JPH11121427A - Substrate processing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which surely prevents the dripping and the mist-state atmosphere of a treatment solution from infiltrating into a second processing part connected to a first processing part through a dividing wall having an opening from the first treatment part where a substrate is processed by being supplied with the treatment solution. SOLUTION: A nozzle 121 is provided in an chemical treatment part 12 on the side close to the upper part of an opening H12 provided between the chemical treatment part 12 and a standby part 11. In the nozzle main body 121a of the nozzle 121, a chemical supply passage 121b is opened, and a chemical supply tube passage 125 is connected to the chemical supply passage 121b. When a pump 127 operates, a chemical is force-fed to the nozzle 121 from a chemical tank 126, is discharged downwards from a chemical outlet 121c through the chemical supply passage 121b and the liquid curtain 51 of the chemical shuts down the opening H12.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a first and a second processing of a plate-like substrate such as a glass substrate for a liquid crystal display device, a semiconductor substrate, a printed substrate and a substrate for a plasma display through an opening in a partition wall. The present invention relates to a substrate processing apparatus that supplies and processes a processing liquid in a first processing unit while transporting between processing units.

[0002]

2. Description of the Related Art An example of this type of substrate processing apparatus is disclosed in Japanese Patent Application Laid-Open No. 9-82775. In this substrate processing apparatus, a standby unit, an etching unit, a washing unit, and a drying unit are linearly connected in this order in a state of being partitioned by a partition wall having an opening for allowing the substrate to pass therethrough. The substrate is conveyed through the opening between them. Then, while transporting the substrate in the order of the standby unit, the etching unit, the washing unit, and the drying unit, the etching unit supplies an etching solution to the substrate to perform the etching process. Replacement water is supplied to perform water washing.

Further, in the above substrate processing apparatus, since the etching process is performed by the etching solution in the etching section, the droplets of the etching solution scattered from the substrate and the mist-like atmosphere are placed adjacent to each other through the opening. There is a possibility that the liquid may enter the washing section or the washing section and adversely affect the processing of the substrate in the standby section or the washing section. Therefore, in order to solve such a problem, a mechanical shutter is provided on a partition wall between the etching unit, the standby unit and the washing unit, and the opening is opened by the mechanical shutter while the etching unit performs the etching process. It is shut off to prevent the droplets of the etching liquid and the mist-like atmosphere from entering the waiting section and the washing section from the etching section.

[0004]

However, when the substrate is carried in from the standby section to the etching section or when the substrate is carried out from the etching section to the washing section, it is necessary to open the mechanical shutter to open the opening. is there. Therefore, in this open state, a gap is formed between the substrate passing through the opening and the opening, and a droplet of the etching liquid or a mist-like atmosphere penetrates the standby section or the washing section from the gap. . As described above, it is difficult to reliably prevent the etchant from entering the adjacent processing unit (standby unit, washing unit) from the etching unit by the mechanical shutter.

[0005] This problem is not limited to the case where the droplets or the mist-like atmosphere of the etching liquid enters the standby section and the washing section from the etching section, but the ion-exchanged water used in the washing section. This is also a problem that occurs when droplets or a mist-like atmosphere enters the etching part. A processing solution such as a chemical solution (developer, etching solution, stripping solution, etc.) or ion-exchange water (pure water) is supplied to the substrate. This is a problem that occurs in the entire substrate processing apparatus in which the second processing unit is connected via a partition wall having an opening to the first processing performed by the first processing unit.

The present invention has been made in view of the above-described problems, and is provided from a first processing unit that supplies a processing liquid to a substrate and processes the processing liquid via a partition wall having an opening. It is an object of the present invention to provide a substrate processing apparatus capable of reliably preventing a droplet of a processing liquid or a mist-like atmosphere from entering a second processing unit connected to a second processing unit.

[0007]

According to a first aspect of the present invention, there is provided a first processing unit for supplying a processing liquid to a substrate to perform processing, and an opening for passing the substrate. A second processing unit disposed adjacent to the first processing unit in a state where the substrate is partitioned by a partition wall having: a substrate transport path between the first and second processing units via the opening; And a liquid curtain forming means for supplying a predetermined liquid in the form of a curtain and blocking the opening inside the first processing section and at a position near the opening. I have.

In the present invention, a predetermined liquid is supplied in a curtain shape inside the first processing unit and at a position near the opening to form a liquid curtain. The liquid curtain blocks the opening and prevents the droplets of the processing liquid and the mist-like atmosphere generated in the first processing unit from entering the second processing unit.

An invention according to a second aspect of the present invention is an auxiliary liquid curtain which is arranged to face the liquid curtain forming means with the substrate transfer path interposed therebetween, and supplies the predetermined liquid to the liquid curtain forming means in a curtain shape. Forming means is further provided. When the substrate is passing through the opening, the liquid curtain formed by the liquid supplied from the liquid curtain forming means contacts one main surface of the substrate over the entire width direction, and the auxiliary The liquid curtain formed by the liquid supplied from the liquid curtain forming means is configured to contact the other main surface of the substrate over the entire width direction.

In the present invention, not only the liquid curtain is formed by the liquid curtain forming means but also another liquid curtain is formed by the auxiliary liquid curtain forming means supplying the liquid to the liquid curtain forming means. . In addition, when the substrate is passing through the opening, the liquid curtain formed by the liquid curtain forming means contacts the entire width direction on one main surface of the substrate, and the liquid curtain formed by the auxiliary liquid curtain forming means is formed on the other main surface. The curtain is in contact over the entire width. In this manner, the two liquid curtains are formed on both the main surface sides of the substrate, respectively, so that the droplets of the processing liquid and the mist-like atmosphere generated in the first processing unit try to enter the second processing unit. Prevent more reliably.

According to a third aspect of the present invention, the predetermined liquid is of the same type as the processing liquid supplied to the substrate in the first processing section.

In the present invention, the liquid curtain is constituted by the same kind of liquid as the processing liquid, and when the substrate passes through the liquid curtain, the liquid (processing liquid) is supplied to the substrate. For this reason, the processing liquid is supplied to the substrate not only in the first processing section but also when the substrate passes through the liquid curtain, so that the processing liquid contacts the main surface of the substrate. A longer time (liquid contact time) can be secured, and the processing efficiency can be improved.

[0013]

FIG. 1 is an explanatory view showing one embodiment of a substrate processing apparatus according to the present invention. In the present embodiment, an apparatus for processing a glass substrate for a liquid crystal display device is employed as a substrate processing apparatus. As shown in the figure, in the substrate processing apparatus 1, an opening H through which a substrate S passes is provided.
A standby section 11, a chemical processing section 12, a washing section 13, and a drying section 14 are connected in series in the transport direction X of the substrate S in a state of being partitioned by a partition wall having 12, H23, and H34.
Note that openings HIN and HOUT for substrate passage are also formed at the upstream end (left end side in the figure) of the standby section 11 and the downstream end (right end side in the figure) of the drying section 14, respectively.

A plurality of drive rollers 20 are provided in each of the parts 11, 12, 13, and 14 at the same height so that their axes are orthogonal to the transport direction X of the substrate S. Is configured. Therefore, by intermittently or continuously driving the drive roller 20, the substrate S is placed in the standby unit 1
1 → opening H12 → chemical solution processing unit 12 → opening H23 → water washing unit 13 → opening H34 → drying unit 14 The substrate is transported along a horizontally extending substrate transport path, and the standby unit 11 and the chemical solution processing unit 12 The substrate S can be reciprocally oscillated by passing, decelerating, or temporarily stopping at each part of the rinsing part 13 and the drying part 14 or by rotating the drive roller 20 forward and reverse.

Then, the substrate S is divided into the respective parts 11, 12, 13,.
At 14, for example, each part 11,
It is configured such that predetermined processing is performed on the substrate S at 12, 13, and 14. Hereinafter, each part 11, 12, 1
After describing the schematic configurations and operations of the components 3 and 14, the features of the present invention will be described in detail with reference to FIGS.

First, the standby unit 11 waits before the substrate S is supplied to the chemical processing unit 12. Note that the standby unit 1
During the standby period in 1, the substrate S may be preliminarily cleaned by air spray or the like.

After the standby in the standby section 11, the substrate S
Is transported to the chemical processing section 12. In the chemical processing section 12, at the position P1 near the opening H12, the transport direction X
The substrate transport path 30 extends so as to sandwich the substrate transport path 30 extending therethrough.
A nozzle 121 for forming a liquid curtain is disposed on the upper side, and a base 122 for forming an auxiliary liquid curtain is disposed on the lower side so as to face the nozzle 121 for forming the liquid curtain. The substrate S is transported to the center of the chemical solution processing unit 12 through the gap between the substrates. In the center, the substrate transport path 30
And a plurality of spray nozzles 123 from the ceiling.
Are suspended, and a plurality of spray nozzles 124 are arranged below the substrate transport path 30 so as to face the spray nozzles 123. Then, these nozzles 121, base 1
The chemical nozzle 22 and the spray nozzles 123 and 124 are connected to a chemical tank 126 by a chemical supply pipe 125, and a pump 127 inserted in the chemical supply pipe 125.
Is operated, a chemical solution such as a developing solution, an etching solution, and a stripping solution stored in the chemical solution tank 126 is pumped.
7 and a filter 128 which is also inserted into the chemical supply pipe 125 to be fed under pressure to the nozzle 121, the base 122 and the spray nozzles 123 and 124. Therefore, at the position P1 near the opening H12, a liquid curtain is formed, and a chemical liquid is supplied to the substrate S from the nozzle 121 and the base 122 to start chemical liquid processing. At the center of the chemical processing section 12, the chemical is supplied to the substrate S in a spray form, and the chemical processing is further performed. In addition, the chemical processing section 1
A return line 129 extends from the bottom of the container 2 to the chemical tank 126, and the used chemical is collected in the chemical tank 126 by the return line 129 so that the chemical can be circulated and used. The chemical processing section 12 is connected to an exhaust pump 42 to exhaust the inside of the processing section.

Next, the substrate S that has been subjected to the chemical treatment is washed with the water washing unit 13.
Transported to In the rinsing section 13, a plurality of spray nozzles 131 hang down from the ceiling of the substrate transfer path 30, and a plurality of spray nozzles 132 are provided below the substrate transfer path 30 in opposition to the spray nozzles 131. Are located. These spray nozzles 131, 132
Is connected to a washing water tank 134 by a washing water supply line 133.
When the pump 135 inserted in the washing water supply pipe 133 is operated, the washing water tank 134
Ion exchange water (pure water) stored in the pump 13
5 and also through a filter 136 inserted in the washing water supply pipe 133 to be sent to the spray nozzles 131 and 132 under pressure. As a result, the plurality of spray nozzles 131, 1
The ion-exchanged water is supplied from 32 to the substrate S in a spray form, and the chemical solution attached to the substrate surface is washed away.
In addition, in this water washing part 13, like the chemical | medical solution processing part 12,
The return line 137 from the bottom of the washing section 13 is the washing water tank 1
34, the used ion exchange water is collected, and the inside of the processing unit is exhausted by the exhaust pump 43.

After the water washing process is performed as described above,
Water transported to the drying unit 14 and adhering to the surface of the substrate S after the cleaning process is removed by an airflow blown from the air knife 141. A return pipe 142 extends from the drying section 14 to the washing water tank 134, and the water removed as described above is collected in the washing water tank 134 via the return pipe 142 and is reused. Is done.

FIG. 2 is a partially cutaway perspective view of the substrate processing apparatus 1 configured as described above, and is a view of the chemical processing section 12 viewed from the standby section 11 side. FIG. 3 is a sectional view of FIG. In both figures, the illustration of the drive roller 20 is omitted.

As shown in these figures, in the substrate processing apparatus 1 according to this embodiment, the nozzle 121 is located inside the chemical solution processing section 12 and near the upper side of the opening H12 provided between the processing section 12 and the standby section 11. It is provided on the side. More specifically, as shown in FIG.
A partition plate 121d extending downward is provided.
A nozzle 121 is fixed below 21d. In FIG. 2, the illustration of the partition plate 121 d is omitted, but the partition plate 121 d has the same length dimension as the width dimension of the chemical processing section 12, and its longitudinal direction is substantially the same as the opening H 12. They are arranged so as to be parallel, and both end portions thereof are in contact with both side walls of the chemical solution treatment section 12, respectively.

The nozzle 121 thus attached to the partition plate 121d is formed of a rectangular parallelepiped block having a predetermined length and at least a length dimension that traverses the substrate S being conveyed. Liquid supply passage 121b perforated in nozzle body 121a
And a liquid discharge port 121 communicating with the liquid supply passage 121b.
c. The chemical supply pipe line 125 is connected to the liquid supply passage 121b. When the chemical liquid is pressure-fed from the chemical tank 126 according to the operation of the pump 127 as described above, the liquid is supplied through the liquid supply passage 121b. The liquid medicine is discharged downward from the discharge port 121c, and the liquid curtain 51 of the liquid medicine is formed so as to block the opening H12. As described above, in this embodiment, the liquid curtain forming means is constituted by the nozzle 121, the chemical supply pipe 125, the filter 128, the pump 127, and the chemical tank 126.

Further, the nozzle 12 is disposed with the substrate transport path 30 interposed therebetween.
A base 122 is arranged so as to face 1. This base 1
Reference numeral 22 denotes a base body 122a formed of a rectangular parallelepiped block having a predetermined thickness set to at least traverse the substrate S being transported, and a liquid supply passage 122b formed in the base body 122a. And the liquid supply passage 12
A liquid discharge port 122c communicating with the liquid discharge port 2b. The chemical supply pipe 125 is also connected to the liquid supply passage 122b, and when the chemical is pumped from the chemical tank 126 in accordance with the operation of the pump 127 as described above, the liquid passes through the liquid supply passage 122b. The chemical liquid is blown upward in a fountain shape from the discharge port 122c, and a liquid curtain 52 of the chemical liquid is formed. As described above, in this embodiment, the base 122, the chemical supply pipe 125, the filter 128, the pump 127, and the chemical tank 126 constitute an auxiliary liquid curtain forming means.

Therefore, when the substrate S is not conveyed to the chemical processing section 12 through the opening H12 (FIG. 3), the two liquid curtains 5 formed as described above are used.
The opening H12 is blocked by the first and the second 52, the atmosphere of the standby unit 11 and the chemical processing unit 12 is separated, and the droplets of the chemical (processing liquid) and the mist-like atmosphere generated in the chemical processing unit 12 are removed. It is possible to prevent an attempt to enter the standby section. When the substrate S is being conveyed to the chemical processing section 12 through the opening H12 (FIG. 4), the liquid curtain 51 is placed on the upper main surface S1 of the substrate S in the width direction on the upper main surface S1 side of the substrate S. While contacting the whole,
The liquid curtain 52 contacts the lower main surface S2 of the substrate S over the entire width direction on the lower main surface S2 side, and
It is possible to prevent the droplets of the chemical solution and the mist-like atmosphere generated in 2 from trying to enter the standby section side.

Moreover, in this embodiment, the partition plate 121
d extends parallel to the opening H12, and both ends thereof are arranged so as to abut both side walls of the chemical processing section 12, so that the liquid droplets and mist-like atmosphere of the chemical liquid generated in the chemical processing section 12 are temporarily provided. Scatters upward, and attempts to invade the standby section side along the ceiling surface of the chemical solution processing section 12, but the partition plate 1
21 d can prevent the liquid droplets and the like of the chemical solution from entering the standby section.

In this embodiment, since the liquid curtains 51 and 52 are formed of the same type of chemical liquid as the chemical liquid used in the chemical liquid processing section 12, the liquid curtains 51 and 52 are formed as shown in FIG. At the time when the liquid is supplied to the substrate S, the chemical processing with the chemical starts, and the substrate S is further transported to the center portion side of the chemical processing section 12 and the spray nozzle 12
When the spray-type chemical solution is supplied from 3, 124, the chemical solution process further proceeds. As described above, the chemical solution is supplied to the substrate S not only when the chemical solution is originally supplied in the chemical solution processing unit but also when the substrate S passes through the liquid curtains 51 and 52. A long solution time can be ensured, and the chemical solution treatment can be performed effectively.

In the above embodiment, as shown in FIG. 3, the nozzle 121 is inclined so that the chemical is discharged from the nozzle 121 toward the downstream side in the transport direction X. The discharge angle θ1 with respect to the direction X is 0
If the angle is not less than ゜ and not more than 90 °, any angle may be set. However, in order to prevent or suppress the generation of backflow or mist due to collision with the liquid curtain 52 or the substrate S, the discharge angle θ1 is set to It is preferable to set the angle in the range of 20 ° to 60 °.

In the above embodiment, the base 122 is provided so as to face the nozzle 121 and the chemical liquid is blown out from the base 122 in the form of a fountain to form the liquid curtain 52. As shown in FIG.
May be arranged facing the nozzle 121 side. Also, similarly to the nozzle 121, the nozzle 122 'is inclined and fixed by a partition plate 122d extending from the bottom surface of the chemical liquid processing section 12, so that the chemical liquid is discharged from the nozzle 122' toward the downstream side in the transport direction X. The discharge angle θ2 with respect to the transport direction X of the chemical solution may be set to any angle as long as it is 10 ° or more and 90 ° or less. In order to prevent or suppress the generation of mist, it is preferable to set the discharge angle θ2 in a range from 20 ° to 60 °. Further, as long as the ejection angles θ1 and θ2 are set in the above range, they may be set to the same value or different values.

In the above embodiment, the substrate transport path 30
Is provided on the lower side of the base, and the liquid curtain 52 is formed. However, only the liquid curtain 51 formed by the chemical discharged from the nozzle 121 is formed, the opening H12 is closed, and the liquid curtain 52 is generated in the chemical processing section 12. The liquid droplets of the chemical solution (processing liquid) and the mist-like atmosphere may be prevented from entering the standby unit 11 side.

In the above embodiment, the nozzle 121,
The chemical solution is supplied under pressure to the base 122 and the spray nozzles 123 and 124 by the chemical solution supply pipe 125 and the chemical solution tank 12.
6, the pump 127 and the filter 128 are commonly used, but the pumping and supply mode is not limited to this. For example, only the chemical tank is shared, and the chemical supply pipe 125, the pump 127 and the filter 128 are used.
Are used for forming a liquid curtain (nozzle 121 and base 122) and for supplying a spray (spray nozzle 12
3 and 124) may be separately and independently prepared. In this case, the timing of forming the liquid curtains 51 and 52 from the nozzle 121 and the base 122 and the spray nozzles 123 and It is possible to independently control the timing at which the chemical solution is supplied to the substrate S by the substrate 124.

In the above embodiment, the chemical processing unit 12
Although the liquid curtains 51 and 52 are formed of the same type of liquid as the chemical liquid (processing liquid) used in the above, the liquid to be discharged from the nozzle 121 and the base 122 is not limited to this, and is different. Liquid curtains 51 and 52 using liquid
May be formed. For example, the liquid curtain 51, which is of the same type as the reused chemical used in the chemical processing section 12, but is not used for the chemical processing at all, is used.
52 may be formed. Conversely, spray nozzle 1
The new liquid may be supplied to the nozzles 23 and 124, while the reused chemical liquid may be supplied to the nozzle 121 and the base 122.

In the above embodiment, the chemical processing unit 12
Inside the liquid curtain 5 at a position P1 near the opening H12.
1 and 52 are formed to prevent the liquid droplets and mist-like atmosphere of the chemical solution generated in the chemical solution processing unit 12 from entering the standby unit 11 side. A liquid curtain is formed at a position P2 (FIG. 1) in the vicinity of the part H23 to prevent the liquid droplets and mist-like atmosphere of the chemical liquid generated in the chemical liquid processing part 12 from entering the washing part 13 side, A liquid curtain is formed in the portion 13 and at a position P3 (FIG. 1) in the vicinity of the opening H23, and droplets of ion-exchanged water (treatment liquid) and a mist-like atmosphere generated by the washing 132 are formed on the side of the chemical treatment section 12 It may be possible to prevent the intrusion into the air.

Further, the object to which the present invention is applied is not limited to the substrate processing apparatus having the processing unit configuration shown in FIG. 1, but a substrate processing apparatus for processing a substrate such as a semiconductor substrate, a printed substrate, and a substrate for a plasma display. Wherein a first processing unit for supplying a processing liquid to the substrate for processing and a second processing unit connected to the first processing unit via a partition wall having an opening are connected to each other. The present invention can be applied to all devices.

[0034]

As described above, according to the substrate processing apparatus of the present invention, a predetermined liquid is supplied in the form of a curtain inside the first processing section and near the opening to form a liquid curtain. Since the opening is blocked by the liquid curtain, it is possible to prevent the droplets and the mist-like atmosphere of the processing liquid generated in the first processing unit from entering the second processing unit. Can be prevented.

[Brief description of the drawings]

FIG. 1 is an explanatory view showing one embodiment of a substrate processing apparatus according to the present invention.

FIG. 2 is a partially cutaway perspective view of the substrate processing apparatus of FIG.

FIG. 3 is a sectional view of FIG. 2;

FIG. 4 is a diagram illustrating an operation of the substrate processing apparatus of FIG. 1;

FIG. 5 is an explanatory view showing another embodiment of the substrate processing apparatus according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Substrate processing apparatus 11 ... Standby part (2nd processing part) 12 ... Chemical liquid processing part (1st processing part) 13 ... Washing part 30 ... Substrate conveyance path 51,52 ... Liquid curtain 121 ... (Liquid curtain formation) nozzle 122 ... (for forming auxiliary liquid curtain) base 122 '... (for forming auxiliary liquid curtain) nozzle 125 ... chemical supply line 126 ... chemical liquid tank 127 ... pump 128 ... filter S1 ... upper main surface (one main surface) S2 ... Lower main surface (other main surface) S: substrate X: transport direction

Claims (3)

[Claims] A first processing unit for supplying a processing liquid to the substrate to perform processing, and a first processing unit adjacent to the first processing unit in a state where the first processing unit is partitioned by a partition wall having an opening through which the substrate passes. A second processing unit disposed in the first processing unit; a transfer unit configured to transfer the substrate between the first and second processing units along the substrate transfer path through the opening; A substrate processing apparatus, comprising: a liquid curtain forming unit that supplies a predetermined liquid in a curtain shape and blocks the opening at a position near the opening. 2. An auxiliary liquid curtain forming means which is arranged opposite to the liquid curtain forming means with the substrate transport path interposed therebetween and supplies the predetermined liquid in a curtain shape toward the liquid curtain forming means. When the substrate is passing through the opening, the liquid curtain formed by the liquid supplied from the liquid curtain forming means contacts one main surface of the substrate over the entire width direction and the auxiliary liquid 2. The substrate processing apparatus according to claim 1, wherein a liquid curtain formed by the liquid supplied from the curtain forming means contacts the other main surface of the substrate over the entire width direction. 3. The substrate processing apparatus according to claim 1, wherein the predetermined liquid is of the same type as a processing liquid supplied to the substrate in the first processing unit.