TWI649285B - Method of horizontal glass etching - Google Patents

Abstract

A method for horizontal glass etching, comprising: A010: providing a glass to horizontally place the glass, the glass comprising a first surface and a second surface; A020: providing a film on the second surface of the glass; A030 Spraying a deoxidizing layer activator on the first surface of the glass; A040: spraying a first atomizing agent on the first surface of the glass to form a plurality of first atomizing particles on the first surface; A050: spraying a second atomizing agent on the first surface of the glass to form the plurality of second atomizing particles; A060: spraying a de-crystalizing agent on the first surface of the glass; A070: spraying an actinizing agent on the first surface of the glass to form the second atomized particles to form a plurality of actinic structures; and A080: removing the film.

Description

Horizontal glass etching method

A method of glass etching, in particular, a glass etching method in which glass is placed horizontally.

With the advancement of technology, many electronic devices have gradually replaced the traditional mechanical operating devices with touch devices, and increased the operating space and display size to provide a more intuitive and convenient operation, such as a central control screen for smart phones or automobiles. And other devices. Under such a background, the demand for touch devices in various fields has increased greatly, and the demand for anti-glare glass (AG Glass, hereinafter referred to as AG glass) on touch devices has also increased. At present, the market competition of related applications is fierce, and the automotive panel market, which has been gradually valued in recent years, has greatly improved the demand and quality requirements of AG glass. At present, the AG glass type, which is mainly used in the market, adopts a coating process, which is sprayed on the surface of the glass by means of a chemical agent, and then forms a microstructure on the surface of the glass by means of heating to achieve an anti-glare function. However, the AG glass coated with the coating has poor abrasion resistance, and the microstructural peeling often occurs for a long time, resulting in a poor hand feeling of the panel. Further, in the AG glass in the vehicle panel, since the interior environment of the vehicle is often at a high temperature, the coating microstructure of the AG glass is easily peeled off at a high temperature. Therefore, coated AG glass cannot be applied to the vehicle panel. The microstructure of the etched AG glass is formed by the glass itself, which has better wear resistance and lower sensitivity to temperature, and is bound to become the mainstream product of the future AG glass. The etching glass commonly used on the market is mostly made by immersion etching technology. The immersion etching technique places the etching liquid in a process tank, and then immerses the glass vertically from top to bottom into the etching liquid to form a grain of the glass surface. However, the immersion glass etching technique has the following disadvantages: 1. When the glass enters and exits the etching liquid, the etching liquid flows downward by gravity, causing a trace of liquid flow on the surface of the glass. 2. Since the glass enters the etching liquid vertically, the lower end of the glass is immersed in the etching liquid for a relatively long time, resulting in uneven surface texture. 3. If the glass is large in size or thin in thickness, it will be unevenly stressed when standing, and the glass will be easily bent or broken. Therefore, in view of the various defects of the immersion glass etching technology, it is difficult to meet the requirements of the market AG glass at this stage. Therefore, how to provide a better glass etching technology is worthy of consideration in the field.

In view of the above, the present invention provides a horizontal glass etching method capable of more efficiently producing etched glass and improving productivity and yield. The invention provides a method for horizontal glass etching, comprising: A010: providing a glass to horizontally place the glass, the glass comprising a first surface and a second surface; A020: providing a second surface of the glass a film; A030: spraying a deoxidizing layer activator on the first surface of the glass; A040: spraying a first atomizing agent on the first surface of the glass, forming a plurality of first fogs on the first surface A050: spraying a second atomizing agent on the first surface of the glass to form the plurality of second atomized particles; A060: spraying a first surface of the glass a crystallization agent; A070: spraying an actinizing agent on the first surface of the glass to form the plurality of actinic structures; and A080: removing the film. The above method of horizontal glass etching, wherein the step A10 and A20 further comprises: A011: cleaning the glass; and A012: drying the glass; after the step A80 further comprising: A081: cleaning the glass; and A082: The glass is dried. The above method of horizontal glass etching, wherein in steps A011, A081, the glass is cleaned using a neutral detergent. In the above method of horizontal glass etching, in step A030, the deoxidation depth of the first surface is controlled to be less than 300 nm. The above method for horizontal glass etching, wherein, in step A040, the first atomized particle size is between 100 and 500 nm; and in step A050, the second atomized particle size is between 20 and 20 ~90 nm between. The above method of horizontal glass etching, wherein, in step A060, the seed remover is an acidic substance suitable for removing the first atomized particles or the twinned sand between the second atomized particles. In the above method of horizontal glass etching, in step A070, the thickness of the actinic structure is controlled to be less than 100 nm. The above method of horizontal glass etching, wherein in step A070, the actin is a hydrofluorinated acid-free substance. In the above method of horizontal glass etching, in steps A012 and A082, the glass is dried using an air knife. In the above method for horizontal glass etching, in the step A020, the film is a fluorine-resistant polymer film.

Please refer to FIG. 1A, FIG. 1B and FIG. 2A to FIG. 2P. FIG. 1A and FIG. 1B illustrate a method for horizontal glass etching according to the present invention. 2A to 2P are schematic views of horizontal glass etching. The present invention provides a method of placing the glass 100 horizontally and processing the surface of the glass 100 by etching to form a microstructure on the surface of the glass 100 to achieve the anti-glare effect of the glass 100. The following is a description of the flowcharts of FIGS. 1A and 1B and the schematic diagrams of FIGS. 2A to 2P. First, a glass 100 is provided and the glass 100 is placed horizontally. The glass 100 further includes a first surface 110 and a second surface 120 (step S010, FIG. 2A), FIG. 2A. The first surface 110 is a processing surface of the glass 110, so it is placed upward when placed for subsequent processing. The second surface 120 is then placed face down. In some embodiments, the first surface 110 is referred to as a Tin surface; the second surface 120 is referred to as an Air surface. Next, the glass 100 is cleaned (step S011, FIG. 2B), and dirt, deposits, dust, or other impurities on the glass 100 are washed away. Avoid affecting the formation of the surface structure of the glass 100 during the etching process. In the present embodiment, step S011 is to clean the glass 100 using the neutral detergent 11, and to clean the first surface 110. Next, the glass 100 is dried (step S012, FIG. 2C), and the liquid or other substance on the glass 100 is removed to keep the glass 100 dry. In the present embodiment, drying is performed using the air knife device 10. The air knife device 10 is capable of providing dry, clean high pressure air. The residual neutral detergent 11 on the first surface 110 of the glass 100 is removed with high pressure air and the glass 100 is kept dry. Then, a film 121 is disposed on the second surface 120 of the glass 100 (step S020, FIG. 2D). The film 121 is attached to the second surface 120 of the glass 100, and can protect the second surface 120 in the subsequent process. Not affected. In the present embodiment, the film 121 is a fluorine-resistant polymer film, which can protect the second surface 120 of the glass 100 from contamination, so as to facilitate subsequent processes. After the film 121 is set, a deoxidizing layer activator 12 is sprayed on the first surface 110 of the glass 100 (step S030, FIG. 2E). The deoxidation layer activator 12 is capable of removing the oxide layer of the first surface 110 and activating the first surface 110. The activated first surface 110 can be more fully reacted with the etching liquid or agent in a subsequent step. In the present embodiment, the deoxidation layer activator 12 is an alkaline substance, and during deoxidation, the depth of deoxidation will be controlled within 300 nm. Next, the glass 100 is cleaned (step S031, FIG. 2F), and the deoxidation layer activator 12 on the first surface 110 of the glass 100 is removed. In this embodiment, after cleaning the glass 100 and its first surface 110 with ultrapure water (DIW) in step S031, a first atomizing agent 14 is sprayed on the first surface 110 of the glass 100, and on the first surface. A plurality of first atomized particles 111 are formed on 110 (step S040, FIG. 2G). The first atomizing agent 14 is capable of initially forming a microstructure (i.e., the first atomized particles 111) on the first surface 110, and initially forms an atomizing effect on the surface of the glass 110. In the present embodiment, the first atomizing agent 14 is a micron-sized atomizing agent, and the size of the first atomizing particles 111 formed is between 100 nm and 500 nm. Then, a second atomizing agent 15 is sprayed on the first surface 110 of the glass 100 to form the first atomizing particles 111 into a plurality of second atomizing particles 112 (step S050, FIG. 2H). The second atomizing agent 15 is capable of further refining the first atomized particles 111 into the second atomized particles 112. Therefore, in the present embodiment, the second atomizing agent 15 is a nano-sized atomizing agent, and the second atomizing particles formed have a size of between 20 nm and 90 nm. The first surface 110 of the glass 100 is further formed to have an atomizing effect. Next, the glass is cleaned (step S051), and the first atomizing agent 14 remaining on the first surface 110 and the first atomizing agent 15 are removed, and in step S061, the glass 100 is cleaned using the ultrapure water 13. Next, the de-crystallizing agent 16 is sprayed on the first surface 110 of the glass 100 (step S060, FIG. 2J). In the foregoing steps S040, S050, when the first atomized particles 111 and the second atomized particles 112 are formed, fine crystal sand 113 is generated between the first atomized particles 111 or the second atomized particles 112, and the crystals are removed. The agent 16 is capable of eliminating these twin sands 113. In the present embodiment, the crystallization remover 16 is an acidic substance, and the crystallization remover 16 is adapted to remove the twinned sand 113 between the first atomized particles 111 or the second atomized particles 112. Thereafter, the glass 100 is cleaned (step S061, FIG. 2K), and the residual crystallizing agent 16 on the first surface 110 is removed. In step S061, the glass 100 is cleaned using ultrapure water 13. Next, an actin 17 is sprayed onto the first surface 110 of the glass 100 to form the second atomized particles 112 into a plurality of actinic structures 114. After the actinic structure 114 is formed on the first surface 110 of the glass 100, the glass 100 can be made to have an anti-glare effect. In the present embodiment, the actinator 17 is a hydrofluorinated acid-free substance, and the thickness of the formed actinic structure 114 is controlled to be less than 100 nm. Then, the glass 100 is cleaned (step S071, FIG. 2M), and the residual actin 17 on the first surface 110 of the glass 100 is removed. In step S071, the glass 100 is cleaned using ultrapure water 13. After a series of surface treatments, the film 121 on the second surface 120 can be removed (step S080, Fig. 2N). Next, the glass 100 is cleaned once (step S081, FIG. 2O), and the stain on the first surface 110 of the glass 100 is removed. In step S081, the glass is cleaned using the neutral detergent 11. Then, the glass 100 is dried (step S082, FIG. 2P), and the liquid or the remaining liquid on the glass 100 is removed by high-pressure air using the air knife device 10 to keep the glass 100 dry. Thus, the method of horizontal glass etching is completed, and the glass 100 of the foregoing steps S010 to S082 has its first surface 110 formed with an actinic structure 114. The actinic structure 114 is a microstructure in which the surface of the glass 100 constitutes an anti-glare effect. Next, the glass 100 can enter an inspection procedure to further check whether the actinic structure 114 on the surface of the glass 100 has flaws. In some embodiments, the glass 100 can be placed on a conveyor belt, and the corresponding equipment is designed in each step, and the glass 100 is sequentially passed through the corresponding equipment horizontally, and the above-described horizontal glass etching method has been completed. The horizontal glass etching method of the present invention processes the glass 100 in a horizontal manner. Compared with the conventional vertical immersion technique, the defects caused by the aforementioned vertical immersion can be overcome, that is, the glass 100 is placed horizontally, and the atomizing agent and the actin agent do not generate additional traces due to gravity flow; the glass 100 When placed horizontally, when the glass 100 is sprayed with the atomizing agent and the actin agent, the glass 100 can be uniformly sprayed with the atomizing agent and the actin agent; the glass 100 is placed horizontally, and the glass 100 is not bent due to uneven force. Or break. The horizontal glass etching method of the present invention can greatly improve the production yield of the glass 100, and can also significantly improve the production efficiency and quality, and can produce a high-quality anti-glare glass product that meets market demands. The present invention has been described above, but it is not intended to limit the scope of patent rights claimed herein. The scope of patent protection is subject to the scope of the patent application and its equivalent fields. Any changes or modifications made by those skilled in the art without departing from the spirit or scope of this patent are subject to the equivalent changes or designs made in the spirit of the present disclosure and should be included in the scope of the patent application below. Inside.

10‧‧‧Air knife device

11‧‧‧Neutral detergent

12‧‧‧Deoxidized layer activator

13‧‧‧Ultra pure water

14‧‧‧First atomizing agent

15‧‧‧Second atomizer

16‧‧‧Desalting agent

17‧‧‧Photochemical

100‧‧‧ glass

110‧‧‧ first surface

111‧‧‧First atomized particles

112‧‧‧Second atomized particles

113‧‧‧矽晶沙

114‧‧‧Photochemical structure

120‧‧‧second surface

121‧‧‧film

S010~S082‧‧‧ Flowchart steps

1A and 1B illustrate a method of horizontal glass etching of the present invention. 2A to 2P are schematic views of horizontal glass etching.

Claims (10)

A method for horizontal glass etching, comprising: A010: providing a glass to horizontally place the glass, the glass comprising a first surface and a second surface; A020: providing a film on the second surface of the glass; A030 Spraying a deoxidizing layer activator on the first surface of the glass; A040: spraying a first atomizing agent on the first surface of the glass to form a plurality of first atomizing particles on the first surface; A050: spraying a second atomizing agent on the first surface of the glass to form the plurality of second atomizing particles; A060: spraying a de-crystalizing agent on the first surface of the glass; A070: spraying an actinizing agent on the first surface of the glass to form the second atomized particles to form a plurality of actinic structures; and A080: removing the film. The method of horizontal glass etching according to claim 1, wherein the step A10 and A20 further comprises: A011: cleaning the glass; and A012: drying the glass; and after step A80, further comprising: A081: cleaning the Glass; and A082: Dry the glass. A method of horizontal glass etching according to claim 2, wherein in steps A011 and A081, the glass is cleaned using a neutral detergent. In the method of horizontal glass etching according to claim 1, in step A030, the deoxidation depth of the first surface is controlled to be less than 300 nm. In the method of horizontal glass etching according to claim 1, in step A040, the first atomized particle size is between 100 and 500 nanometers; in step A050, the second atomized particle size is It is between 20 and 90 nm. The method of horizontal glass etching according to claim 1, wherein in step A060, the seed remover is an acidic substance suitable for removing the first atomized particles or the twinned sand between the second atomized particles. . In the method of horizontal glass etching according to claim 1, in step A070, the thickness of the actinic structure is controlled to be less than 100 nm. In the method of horizontal glass etching according to claim 1, in step A070, the actin is a hydrofluorinated acid-free substance. In the method of horizontal glass etching according to item 2 of the patent application, in steps A012 and A082, the glass is dried using an air knife. In the method of horizontal glass etching according to claim 1 of the patent application, in step A020, the film is a polymer film of a hydrofluoric acid resistant polymer.