CN101630635B - glass substrate etching device - Google Patents
glass substrate etching device Download PDFInfo
- Publication number
- CN101630635B CN101630635B CN2009101693266A CN200910169326A CN101630635B CN 101630635 B CN101630635 B CN 101630635B CN 2009101693266 A CN2009101693266 A CN 2009101693266A CN 200910169326 A CN200910169326 A CN 200910169326A CN 101630635 B CN101630635 B CN 101630635B
- Authority
- CN
- China
- Prior art keywords
- glass substrate
- intake line
- valve
- filter group
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to a glass substrate etching device which comprises a reaction chamber, a fixing device, a liquor storage tank and a liquor circulation system, wherein the fixing device is arranged in the reaction chamber and used for vertically fixing glass substrates; the liquor storage tank is communicated with the reaction chamber; the liquor circulation system is communicated with the liquor storage tank, and comprises a plurality of spray nozzles; and the spray nozzles are uniformly distributed upon each glass substrate in one row. The spray nozzles are arranged upon the glass substrates, and are used for spraying liquor from the upper part to form uniformly sprayed liquor on the glass substrates arranged under the spray nozzles, and the etching liquor flows along the sides of the glass substrates. The etching operation can be performed on 0.3mm super-thin plates, the strength of the glass substrates can not be reduced during the etching, and the damage to the glass substrates can not occur.
Description
Technical field
The invention belongs to flat-panel monitor (FPD) engineering field, particularly a kind of Etaching device of glass substrate.
Background technology
In information-based fast-developing modern society, the FPD technology is innovation day by day, is advancing the research work of its procreation product cause simultaneously in full preparation.Therefore, the technology of indispensable thickness of glass substrate attenuation is also constantly developing when making the FPD device.The technology of making FPD plate attenuation in the past is the Ginding process and the chemical wet corrosion method of utilizing acid powder soup by machinery.Along with the continuous development of informationized society, Fa Zhan technical field is mobile FPD field therewith, and the advanced person's of demand ultrathin type, super electricity saving type, super artistic type FPD plate more and more.For above-mentioned chemical wet corrosion mode, with reference to figure 1, former technology is to be equipped for the master with the etching that is ejected into glass at glass plate 105 side arrangement nozzles 104, is about to the glass substrate vertical fixing, from the side the mode of vertical injection on the glass.Because this mode is to applying vertical hitting power on the glass substrate face, therefore very thin glass self intensity decreases, thus damaged probability is big, can't carry out etching operation below the 0.5mm from actual test value simultaneously, is restricted when therefore making ultra-thin template.Fig. 2 is the soup circulating circuit figure of existing chemical wet corrosion etching equipment.At etching soup and the accessory substance mud that 100 li of the reative cells that carries out chemical reaction reflect, assemble storage tank 101 by pipeline, its most of mud all can concentrate at here.Therefore etching soup reproducible utilization sends back to reative cell 100 again by shifting pump 102.At this moment, filter 103 is installed between pipeline, a large amount of mud then can here be filtered.
Summary of the invention
The technical problem to be solved in the present invention provide the ultrathin glass substrate of a kind of 0.3mm of realization etching operation, glass substrate intensity height, can not damaged glass substrate etching device.
For solving the problems of the technologies described above, the present invention adopts following technical scheme:
A kind of glass substrate etching device, comprise reative cell, be positioned at the medicine liquid circulation that reative cell is used for the fixture that the glass substrate vertical fixing is lived, the soup storage tank that communicates with reative cell and communicates with the soup storage tank, medicine liquid circulation comprises several nozzles, and wherein said nozzle is uniform one-tenth one row above every glass substrate.
Glass substrate etching device of the present invention, wherein said medicine liquid circulation also comprises total intake line that import communicates with the soup storage tank, filtration system and total output pipe, filtration system comprises first intake line and second intake line, the outlet of total intake line respectively with the import of first intake line, the import of second intake line links to each other, be in series with valve VA on first intake line successively, the first filter group, valve VC, be in series with valve VB on second intake line successively, the second filter group, valve VD, the outlet of first intake line, the outlet of second intake line links to each other with the import of total output pipe, the top that is positioned at every glass substrate corresponding position is provided with branch's output pipe that links to each other with total output pipe, and described nozzle is installed on branch's output pipe.
Glass substrate etching device of the present invention, wherein said filtration system also comprises the filter regenerative circuit, described filter regenerative circuit comprises backwash intake line and backwash output pipe, the pipeline of described backwash intake line by being in series with valve VE links to each other with first intake line between the valve VC and the first filter group, the pipeline of backwash intake line by being in series with valve VF links to each other with second intake line between the valve VD and the second filter group, the first filter group links to each other with the backwash output pipe by the pipeline that is in series with valve VG with first intake line between the valve VA, and the second filter group links to each other with the backwash output pipe by the pipeline that is in series with valve VH with second intake line between the valve VB.
Glass substrate etching device of the present invention, the filter in the wherein said first filter group and the second filter group is arranged in parallel.
Glass substrate etching device of the present invention, the quantity of the filter in the wherein said first filter group and the second filter group is respectively 1~5.
Glass substrate etching device of the present invention, wherein said fixture comprises support, support is assembled by the crossbeam that is oppositely arranged, longeron and montant, the middle and lower part of montant also is fixed with middle cross beam, evenly be fixed with the brace summer that several parallel with longeron between the crossbeam of bottom, evenly be fixed with several supporting seats on each brace summer, the top of supporting seat has the groove that is used to place glass substrate; On the every crossbeam at top with the every corresponding position of glass substrate, every middle cross beam on be fixed with fixed head respectively with the every corresponding position of glass substrate, be fixed with a fixed lever respectively in the both sides of every glass substrate on the fixed head, have the gap between fixed lever and the glass substrate.
Glass substrate etching device of the present invention, wherein said fixed lever adopt macromolecule resin material to make.
Glass substrate etching device of the present invention, the gap between wherein said fixed lever and the glass substrate are 1~1.5mm.
Glass substrate etching device of the present invention, the place, two angles of wherein said fixed head offers the through hole of oblique glass substrate respectively, one end of described every fixed lever inserts in the through hole and with the fixed head stickup and fixes, and the other end of described every fixed lever is obliquely extended to a side of glass substrate.
Glass substrate etching device of the present invention is arranged on nozzle the top of glass substrate, spray from the top, by nozzle below glass substrate on form the soup that evenly sprays, the etching soup is trickled along glass sides, this mode can realize the etching operation of the ultra-thin template of 0.3mm, can not weaken the intensity of glass substrate in the etching process, also can not cause breakage glass substrate.
Description of drawings
Fig. 1 is the schematic diagram of existing glass substrate etching device spray regime;
Fig. 2 is existing glass substrate etching device soup circulating circuit figure;
Fig. 3 is the main TV structure schematic diagram of glass substrate etching device of the present invention;
Fig. 4 is the end view of fixture and nozzle segment among Fig. 3;
Fig. 5 is the vertical view of Fig. 4;
Fig. 6 is that partial sectional view is amplified at the A place among Fig. 5;
Fig. 7 is the stereogram at fixed lever place;
Fig. 8 is the plan structure schematic diagram at fixed lever place;
Fig. 9 sprays the schematic diagram of mode for glass substrate etching device of the present invention;
Figure 10 is the loop diagram of medicine liquid circulation.
Embodiment
As Fig. 3, Fig. 4 and shown in Figure 10, glass substrate etching device of the present invention, soup storage tank 4 that comprises reative cell 1, is positioned at fixture 3 that reative cell 1 is used for glass substrate 2 vertical fixing are lived, communicates with reative cell 1 bottom by pipeline and the medicine liquid circulation that communicates with soup storage tank 4.Medicine liquid circulation comprises total intake line 5 that import communicates with soup storage tank 4, filtration system 11 and total output pipe 56, filtration system 11 comprises first intake line 52 and second intake line 53, be in series with pump 51 on total intake line 5, the outlet of total intake line 5 respectively with the import of first intake line 52, the import of second intake line 53 links to each other, be in series with valve VA successively on first intake line 52, the first filter group 54, valve VC, be in series with valve VB successively on second intake line 53, the second filter group 55, valve VD, the outlet of first intake line 52, the outlet of second intake line 53 links to each other with the import of total output pipe 56, the top that is positioned at every glass substrate 2 corresponding positions is provided with branch's output pipe 57 that links to each other with total output pipe 56, evenly is provided with several nozzles 58 on every branch's output pipe 57.The filter regenerative circuit comprises backwash intake line 61 and backwash output pipe 62, the pipeline 63 of backwash intake line 61 by being in series with valve VE links to each other with first intake line 52 between the valve VC and the first filter group 54, the pipeline 64 of backwash intake line 61 by being in series with valve VF links to each other with second intake line 53 between the valve VD and the second filter group 55, the first filter group 54 links to each other with backwash output pipe 62 by the pipeline 65 that is in series with valve VG with first intake line 52 between the valve VA, and the second filter group 55 links to each other with backwash output pipe 62 by the pipeline 66 that is in series with valve VH with second intake line 55 between the valve VB.The inlet of backwash intake line 61 can join with water or etching soup.
Filter in the first filter group 54 and the second filter group 55 is arranged in parallel, and the quantity of every group of filter can be provided with according to the flow needs, as is 1~5.Present embodiment is illustrated as 3.
In reative cell 1, assemble storage tank 4 by pipeline with glass substrate 2 reacted etching soups and accessory substance mud, soup in the storage tank 4 can enter first intake line 52 or second intake line 53 by total intake line 5, when entering first intake line 52, valve VA, VC open, use the first filter group 54 to filter, valve VE, VG are in closed condition in the use.When entering second intake line 53, valve VB, VD open, and use the second filter group 55 to filter, and valve VF, VH are in closed condition in the use.No matter use which filter group, the phenomenon of blocking because pile up mud all can appear as time passes, and should be altered to off-the-shelf another filter group with valve pipe this moment by sequential control or manual working.When using the first filter group 54, can carry out backwash to the second filter group 55; When using the second filter group 55, can carry out backwash to the first filter group 54, discharge the mud of piling up by the backwash output pipe, realize the online regeneration of used filter with this, prolong the service time of filter.
When producing continuously, valve operation adopts the sequencing mode comparatively appropriate.Table 1 is depicted as the valve opening and closing state table of sequential control.
Table 1
VE | VG | VF | VH | VC | VA | VD | VB | |
When using the first filter group | ● | ● | ● | ● | ○ | ○ | ● | ● |
When regenerating the first filter group | ○ | ○ | ● | ● | ● | ● | ● | ● |
When using the second filter group | ● | ● | ● | ● | ● | ● | ○ | ○ |
When regenerating the second filter group | ● | ● | ○ | ○ | ● | ● | ● | ● |
As time passes, glass substrate and etching soup react and attenuation gradually, glass substrate can fall to an inclination because of himself weight, need use fixture that the glass substrate vertical fixing is lived when therefore carrying out the etching operation, to prevent that it from falling to an inclination, makes soup can evenly be ejected into the two sides of glass substrate.Generally adopt the securing mode in glass substrate bottom and two ends, the left and right sides, fixed form can have multiple, as adopting the bottom and the left and right sides face of clamp clamps glass substrate 2.The invention provides a kind of preferred fixed form, this fixed form is simple in structure, and dismounting is quick, is convenient to regulate according to the size of glass substrate 2, and is reliable and stable, and both can prevent that glass substrate from falling to an inclination, do not influence flowing of soup and mud again.As shown in Figure 3, Figure 4, this fixture 3 comprises support, support is assembled by bolt by the crossbeam 31 that is oppositely arranged, longeron 32 and montant 33, the middle and lower part of montant 33 also is fixed with middle cross beam 34 and middle longeron 35, evenly be fixed with the brace summer (not shown) that several parallel with longeron 32 between the crossbeam 31 of bottom, evenly be fixed with three supporting seats 36 on each brace summer, the top of supporting seat 36 has groove 37, is used to place glass substrate 2.As Fig. 5, shown in Figure 6, on the every crossbeam 31 at top with every glass substrate 2 corresponding positions, every middle cross beam 34 on being fixed with fixed head 38 respectively with every glass substrate 2 corresponding positions, be fixed with a fixed lever 39 respectively in the both sides of every glass substrate 2 on the fixed head 38.Has the gap between fixed lever 39 and the glass substrate 2, so be provided with, fixed lever 39 both can be lived the position limit of glass substrate 2, prevent that it from falling to an inclination, can make its flow velocity that does not influence soup and mud again, thereby eliminate because the glass baseplate surface that the unbalanced etching that change in flow produces causes is coarse and thickness deviation is big.This gap generally should remain on 1~1.5mm, and fixed lever 39 adopts macromolecule resin material to make, and can prevent the influence of the mud that etching soup and glass substrate 2 reactions are produced.
The fixed form of fixed lever 39 has multiple, Fig. 7 and Fig. 8 have provided a kind of preferred mode, offer the through hole 21 of oblique glass substrate 2 respectively at the place, two angles of fixed head 38, one end of every fixed lever 39 inserts in the through hole 21 and with fixed head 38 stickups and fixes, and the other end of every fixed lever 39 is obliquely extended to a side of glass substrate 2.
Glass substrate etching device of the present invention is compared with existing Etaching device, has the following advantages:
1, as shown in Figure 9, nozzle is arranged on the top of glass substrate, spray from the top, by nozzle below glass substrate on form the soup that evenly sprays, the etching soup is trickled along glass sides, and this mode can be made the ultrathin glass plate that can't be realized by former vertical injection glass-board surface mode, can realize the etching operation of the ultra-thin template of 0.3mm, can not weaken the intensity of glass substrate in the etching process, also can not cause breakage glass substrate.
2, existing soup circulation circuit As time goes on, filter causes pore blocked owing to collect mud, thereby flow reduces, the roughness of the variable effect glass substrate of flow when flow reaches restriction point, then must be changed filter, the entire job process stops, restart behind to be replaced the finishing, the production cost height, efficient is low.Medicine liquid circulation of the present invention adopts two filter groups to be used alternatingly, and can stably carry out the etching operation, remains certain pressure state, stability of flow, glass substrate is smooth, need not to change filter, can work continuously, improve production efficiency, reduce production cost; In addition, be provided with the online backwash loop of filter, can carry out online regeneration, prolonged the service time of filter used filter group.
Above-described embodiment is described preferred implementation of the present invention; be not that scope of the present invention is limited; design under the prerequisite of spirit not breaking away from the present invention; various distortion and improvement that those of ordinary skills make technical scheme of the present invention all should fall in the definite protection range of claims of the present invention.
Claims (8)
1. glass substrate etching device, comprise reative cell, be positioned at reative cell and be used for fixture that the glass substrate vertical fixing is lived, soup storage tank that communicates with reative cell and the medicine liquid circulation that communicates with the soup storage tank, medicine liquid circulation comprises several nozzles, it is characterized in that: described nozzle is uniform one-tenth one row above every glass substrate, described medicine liquid circulation also comprises total intake line that import communicates with the soup storage tank, filtration system and total output pipe, filtration system comprises first intake line and second intake line, the outlet of total intake line respectively with the import of first intake line, the import of second intake line links to each other, be in series with valve VA on first intake line successively, the first filter group, valve VC, be in series with valve VB on second intake line successively, the second filter group, valve VD, the outlet of first intake line, the outlet of second intake line links to each other with the import of total output pipe, the top that is positioned at every glass substrate corresponding position is provided with branch's output pipe that links to each other with total output pipe, and described nozzle is installed on branch's output pipe.
2. glass substrate etching device according to claim 1, it is characterized in that: described filtration system also comprises the filter regenerative circuit, described filter regenerative circuit comprises backwash intake line and backwash output pipe, the pipeline of described backwash intake line by being in series with valve VE links to each other with first intake line between the valve VC and the first filter group, the pipeline of backwash intake line by being in series with valve VF links to each other with second intake line between the valve VD and the second filter group, the first filter group links to each other with the backwash output pipe by the pipeline that is in series with valve VG with first intake line between the valve VA, and the second filter group links to each other with the backwash output pipe by the pipeline that is in series with valve VH with second intake line between the valve VB.
3. glass substrate etching device according to claim 1 and 2 is characterized in that: the filter in the described first filter group and the second filter group is arranged in parallel.
4. glass substrate etching device according to claim 1 and 2 is characterized in that: the quantity of the filter in the described first filter group and the second filter group is respectively 1~5.
5. glass substrate etching device according to claim 4, it is characterized in that: described fixture comprises support, support is assembled by the crossbeam that is oppositely arranged, longeron and montant, the middle and lower part of montant also is fixed with middle cross beam, evenly be fixed with the brace summer that several parallel with longeron between the crossbeam of bottom, evenly be fixed with several supporting seats on each brace summer, the top of supporting seat has the groove that is used to place glass substrate; On the every crossbeam at top with the every corresponding position of glass substrate, every middle cross beam on be fixed with fixed head respectively with the every corresponding position of glass substrate, be fixed with a fixed lever respectively in the both sides of every glass substrate on the fixed head, have the gap between fixed lever and the glass substrate.
6. glass substrate etching device according to claim 5 is characterized in that: described fixed lever adopts macromolecule resin material to make.
7. glass substrate etching device according to claim 6 is characterized in that: the gap between described fixed lever and the glass substrate is 1~1.5mm.
8. glass substrate etching device according to claim 7, it is characterized in that: the place, two angles of described fixed head offers the through hole of oblique glass substrate respectively, one end of described every fixed lever inserts in the through hole and with the fixed head stickup and fixes, and the other end of described every fixed lever is obliquely extended to a side of glass substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009101693266A CN101630635B (en) | 2009-08-25 | 2009-08-25 | glass substrate etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009101693266A CN101630635B (en) | 2009-08-25 | 2009-08-25 | glass substrate etching device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101630635A CN101630635A (en) | 2010-01-20 |
CN101630635B true CN101630635B (en) | 2011-11-30 |
Family
ID=41575690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009101693266A Expired - Fee Related CN101630635B (en) | 2009-08-25 | 2009-08-25 | glass substrate etching device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101630635B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101352469B1 (en) | 2012-02-02 | 2014-01-17 | (주) 청심이엔지 | Apparatus for etching glass wafer |
CN102617042A (en) * | 2012-03-29 | 2012-08-01 | 广州普耀光学科技有限公司 | Method and equipment for etching glass |
CN102659321B (en) * | 2012-05-14 | 2015-03-18 | 汕头市拓捷科技有限公司 | Equipment and method for single-surface thinning of multiple pieces of glass |
WO2014091561A1 (en) * | 2012-12-11 | 2014-06-19 | 富士技研工業株式会社 | Method for renewing chemical solution used for device for etching liquid crystal glass, nozzle for chemical solution renewal, and chemical solution for renewal |
CN103396003A (en) * | 2013-07-24 | 2013-11-20 | 惠晶显示科技(苏州)有限公司 | Protection mechanism in glass etching device |
CN109485263A (en) * | 2018-10-18 | 2019-03-19 | 武汉华星光电半导体显示技术有限公司 | Panel thinning apparatus and its fixed structure |
CN113735454B (en) * | 2021-08-16 | 2022-12-02 | 蚌埠高华电子股份有限公司 | Low-pressure acid mist etching equipment for liquid crystal glass and automatic control method thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1669967A (en) * | 2004-03-17 | 2005-09-21 | 西山不锈化学股份有限公司 | Glass panel surface etching method and apparatus, glass panel and flat display |
CN101481217A (en) * | 2008-01-09 | 2009-07-15 | 伊可尼股份有限公司 | An apparatus for etching a glass wafer, and a glass sheet manufactured by the same |
-
2009
- 2009-08-25 CN CN2009101693266A patent/CN101630635B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1669967A (en) * | 2004-03-17 | 2005-09-21 | 西山不锈化学股份有限公司 | Glass panel surface etching method and apparatus, glass panel and flat display |
CN101481217A (en) * | 2008-01-09 | 2009-07-15 | 伊可尼股份有限公司 | An apparatus for etching a glass wafer, and a glass sheet manufactured by the same |
Also Published As
Publication number | Publication date |
---|---|
CN101630635A (en) | 2010-01-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101630635B (en) | glass substrate etching device | |
CN106925126A (en) | A kind of soft flat membrane components of new MBR and its membrane module | |
WO2023231277A1 (en) | Automatic backwashing filtration apparatus and method for low-temperature multi-effect distillation seawater desalination system | |
CN206730875U (en) | A kind of high density plate film assembly | |
CN112723538A (en) | Upflow type small-resistance anti-clogging anaerobic water distributor and process method thereof | |
CN102127792A (en) | Electrophoresis energy-saving device and energy-saving method thereof | |
CN207153485U (en) | One kind is used for membrane for water treatment elastic fixing structure | |
CN206887876U (en) | A kind of water conservancy project physical experiments stable water supply device | |
CN210595448U (en) | Easy-to-overhaul light filter material denitrification biological filter | |
CN101481175B (en) | V shaped groove type microgrid component capable of continuously on-line updating dynamic membrane and use method thereof | |
CN201882972U (en) | Grid type aeration tank | |
CN201750989U (en) | Assembled ultrafiltration host | |
CN203807578U (en) | Device and system for electroplating thin plate | |
CN202427214U (en) | Improved hot-rolling water treatment high-seed filter | |
CN103993339B (en) | A kind of apparatus and system of electroplating thin plate | |
CN207748917U (en) | A kind of short-cut nitrification and denitrification water-distributing device | |
CN214416866U (en) | UV glue coating machine | |
CN110117062A (en) | A kind of novel biofilter backwash gas distributing pipeline system and biological aerated filter | |
CN208916981U (en) | Water purification unit and have its urea machine | |
CN218844562U (en) | Mining concentrated liquid supply type emulsification pump station base structure | |
CN211770531U (en) | Folded plate denitrification biological filter suitable for light filter material | |
CN210795915U (en) | Umbrella-shaped denitrification biological filter suitable for light filter material | |
CN210620503U (en) | Integrated sewage treatment equipment with ABR anaerobic tank | |
CN219136469U (en) | Recycling device for grinding wastewater in semiconductor industry | |
CN206772084U (en) | A kind of waste water heat energy recovery system with filter |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20111130 Termination date: 20140825 |
|
EXPY | Termination of patent right or utility model |