SK282993B6 - Spôsob ukladania filmu na sklenom substráte metódou nanášania z chemických pár - Google Patents
Spôsob ukladania filmu na sklenom substráte metódou nanášania z chemických pár Download PDFInfo
- Publication number
- SK282993B6 SK282993B6 SK915-93A SK91593A SK282993B6 SK 282993 B6 SK282993 B6 SK 282993B6 SK 91593 A SK91593 A SK 91593A SK 282993 B6 SK282993 B6 SK 282993B6
- Authority
- SK
- Slovakia
- Prior art keywords
- layer
- tin oxide
- oxide
- precursor
- refractive index
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 81
- 239000011521 glass Substances 0.000 title claims abstract description 49
- 239000000758 substrate Substances 0.000 title claims description 35
- 238000000576 coating method Methods 0.000 title abstract description 27
- 239000011248 coating agent Substances 0.000 title abstract description 15
- 238000000151 deposition Methods 0.000 claims abstract description 54
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 50
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 41
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 37
- 239000002243 precursor Substances 0.000 claims abstract description 35
- 239000000203 mixture Substances 0.000 claims description 40
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical group CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 37
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 26
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical group CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 claims description 24
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical group CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 claims description 22
- 239000000126 substance Substances 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 14
- -1 or a straight Chemical group 0.000 claims description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 150000001642 boronic acid derivatives Chemical class 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 229910001392 phosphorus oxide Inorganic materials 0.000 claims description 6
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims description 3
- 150000004820 halides Chemical class 0.000 claims description 3
- 235000021317 phosphate Nutrition 0.000 claims description 3
- VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical group CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
- KXJLGCBCRCSXQF-UHFFFAOYSA-N [diacetyloxy(ethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(OC(C)=O)OC(C)=O KXJLGCBCRCSXQF-UHFFFAOYSA-N 0.000 claims description 2
- 125000002252 acyl group Chemical group 0.000 claims description 2
- 229910052810 boron oxide Inorganic materials 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical group 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 2
- 239000012686 silicon precursor Substances 0.000 claims description 2
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims description 2
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 claims description 2
- 150000002222 fluorine compounds Chemical class 0.000 claims 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 claims 1
- GCTFWCDSFPMHHS-UHFFFAOYSA-M Tributyltin chloride Chemical compound CCCC[Sn](Cl)(CCCC)CCCC GCTFWCDSFPMHHS-UHFFFAOYSA-M 0.000 claims 1
- AONDIGWFVXEZGD-UHFFFAOYSA-N diacetyloxy(methyl)silicon Chemical compound CC(=O)O[Si](C)OC(C)=O AONDIGWFVXEZGD-UHFFFAOYSA-N 0.000 claims 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims 1
- RJGHQTVXGKYATR-UHFFFAOYSA-L dibutyl(dichloro)stannane Chemical compound CCCC[Sn](Cl)(Cl)CCCC RJGHQTVXGKYATR-UHFFFAOYSA-L 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- DVYWNXMKZUKBRA-UHFFFAOYSA-N tetrakis(1-methoxypropan-2-yl) silicate Chemical compound COCC(C)O[Si](OC(C)COC)(OC(C)COC)OC(C)COC DVYWNXMKZUKBRA-UHFFFAOYSA-N 0.000 claims 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims 1
- 230000008021 deposition Effects 0.000 abstract description 41
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 22
- 239000000377 silicon dioxide Substances 0.000 abstract description 13
- 238000005299 abrasion Methods 0.000 abstract description 4
- 239000008246 gaseous mixture Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 4
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 36
- 239000007789 gas Substances 0.000 description 13
- 230000000694 effects Effects 0.000 description 12
- 238000003860 storage Methods 0.000 description 12
- 239000011135 tin Substances 0.000 description 12
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 11
- 239000000654 additive Substances 0.000 description 10
- 239000003570 air Substances 0.000 description 9
- 229910052718 tin Inorganic materials 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 239000002841 Lewis acid Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000010923 batch production Methods 0.000 description 3
- 229910052793 cadmium Inorganic materials 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- 150000007517 lewis acids Chemical class 0.000 description 3
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910008045 Si-Si Inorganic materials 0.000 description 2
- 229910006411 Si—Si Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 239000012702 metal oxide precursor Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- LFGREXWGYUGZLY-UHFFFAOYSA-N phosphoryl Chemical class [P]=O LFGREXWGYUGZLY-UHFFFAOYSA-N 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 230000001502 supplementing effect Effects 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 2
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 1
- SGNZYJXNUURYCH-UHFFFAOYSA-N 5,6-dihydroxyindole Chemical compound C1=C(O)C(O)=CC2=C1NC=C2 SGNZYJXNUURYCH-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- STSCVKRWJPWALQ-UHFFFAOYSA-N TRIFLUOROACETIC ACID ETHYL ESTER Chemical compound CCOC(=O)C(F)(F)F STSCVKRWJPWALQ-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- BTFOWJRRWDOUKQ-UHFFFAOYSA-N [Si]=O.[Sn] Chemical compound [Si]=O.[Sn] BTFOWJRRWDOUKQ-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000005234 alkyl aluminium group Chemical group 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 235000013361 beverage Nutrition 0.000 description 1
- UORVGPXVDQYIDP-BJUDXGSMSA-N borane Chemical class [10BH3] UORVGPXVDQYIDP-BJUDXGSMSA-N 0.000 description 1
- 229940065285 cadmium compound Drugs 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- BQLQQEHXQQLKEV-UHFFFAOYSA-N dimethoxy-methyl-trimethylsilylsilane Chemical compound CO[Si](C)(OC)[Si](C)(C)C BQLQQEHXQQLKEV-UHFFFAOYSA-N 0.000 description 1
- JDTCYQUMKGXSMX-UHFFFAOYSA-N dimethyl(methylsilyl)silane Chemical compound C[SiH2][SiH](C)C JDTCYQUMKGXSMX-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- UTUAUBOPWUPBCH-UHFFFAOYSA-N dimethylsilylidene(dimethyl)silane Chemical compound C[Si](C)=[Si](C)C UTUAUBOPWUPBCH-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 239000005344 low-emissivity glass Substances 0.000 description 1
- DWZFNULJNZJRLM-UHFFFAOYSA-N methoxy-dimethyl-trimethylsilylsilane Chemical compound CO[Si](C)(C)[Si](C)(C)C DWZFNULJNZJRLM-UHFFFAOYSA-N 0.000 description 1
- UPARUZSLIVQDTG-UHFFFAOYSA-N methyl(methylsilyl)silane Chemical compound C[SiH2][SiH2]C UPARUZSLIVQDTG-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 150000008301 phosphite esters Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical class Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XOSXWYQMOYSSKB-LDKJGXKFSA-L water blue Chemical compound CC1=CC(/C(\C(C=C2)=CC=C2NC(C=C2)=CC=C2S([O-])(=O)=O)=C(\C=C2)/C=C/C\2=N\C(C=C2)=CC=C2S([O-])(=O)=O)=CC(S(O)(=O)=O)=C1N.[Na+].[Na+] XOSXWYQMOYSSKB-LDKJGXKFSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Glass Compositions (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US81436691A | 1991-12-26 | 1991-12-26 | |
| US81435291A | 1991-12-27 | 1991-12-27 | |
| PCT/US1992/010872 WO1993012892A1 (en) | 1991-12-26 | 1992-12-21 | Method for coating glass substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| SK91593A3 SK91593A3 (en) | 1994-01-12 |
| SK282993B6 true SK282993B6 (sk) | 2003-01-09 |
Family
ID=27123834
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SK915-93A SK282993B6 (sk) | 1991-12-26 | 1992-12-21 | Spôsob ukladania filmu na sklenom substráte metódou nanášania z chemických pár |
| SK913-93A SK282141B6 (sk) | 1991-12-26 | 1992-12-21 | Spôsob povliekania skleného výrobku a prostriedok na vykonávanie tohto spôsobu |
| SK914-93A SK281638B6 (sk) | 1991-12-26 | 1992-12-21 | Sklenený výrobok |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SK913-93A SK282141B6 (sk) | 1991-12-26 | 1992-12-21 | Spôsob povliekania skleného výrobku a prostriedok na vykonávanie tohto spôsobu |
| SK914-93A SK281638B6 (sk) | 1991-12-26 | 1992-12-21 | Sklenený výrobok |
Country Status (26)
| Country | Link |
|---|---|
| US (2) | US5401305A (cs) |
| EP (4) | EP0573640A4 (cs) |
| JP (3) | JP3485920B2 (cs) |
| KR (3) | KR100238920B1 (cs) |
| CN (3) | CN1041815C (cs) |
| AR (1) | AR248263A1 (cs) |
| AT (2) | ATE272582T1 (cs) |
| AU (3) | AU3322893A (cs) |
| BR (3) | BR9205674A (cs) |
| CA (3) | CA2104591C (cs) |
| CZ (3) | CZ286855B6 (cs) |
| DE (2) | DE69230219T2 (cs) |
| DK (2) | DK0573639T3 (cs) |
| ES (2) | ES2221257T3 (cs) |
| GR (1) | GR3031624T3 (cs) |
| HU (3) | HUT67686A (cs) |
| MX (2) | MX9207592A (cs) |
| MY (1) | MY110355A (cs) |
| NO (3) | NO316642B1 (cs) |
| NZ (1) | NZ246459A (cs) |
| PL (1) | PL169649B1 (cs) |
| PT (4) | PT927706E (cs) |
| RU (2) | RU2102347C1 (cs) |
| SK (3) | SK282993B6 (cs) |
| UY (3) | UY23527A1 (cs) |
| WO (3) | WO1993012934A1 (cs) |
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| US5356718A (en) * | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
| US5863337A (en) * | 1993-02-16 | 1999-01-26 | Ppg Industries, Inc. | Apparatus for coating a moving glass substrate |
| US5599387A (en) * | 1993-02-16 | 1997-02-04 | Ppg Industries, Inc. | Compounds and compositions for coating glass with silicon oxide |
| US5395698A (en) * | 1993-06-04 | 1995-03-07 | Ppg Industries, Inc. | Neutral, low emissivity coated glass articles and method for making |
| JP3373298B2 (ja) | 1993-08-20 | 2003-02-04 | 旭硝子株式会社 | 機能性物品とその製造方法 |
| DE4433206A1 (de) * | 1994-09-17 | 1996-03-21 | Goldschmidt Ag Th | Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten |
| DE19504906A1 (de) * | 1995-02-15 | 1996-08-22 | Goldschmidt Ag Th | Verfahren zur Heißendvergütung von Hohlglaskörpern durch Aufbringen von Metallverbindungen auf die heiße äußere Glasoberfläche |
| CO4560356A1 (es) * | 1995-02-22 | 1998-02-10 | Elf Atochem Vlissingen Bv | Proceso para la produccion de un recubrimiento de proteccion sobre la superficie de un articulo de vidrio o ceramica |
| US5648175A (en) * | 1996-02-14 | 1997-07-15 | Applied Materials, Inc. | Chemical vapor deposition reactor system and integrated circuit |
| GB9616983D0 (en) * | 1996-08-13 | 1996-09-25 | Pilkington Plc | Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass |
| GB9710547D0 (en) * | 1997-05-23 | 1997-07-16 | Pilkington Plc | Coating method |
| GB9806027D0 (en) * | 1998-03-20 | 1998-05-20 | Glaverbel | Coated substrate with high reflectance |
| GB9806030D0 (en) * | 1998-03-20 | 1998-05-20 | Glaverbel | Solar control coated substrate with high reflectance |
| FR2780054B1 (fr) * | 1998-06-19 | 2000-07-21 | Saint Gobain Vitrage | Procede de depot d'une couche a base d'oxyde metallique sur un substrat verrier, substrat verrier ainsi revetu |
| FR2789698B1 (fr) * | 1999-02-11 | 2002-03-29 | Air Liquide | Procede et installation pour former un depot d'une couche sur un substrat |
| US6797388B1 (en) | 1999-03-18 | 2004-09-28 | Ppg Industries Ohio, Inc. | Methods of making low haze coatings and the coatings and coated articles made thereby |
| JP3227449B2 (ja) * | 1999-05-28 | 2001-11-12 | 日本板硝子株式会社 | 光電変換装置用基板とその製造方法、およびこれを用いた光電変換装置 |
| LU90432B1 (fr) * | 1999-09-01 | 2001-03-02 | Glaverbel | Couche pyrolytique phosphostannate ou borostannate et vitrage comportant cette couche |
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| US20040175500A1 (en) * | 2002-01-28 | 2004-09-09 | Akira Fujisawa | Method for forming transparent conductive film, transparent conductive film, glass substrate having the same and photoelectric transduction unit including the glass substrate |
| EP1375445A1 (fr) * | 2002-06-17 | 2004-01-02 | Glaverbel | Procédé de fabrication d'un vitrage pourvu d'un revêtement multicouche |
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| KR101429785B1 (ko) * | 2006-08-29 | 2014-08-18 | 필킹톤 그룹 리미티드 | 저 저항률의 도핑된 아연 산화물 코팅의 제조 방법 및 그에 의해 형성된 물품 |
| MY148287A (en) * | 2006-08-29 | 2013-03-29 | Pilkington Group Ltd | Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby |
| FR2913973B1 (fr) * | 2007-03-21 | 2011-02-18 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
| AU2008214505B2 (en) * | 2007-01-15 | 2013-02-07 | Saint-Gobain Glass France | Glass substrate coated with layers having an improved mechanical strength |
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| US8133599B2 (en) | 2008-11-19 | 2012-03-13 | Ppg Industries Ohio, Inc | Undercoating layers providing improved photoactive topcoat functionality |
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| US20100124642A1 (en) * | 2008-11-19 | 2010-05-20 | Ppg Industries Ohio, Inc. | Undercoating layers providing improved conductive topcoat functionality |
| DE102008060923B4 (de) | 2008-12-06 | 2012-09-27 | Innovent E.V. | Verwendung einer Schicht |
| RU2530484C2 (ru) * | 2009-07-06 | 2014-10-10 | Аркема Инк. | Подложка органического светоизлучающего диода, состоящая из прозрачного проводящего оксида (тсо) и антирадужного промежуточного слоя |
| US9224892B2 (en) * | 2009-12-21 | 2015-12-29 | Ppg Industries Ohio, Inc. | Silicon thin film solar cell having improved haze and methods of making the same |
| US9366783B2 (en) * | 2009-12-21 | 2016-06-14 | Ppg Industries Ohio, Inc. | Silicon thin film solar cell having improved underlayer coating |
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| FR2956659B1 (fr) * | 2010-02-22 | 2014-10-10 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
| EP2441860A1 (en) * | 2010-10-13 | 2012-04-18 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Apparatus and method for atomic layer deposition on a surface |
| US8557099B2 (en) | 2010-10-25 | 2013-10-15 | Ppg Industries Ohio, Inc. | Electrocurtain coating process for coating solar mirrors |
| RU2477711C1 (ru) * | 2011-08-12 | 2013-03-20 | Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Уральский федеральный университет имени первого Президента России Б.Н. Ельцина" | Легированное кварцевое стекло с тетраэдрической координацией атомов титана |
| US8734903B2 (en) | 2011-09-19 | 2014-05-27 | Pilkington Group Limited | Process for forming a silica coating on a glass substrate |
| US20140227512A1 (en) * | 2011-09-30 | 2014-08-14 | Arkema Inc. | Deposition of silicon oxide by atmospheric pressure chemical vapor deposition |
| CN102584025B (zh) * | 2012-01-19 | 2014-06-11 | 江苏秀强玻璃工艺股份有限公司 | 具有宽带隙折射率可调隔离层玻璃的制备方法 |
| US20130334089A1 (en) * | 2012-06-15 | 2013-12-19 | Michael P. Remington, Jr. | Glass Container Insulative Coating |
| JP6267316B2 (ja) * | 2013-03-12 | 2018-01-24 | ビトロ、エセ．ア．ベ． デ セ．ウベ． | 太陽電池用の高ヘイズ下層 |
| TW201716245A (zh) * | 2015-08-05 | 2017-05-16 | 康寧公司 | 用於將片材與載體鍵結之物件及方法 |
| US10858379B2 (en) * | 2015-11-11 | 2020-12-08 | Korea Research Institute Of Chemical Technology | Metal precursor for making metal oxide |
| EP3173507A1 (de) * | 2015-11-25 | 2017-05-31 | Umicore AG & Co. KG | Verfahren zur metallorganischen gasphasenabscheidung unter verwendung von lösungen von indiumalkylverbindungen in kohlenwasserstoffen |
| GB201523156D0 (en) * | 2015-12-31 | 2016-02-17 | Pilkington Group Ltd | High strength glass containers |
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| CN106217968A (zh) * | 2016-07-15 | 2016-12-14 | 常熟市赛蒂镶嵌玻璃制品有限公司 | 一种高耐磨防爆玻璃 |
| EP3676416A1 (en) * | 2017-08-31 | 2020-07-08 | Pilkington Group Limited | Chemical vapor deposition process for forming a silicon oxide coating |
| CN111032591B (zh) | 2017-08-31 | 2023-02-17 | 皮尔金顿集团有限公司 | 涂覆的玻璃制品、其制造方法，以及用其制成的光伏电池 |
| JP6993394B2 (ja) * | 2019-08-06 | 2022-02-21 | バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー | ケイ素化合物及びケイ素化合物を使用してフィルムを堆積する方法 |
| JP2023522993A (ja) * | 2020-04-23 | 2023-06-01 | ピルキントン グループ リミテッド | コーティングされたガラス物品の製造方法 |
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-
1992
- 1992-12-21 CZ CZ19931734A patent/CZ286855B6/cs not_active IP Right Cessation
- 1992-12-21 MX MX9207592A patent/MX9207592A/es unknown
- 1992-12-21 BR BR9205674A patent/BR9205674A/pt not_active IP Right Cessation
- 1992-12-21 SK SK915-93A patent/SK282993B6/sk unknown
- 1992-12-21 HU HU9302411A patent/HUT67686A/hu unknown
- 1992-12-21 AU AU33228/93A patent/AU3322893A/en not_active Abandoned
- 1992-12-21 DK DK93901245T patent/DK0573639T3/da active
- 1992-12-21 PT PT99106266T patent/PT927706E/pt unknown
- 1992-12-21 RU RU93058399A patent/RU2102347C1/ru not_active IP Right Cessation
- 1992-12-21 CZ CZ19931733A patent/CZ286854B6/cs not_active IP Right Cessation
- 1992-12-21 EP EP93901246A patent/EP0573640A4/en not_active Withdrawn
- 1992-12-21 CZ CZ19931735A patent/CZ289572B6/cs not_active IP Right Cessation
- 1992-12-21 AT AT99106266T patent/ATE272582T1/de not_active IP Right Cessation
- 1992-12-21 WO PCT/US1992/010874 patent/WO1993012934A1/en active IP Right Grant
- 1992-12-21 RU RU9293058398A patent/RU2091340C1/ru active
- 1992-12-21 BR BR9205672A patent/BR9205672A/pt not_active IP Right Cessation
- 1992-12-21 DE DE69230219T patent/DE69230219T2/de not_active Expired - Fee Related
- 1992-12-21 AU AU33230/93A patent/AU651754B2/en not_active Expired
- 1992-12-21 DE DE1992633396 patent/DE69233396T2/de not_active Expired - Fee Related
- 1992-12-21 NZ NZ246459A patent/NZ246459A/en unknown
- 1992-12-21 KR KR1019930702539A patent/KR100238920B1/ko not_active Expired - Fee Related
- 1992-12-21 CA CA002104591A patent/CA2104591C/en not_active Expired - Fee Related
- 1992-12-21 SK SK913-93A patent/SK282141B6/sk unknown
- 1992-12-21 ES ES99106266T patent/ES2221257T3/es not_active Expired - Lifetime
- 1992-12-21 AU AU33229/93A patent/AU663559B2/en not_active Expired
- 1992-12-21 JP JP51173693A patent/JP3485920B2/ja not_active Expired - Lifetime
- 1992-12-21 EP EP93901245A patent/EP0573639B1/en not_active Expired - Lifetime
- 1992-12-21 PL PL92300480A patent/PL169649B1/pl not_active IP Right Cessation
- 1992-12-21 KR KR1019930702538A patent/KR100238740B1/ko not_active Expired - Fee Related
- 1992-12-21 SK SK914-93A patent/SK281638B6/sk unknown
- 1992-12-21 EP EP99106266A patent/EP0927706B1/en not_active Expired - Lifetime
- 1992-12-21 HU HU9302413A patent/HUT67158A/hu unknown
- 1992-12-21 CA CA002104592A patent/CA2104592A1/en not_active Abandoned
- 1992-12-21 ES ES93901245T patent/ES2137984T3/es not_active Expired - Lifetime
- 1992-12-21 KR KR1019930702540A patent/KR100243801B1/ko not_active Expired - Fee Related
- 1992-12-21 MX MX9207591A patent/MX9207591A/es unknown
- 1992-12-21 BR BR9205673A patent/BR9205673A/pt not_active IP Right Cessation
- 1992-12-21 AT AT93901245T patent/ATE186039T1/de not_active IP Right Cessation
- 1992-12-21 HU HU9302412A patent/HU214047B/hu not_active IP Right Cessation
- 1992-12-21 WO PCT/US1992/010873 patent/WO1993013393A1/en active IP Right Grant
- 1992-12-21 CA CA002104590A patent/CA2104590C/en not_active Expired - Lifetime
- 1992-12-21 JP JP51173593A patent/JP3485919B2/ja not_active Expired - Lifetime
- 1992-12-21 JP JP51173493A patent/JP3485918B2/ja not_active Expired - Fee Related
- 1992-12-21 DK DK99106266T patent/DK0927706T3/da active
- 1992-12-21 WO PCT/US1992/010872 patent/WO1993012892A1/en active IP Right Grant
- 1992-12-26 CN CN92115316A patent/CN1041815C/zh not_active Expired - Lifetime
- 1992-12-26 CN CN92115289A patent/CN1041814C/zh not_active Expired - Lifetime
- 1992-12-26 CN CN92115290A patent/CN1043988C/zh not_active Expired - Fee Related
- 1992-12-28 UY UY23527A patent/UY23527A1/es not_active IP Right Cessation
- 1992-12-28 AR AR92324007A patent/AR248263A1/es active
- 1992-12-28 PT PT101160A patent/PT101160B/pt active IP Right Grant
- 1992-12-28 PT PT101161A patent/PT101161B/pt not_active IP Right Cessation
- 1992-12-28 UY UY23526A patent/UY23526A1/es not_active IP Right Cessation
- 1992-12-28 PT PT101159A patent/PT101159B/pt active IP Right Grant
- 1992-12-28 UY UY23528A patent/UY23528A1/es not_active IP Right Cessation
-
1993
- 1993-02-03 MY MYPI93000167A patent/MY110355A/en unknown
- 1993-07-19 EP EP93901244A patent/EP0582691A4/en not_active Withdrawn
- 1993-08-25 NO NO19933030A patent/NO316642B1/no unknown
- 1993-08-25 NO NO19933031A patent/NO316683B1/no not_active IP Right Cessation
- 1993-08-25 NO NO19933029A patent/NO316641B1/no unknown
- 1993-12-13 US US08/104,125 patent/US5401305A/en not_active Ceased
-
1999
- 1999-04-07 US US09/287,664 patent/USRE41799E1/en not_active Expired - Lifetime
- 1999-10-29 GR GR990402439T patent/GR3031624T3/el unknown
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