SG68057A1 - Protective coating by high rate arc plasma deposition - Google Patents

Protective coating by high rate arc plasma deposition

Info

Publication number
SG68057A1
SG68057A1 SG1998001444A SG1998001444A SG68057A1 SG 68057 A1 SG68057 A1 SG 68057A1 SG 1998001444 A SG1998001444 A SG 1998001444A SG 1998001444 A SG1998001444 A SG 1998001444A SG 68057 A1 SG68057 A1 SG 68057A1
Authority
SG
Singapore
Prior art keywords
protective coating
high rate
plasma deposition
arc plasma
rate arc
Prior art date
Application number
SG1998001444A
Other languages
English (en)
Inventor
Barry Lee-Mean Yang
Steven Marc Gasworth
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of SG68057A1 publication Critical patent/SG68057A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
SG1998001444A 1997-06-26 1998-06-17 Protective coating by high rate arc plasma deposition SG68057A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5082197P 1997-06-26 1997-06-26
US09/036,776 US6110544A (en) 1997-06-26 1998-03-09 Protective coating by high rate arc plasma deposition

Publications (1)

Publication Number Publication Date
SG68057A1 true SG68057A1 (en) 1999-10-19

Family

ID=26713488

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998001444A SG68057A1 (en) 1997-06-26 1998-06-17 Protective coating by high rate arc plasma deposition

Country Status (10)

Country Link
US (2) US6110544A (de)
EP (1) EP0887437B1 (de)
JP (1) JP4833388B2 (de)
KR (2) KR100786439B1 (de)
CN (2) CN1198957C (de)
BR (1) BR9802208A (de)
CA (1) CA2238208C (de)
DE (1) DE69837954T2 (de)
ES (1) ES2288761T3 (de)
SG (1) SG68057A1 (de)

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KR20060119828A (ko) 2006-11-24
CA2238208C (en) 2008-03-25
KR100766141B1 (ko) 2007-10-10
BR9802208A (pt) 1999-06-29
JPH1171681A (ja) 1999-03-16
EP0887437B1 (de) 2007-06-20
KR19990007365A (ko) 1999-01-25
CN1198957C (zh) 2005-04-27
US6110544A (en) 2000-08-29
EP0887437A3 (de) 2001-04-11
US6432494B1 (en) 2002-08-13
JP4833388B2 (ja) 2011-12-07
DE69837954D1 (de) 2007-08-02
DE69837954T2 (de) 2008-02-21
CA2238208A1 (en) 1998-12-26
CN1641069A (zh) 2005-07-20
CN1210901A (zh) 1999-03-17
ES2288761T3 (es) 2008-01-16
KR100786439B1 (ko) 2009-03-31
EP0887437A2 (de) 1998-12-30

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