etched by about 300 μm.

  It was confirmed visually that a recess was formed on the etched glass surface. Moreover, when visually confirmed, peeling of a masking agent was not recognized and it was not confirmed that the square shape of the bottom part of the formed recessed part was curving.

1 is a schematic view of an etching apparatus according to the present invention. It is a figure showing the glass plate with which the masking agent was coat | covered. It is a figure for demonstrating the glass plate storage unit which accommodated the glass plate coat | covered with the masking agent of FIG. It is a top view showing the state by which a glass plate storage unit is conveyed in a glass etching chamber by a conveying apparatus. FIG. 5 is a schematic cross - sectional view taken along the line C-C in FIG. 4. It is a figure for demonstrating the process in which the glass plate surface is etched. It is an enlarged view of the broken-line part of FIG. It is a figure for demonstrating the glass plate storage unit which accommodated the glass plate which is not coat | covered with a masking agent. It is a figure showing an example of the ELD panel which is one of FPD. It is a cross-sectional schematic diagram showing the change on the glass surface in the case of immersing and etching a glass plate in etching liquid. It is an enlarged view of the broken-line part of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Etching chamber 2 Etching solution removal chamber 3 Etching solution storage tank 4 Etching solution recovery device 5 Water storage tank 6, 23 Glass plate storage unit 7, 18 Transport roller 8, 16 Nozzle 9, 11, 13 Pump 12, 14a, 14b Filter 15a, 15b On-off valve 19, 24 Glass plate 20 Masking agent

Claims (3)

A masking step of forming a predetermined opening pattern and covering the glass plate surface with a masking agent;
Etching step of etching the uncoated exposed portion of the glass plate surface by supporting the glass plate surface covered with the masking agent substantially horizontally with the bottom surface and spraying an etchant from below toward the bottom surface. When,
The manufacturing method of the glass substrate for flat panel displays which performs the washing | cleaning process which removes the said etching liquid from the said glass plate in this order, and forms a recessed part in the glass plate surface.   The said glass plate is a manufacturing method of Claim 1 accommodated in the storage unit which has an opening part corresponding to the said exposed part, and is etched.   The manufacturing method according to claim 2, wherein the glass plate stored in the storage unit is fixed by a pressing plate on the glass plate.

Images