SG98057A1 - Dicing method and dicing apparatus for dicing plate-like workpiece - Google Patents
Dicing method and dicing apparatus for dicing plate-like workpieceInfo
- Publication number
- SG98057A1 SG98057A1 SG200203616A SG200203616A SG98057A1 SG 98057 A1 SG98057 A1 SG 98057A1 SG 200203616 A SG200203616 A SG 200203616A SG 200203616 A SG200203616 A SG 200203616A SG 98057 A1 SG98057 A1 SG 98057A1
- Authority
- SG
- Singapore
- Prior art keywords
- dicing
- workpiece
- plate
- dicing apparatus
- dicing method
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/009—Working by laser beam, e.g. welding, cutting or boring using a non-absorbing, e.g. transparent, reflective or refractive, layer on the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/123—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/146—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing a liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
- B28D1/221—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising by thermic methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/94—Laser ablative material removal
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mining & Mineral Resources (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001258159 | 2001-08-28 | ||
JP2002038032A JP2003151924A (ja) | 2001-08-28 | 2002-02-15 | ダイシング方法およびダイシング装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG98057A1 true SG98057A1 (en) | 2003-08-20 |
Family
ID=26621128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200203616A SG98057A1 (en) | 2001-08-28 | 2002-06-15 | Dicing method and dicing apparatus for dicing plate-like workpiece |
Country Status (7)
Country | Link |
---|---|
US (1) | US6734083B2 (fr) |
EP (1) | EP1293316A1 (fr) |
JP (1) | JP2003151924A (fr) |
KR (1) | KR20030019848A (fr) |
MY (1) | MY134301A (fr) |
SG (1) | SG98057A1 (fr) |
TW (1) | TW582096B (fr) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4856328B2 (ja) * | 2001-07-13 | 2012-01-18 | ローム株式会社 | 半導体装置の製造方法 |
JP2004214359A (ja) * | 2002-12-27 | 2004-07-29 | Tokyo Seimitsu Co Ltd | 基板加工方法および基板加工装置 |
US6777647B1 (en) * | 2003-04-16 | 2004-08-17 | Scimed Life Systems, Inc. | Combination laser cutter and cleaner |
JP2005032903A (ja) * | 2003-07-10 | 2005-02-03 | Oki Electric Ind Co Ltd | 半導体装置及びその製造方法 |
JP2005059064A (ja) * | 2003-08-13 | 2005-03-10 | Toshiba Corp | 加工方法及び半導体装置の製造方法 |
EP1738419B1 (fr) * | 2004-04-20 | 2012-07-11 | Showa Denko K.K. | Procédé de production d'une galette de dispositif électroluminescent à semi-conducteurs composés |
JP4683989B2 (ja) * | 2004-04-20 | 2011-05-18 | 昭和電工株式会社 | 化合物半導体発光素子ウェハーの製造方法 |
US6960117B1 (en) * | 2004-04-28 | 2005-11-01 | Sae Magnetics (H.K.) Ltd. | Method to eliminate defects on the periphery of a slider due to conventional machining processes |
US7163640B2 (en) | 2004-05-21 | 2007-01-16 | Hewlett-Packard Development Company, L.P. | Methods and systems for laser processing |
WO2006010289A2 (fr) * | 2004-07-30 | 2006-02-02 | Synova S.A. | Procede pour separer des unites electroniques de type circuits (puces) qui sont disposees sur une plaquette en semi-conducteur |
US7662661B2 (en) * | 2004-08-16 | 2010-02-16 | Harvatek Corporation | Method of manufacturing a substrate structure for increasing cutting precision and strength thereof |
US7923658B2 (en) * | 2004-09-13 | 2011-04-12 | Hewlett-Packard Development Company, L.P. | Laser micromachining methods and systems |
JP4018096B2 (ja) | 2004-10-05 | 2007-12-05 | 松下電器産業株式会社 | 半導体ウェハの分割方法、及び半導体素子の製造方法 |
US7422962B2 (en) * | 2004-10-27 | 2008-09-09 | Hewlett-Packard Development Company, L.P. | Method of singulating electronic devices |
EP1657020A1 (fr) * | 2004-11-10 | 2006-05-17 | Synova S.A. | Méthode et dispositif pour optimiser la cohérence d'un jet de fluide utilisé pour le travail de matériaux et buse pour un tel dispositif |
JP2006140341A (ja) * | 2004-11-12 | 2006-06-01 | Disco Abrasive Syst Ltd | ウエーハの分割方法 |
TWI290500B (en) * | 2004-12-14 | 2007-12-01 | Arima Optoelectronics Corp | Laser dicing apparatus for a silicon wafer and dicing method thereof |
US9034731B2 (en) * | 2005-02-03 | 2015-05-19 | Stats Chippac Ltd. | Integrated, integrated circuit singulation system |
JP5035653B2 (ja) * | 2005-03-18 | 2012-09-26 | 澁谷工業株式会社 | ハイブリッドレーザ加工装置 |
DE502006007281D1 (de) * | 2005-05-17 | 2010-08-05 | Technikus Ag | Verfahren zur materialbearbeitung mittels eines in einem wasserstrahl geführten lasers sowie vorrichtung zur durchführung des verfahrens |
JP4809632B2 (ja) | 2005-06-01 | 2011-11-09 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP4839818B2 (ja) * | 2005-12-16 | 2011-12-21 | 信越半導体株式会社 | 貼り合わせ基板の製造方法 |
JP2009524523A (ja) * | 2006-01-25 | 2009-07-02 | フラオンホファー−ゲゼルシャフト・ツア・フェルデルング・デア・アンゲヴァンテン・フォルシュング・エー・ファオ | 基板を精密加工するための方法および装置ならびにその使用 |
KR100711882B1 (ko) * | 2006-01-27 | 2007-04-25 | 삼성에스디아이 주식회사 | 유기 전계 발광표시장치 및 그의 제조방법 |
JP4885553B2 (ja) * | 2006-01-31 | 2012-02-29 | セイコーインスツル株式会社 | ダイシング方法及びダイシング装置 |
KR101129762B1 (ko) * | 2006-06-23 | 2012-03-26 | 히다치 가세고교 가부시끼가이샤 | 반도체 디바이스의 제조 방법 |
US20080003718A1 (en) * | 2006-06-30 | 2008-01-03 | Erwin Remoblas Estepa | Singulation Process for Block-Molded Packages |
US8022433B2 (en) | 2006-09-06 | 2011-09-20 | Hitachi Metals, Ltd. | Semiconductor sensor device and method for manufacturing same |
JP2008098216A (ja) * | 2006-10-06 | 2008-04-24 | Disco Abrasive Syst Ltd | ウエーハの加工装置 |
JP2008288285A (ja) * | 2007-05-15 | 2008-11-27 | Sharp Corp | 積層基板の切断方法、半導体装置の製造方法、半導体装置、発光装置及びバックライト装置 |
JP5196298B2 (ja) * | 2008-02-18 | 2013-05-15 | 澁谷工業株式会社 | レーザ加工装置 |
US8525074B2 (en) * | 2008-12-26 | 2013-09-03 | Denso Corporation | Machining method and machining system for micromachining a part in a machine component |
JP5381240B2 (ja) * | 2009-03-31 | 2014-01-08 | 凸版印刷株式会社 | Icチップ及びその製造方法 |
US8664043B2 (en) * | 2009-12-01 | 2014-03-04 | Infineon Technologies Ag | Method of manufacturing a laminate electronic device including separating a carrier into a plurality of parts |
KR101034619B1 (ko) * | 2009-12-29 | 2011-05-12 | 명지대학교 산학협력단 | 반도체 웨이퍼 다이싱 방법 |
JP5071487B2 (ja) * | 2010-01-06 | 2012-11-14 | 株式会社デンソー | レーザー加工装置およびレーザー加工方法 |
US20120160818A1 (en) * | 2010-06-14 | 2012-06-28 | Mitsubishi Electric Corporation | Laser machining apparatus and laser machining method |
JP2012109327A (ja) * | 2010-11-16 | 2012-06-07 | Disco Abrasive Syst Ltd | 分割方法 |
US8809166B2 (en) * | 2012-12-20 | 2014-08-19 | Nxp B.V. | High die strength semiconductor wafer processing method and system |
US9016552B2 (en) * | 2013-03-15 | 2015-04-28 | Sanmina Corporation | Method for forming interposers and stacked memory devices |
US9165832B1 (en) | 2014-06-30 | 2015-10-20 | Applied Materials, Inc. | Method of die singulation using laser ablation and induction of internal defects with a laser |
US9093518B1 (en) * | 2014-06-30 | 2015-07-28 | Applied Materials, Inc. | Singulation of wafers having wafer-level underfill |
TWI566288B (zh) * | 2014-07-14 | 2017-01-11 | 矽品精密工業股份有限公司 | 切割用載具及切割方法 |
JP7242220B2 (ja) * | 2018-09-03 | 2023-03-20 | キヤノン株式会社 | 接合ウェハ及びその製造方法、並びにスルーホール形成方法 |
CN108922866B (zh) * | 2018-09-13 | 2023-10-13 | 环维电子(上海)有限公司 | 切割盘以及切割机台 |
JP2020061496A (ja) * | 2018-10-11 | 2020-04-16 | 株式会社ディスコ | ウェーハの加工方法 |
US11289378B2 (en) * | 2019-06-13 | 2022-03-29 | Wolfspeed, Inc. | Methods for dicing semiconductor wafers and semiconductor devices made by the methods |
CN113053813A (zh) * | 2019-12-27 | 2021-06-29 | 美光科技公司 | 形成具有用于堆叠裸片封装的周边轮廓的半导体裸片的方法 |
US20210202318A1 (en) * | 2019-12-27 | 2021-07-01 | Micron Technology, Inc. | Methods of forming semiconductor dies with perimeter profiles for stacked die packages |
US11784092B2 (en) * | 2020-02-27 | 2023-10-10 | Micron Technology, Inc. | Disposing protective cover film and underfill layer over singulated integrated circuit dice for protection during integrated circuit processing |
CN111266660A (zh) * | 2020-03-20 | 2020-06-12 | 台州市双辉机械设备有限公司 | 一种vcm磁钢的切割方法及粘接工装 |
CN114714004B (zh) * | 2022-06-09 | 2022-09-13 | 西安晟光硅研半导体科技有限公司 | 基于水导激光滚圆晶锭的排水加工方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60163491A (ja) * | 1984-02-03 | 1985-08-26 | Omron Tateisi Electronics Co | 半導体レ−ザ・ウエハの劈開方法 |
JPH07115075A (ja) * | 1993-10-18 | 1995-05-02 | Sony Corp | ウェーハのダイシング装置 |
US5916460A (en) * | 1995-07-07 | 1999-06-29 | Hitachi Cable, Ltd. | Method and apparatus for dicing a substrate |
JPH11251264A (ja) * | 1998-02-27 | 1999-09-17 | Nec Kansai Ltd | ダイシング装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56103447A (en) * | 1980-01-22 | 1981-08-18 | Toshiba Corp | Dicing method of semiconductor wafer |
JPS63293939A (ja) | 1987-05-27 | 1988-11-30 | Hitachi Ltd | 半導体集積回路装置の製造方法 |
US5543365A (en) * | 1994-12-02 | 1996-08-06 | Texas Instruments Incorporated | Wafer scribe technique using laser by forming polysilicon |
JP3223421B2 (ja) | 1996-08-13 | 2001-10-29 | 株式会社東京精密 | ダイシング装置 |
JP3294254B2 (ja) | 1997-12-01 | 2002-06-24 | 株式会社東京精密 | ダイシング装置のスピンドル移動機構 |
JP3203365B2 (ja) | 1997-12-02 | 2001-08-27 | 株式会社東京精密 | ダイシング装置におけるワーク切断方法 |
US6271102B1 (en) | 1998-02-27 | 2001-08-07 | International Business Machines Corporation | Method and system for dicing wafers, and semiconductor structures incorporating the products thereof |
WO1999048137A2 (fr) | 1998-03-14 | 1999-09-23 | Michael Stromberg | Procede et dispositif permettant de traiter des tranches dotees de composants lors de l'amincissement de la tranche et de l'individualisation des composants |
TW419867B (en) * | 1998-08-26 | 2001-01-21 | Samsung Electronics Co Ltd | Laser cutting apparatus and method |
US6252197B1 (en) | 1998-12-01 | 2001-06-26 | Accudyne Display And Semiconductor Systems, Inc. | Method and apparatus for separating non-metallic substrates utilizing a supplemental mechanical force applicator |
US6211488B1 (en) * | 1998-12-01 | 2001-04-03 | Accudyne Display And Semiconductor Systems, Inc. | Method and apparatus for separating non-metallic substrates utilizing a laser initiated scribe |
KR100606955B1 (ko) * | 1999-09-21 | 2006-07-31 | 엘지.필립스 엘시디 주식회사 | 레이저 절단장치 및 그것에 의한 유리기판 절단방법 |
JP3484396B2 (ja) * | 2000-05-09 | 2004-01-06 | 新光電気工業株式会社 | ウェハーの切断方法 |
US6770544B2 (en) * | 2001-02-21 | 2004-08-03 | Nec Machinery Corporation | Substrate cutting method |
-
2002
- 2002-02-15 JP JP2002038032A patent/JP2003151924A/ja active Pending
- 2002-06-15 SG SG200203616A patent/SG98057A1/en unknown
- 2002-06-19 MY MYPI20022292A patent/MY134301A/en unknown
- 2002-06-20 EP EP02254316A patent/EP1293316A1/fr not_active Withdrawn
- 2002-06-20 US US10/175,677 patent/US6734083B2/en not_active Expired - Fee Related
- 2002-06-24 TW TW091113763A patent/TW582096B/zh not_active IP Right Cessation
- 2002-07-10 KR KR1020020040037A patent/KR20030019848A/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60163491A (ja) * | 1984-02-03 | 1985-08-26 | Omron Tateisi Electronics Co | 半導体レ−ザ・ウエハの劈開方法 |
JPH07115075A (ja) * | 1993-10-18 | 1995-05-02 | Sony Corp | ウェーハのダイシング装置 |
US5916460A (en) * | 1995-07-07 | 1999-06-29 | Hitachi Cable, Ltd. | Method and apparatus for dicing a substrate |
JPH11251264A (ja) * | 1998-02-27 | 1999-09-17 | Nec Kansai Ltd | ダイシング装置 |
Also Published As
Publication number | Publication date |
---|---|
US20030045031A1 (en) | 2003-03-06 |
MY134301A (en) | 2007-12-31 |
KR20030019848A (ko) | 2003-03-07 |
US6734083B2 (en) | 2004-05-11 |
TW582096B (en) | 2004-04-01 |
JP2003151924A (ja) | 2003-05-23 |
EP1293316A1 (fr) | 2003-03-19 |
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